DE69801019D1 - Hochmolekulares Novolakphenolharz mit hohem Anteil an ortho-Bindungen - Google Patents

Hochmolekulares Novolakphenolharz mit hohem Anteil an ortho-Bindungen

Info

Publication number
DE69801019D1
DE69801019D1 DE69801019T DE69801019T DE69801019D1 DE 69801019 D1 DE69801019 D1 DE 69801019D1 DE 69801019 T DE69801019 T DE 69801019T DE 69801019 T DE69801019 T DE 69801019T DE 69801019 D1 DE69801019 D1 DE 69801019D1
Authority
DE
Germany
Prior art keywords
molecular weight
phenolic resin
novolak phenolic
high molecular
weight novolak
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69801019T
Other languages
English (en)
Other versions
DE69801019T2 (de
Inventor
Masayuki Inagaki
Shoji Tomita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Application granted granted Critical
Publication of DE69801019D1 publication Critical patent/DE69801019D1/de
Publication of DE69801019T2 publication Critical patent/DE69801019T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
DE69801019T 1997-04-15 1998-04-14 Hochmolekulares Novolakphenolharz mit hohem Anteil an ortho-Bindungen Expired - Lifetime DE69801019T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP9749397 1997-04-15
JP9749497 1997-04-15

Publications (2)

Publication Number Publication Date
DE69801019D1 true DE69801019D1 (de) 2001-08-09
DE69801019T2 DE69801019T2 (de) 2001-10-18

Family

ID=26438651

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69801019T Expired - Lifetime DE69801019T2 (de) 1997-04-15 1998-04-14 Hochmolekulares Novolakphenolharz mit hohem Anteil an ortho-Bindungen

Country Status (5)

Country Link
US (1) US5986035A (de)
EP (1) EP0872498B1 (de)
DE (1) DE69801019T2 (de)
ID (1) ID20161A (de)
TW (1) TW531543B (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1323780B1 (de) * 2000-06-12 2008-08-06 Mitsui Chemicals, Inc. Phenolharzzusammensetzung
US20040206702A1 (en) * 2002-08-08 2004-10-21 Davidson James M. Use of an oxidizer to improve trace metals removal from photoresist and photoresist components
JP4727958B2 (ja) * 2004-08-19 2011-07-20 旭有機材工業株式会社 ノボラック型フェノール樹脂の製造方法
KR100665758B1 (ko) * 2005-09-15 2007-01-09 제일모직주식회사 반사방지성을 갖는 하드마스크 조성물
US7654637B2 (en) * 2005-09-30 2010-02-02 Lexmark International, Inc Photoimageable nozzle members and methods relating thereto
US7571979B2 (en) * 2005-09-30 2009-08-11 Lexmark International, Inc. Thick film layers and methods relating thereto
DE102007015980B4 (de) * 2006-04-07 2015-11-05 Mitsubishi Gas Chemical Co., Inc. Verfahren zur Herstellung von Phenol-modifizierten aromatischen Kohlenwasserstoff-Formaldehyd-Harzen mit niedriger Viskosität

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS576444B2 (de) * 1974-04-18 1982-02-04
US4097463A (en) * 1977-01-10 1978-06-27 Monsanto Company Process for preparing high ortho novolac resins
JPS5948048B2 (ja) * 1978-12-28 1984-11-24 住友ベークライト株式会社 速硬化性フエノ−ル樹脂及びその製造方法
JPS5692908A (en) * 1979-12-27 1981-07-28 Mitsui Petrochem Ind Ltd High-molecular novolak type substituted phenolic resin, its preparation and application
JPS56103215A (en) * 1980-01-21 1981-08-18 Sumitomo Bakelite Co Ltd Crystalline phenolic novolak resin
JPS57177011A (en) * 1981-04-23 1982-10-30 Kanebo Ltd Granular or powdery phenol formaldehyde type resin and its preparation
JPS57187311A (en) * 1981-05-12 1982-11-18 Sumitomo Bakelite Co Ltd Production of novolak type phenol resin having extremely wide molecular weight distribution
JPS5980418A (ja) * 1982-10-29 1984-05-09 Mitsui Toatsu Chem Inc ハイオルソノボラツク樹脂の製造方法
JPS60260611A (ja) * 1984-06-08 1985-12-23 Mitsubishi Petrochem Co Ltd 高分子量クレゾ−ルノボラツク樹脂の製造方法
JPS6112714A (ja) * 1984-06-28 1986-01-21 Mitsubishi Petrochem Co Ltd 線状高分子量クレゾ−ルノボラツク樹脂の製造法
CA1279430C (en) * 1985-12-06 1991-01-22 Takashi Kubota High-molecular-weight soluble novolak resin and process for preparation thereof
JPH0735427B2 (ja) * 1986-03-31 1995-04-19 アイシン化工株式会社 速硬化性ノボラツク型フエノ−ル樹脂およびその製造方法
US5413894A (en) * 1993-05-07 1995-05-09 Ocg Microelectronic Materials, Inc. High ortho-ortho bonded novolak binder resins and their use in radiation-sensitive compositions

Also Published As

Publication number Publication date
DE69801019T2 (de) 2001-10-18
TW531543B (en) 2003-05-11
US5986035A (en) 1999-11-16
EP0872498A1 (de) 1998-10-21
EP0872498B1 (de) 2001-07-04
ID20161A (id) 1998-10-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition