DE69521079D1 - Verfahren zur Behandlung einer photographischen Schmutzlösung - Google Patents
Verfahren zur Behandlung einer photographischen SchmutzlösungInfo
- Publication number
- DE69521079D1 DE69521079D1 DE69521079T DE69521079T DE69521079D1 DE 69521079 D1 DE69521079 D1 DE 69521079D1 DE 69521079 T DE69521079 T DE 69521079T DE 69521079 T DE69521079 T DE 69521079T DE 69521079 D1 DE69521079 D1 DE 69521079D1
- Authority
- DE
- Germany
- Prior art keywords
- photographic
- treating
- soil solution
- soil
- solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F9/00—Multistage treatment of water, waste water or sewage
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/02—Treatment of water, waste water, or sewage by heating
- C02F1/025—Thermal hydrolysis
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/72—Treatment of water, waste water, or sewage by oxidation
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/72—Treatment of water, waste water, or sewage by oxidation
- C02F1/725—Treatment of water, waste water, or sewage by oxidation by catalytic oxidation
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F11/00—Treatment of sludge; Devices therefor
- C02F11/06—Treatment of sludge; Devices therefor by oxidation
- C02F11/08—Wet air oxidation
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F3/00—Biological treatment of water, waste water, or sewage
- C02F3/30—Aerobic and anaerobic processes
- C02F3/308—Biological phosphorus removal
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/72—Treatment of water, waste water, or sewage by oxidation
- C02F1/727—Treatment of water, waste water, or sewage by oxidation using pure oxygen or oxygen rich gas
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F3/00—Biological treatment of water, waste water, or sewage
- C02F2003/001—Biological treatment of water, waste water, or sewage using granular carriers or supports for the microorganisms
- C02F2003/003—Biological treatment of water, waste water, or sewage using granular carriers or supports for the microorganisms using activated carbon or the like
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2101/00—Nature of the contaminant
- C02F2101/10—Inorganic compounds
- C02F2101/20—Heavy metals or heavy metal compounds
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
- C02F2103/40—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from the manufacture or use of photosensitive materials
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/02—Temperature
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/06—Controlling or monitoring parameters in water treatment pH
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2301/00—General aspects of water treatment
- C02F2301/06—Pressure conditions
- C02F2301/066—Overpressure, high pressure
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F3/00—Biological treatment of water, waste water, or sewage
- C02F3/30—Aerobic and anaerobic processes
- C02F3/301—Aerobic and anaerobic treatment in the same reactor
Landscapes
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Water Supply & Treatment (AREA)
- Organic Chemistry (AREA)
- Hydrology & Water Resources (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Biodiversity & Conservation Biology (AREA)
- Microbiology (AREA)
- Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Treatment Of Water By Oxidation Or Reduction (AREA)
- Purification Treatments By Anaerobic Or Anaerobic And Aerobic Bacteria Or Animals (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
- Photographic Processing Devices Using Wet Methods (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16577394A JP3500188B2 (ja) | 1994-06-27 | 1994-06-27 | 写真処理廃液の処理方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69521079D1 true DE69521079D1 (de) | 2001-07-05 |
DE69521079T2 DE69521079T2 (de) | 2001-09-13 |
Family
ID=15818768
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69521079T Expired - Fee Related DE69521079T2 (de) | 1994-06-27 | 1995-06-26 | Verfahren zur Behandlung einer photographischen Schmutzlösung |
Country Status (4)
Country | Link |
---|---|
US (1) | US5534148A (de) |
EP (1) | EP0690025B1 (de) |
JP (1) | JP3500188B2 (de) |
DE (1) | DE69521079T2 (de) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5954963A (en) * | 1996-01-25 | 1999-09-21 | Oklahoma Rural Water Association | Process for biologically treating water |
FR2764399A1 (fr) * | 1997-06-05 | 1998-12-11 | Eastman Kodak Co | Depollution d'un effluent photographique par traitement avec un alumino-silicate polymere fibreux |
LT4358B (lt) | 1997-11-14 | 1998-07-27 | Chemijos Institutas | Nutekamųjų vandenų, turinčių sunkiųjų metalų jonų, nukenksminimo būdas |
EP0945408B1 (de) * | 1998-03-26 | 2003-09-03 | Pâques Bio Systems B.V. | Verfahren zur Entfernung von polyamin-chelatbildenden Wirkstoffen aus wässrigen Lösungen |
US6126840A (en) * | 1998-08-13 | 2000-10-03 | Fuji Hunt Photographic Chemicals, Inc. | Process for removing silver in the presence of iron from waste effluent |
US6190564B1 (en) * | 1998-10-01 | 2001-02-20 | United States Filter Corporation | Two-stage separation process |
US6391203B1 (en) * | 2000-11-22 | 2002-05-21 | Alexander G. Fassbender | Enhanced biogas production from nitrogen bearing feed stocks |
US6752974B2 (en) * | 2002-04-10 | 2004-06-22 | Corning Incorporated | Halocarbon abatement system for a glass manufacturing facility |
JP2004098055A (ja) * | 2002-08-21 | 2004-04-02 | Fuji Photo Film Co Ltd | アミノポリカルボン酸を含有する有機廃水の処理方法 |
JP3826891B2 (ja) | 2003-03-05 | 2006-09-27 | 株式会社島津製作所 | オートサンプラ |
EP1477458A3 (de) * | 2003-05-16 | 2005-01-05 | Fuji Photo Film Co., Ltd. | Verfahren zur Behandlung von Abwässern aus der Photoindustrie |
US7850822B2 (en) * | 2003-10-29 | 2010-12-14 | Siemens Water Technologies Holding Corp. | System and method of wet oxidation of a viscose process stream |
US20050171390A1 (en) * | 2003-12-17 | 2005-08-04 | Usfilter Corporation | Wet oxidation process and system |
ITMI20080243A1 (it) * | 2008-02-15 | 2009-08-16 | C S A S R L | Impianto e processo per la depurazione di acque di scarico |
RU2446108C1 (ru) * | 2010-11-10 | 2012-03-27 | Общество с ограниченной ответственностью Научно-производственная фирма "ФИТО" | Установка для термического обеззараживания дренажной воды |
CN102477111B (zh) * | 2010-11-30 | 2013-08-14 | 中国石油化工股份有限公司 | 聚合物加氢方法 |
CN103359820B (zh) * | 2012-03-30 | 2015-04-29 | 中国石油化工股份有限公司 | 一种采用炼油废催化剂催化氧化处理废水的方法 |
US20160060133A1 (en) * | 2014-08-27 | 2016-03-03 | Baker Hughes Incorporated | Removal of metals and cations thereof from water-based fluids |
CN105417875A (zh) * | 2015-12-11 | 2016-03-23 | 深圳市盘古环保科技有限公司 | 一种废水处理方法及设备 |
CN108726803B (zh) * | 2018-06-12 | 2021-06-04 | 浙江荣晟环保纸业股份有限公司 | 一种用于厌氧塔的造纸废水控钙工艺 |
CN111072124B (zh) * | 2018-10-18 | 2022-07-08 | 中国石油化工股份有限公司 | 湿式氧化处理工业丙烯酸废水的方法 |
CN110818160A (zh) * | 2019-09-12 | 2020-02-21 | 浙江奇彩环境科技股份有限公司 | 高盐高cod废水的处理工艺 |
CN115916710A (zh) * | 2020-07-09 | 2023-04-04 | 西门子能源美国公司 | 废苛性碱中氮化合物的处理 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5919757B2 (ja) * | 1976-08-10 | 1984-05-08 | 大阪瓦斯株式会社 | 廃水の処理方法 |
US4699720A (en) * | 1985-03-12 | 1987-10-13 | Osaka Gas Company Limited | Process for treating waste water by wet oxidations |
US4874530A (en) * | 1986-12-05 | 1989-10-17 | Knica Corporation | Method for treating photographic processing waste solution |
DE3815271A1 (de) * | 1988-05-05 | 1989-11-16 | Sandoz Ag | Verfahren zur reinigung von industrieabwaessern |
JP2722147B2 (ja) * | 1991-10-25 | 1998-03-04 | 大阪瓦斯株式会社 | 写真廃液の処理方法 |
-
1994
- 1994-06-27 JP JP16577394A patent/JP3500188B2/ja not_active Expired - Fee Related
-
1995
- 1995-06-26 DE DE69521079T patent/DE69521079T2/de not_active Expired - Fee Related
- 1995-06-26 EP EP95109945A patent/EP0690025B1/de not_active Expired - Lifetime
- 1995-06-27 US US08/495,001 patent/US5534148A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JP3500188B2 (ja) | 2004-02-23 |
EP0690025A2 (de) | 1996-01-03 |
EP0690025A3 (de) | 1998-07-01 |
EP0690025B1 (de) | 2001-05-30 |
DE69521079T2 (de) | 2001-09-13 |
US5534148A (en) | 1996-07-09 |
JPH0810797A (ja) | 1996-01-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE69521079D1 (de) | Verfahren zur Behandlung einer photographischen Schmutzlösung | |
DE69420339D1 (de) | Verfahren zur Behandlung einer Flüssigkeit | |
DE69325252D1 (de) | Verfahren zur Behandlung einer Oberfläche | |
DE69331469D1 (de) | Verfahren zur behandlung von abfällen | |
DE69425372D1 (de) | Verfahren zur behandlung endo-ostealer materialien | |
DE3874867D1 (de) | Verfahren zur behandlung einer kupferoberflaeche. | |
DE69636618D1 (de) | Verfahren zur behandlung einer substratoberfläche und behandlungsmittel hierfür | |
DE69426970D1 (de) | Verfahren zur Behandlung einer Ölquelle | |
DE69203919D1 (de) | Verfahren und Gerät zur Behandlung einer Oberfläche. | |
DE69218202D1 (de) | Verfahren zur behandlung von fluoroaluminosilikatgläsern | |
DE69507500D1 (de) | Verfahren zur behandlung von kunststoffgiessformen | |
DE69409066D1 (de) | Verfahren zur Behandlung einer Oberfläche | |
DE69102552D1 (de) | Verfahren zur Behandlung von Fasermaterialien. | |
DE69526796D1 (de) | Verfahren zur inhibierung von pflanzenkrankheiten | |
DE69016076D1 (de) | Verfahren zur Behandlung einer Metallfläche. | |
DE69416645D1 (de) | Verfahren zur Behandlung von photographischem Abwasser | |
DE68908701D1 (de) | Verfahren zur behandlung einer retrovirusinfektion. | |
DE3867171D1 (de) | Verfahren zur behandlung einer fluessigkeit. | |
DE69838116D1 (de) | Verfahren zur Behandlung einer Substratoberfläche und Behandlungsmittel hierfür | |
DE69219114D1 (de) | Verfahren zur behandlung einer mit radionukliden kontaminierten oberflaeche | |
DE69210233D1 (de) | Verfahren zur reinigung einer photoprozessvorrichtung | |
DE69114854D1 (de) | Verfahren zur behandlung von photographischen abwässern. | |
DE69607559D1 (de) | Verfahren zur Behandlung von Phenolteer | |
DE69605787D1 (de) | Verfahren zur behandlung einer materialbahn auf einer zentralen behandlungstrommel | |
DE59610899D1 (de) | Verfahren zur Behandlung einer siegelfähigen Folienoberfläche |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8327 | Change in the person/name/address of the patent owner |
Owner name: FUJI PHOTO FILM CO., LTD., MINAMI-ASHIGARA, KANAGA |
|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP |
|
8339 | Ceased/non-payment of the annual fee |