DE69417637T2 - Magnetronzerstäubungs-Anlage sowie -Systeme - Google Patents

Magnetronzerstäubungs-Anlage sowie -Systeme

Info

Publication number
DE69417637T2
DE69417637T2 DE69417637T DE69417637T DE69417637T2 DE 69417637 T2 DE69417637 T2 DE 69417637T2 DE 69417637 T DE69417637 T DE 69417637T DE 69417637 T DE69417637 T DE 69417637T DE 69417637 T2 DE69417637 T2 DE 69417637T2
Authority
DE
Germany
Prior art keywords
systems
magnetron sputtering
sputtering system
magnetron
sputtering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69417637T
Other languages
English (en)
Other versions
DE69417637D1 (de
Inventor
Peter A Sieck
Russel J Hill
John L Vossen
Stephen C Schulz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Linde LLC
Original Assignee
BOC Group Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BOC Group Inc filed Critical BOC Group Inc
Publication of DE69417637D1 publication Critical patent/DE69417637D1/de
Application granted granted Critical
Publication of DE69417637T2 publication Critical patent/DE69417637T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3438—Electrodes other than cathode
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Chemical Vapour Deposition (AREA)
DE69417637T 1993-07-01 1994-06-21 Magnetronzerstäubungs-Anlage sowie -Systeme Expired - Fee Related DE69417637T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US8613693A 1993-07-01 1993-07-01

Publications (2)

Publication Number Publication Date
DE69417637D1 DE69417637D1 (de) 1999-05-12
DE69417637T2 true DE69417637T2 (de) 1999-09-09

Family

ID=22196512

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69417637T Expired - Fee Related DE69417637T2 (de) 1993-07-01 1994-06-21 Magnetronzerstäubungs-Anlage sowie -Systeme

Country Status (9)

Country Link
US (2) US5487821A (de)
EP (1) EP0632142B1 (de)
JP (1) JP2586881B2 (de)
CN (1) CN1101082A (de)
CA (1) CA2123479C (de)
DE (1) DE69417637T2 (de)
ES (1) ES2129587T3 (de)
RU (1) RU94022474A (de)
TW (1) TW320739B (de)

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5616225A (en) * 1994-03-23 1997-04-01 The Boc Group, Inc. Use of multiple anodes in a magnetron for improving the uniformity of its plasma
US6342134B1 (en) * 2000-02-11 2002-01-29 Agere Systems Guardian Corp. Method for producing piezoelectric films with rotating magnetron sputtering system
US6440280B1 (en) 2000-06-28 2002-08-27 Sola International, Inc. Multi-anode device and methods for sputter deposition
US6597447B1 (en) 2001-07-31 2003-07-22 Advanced Micro Devices, Inc. Method and apparatus for periodic correction of metrology data
US6736948B2 (en) * 2002-01-18 2004-05-18 Von Ardenne Anlagentechnik Gmbh Cylindrical AC/DC magnetron with compliant drive system and improved electrical and thermal isolation
WO2004005574A2 (en) * 2002-07-02 2004-01-15 Academy Precision Materials A Division Of Academy Corporation Rotary target and method for onsite mechanical assembly of rotary target
CA2509952A1 (en) * 2002-12-18 2004-11-25 Cardinal Cg Company Plasma-enhanced film deposition
US20040200418A1 (en) * 2003-01-03 2004-10-14 Klaus Hartig Plasma spray systems and methods of uniformly coating rotary cylindrical targets
US20040129561A1 (en) * 2003-01-07 2004-07-08 Von Ardenne Anlagentechnik Gmbh Cylindrical magnetron magnetic array mid span support
US20050051422A1 (en) * 2003-02-21 2005-03-10 Rietzel James G. Cylindrical magnetron with self cleaning target
US7014741B2 (en) * 2003-02-21 2006-03-21 Von Ardenne Anlagentechnik Gmbh Cylindrical magnetron with self cleaning target
US20050276381A1 (en) * 2003-07-02 2005-12-15 Academy Corporation Rotary target locking ring assembly
US20050224343A1 (en) * 2004-04-08 2005-10-13 Richard Newcomb Power coupling for high-power sputtering
US7491453B2 (en) * 2004-07-14 2009-02-17 The Penn State Research Foundation Bio-electrochemically assisted microbial reactor that generates hydrogen gas and methods of generating hydrogen gas
US8962165B2 (en) * 2006-05-02 2015-02-24 The Penn State Research Foundation Materials and configurations for scalable microbial fuel cells
US20080292912A1 (en) * 2006-05-02 2008-11-27 The Penn State Research Foundation Electrodes and methods for microbial fuel cells
US8277984B2 (en) * 2006-05-02 2012-10-02 The Penn State Research Foundation Substrate-enhanced microbial fuel cells
US7922878B2 (en) * 2004-07-14 2011-04-12 The Penn State Research Foundation Electrohydrogenic reactor for hydrogen gas production
US8500973B2 (en) * 2004-08-20 2013-08-06 Jds Uniphase Corporation Anode for sputter coating
US7879209B2 (en) 2004-08-20 2011-02-01 Jds Uniphase Corporation Cathode for sputter coating
US20060049041A1 (en) * 2004-08-20 2006-03-09 Jds Uniphase Corporation Anode for sputter coating
US20060065524A1 (en) * 2004-09-30 2006-03-30 Richard Newcomb Non-bonded rotatable targets for sputtering
US20060096855A1 (en) * 2004-11-05 2006-05-11 Richard Newcomb Cathode arrangement for atomizing a rotatable target pipe
US20060278519A1 (en) * 2005-06-10 2006-12-14 Leszek Malaszewski Adaptable fixation for cylindrical magnetrons
US20060278521A1 (en) * 2005-06-14 2006-12-14 Stowell Michael W System and method for controlling ion density and energy using modulated power signals
US20060278524A1 (en) * 2005-06-14 2006-12-14 Stowell Michael W System and method for modulating power signals to control sputtering
US20070095281A1 (en) * 2005-11-01 2007-05-03 Stowell Michael W System and method for power function ramping of microwave liner discharge sources
US7842355B2 (en) * 2005-11-01 2010-11-30 Applied Materials, Inc. System and method for modulation of power and power related functions of PECVD discharge sources to achieve new film properties
US9117637B2 (en) * 2005-11-04 2015-08-25 Von Ardenne Gmbh Redundant anode sputtering method and assembly
KR100712818B1 (ko) * 2005-12-16 2007-04-30 동부일렉트로닉스 주식회사 구리 배선 형성 방법
US7626135B2 (en) * 2006-05-10 2009-12-01 Sub-One Technology, Inc. Electrode systems and methods of using electrodes
BRPI0923775A2 (pt) * 2008-12-30 2019-09-24 Penn State Res Found aparelho usando celula microbial combustivel ou de eletrolise e método de fabricação
EP2325350A1 (de) * 2009-11-24 2011-05-25 Applied Materials, Inc. Anodenstab für ein Sputtersystem
US9546426B2 (en) 2013-03-07 2017-01-17 The Penn State Research Foundation Methods for hydrogen gas production
US9546429B1 (en) 2013-04-12 2017-01-17 Microrganic Technologies Inc Multi-strand electrode and method of making
US10580611B2 (en) * 2014-08-21 2020-03-03 Raytheon Company Rapid 3D prototyping and fabricating of slow-wave structures, including electromagnetic meta-material structures, for millimeter-wavelength and terahertz-frequency high-power vacuum electronic devices
US10811236B2 (en) 2014-10-29 2020-10-20 General Plasma, Inc. Magnetic anode for sputter magnetron cathode
JP2018517846A (ja) * 2015-06-05 2018-07-05 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ スパッタ堆積源、スパッタリング装置およびそれらを動作させる方法
KR102651759B1 (ko) * 2016-10-11 2024-03-29 삼성디스플레이 주식회사 증착장치

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE222900C (de) *
US3514391A (en) * 1967-05-05 1970-05-26 Nat Res Corp Sputtering apparatus with finned anode
US3594301A (en) * 1968-11-22 1971-07-20 Gen Electric Sputter coating apparatus
US3616449A (en) * 1970-03-30 1971-10-26 Bendix Corp Sputtering anode
US3767559A (en) * 1970-06-24 1973-10-23 Eastman Kodak Co Sputtering apparatus with accordion pleated anode means
US4166018A (en) * 1974-01-31 1979-08-28 Airco, Inc. Sputtering process and apparatus
US4046659A (en) * 1974-05-10 1977-09-06 Airco, Inc. Method for coating a substrate
US4356073A (en) * 1981-02-12 1982-10-26 Shatterproof Glass Corporation Magnetron cathode sputtering apparatus
US4466877A (en) * 1983-10-11 1984-08-21 Shatterproof Glass Corporation Magnetron cathode sputtering apparatus
US4478702A (en) * 1984-01-17 1984-10-23 Ppg Industries, Inc. Anode for magnetic sputtering apparatus
DE3427587A1 (de) * 1984-07-26 1986-02-06 Leybold-Heraeus GmbH, 5000 Köln Zerstaeubungseinrichtung fuer katodenzerstaeubungsanlagen
US4888199A (en) * 1987-07-15 1989-12-19 The Boc Group, Inc. Plasma thin film deposition process
US4849087A (en) * 1988-02-11 1989-07-18 Southwall Technologies Apparatus for obtaining transverse uniformity during thin film deposition on extended substrate
US5047131A (en) * 1989-11-08 1991-09-10 The Boc Group, Inc. Method for coating substrates with silicon based compounds
US5106474A (en) * 1990-11-21 1992-04-21 Viratec Thin Films, Inc. Anode structures for magnetron sputtering apparatus
US5171411A (en) * 1991-05-21 1992-12-15 The Boc Group, Inc. Rotating cylindrical magnetron structure with self supporting zinc alloy target
US5393575A (en) * 1992-03-03 1995-02-28 Esterlis; Moisei Method for carrying out surface processes

Also Published As

Publication number Publication date
EP0632142A1 (de) 1995-01-04
TW320739B (de) 1997-11-21
DE69417637D1 (de) 1999-05-12
US5487821A (en) 1996-01-30
JPH0718436A (ja) 1995-01-20
US5683558A (en) 1997-11-04
CA2123479A1 (en) 1995-01-02
CA2123479C (en) 1999-07-06
CN1101082A (zh) 1995-04-05
EP0632142B1 (de) 1999-04-07
RU94022474A (ru) 1996-04-10
ES2129587T3 (es) 1999-06-16
JP2586881B2 (ja) 1997-03-05

Similar Documents

Publication Publication Date Title
DE69417637D1 (de) Magnetronzerstäubungs-Anlage sowie -Systeme
DE69311876T2 (de) Enteisungssystem
AU2190192A (en) Failure and performance tracking system
DE69430812T2 (de) Verfolgungsystem
NO942431L (no) Radar-system
DE69418010D1 (de) Radarsignalverarbeitungssystem
FI954479A (fi) Hälytysjärjestelmä
DE69232721D1 (de) Enzymsysteme
NL1000139C2 (nl) Magnetronsputtersysteem.
DE59207431D1 (de) Kathodenzerstäubungsanlage
DE69416438D1 (de) Alarmanlage
FI930233A0 (fi) System foer bekaempning av braender
DE69413625D1 (de) Informationsverarbeitungssystem
DE69229083D1 (de) Sputteranlage und Ionenquelle
DE69412164T2 (de) Nachrichtenübertragungssystem
DE59408869D1 (de) Kochsystem
DE69031743T2 (de) Magnetronsputteranlage
NO942958D0 (no) Fölgingssystem
ATA114393A (de) Plattenaufteilanlage
KR950009893U (ko) 마그네트론 스퍼터링 장치
DE69428722D1 (de) Signalverarbeitungsanlage
KR940022675U (ko) 마그네트론 타입 스퍼터링 장치
DE9309372U1 (de) Display- und Exponatsystem
DE4491575D2 (de) Datenträgerarchivsystem
DE9312721U1 (de) Regalsystem

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee