DE69417970D1 - Quelle für schnelle Atomstrahlen - Google Patents

Quelle für schnelle Atomstrahlen

Info

Publication number
DE69417970D1
DE69417970D1 DE69417970T DE69417970T DE69417970D1 DE 69417970 D1 DE69417970 D1 DE 69417970D1 DE 69417970 T DE69417970 T DE 69417970T DE 69417970 T DE69417970 T DE 69417970T DE 69417970 D1 DE69417970 D1 DE 69417970D1
Authority
DE
Germany
Prior art keywords
source
fast atomic
atomic rays
rays
fast
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69417970T
Other languages
English (en)
Other versions
DE69417970T2 (de
Inventor
Masahiro Hatakeyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP22799393A external-priority patent/JP3213135B2/ja
Priority claimed from JP22799493A external-priority patent/JPH0755999A/ja
Application filed by Ebara Corp filed Critical Ebara Corp
Publication of DE69417970D1 publication Critical patent/DE69417970D1/de
Application granted granted Critical
Publication of DE69417970T2 publication Critical patent/DE69417970T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H3/00—Production or acceleration of neutral particle beams, e.g. molecular or atomic beams
    • H05H3/02—Molecular or atomic beam generation
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • G21K5/04—Irradiation devices with beam-forming means

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Particle Accelerators (AREA)
DE69417970T 1993-08-20 1994-08-18 Quelle für schnelle Atomstrahlen Expired - Fee Related DE69417970T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP22799393A JP3213135B2 (ja) 1993-08-20 1993-08-20 高速原子線源
JP22799493A JPH0755999A (ja) 1993-08-20 1993-08-20 高速原子線源

Publications (2)

Publication Number Publication Date
DE69417970D1 true DE69417970D1 (de) 1999-05-27
DE69417970T2 DE69417970T2 (de) 1999-12-02

Family

ID=26527992

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69417970T Expired - Fee Related DE69417970T2 (de) 1993-08-20 1994-08-18 Quelle für schnelle Atomstrahlen

Country Status (4)

Country Link
US (1) US5519213A (de)
EP (1) EP0639939B1 (de)
KR (1) KR100307070B1 (de)
DE (1) DE69417970T2 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5989779A (en) * 1994-10-18 1999-11-23 Ebara Corporation Fabrication method employing and energy beam source
EP0731490A3 (de) * 1995-03-02 1998-03-11 Ebara Corporation Ultrafeines Mikroherstellungsverfahren unter Verwendung eines Energiebündel
JP3328498B2 (ja) * 1996-02-16 2002-09-24 株式会社荏原製作所 高速原子線源
US6671034B1 (en) * 1998-04-30 2003-12-30 Ebara Corporation Microfabrication of pattern imprinting
JP2003050300A (ja) * 2001-05-28 2003-02-21 Sei Matsuoka 価値的情報の送信装置および送信方法
KR100476903B1 (ko) * 2002-10-15 2005-03-17 주식회사 셈테크놀러지 중성입자 변환 효율이 향상된 중성입자 처리 장치
US6903511B2 (en) * 2003-05-06 2005-06-07 Zond, Inc. Generation of uniformly-distributed plasma
GB2437820B (en) * 2006-04-27 2011-06-22 Matsushita Electric Ind Co Ltd Fast atom bombardment source, fast atom beam emission method, and surface modification apparatus
DE102008058212B4 (de) 2008-11-19 2011-07-07 Astrium GmbH, 81667 Ionenantrieb für ein Raumfahrzeug
US8153958B2 (en) * 2009-07-10 2012-04-10 Sphere Renewable Energy Corp. Method and apparatus for producing hyperthermal beams
WO2015175934A1 (en) 2014-05-15 2015-11-19 Anthony John Mark Deposition and patterning using emitted electrons
CN104843198B (zh) * 2015-04-03 2017-04-12 湘潭大学 一种阿尔法粒子级联衰变的放射性材料及其制成的推进装置和莲子推进器

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60115220A (ja) * 1983-11-26 1985-06-21 Anelva Corp 三極グロ−放電型表面処理装置
US4842707A (en) * 1986-06-23 1989-06-27 Oki Electric Industry Co., Ltd. Dry process apparatus
JPH0799720B2 (ja) * 1990-08-30 1995-10-25 株式会社荏原製作所 高速原子線源
US5055672A (en) * 1990-11-20 1991-10-08 Ebara Corporation Fast atom beam source
JPH0724240B2 (ja) * 1991-03-05 1995-03-15 株式会社荏原製作所 高速原子線源
JPH0715808B2 (ja) * 1991-04-23 1995-02-22 株式会社荏原製作所 イオン中和器
JP2509488B2 (ja) * 1991-09-12 1996-06-19 株式会社荏原製作所 高速原子線源

Also Published As

Publication number Publication date
US5519213A (en) 1996-05-21
KR950007207A (ko) 1995-03-21
EP0639939B1 (de) 1999-04-21
KR100307070B1 (ko) 2001-12-01
EP0639939A1 (de) 1995-02-22
DE69417970T2 (de) 1999-12-02

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee