DE69521079D1 - Verfahren zur Behandlung einer photographischen Schmutzlösung - Google Patents

Verfahren zur Behandlung einer photographischen Schmutzlösung

Info

Publication number
DE69521079D1
DE69521079D1 DE69521079T DE69521079T DE69521079D1 DE 69521079 D1 DE69521079 D1 DE 69521079D1 DE 69521079 T DE69521079 T DE 69521079T DE 69521079 T DE69521079 T DE 69521079T DE 69521079 D1 DE69521079 D1 DE 69521079D1
Authority
DE
Germany
Prior art keywords
photographic
treating
soil solution
soil
solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69521079T
Other languages
English (en)
Other versions
DE69521079T2 (de
Inventor
Seiji Suzuki
Kiyotaka Hori
Yusuke Shiota
Kiichiro Mitsui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Nippon Shokubai Co Ltd
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Shokubai Co Ltd, Fuji Photo Film Co Ltd filed Critical Nippon Shokubai Co Ltd
Publication of DE69521079D1 publication Critical patent/DE69521079D1/de
Application granted granted Critical
Publication of DE69521079T2 publication Critical patent/DE69521079T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F9/00Multistage treatment of water, waste water or sewage
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/02Treatment of water, waste water, or sewage by heating
    • C02F1/025Thermal hydrolysis
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/72Treatment of water, waste water, or sewage by oxidation
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/72Treatment of water, waste water, or sewage by oxidation
    • C02F1/725Treatment of water, waste water, or sewage by oxidation by catalytic oxidation
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F11/00Treatment of sludge; Devices therefor
    • C02F11/06Treatment of sludge; Devices therefor by oxidation
    • C02F11/08Wet air oxidation
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F3/00Biological treatment of water, waste water, or sewage
    • C02F3/30Aerobic and anaerobic processes
    • C02F3/308Biological phosphorus removal
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/72Treatment of water, waste water, or sewage by oxidation
    • C02F1/727Treatment of water, waste water, or sewage by oxidation using pure oxygen or oxygen rich gas
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F3/00Biological treatment of water, waste water, or sewage
    • C02F2003/001Biological treatment of water, waste water, or sewage using granular carriers or supports for the microorganisms
    • C02F2003/003Biological treatment of water, waste water, or sewage using granular carriers or supports for the microorganisms using activated carbon or the like
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2101/00Nature of the contaminant
    • C02F2101/10Inorganic compounds
    • C02F2101/20Heavy metals or heavy metal compounds
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/34Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
    • C02F2103/40Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from the manufacture or use of photosensitive materials
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00Controlling or monitoring parameters in water treatment
    • C02F2209/02Temperature
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00Controlling or monitoring parameters in water treatment
    • C02F2209/06Controlling or monitoring parameters in water treatment pH
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2301/00General aspects of water treatment
    • C02F2301/06Pressure conditions
    • C02F2301/066Overpressure, high pressure
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F3/00Biological treatment of water, waste water, or sewage
    • C02F3/30Aerobic and anaerobic processes
    • C02F3/301Aerobic and anaerobic treatment in the same reactor

Landscapes

  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Water Supply & Treatment (AREA)
  • Organic Chemistry (AREA)
  • Hydrology & Water Resources (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Biodiversity & Conservation Biology (AREA)
  • Microbiology (AREA)
  • Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Treatment Of Water By Oxidation Or Reduction (AREA)
  • Purification Treatments By Anaerobic Or Anaerobic And Aerobic Bacteria Or Animals (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Photographic Processing Devices Using Wet Methods (AREA)
DE69521079T 1994-06-27 1995-06-26 Verfahren zur Behandlung einer photographischen Schmutzlösung Expired - Fee Related DE69521079T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16577394A JP3500188B2 (ja) 1994-06-27 1994-06-27 写真処理廃液の処理方法

Publications (2)

Publication Number Publication Date
DE69521079D1 true DE69521079D1 (de) 2001-07-05
DE69521079T2 DE69521079T2 (de) 2001-09-13

Family

ID=15818768

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69521079T Expired - Fee Related DE69521079T2 (de) 1994-06-27 1995-06-26 Verfahren zur Behandlung einer photographischen Schmutzlösung

Country Status (4)

Country Link
US (1) US5534148A (de)
EP (1) EP0690025B1 (de)
JP (1) JP3500188B2 (de)
DE (1) DE69521079T2 (de)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5954963A (en) * 1996-01-25 1999-09-21 Oklahoma Rural Water Association Process for biologically treating water
FR2764399A1 (fr) * 1997-06-05 1998-12-11 Eastman Kodak Co Depollution d'un effluent photographique par traitement avec un alumino-silicate polymere fibreux
LT4358B (lt) 1997-11-14 1998-07-27 Chemijos Institutas Nutekamųjų vandenų, turinčių sunkiųjų metalų jonų, nukenksminimo būdas
EP0945408B1 (de) * 1998-03-26 2003-09-03 Pâques Bio Systems B.V. Verfahren zur Entfernung von polyamin-chelatbildenden Wirkstoffen aus wässrigen Lösungen
US6126840A (en) * 1998-08-13 2000-10-03 Fuji Hunt Photographic Chemicals, Inc. Process for removing silver in the presence of iron from waste effluent
US6190564B1 (en) * 1998-10-01 2001-02-20 United States Filter Corporation Two-stage separation process
US6391203B1 (en) * 2000-11-22 2002-05-21 Alexander G. Fassbender Enhanced biogas production from nitrogen bearing feed stocks
US6752974B2 (en) * 2002-04-10 2004-06-22 Corning Incorporated Halocarbon abatement system for a glass manufacturing facility
JP2004098055A (ja) * 2002-08-21 2004-04-02 Fuji Photo Film Co Ltd アミノポリカルボン酸を含有する有機廃水の処理方法
JP3826891B2 (ja) 2003-03-05 2006-09-27 株式会社島津製作所 オートサンプラ
EP1477458A3 (de) * 2003-05-16 2005-01-05 Fuji Photo Film Co., Ltd. Verfahren zur Behandlung von Abwässern aus der Photoindustrie
US7850822B2 (en) * 2003-10-29 2010-12-14 Siemens Water Technologies Holding Corp. System and method of wet oxidation of a viscose process stream
US20050171390A1 (en) * 2003-12-17 2005-08-04 Usfilter Corporation Wet oxidation process and system
ITMI20080243A1 (it) * 2008-02-15 2009-08-16 C S A S R L Impianto e processo per la depurazione di acque di scarico
RU2446108C1 (ru) * 2010-11-10 2012-03-27 Общество с ограниченной ответственностью Научно-производственная фирма "ФИТО" Установка для термического обеззараживания дренажной воды
CN102477111B (zh) * 2010-11-30 2013-08-14 中国石油化工股份有限公司 聚合物加氢方法
CN103359820B (zh) * 2012-03-30 2015-04-29 中国石油化工股份有限公司 一种采用炼油废催化剂催化氧化处理废水的方法
US20160060133A1 (en) * 2014-08-27 2016-03-03 Baker Hughes Incorporated Removal of metals and cations thereof from water-based fluids
CN105417875A (zh) * 2015-12-11 2016-03-23 深圳市盘古环保科技有限公司 一种废水处理方法及设备
CN108726803B (zh) * 2018-06-12 2021-06-04 浙江荣晟环保纸业股份有限公司 一种用于厌氧塔的造纸废水控钙工艺
CN111072124B (zh) * 2018-10-18 2022-07-08 中国石油化工股份有限公司 湿式氧化处理工业丙烯酸废水的方法
CN110818160A (zh) * 2019-09-12 2020-02-21 浙江奇彩环境科技股份有限公司 高盐高cod废水的处理工艺
CN115916710A (zh) * 2020-07-09 2023-04-04 西门子能源美国公司 废苛性碱中氮化合物的处理

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5919757B2 (ja) * 1976-08-10 1984-05-08 大阪瓦斯株式会社 廃水の処理方法
US4699720A (en) * 1985-03-12 1987-10-13 Osaka Gas Company Limited Process for treating waste water by wet oxidations
US4874530A (en) * 1986-12-05 1989-10-17 Knica Corporation Method for treating photographic processing waste solution
DE3815271A1 (de) * 1988-05-05 1989-11-16 Sandoz Ag Verfahren zur reinigung von industrieabwaessern
JP2722147B2 (ja) * 1991-10-25 1998-03-04 大阪瓦斯株式会社 写真廃液の処理方法

Also Published As

Publication number Publication date
JP3500188B2 (ja) 2004-02-23
EP0690025A2 (de) 1996-01-03
EP0690025A3 (de) 1998-07-01
EP0690025B1 (de) 2001-05-30
DE69521079T2 (de) 2001-09-13
US5534148A (en) 1996-07-09
JPH0810797A (ja) 1996-01-16

Similar Documents

Publication Publication Date Title
DE69521079D1 (de) Verfahren zur Behandlung einer photographischen Schmutzlösung
DE69420339D1 (de) Verfahren zur Behandlung einer Flüssigkeit
DE69325252D1 (de) Verfahren zur Behandlung einer Oberfläche
DE69331469D1 (de) Verfahren zur behandlung von abfällen
DE69425372D1 (de) Verfahren zur behandlung endo-ostealer materialien
DE3874867D1 (de) Verfahren zur behandlung einer kupferoberflaeche.
DE69636618D1 (de) Verfahren zur behandlung einer substratoberfläche und behandlungsmittel hierfür
DE69426970D1 (de) Verfahren zur Behandlung einer Ölquelle
DE69203919D1 (de) Verfahren und Gerät zur Behandlung einer Oberfläche.
DE69218202D1 (de) Verfahren zur behandlung von fluoroaluminosilikatgläsern
DE69507500D1 (de) Verfahren zur behandlung von kunststoffgiessformen
DE69409066D1 (de) Verfahren zur Behandlung einer Oberfläche
DE69102552D1 (de) Verfahren zur Behandlung von Fasermaterialien.
DE69526796D1 (de) Verfahren zur inhibierung von pflanzenkrankheiten
DE69016076D1 (de) Verfahren zur Behandlung einer Metallfläche.
DE69416645D1 (de) Verfahren zur Behandlung von photographischem Abwasser
DE68908701D1 (de) Verfahren zur behandlung einer retrovirusinfektion.
DE3867171D1 (de) Verfahren zur behandlung einer fluessigkeit.
DE69838116D1 (de) Verfahren zur Behandlung einer Substratoberfläche und Behandlungsmittel hierfür
DE69219114D1 (de) Verfahren zur behandlung einer mit radionukliden kontaminierten oberflaeche
DE69210233D1 (de) Verfahren zur reinigung einer photoprozessvorrichtung
DE69114854D1 (de) Verfahren zur behandlung von photographischen abwässern.
DE69607559D1 (de) Verfahren zur Behandlung von Phenolteer
DE69605787D1 (de) Verfahren zur behandlung einer materialbahn auf einer zentralen behandlungstrommel
DE59610899D1 (de) Verfahren zur Behandlung einer siegelfähigen Folienoberfläche

Legal Events

Date Code Title Description
8327 Change in the person/name/address of the patent owner

Owner name: FUJI PHOTO FILM CO., LTD., MINAMI-ASHIGARA, KANAGA

8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP

8339 Ceased/non-payment of the annual fee