DE69717182T2 - Excimerlasergenerator - Google Patents

Excimerlasergenerator

Info

Publication number
DE69717182T2
DE69717182T2 DE69717182T DE69717182T DE69717182T2 DE 69717182 T2 DE69717182 T2 DE 69717182T2 DE 69717182 T DE69717182 T DE 69717182T DE 69717182 T DE69717182 T DE 69717182T DE 69717182 T2 DE69717182 T2 DE 69717182T2
Authority
DE
Germany
Prior art keywords
excimer laser
excimer
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69717182T
Other languages
English (en)
Other versions
DE69717182D1 (de
Inventor
Tadahiro Ohmi
Yasuyuki Shirai
Naoto Sano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE69717182D1 publication Critical patent/DE69717182D1/de
Publication of DE69717182T2 publication Critical patent/DE69717182T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/0305—Selection of materials for the tube or the coatings thereon
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
DE69717182T 1996-03-07 1997-03-06 Excimerlasergenerator Expired - Lifetime DE69717182T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP7957096 1996-03-07
JP7957496 1996-03-07
JP7956896 1996-03-07
JP7956996 1996-03-07

Publications (2)

Publication Number Publication Date
DE69717182D1 DE69717182D1 (de) 2003-01-02
DE69717182T2 true DE69717182T2 (de) 2003-07-24

Family

ID=27466327

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69717182T Expired - Lifetime DE69717182T2 (de) 1996-03-07 1997-03-06 Excimerlasergenerator

Country Status (4)

Country Link
US (1) US6215806B1 (de)
EP (1) EP0794598B1 (de)
DE (1) DE69717182T2 (de)
TW (1) TW432763B (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3697036B2 (ja) * 1997-10-03 2005-09-21 キヤノン株式会社 露光装置及びそれを用いた半導体製造方法
US20020011215A1 (en) 1997-12-12 2002-01-31 Goushu Tei Plasma treatment apparatus and method of manufacturing optical parts using the same
US6379492B2 (en) * 1998-10-31 2002-04-30 Applied Materials, Inc. Corrosion resistant coating
JP3927327B2 (ja) * 1998-11-06 2007-06-06 株式会社小松製作所 ハロゲンガスを含むガスレーザ装置
WO2000034546A1 (fr) * 1998-12-04 2000-06-15 Stella Chemifa Kabushiki Kaisha Acier inoxydable revetu d'un film au fluorure passif et equipement produit au moyen de cet acier
JP3444350B2 (ja) * 1999-11-17 2003-09-08 ウシオ電機株式会社 エキシマレーザ装置
KR100767762B1 (ko) * 2000-01-18 2007-10-17 에이에스엠 저펜 가부시기가이샤 자가 세정을 위한 원격 플라즈마 소스를 구비한 cvd 반도체 공정장치
US6765201B2 (en) * 2000-02-09 2004-07-20 Hitachi, Ltd. Ultraviolet laser-generating device and defect inspection apparatus and method therefor
US6644324B1 (en) 2000-03-06 2003-11-11 Cymer, Inc. Laser discharge chamber passivation by plasma
US7006546B2 (en) * 2000-03-15 2006-02-28 Komatsu Ltd. Gas laser electrode, laser chamber employing the electrode, and gas laser device
US20030010288A1 (en) * 2001-02-08 2003-01-16 Shunpei Yamazaki Film formation apparatus and film formation method
DE20110048U1 (de) * 2001-06-18 2001-08-16 Lambda Physik Ag Gasentladungslaser mit Mitteln zur Entfernung von Gasverunreinigungen
US6810061B2 (en) * 2001-08-27 2004-10-26 Komatsu Ltd. Discharge electrode and discharge electrode manufacturing method
AU2009330191B2 (en) * 2008-12-22 2013-03-14 Ams Research Corporation Laser resonator
CN102517540B (zh) * 2011-12-20 2013-11-20 广东华南特种气体研究所有限公司 一种准分子***配置装置的钝化方法
US9583369B2 (en) * 2013-07-20 2017-02-28 Applied Materials, Inc. Ion assisted deposition for rare-earth oxide based coatings on lids and nozzles
US8929419B1 (en) 2013-08-13 2015-01-06 Lightmachinery Inc. Excimer laser with gas purification
US10131971B2 (en) * 2013-08-13 2018-11-20 Nippon Light Metal Company, Ltd. High strength aluminum alloy sheet for anodic oxide coated material and method of producing same and high strength anodic oxide aluminum alloy sheet
US10982811B2 (en) * 2016-04-05 2021-04-20 Kanto Denka Kogyo, Co., Ltd. Material, storage container using the material, valve attached to the storage container, method of storing ClF and method of using ClF storage container
CN111139428A (zh) * 2019-12-30 2020-05-12 中船重工（邯郸）派瑞特种气体有限公司 一种储存含氟化合物电子级气体钢瓶的钝化处理方法

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4888203A (en) * 1987-11-13 1989-12-19 Massachusetts Institute Of Technology Hydrolysis-induced vapor deposition of oxide films
US5018161A (en) * 1988-01-15 1991-05-21 Cymer Laser Technologies Compact excimer laser
US5029177A (en) 1988-01-15 1991-07-02 Cymer Laser Technologies Compact excimer laser
US5009963A (en) * 1988-07-20 1991-04-23 Tadahiro Ohmi Metal material with film passivated by fluorination and apparatus composed of the metal material
DE68918365T2 (de) 1988-07-20 1995-05-04 Hashimoto Chemical Ind Co Metallischer Werkstoff mit durch Fluorierung passiviertem Film und aus dem metallischen Werkstoff bestehende Anlage.
JPH0254751A (ja) 1988-08-17 1990-02-23 Tadahiro Omi 金属酸化処理装置及び金属酸化処理方法並びに金属装入方法
WO1990012434A1 (de) * 1989-04-04 1990-10-18 Doduco Gmbh & Co. Dr. Eugen Dürrwächter Elektrode für gepulste gas-laser und verfahren zu ihrer herstellung
JP3030351B2 (ja) 1990-01-19 2000-04-10 ステラケミファ株式会社 フッ化不働態膜が形成されたステンレス鋼、その製造方法並びにそのステンレスを用いた装置
JP2954716B2 (ja) 1990-03-08 1999-09-27 三菱アルミニウム株式会社 フッ化不働態膜を形成した工業材料およびその製造方法
JP2986859B2 (ja) 1990-07-05 1999-12-06 三菱アルミニウム株式会社 アルミニウム合金材およびその製造方法
US5343270A (en) * 1990-10-30 1994-08-30 Nikon Corporation Projection exposure apparatus
US5260961A (en) * 1990-11-01 1993-11-09 Florod Corporation Sealed excimer laser with longitudinal discharge and transverse preionization for low-average-power uses
CH683188A5 (de) * 1991-01-11 1994-01-31 Alusuisse Lonza Services Ag Aluminiumoberflächen.
JP3017301B2 (ja) * 1991-02-18 2000-03-06 大阪酸素工業株式会社 不動態膜の形成方法
US5450436A (en) * 1992-11-20 1995-09-12 Kabushiki Kaisha Komatsu Seisakusho Laser gas replenishing apparatus and method in excimer laser system
JP3691089B2 (ja) 1994-09-27 2005-08-31 ステラケミファ株式会社 フッ化処理用アルミニウム合金
JP3175515B2 (ja) * 1994-12-26 2001-06-11 キヤノン株式会社 露光装置及びそれを用いたデバイスの製造方法
CA2152567C (en) * 1995-06-23 2000-01-11 Kenneth M. Buckland Approach to directly performing asynchronous transfer mode (atm) adaptation layer 5 reassembly
US5748656A (en) * 1996-01-05 1998-05-05 Cymer, Inc. Laser having improved beam quality and reduced operating cost
DK0824154T3 (da) * 1996-08-15 2002-08-26 Alcan Tech & Man Ag Reflektor med resistent overflade

Also Published As

Publication number Publication date
EP0794598B1 (de) 2002-11-20
US6215806B1 (en) 2001-04-10
TW432763B (en) 2001-05-01
DE69717182D1 (de) 2003-01-02
EP0794598A1 (de) 1997-09-10

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition