DE69535054D1 - Verfahren zur Ozonerzeugung und Methoden zur Benutzung der Vorrichtung - Google Patents
Verfahren zur Ozonerzeugung und Methoden zur Benutzung der VorrichtungInfo
- Publication number
- DE69535054D1 DE69535054D1 DE69535054T DE69535054T DE69535054D1 DE 69535054 D1 DE69535054 D1 DE 69535054D1 DE 69535054 T DE69535054 T DE 69535054T DE 69535054 T DE69535054 T DE 69535054T DE 69535054 D1 DE69535054 D1 DE 69535054D1
- Authority
- DE
- Germany
- Prior art keywords
- methods
- generation method
- ozone generation
- ozone
- generation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
- C01B13/10—Preparation of ozone
- C01B13/11—Preparation of ozone by electric discharge
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
- C01B13/10—Preparation of ozone
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
- C23C16/402—Silicon dioxide
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4402—Reduction of impurities in the source gas
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/08—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
- C23C8/10—Oxidising
- C23C8/12—Oxidising using elemental oxygen or ozone
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2201/00—Preparation of ozone by electrical discharge
- C01B2201/60—Feed streams for electrical dischargers
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2201/00—Preparation of ozone by electrical discharge
- C01B2201/60—Feed streams for electrical dischargers
- C01B2201/66—Pretreatment of the feed
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
- Chemical Vapour Deposition (AREA)
- Formation Of Insulating Films (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6224151A JPH0859214A (ja) | 1994-08-24 | 1994-08-24 | オゾン発生装置 |
JP22415194 | 1994-08-24 | ||
JP29909294 | 1994-11-09 | ||
JP6299092A JPH08133707A (ja) | 1994-11-09 | 1994-11-09 | オゾン発生方法と装置及びその使用方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69535054D1 true DE69535054D1 (de) | 2006-07-27 |
DE69535054T2 DE69535054T2 (de) | 2007-01-04 |
Family
ID=26525876
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69535054T Expired - Fee Related DE69535054T2 (de) | 1994-08-24 | 1995-08-23 | Verfahren zur Ozonerzeugung und Methoden zur Benutzung der Vorrichtung |
Country Status (5)
Country | Link |
---|---|
US (2) | US5632868A (de) |
EP (1) | EP0703187B1 (de) |
KR (1) | KR960007449A (de) |
DE (1) | DE69535054T2 (de) |
TW (1) | TW350832B (de) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19648514A1 (de) * | 1995-11-27 | 1997-05-28 | Sumitomo Precision Prod Co | Verfahren zum verringern metallischer Verunreinigungen in einer Ozongasleitung |
FR2746385B1 (fr) * | 1996-03-19 | 1998-05-15 | Ozonia Int Sa | Procede et dispositif pour eviter la corrosion dans les equipements de compression d'un gaz contenant de l'ozone |
KR100205316B1 (ko) * | 1996-05-16 | 1999-07-01 | 구본준 | 티이오에스 오존 산화막 증착장치 및 그 장치에 오존을 공급하는 방법 |
US6004397A (en) * | 1996-05-16 | 1999-12-21 | Lg Semicon Co., Ltd. | TEOS-O3 oxidizing film depositing system and process for supplying ozone (O3) thereto |
US6143081A (en) * | 1996-07-12 | 2000-11-07 | Tokyo Electron Limited | Film forming apparatus and method, and film modifying apparatus and method |
US7264680B2 (en) * | 1997-05-09 | 2007-09-04 | Semitool, Inc. | Process and apparatus for treating a workpiece using ozone |
JPH1145779A (ja) * | 1997-07-25 | 1999-02-16 | Tdk Corp | 有機el素子の製造方法および装置 |
US6517787B2 (en) * | 1998-12-30 | 2003-02-11 | Ind Tech Res Inst | Ozone generator with reduced NOx and method thereof |
US6740597B1 (en) * | 2000-08-31 | 2004-05-25 | Micron Technology, Inc. | Methods of removing at least some of a material from a semiconductor substrate |
EP1243918A3 (de) | 2001-03-23 | 2004-10-06 | Instrumentarium Corporation | Verbesserter Chemilumineszenz-Gasanalysator |
JP4071968B2 (ja) * | 2002-01-17 | 2008-04-02 | 東芝三菱電機産業システム株式会社 | ガス供給システム及びガス供給方法 |
US7365403B1 (en) | 2002-02-13 | 2008-04-29 | Cypress Semiconductor Corp. | Semiconductor topography including a thin oxide-nitride stack and method for making the same |
JP3999059B2 (ja) * | 2002-06-26 | 2007-10-31 | 東京エレクトロン株式会社 | 基板処理システム及び基板処理方法 |
US20040185396A1 (en) * | 2003-03-21 | 2004-09-23 | The Regents Of The University Of California | Combustion enhancement with silent discharge plasma |
KR100505064B1 (ko) * | 2003-05-06 | 2005-07-29 | 삼성전자주식회사 | 반도체 소자의 산화방법 및 이를 이용한 산화막 형성방법 |
JP3642572B2 (ja) * | 2003-05-09 | 2005-04-27 | 東芝三菱電機産業システム株式会社 | オゾン発生装置およびオゾン発生方法 |
EP1630133A1 (de) * | 2004-08-27 | 2006-03-01 | Innovative Ozone Services Inc. | Verfahren und Anordnung zur Herstellung von Stickstoffoxiden |
JP2006261434A (ja) * | 2005-03-17 | 2006-09-28 | L'air Liquide Sa Pour L'etude & L'exploitation Des Procede S Georges Claude | シリコン酸化膜の形成方法 |
US20060251551A1 (en) * | 2005-05-09 | 2006-11-09 | Brian Johnson | Apparatus and method for ozone gas distribution |
US7588750B2 (en) * | 2007-07-03 | 2009-09-15 | Amarante Technologies, Inc. | Systems and methods for generating and storing ozone |
EP2140833A1 (de) * | 2008-07-03 | 2010-01-06 | Curozone USA Inc. | Zahnbehandlungsgerät |
JP5453490B2 (ja) | 2011-12-21 | 2014-03-26 | 財團法人工業技術研究院 | 除湿と離脱装置及びシステム |
CN104144874B (zh) * | 2012-04-05 | 2016-04-27 | 三菱电机株式会社 | 臭氧产生机构以及臭氧产生方法 |
JP6072999B2 (ja) | 2014-09-22 | 2017-02-01 | 三菱電機株式会社 | オゾン発生システムおよびその運転方法 |
CN109081423A (zh) * | 2018-10-31 | 2018-12-25 | 首创爱华(天津)市政环境工程有限公司 | 一种集装箱式氧化***和方法 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2700648A (en) * | 1951-01-19 | 1955-01-25 | Air Reduction | Ozone stabilization |
US2857323A (en) * | 1955-10-20 | 1958-10-21 | Welsbach Corp | Method for ozone generation |
BE562398A (de) * | 1956-11-22 | |||
JPS583963B2 (ja) * | 1977-01-31 | 1983-01-24 | 三菱電機株式会社 | オゾン発生機 |
JPS55121903A (en) * | 1979-03-15 | 1980-09-19 | Mitsubishi Electric Corp | Ozone generator |
JPS5795808A (en) * | 1980-12-02 | 1982-06-14 | Mitsubishi Electric Corp | Generating apparatus for ozone |
JPS57183304A (en) * | 1981-04-30 | 1982-11-11 | Mitsubishi Electric Corp | Ozonizer |
JPH0616813B2 (ja) * | 1987-12-10 | 1994-03-09 | 国立公害研究所長 | 道路トンネルにおける換気ガスの浄化方法 |
JPH0621010B2 (ja) * | 1988-05-06 | 1994-03-23 | 住友精密工業株式会社 | 高純度、高濃度オゾンをほとんど経時変化なく発生させる方法 |
JPH02208204A (ja) * | 1989-02-08 | 1990-08-17 | Ishikawajima Harima Heavy Ind Co Ltd | NOx含有量の少ないオゾン製造方法及び装置 |
US5370846A (en) * | 1990-10-26 | 1994-12-06 | Sumitomo Precision Products Co., Ltd. | Apparatus and method for generating high concentration ozone |
US6126781A (en) * | 1991-08-01 | 2000-10-03 | Union Camp Patent Holding, Inc. | Process for conditioning ozone gas recycle stream in ozone pulp bleaching |
JPH0621010A (ja) * | 1992-06-30 | 1994-01-28 | Tokyo Electron Ltd | プラズマ処理装置 |
DE69321409T2 (de) * | 1992-07-03 | 1999-04-01 | Ebara Corp., Tokio/Tokyo | Verfahren zur Ozonherstellung |
US5294571A (en) * | 1992-07-22 | 1994-03-15 | Vlsi Technology, Inc. | Rapid thermal oxidation of silicon in an ozone ambient |
JP2809018B2 (ja) * | 1992-11-26 | 1998-10-08 | 日本電気株式会社 | 半導体装置およびその製造方法 |
-
1995
- 1995-08-23 TW TW084108787A patent/TW350832B/zh active
- 1995-08-23 EP EP95113254A patent/EP0703187B1/de not_active Expired - Lifetime
- 1995-08-23 DE DE69535054T patent/DE69535054T2/de not_active Expired - Fee Related
- 1995-08-23 US US08/518,418 patent/US5632868A/en not_active Expired - Fee Related
- 1995-08-24 KR KR1019950026263A patent/KR960007449A/ko not_active Application Discontinuation
-
1997
- 1997-01-13 US US08/782,390 patent/US5792326A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP0703187A2 (de) | 1996-03-27 |
KR960007449A (ko) | 1996-03-22 |
US5792326A (en) | 1998-08-11 |
TW350832B (en) | 1999-01-21 |
US5632868A (en) | 1997-05-27 |
EP0703187B1 (de) | 2006-06-14 |
DE69535054T2 (de) | 2007-01-04 |
EP0703187A3 (de) | 1999-11-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |