DE69307950D1 - Material für Verdampfungsquelle und Verdampfungsverfahren zur Herstellung einer durchsichtigen Sperrschicht - Google Patents

Material für Verdampfungsquelle und Verdampfungsverfahren zur Herstellung einer durchsichtigen Sperrschicht

Info

Publication number
DE69307950D1
DE69307950D1 DE69307950T DE69307950T DE69307950D1 DE 69307950 D1 DE69307950 D1 DE 69307950D1 DE 69307950 T DE69307950 T DE 69307950T DE 69307950 T DE69307950 T DE 69307950T DE 69307950 D1 DE69307950 D1 DE 69307950D1
Authority
DE
Germany
Prior art keywords
evaporation
create
source material
clear barrier
evaporation source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69307950T
Other languages
English (en)
Other versions
DE69307950T2 (de
Inventor
Nobuhiko Imai
Mamoru Sekiguchi
Mitsuru Kano
Thomas Krug
Gerhard Steiniger
Andreas Meier
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oerlikon Deutschland Holding GmbH
Original Assignee
Leybold AG
Balzers und Leybold Deutschland Holding AG
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold AG, Balzers und Leybold Deutschland Holding AG, Toppan Printing Co Ltd filed Critical Leybold AG
Application granted granted Critical
Publication of DE69307950D1 publication Critical patent/DE69307950D1/de
Publication of DE69307950T2 publication Critical patent/DE69307950T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
    • B65D65/00—Wrappers or flexible covers; Packaging materials of special type or form
    • B65D65/38—Packaging materials of special type or form
    • B65D65/42—Applications of coated or impregnated materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/081—Oxides of aluminium, magnesium or beryllium

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
DE69307950T 1992-05-11 1993-05-10 Material für Verdampfungsquelle und Verdampfungsverfahren zur Herstellung einer durchsichtigen Sperrschicht Expired - Lifetime DE69307950T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4117717A JPH05311412A (ja) 1992-05-11 1992-05-11 蒸着材料および透明バリヤーフィルムの製造方法

Publications (2)

Publication Number Publication Date
DE69307950D1 true DE69307950D1 (de) 1997-03-20
DE69307950T2 DE69307950T2 (de) 1997-07-10

Family

ID=14718555

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69307950T Expired - Lifetime DE69307950T2 (de) 1992-05-11 1993-05-10 Material für Verdampfungsquelle und Verdampfungsverfahren zur Herstellung einer durchsichtigen Sperrschicht

Country Status (4)

Country Link
US (1) US5378506A (de)
EP (1) EP0570182B1 (de)
JP (1) JPH05311412A (de)
DE (1) DE69307950T2 (de)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10204625A (ja) * 1997-01-14 1998-08-04 Sumitomo Heavy Ind Ltd ＭｇＯ膜成膜方法及び成膜装置
US6150030A (en) * 1997-11-20 2000-11-21 Balzers Hochvakuum Ag Substrate coated with an MgO-layer
EP0918043B8 (de) * 1997-11-20 2005-11-23 Applied Films GmbH & Co. KG Mit mindestens einer MgO-Schicht beschichtetes Substrat
EP0918042A1 (de) * 1997-11-20 1999-05-26 Balzers Hochvakuum AG Mit mindestens einer MgO-Schicht beschichtetes Substrat
US6667553B2 (en) 1998-05-29 2003-12-23 Dow Corning Corporation H:SiOC coated substrates
US7666490B1 (en) * 1999-02-10 2010-02-23 Toyo Boseki Kabushiki Kaisha Functional roll film and vacuum evaporation apparatus capable of producing the functional roll film
JP4383626B2 (ja) * 2000-04-13 2009-12-16 キヤノン株式会社 位置決め装置および露光装置
US8043484B1 (en) 2001-03-13 2011-10-25 Novellus Systems, Inc. Methods and apparatus for resputtering process that improves barrier coverage
US7186648B1 (en) 2001-03-13 2007-03-06 Novellus Systems, Inc. Barrier first method for single damascene trench applications
US7781327B1 (en) 2001-03-13 2010-08-24 Novellus Systems, Inc. Resputtering process for eliminating dielectric damage
US6764940B1 (en) 2001-03-13 2004-07-20 Novellus Systems, Inc. Method for depositing a diffusion barrier for copper interconnect applications
US6589887B1 (en) * 2001-10-11 2003-07-08 Novellus Systems, Inc. Forming metal-derived layers by simultaneous deposition and evaporation of metal
US6730373B2 (en) * 2001-11-21 2004-05-04 Optical Coating Laboratory, Inc. Glass panel with barrier coating and related methods
US8298933B2 (en) 2003-04-11 2012-10-30 Novellus Systems, Inc. Conformal films on semiconductor substrates
US7842605B1 (en) 2003-04-11 2010-11-30 Novellus Systems, Inc. Atomic layer profiling of diffusion barrier and metal seed layers
JP4036452B2 (ja) * 2003-04-18 2008-01-23 日本テトラパック株式会社 包装積層材料の製造方法
EP1764425A1 (de) * 2005-09-15 2007-03-21 Semico S.r.l. Vorrichtung und Verfahren zur Herstellung eines flexibelen Bandes mit einer transparenten Beschichtung
US7855147B1 (en) 2006-06-22 2010-12-21 Novellus Systems, Inc. Methods and apparatus for engineering an interface between a diffusion barrier layer and a seed layer
US7645696B1 (en) 2006-06-22 2010-01-12 Novellus Systems, Inc. Deposition of thin continuous PVD seed layers having improved adhesion to the barrier layer
US7510634B1 (en) 2006-11-10 2009-03-31 Novellus Systems, Inc. Apparatus and methods for deposition and/or etch selectivity
US7682966B1 (en) 2007-02-01 2010-03-23 Novellus Systems, Inc. Multistep method of depositing metal seed layers
US7922880B1 (en) 2007-05-24 2011-04-12 Novellus Systems, Inc. Method and apparatus for increasing local plasma density in magnetically confined plasma
US7897516B1 (en) 2007-05-24 2011-03-01 Novellus Systems, Inc. Use of ultra-high magnetic fields in resputter and plasma etching
US7659197B1 (en) 2007-09-21 2010-02-09 Novellus Systems, Inc. Selective resputtering of metal seed layers
US8017523B1 (en) 2008-05-16 2011-09-13 Novellus Systems, Inc. Deposition of doped copper seed layers having improved reliability
JP2011142034A (ja) * 2010-01-08 2011-07-21 Sumitomo Electric Ind Ltd 固体電解質膜とその製造方法および固体電解質電池
JP5545104B2 (ja) * 2010-07-02 2014-07-09 三菱マテリアル株式会社 薄膜形成用の蒸着材及び該薄膜を備える薄膜シート並びに積層シート
DE102012018525A1 (de) * 2012-09-19 2014-03-20 Fresenius Medical Care Deutschland Gmbh Vorrichtung zur Herstellung einer klebefreien Gasbarrierefolie mit einer keramischen Barriereschicht
JP2014152362A (ja) * 2013-02-08 2014-08-25 Nitto Denko Corp 透明ガスバリアフィルムの製造方法、及び透明ガスバリアフィルムの製造装置
CN106929806B (zh) * 2016-10-25 2020-06-02 广东振华科技股份有限公司 高阻隔纳米无机非金属薄膜、其制备方法以及真空卷绕镀膜设备
CN112030101A (zh) * 2020-09-05 2020-12-04 昆山鑫美源电子科技有限公司 一种多层复合结构的铝基导电薄膜的制备方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3442686A (en) * 1964-03-13 1969-05-06 Du Pont Low permeability transparent packaging films
BR8009125A (pt) * 1980-12-29 1982-12-14 Dow Chemical Co Processo para producao de oxido de magnesio refratario anidro
JPS6050164A (ja) * 1983-08-29 1985-03-19 Sekisui Chem Co Ltd 防湿性を有する透明薄膜の形成方法
KR870001762B1 (ko) * 1983-10-31 1987-10-06 신닛뽕 가가꾸 고오교 가부시끼가이샤 마그네시아 클링커 및 그의 제조법

Also Published As

Publication number Publication date
US5378506A (en) 1995-01-03
EP0570182A1 (de) 1993-11-18
DE69307950T2 (de) 1997-07-10
JPH05311412A (ja) 1993-11-22
EP0570182B1 (de) 1997-02-05

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: UNAXIS DEUTSCHLAND HOLDING GMBH, 63450 HANAU, DE T