DE69625688T2 - Verfahren und vorrichtung zur abscheidung von silizium in einem wirbelschichtreaktor - Google Patents
Verfahren und vorrichtung zur abscheidung von silizium in einem wirbelschichtreaktorInfo
- Publication number
- DE69625688T2 DE69625688T2 DE69625688T DE69625688T DE69625688T2 DE 69625688 T2 DE69625688 T2 DE 69625688T2 DE 69625688 T DE69625688 T DE 69625688T DE 69625688 T DE69625688 T DE 69625688T DE 69625688 T2 DE69625688 T2 DE 69625688T2
- Authority
- DE
- Germany
- Prior art keywords
- bed reactor
- fluid bed
- depositing silicon
- depositing
- silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/442—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using fluidised bed process
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
- B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
- B01J8/24—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles according to "fluidised-bed" technique
- B01J8/245—Spouted-bed technique
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/021—Preparation
- C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/19—Details relating to the geometry of the reactor
- B01J2219/194—Details relating to the geometry of the reactor round
- B01J2219/1941—Details relating to the geometry of the reactor round circular or disk-shaped
- B01J2219/1942—Details relating to the geometry of the reactor round circular or disk-shaped spherical
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Combustion & Propulsion (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/481,801 US5798137A (en) | 1995-06-07 | 1995-06-07 | Method for silicon deposition |
US08/487,008 US5810934A (en) | 1995-06-07 | 1995-06-07 | Silicon deposition reactor apparatus |
PCT/US1996/009690 WO1996041036A2 (en) | 1995-06-07 | 1996-06-07 | Method and apparatus for silicon deposition in a fluidized-bed reactor |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69625688D1 DE69625688D1 (de) | 2003-02-13 |
DE69625688T2 true DE69625688T2 (de) | 2003-10-23 |
Family
ID=27047054
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69625688T Expired - Lifetime DE69625688T2 (de) | 1995-06-07 | 1996-06-07 | Verfahren und vorrichtung zur abscheidung von silizium in einem wirbelschichtreaktor |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP0832312B1 (de) |
JP (1) | JPH11510560A (de) |
DE (1) | DE69625688T2 (de) |
TW (1) | TW541367B (de) |
WO (1) | WO1996041036A2 (de) |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5855678A (en) * | 1997-04-30 | 1999-01-05 | Sri International | Fluidized bed reactor to deposit a material on a surface by chemical vapor deposition, and methods of forming a coated substrate therewith |
DE19948395A1 (de) | 1999-10-06 | 2001-05-03 | Wacker Chemie Gmbh | Strahlungsbeheizter Fliessbettreaktor |
DE10359587A1 (de) | 2003-12-18 | 2005-07-14 | Wacker-Chemie Gmbh | Staub- und porenfreies hochreines Polysiliciumgranulat |
DE102005042753A1 (de) | 2005-09-08 | 2007-03-15 | Wacker Chemie Ag | Verfahren und Vorrichtung zur Herstellung von granulatförmigem polykristallinem Silicium in einem Wirbelschichtreaktor |
KR100756310B1 (ko) | 2006-02-07 | 2007-09-07 | 한국화학연구원 | 입자형 다결정실리콘 제조용 고압 유동층반응기 |
KR100661284B1 (ko) | 2006-02-14 | 2006-12-27 | 한국화학연구원 | 유동층 반응기를 이용한 다결정실리콘 제조 방법 |
KR100783667B1 (ko) * | 2006-08-10 | 2007-12-07 | 한국화학연구원 | 입자형 다결정 실리콘의 제조방법 및 제조장치 |
WO2009132198A2 (en) * | 2008-04-23 | 2009-10-29 | University Of Florida Research Foundation, Inc. | Method for making designed particle size distributions by flow manufacturing |
CN103787336B (zh) | 2008-09-16 | 2016-09-14 | 储晞 | 生产高纯颗粒硅的方法 |
JP2010119912A (ja) * | 2008-11-17 | 2010-06-03 | Ihi Corp | 流動層装置 |
KR101678661B1 (ko) | 2009-11-18 | 2016-11-22 | 알이씨 실리콘 인코포레이티드 | 유동층 반응기 |
CA2881640A1 (en) | 2012-08-29 | 2014-03-06 | Hemlock Semiconductor Corporation | Tapered fluidized bed reactor and process for its use |
CN105026029B (zh) * | 2012-12-31 | 2017-12-22 | 爱迪生太阳能公司 | 借助粒度分布控制使温度梯度最佳化而改进流化床反应器的操作 |
DE102013208071A1 (de) * | 2013-05-02 | 2014-11-06 | Wacker Chemie Ag | Wirbelschichtreaktor und Verfahren zur Herstellung von granularem Polysilicium |
DE102013208274A1 (de) * | 2013-05-06 | 2014-11-20 | Wacker Chemie Ag | Wirbelschichtreaktor und Verfahren zur Herstellung von granularem Polysilicium |
DE102013209076A1 (de) * | 2013-05-16 | 2014-11-20 | Wacker Chemie Ag | Reaktor zur Herstellung von polykristallinem Silicium und Verfahren zur Entfernung eines Silicium enthaltenden Belags auf einem Bauteil eines solchen Reaktors |
DE102013210039A1 (de) * | 2013-05-29 | 2014-12-04 | Wacker Chemie Ag | Verfahren zur Herstellung von granularem Polysilicium |
KR101541361B1 (ko) * | 2013-07-15 | 2015-08-03 | 광주과학기술원 | 나노코팅 입자 제조를 위한 유동층 원자층 증착 장치 |
DE102013223883A1 (de) * | 2013-11-22 | 2015-05-28 | Wacker Chemie Ag | Verfahren zur Herstellung von polykristallinem Silicium |
JP2014205145A (ja) * | 2014-06-23 | 2014-10-30 | ロード・リミテッド・エルピー | 流動床析出からの粒状微細物質の上方取り出しのための器械と方法 |
US9428830B2 (en) | 2014-07-02 | 2016-08-30 | Gtat Corporation | Reverse circulation fluidized bed reactor for granular polysilicon production |
JP6448816B2 (ja) * | 2015-04-01 | 2019-01-09 | ハンワ ケミカル コーポレイション | 流動床反応器システム用ガス分配装置、前記ガス分配装置を含む流動床反応器システム、および前記流動床反応器システムを利用した粒子状ポリシリコンの製造方法 |
DE102016202991A1 (de) * | 2016-02-25 | 2017-08-31 | Wacker Chemie Ag | Verfahren und Vorrichtung zur Herstellung von polykristallinem Siliciumgranulat |
FR3126231B1 (fr) * | 2021-08-20 | 2023-11-17 | Safran Ceram | Dispositif pour le dépôt chimique en phase vapeur |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4288162A (en) * | 1979-02-27 | 1981-09-08 | Sumitomo Kinzoku Kogyo Kabushiki Kaisha | Measuring particle size distribution |
US4424199A (en) * | 1981-12-11 | 1984-01-03 | Union Carbide Corporation | Fluid jet seed particle generator for silane pyrolysis reactor |
JPS58204814A (ja) * | 1982-05-21 | 1983-11-29 | Hitachi Ltd | 高純度シリコンの製造装置 |
NO163384C (no) * | 1987-12-18 | 1990-05-16 | Norsk Hydro As | Fremgangsmaate ved automatisk partikkelanalyse og anordning for dens utfoerelse. |
US5326547A (en) * | 1988-10-11 | 1994-07-05 | Albemarle Corporation | Process for preparing polysilicon with diminished hydrogen content by using a two-step heating process |
GB2271518B (en) * | 1992-10-16 | 1996-09-25 | Korea Res Inst Chem Tech | Heating of fluidized bed reactor by microwave |
JPH06127922A (ja) * | 1992-10-16 | 1994-05-10 | Tonen Chem Corp | 多結晶シリコン製造用流動層反応器 |
-
1996
- 1996-06-07 JP JP9501952A patent/JPH11510560A/ja not_active Expired - Lifetime
- 1996-06-07 DE DE69625688T patent/DE69625688T2/de not_active Expired - Lifetime
- 1996-06-07 EP EP96921428A patent/EP0832312B1/de not_active Expired - Lifetime
- 1996-06-07 WO PCT/US1996/009690 patent/WO1996041036A2/en active IP Right Grant
- 1996-07-01 TW TW85107190A patent/TW541367B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
WO1996041036A2 (en) | 1996-12-19 |
WO1996041036A3 (en) | 1997-04-03 |
DE69625688D1 (de) | 2003-02-13 |
EP0832312A2 (de) | 1998-04-01 |
JPH11510560A (ja) | 1999-09-14 |
EP0832312B1 (de) | 2003-01-08 |
TW541367B (en) | 2003-07-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
R082 | Change of representative |
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