DE69224514T2 - Verfahren und Vorrichtung zur Erzeugung eines Bildes - Google Patents

Verfahren und Vorrichtung zur Erzeugung eines Bildes

Info

Publication number
DE69224514T2
DE69224514T2 DE69224514T DE69224514T DE69224514T2 DE 69224514 T2 DE69224514 T2 DE 69224514T2 DE 69224514 T DE69224514 T DE 69224514T DE 69224514 T DE69224514 T DE 69224514T DE 69224514 T2 DE69224514 T2 DE 69224514T2
Authority
DE
Germany
Prior art keywords
generating
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69224514T
Other languages
English (en)
Other versions
DE69224514D1 (de
Inventor
Erland Torbjoern Sandstroem
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of DE69224514D1 publication Critical patent/DE69224514D1/de
Application granted granted Critical
Publication of DE69224514T2 publication Critical patent/DE69224514T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Projection-Type Copiers In General (AREA)
  • Microscoopes, Condenser (AREA)
DE69224514T 1992-03-23 1992-03-23 Verfahren und Vorrichtung zur Erzeugung eines Bildes Expired - Fee Related DE69224514T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP92105002A EP0562133B1 (de) 1992-03-23 1992-03-23 Verfahren und Vorrichtung zur Erzeugung eines Bildes

Publications (2)

Publication Number Publication Date
DE69224514D1 DE69224514D1 (de) 1998-04-02
DE69224514T2 true DE69224514T2 (de) 1998-06-18

Family

ID=8209460

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69224514T Expired - Fee Related DE69224514T2 (de) 1992-03-23 1992-03-23 Verfahren und Vorrichtung zur Erzeugung eines Bildes

Country Status (5)

Country Link
US (1) US5440426A (de)
EP (1) EP0562133B1 (de)
JP (1) JP3429802B2 (de)
KR (1) KR100299420B1 (de)
DE (1) DE69224514T2 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007009661A1 (de) * 2006-08-31 2008-03-13 Carl Zeiss Sms Gmbh Verfahren und Vorrichtung zur ortsaufgelösten Bestimmung der Phase und Amplitude des elektromagnetischen Feldes in der Bildebene einer Abbildung eines Objektes

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US5638211A (en) 1990-08-21 1997-06-10 Nikon Corporation Method and apparatus for increasing the resolution power of projection lithography exposure system
US7656504B1 (en) 1990-08-21 2010-02-02 Nikon Corporation Projection exposure apparatus with luminous flux distribution
US6885433B2 (en) * 1990-11-15 2005-04-26 Nikon Corporation Projection exposure apparatus and method
US6252647B1 (en) 1990-11-15 2001-06-26 Nikon Corporation Projection exposure apparatus
US5719704A (en) 1991-09-11 1998-02-17 Nikon Corporation Projection exposure apparatus
US6710855B2 (en) * 1990-11-15 2004-03-23 Nikon Corporation Projection exposure apparatus and method
US6967710B2 (en) 1990-11-15 2005-11-22 Nikon Corporation Projection exposure apparatus and method
US6897942B2 (en) * 1990-11-15 2005-05-24 Nikon Corporation Projection exposure apparatus and method
US5642183A (en) * 1993-08-27 1997-06-24 Sharp Kabushiki Kaisha Spatial filter used in a reduction-type projection printing apparatus
US5572037A (en) * 1995-02-03 1996-11-05 University Of Massachusetts Medical Center Digital imaging using a scanning mirror apparatus
US5663785A (en) * 1995-05-24 1997-09-02 International Business Machines Corporation Diffraction pupil filler modified illuminator for annular pupil fills
JPH09199390A (ja) * 1996-01-16 1997-07-31 Hitachi Ltd パターン形成方法、投影露光装置および半導体装置の製造方法
GB9608178D0 (en) * 1996-04-19 1996-06-26 Bio Rad Micromeasurements Ltd Image enhancement using interferometry
JPH10233361A (ja) * 1996-12-16 1998-09-02 Toshiba Corp 露光方法と露光用マスク
US6233044B1 (en) 1997-01-21 2001-05-15 Steven R. J. Brueck Methods and apparatus for integrating optical and interferometric lithography to produce complex patterns
JP2003504861A (ja) * 1999-07-01 2003-02-04 エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ 空間濾波による画像向上装置および方法
US6261727B1 (en) 1999-12-28 2001-07-17 Taiwan Semiconductor Manufacturing Company DOF for both dense and isolated contact holes
JP3544914B2 (ja) * 2000-03-17 2004-07-21 住友化学工業株式会社 光学顕微鏡装置および顕微鏡観察方法。
US6657796B2 (en) * 2000-04-18 2003-12-02 Gary Greenberg Variable-size sector-shaped aperture mask and method of using same to create focal plane-specific images
US6344837B1 (en) * 2000-06-16 2002-02-05 Andrew H. Gelsey Three-dimensional image display with picture elements formed from directionally modulated pixels
RU2212044C1 (ru) * 2002-01-31 2003-09-10 Общество С Ограниченной Ответственностью "Инсмат Технология" Способ формирования оптического изображения в некогерентном свете
TWI274232B (en) 2002-03-05 2007-02-21 Asml Holding Nv Apparatus and system for improving phase shift mask imaging performance and associated methods
US7303841B2 (en) * 2004-03-26 2007-12-04 Taiwan Semiconductor Manufacturing Company Repair of photolithography masks by sub-wavelength artificial grating technology
DE102004058044B4 (de) * 2004-12-01 2014-02-06 Friedrich-Schiller-Universität Jena Ortsfrequenzfiltervorrichtung und Verfahren zur Ortsfrequenzfilterung von Laserstrahlen
US7345754B1 (en) 2005-09-16 2008-03-18 Kla-Tencor Technologies Corp. Fourier filters and wafer inspection systems
KR20080075123A (ko) * 2005-11-30 2008-08-14 가부시키가이샤 니콘 관찰장치
US8054449B2 (en) 2006-11-22 2011-11-08 Asml Holding N.V. Enhancing the image contrast of a high resolution exposure tool
EP3030932A1 (de) * 2013-08-06 2016-06-15 BAE Systems PLC Anzeigesystem
US10607316B2 (en) * 2016-07-22 2020-03-31 Panasonic Intellectual Property Management Co., Ltd. Image generating apparatus and image generating method
US11156818B2 (en) * 2018-08-13 2021-10-26 The Board Of Regents Of The University Of Texas System Flexible light sheet generation by field synthesis
DE102020106535A1 (de) * 2020-03-10 2021-09-16 Xion Gmbh Verfahren zum Anpassen einer Bildmaske

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US2699092A (en) * 1949-09-13 1955-01-11 Zeiss Carl Microscope with an arrangement for production of image contrasts
US2687670A (en) * 1950-04-26 1954-08-31 Vente Des Instr De Geodesie He Optical device with a variable and colored phase contrast
US3604806A (en) * 1968-10-09 1971-09-14 Atomic Energy Authority Uk Pattern classification apparatus
US3703724A (en) * 1971-07-22 1972-11-21 Kms Ind Inc Recorder with zone plate scanner
US3771129A (en) * 1972-07-27 1973-11-06 Sperry Rand Corp Optical processor fingerprint identification apparatus
DE2237564C3 (de) * 1972-07-31 1981-02-05 Ernst Leitz Wetzlar Gmbh, 6330 Wetzlar Verfahren zur berührungslosen optischen Messung von Bewegungsgrößen, wie Geschwindigkeiten und Verschiebestrecken und Einrichtung zur Durchführung des Verfahrens
US3870414A (en) * 1973-05-25 1975-03-11 Gen Electric Method for sensing surface displacement orthogonal to the direction of observation
JPS5324301B2 (de) * 1974-09-09 1978-07-20
US4035068A (en) * 1975-06-25 1977-07-12 Xerox Corporation Speckle minimization in projection displays by reducing spatial coherence of the image light
JPS5276088A (en) * 1975-12-22 1977-06-25 Toshiba Corp System for inspecting defects of pattern having directivity
US4245909A (en) * 1978-06-26 1981-01-20 Loos Hendricus G Optical instrument for measurement of particle size distributions
US4338030A (en) * 1978-06-26 1982-07-06 Loos Hendricus G Dispersive instrument for measurement of particle size distributions
US4528448A (en) * 1982-05-13 1985-07-09 Benson, Inc. Plane linear grating for optically encoding information
JPH0782655B2 (ja) * 1983-04-28 1995-09-06 オリンパス光学工業株式会社 光ヘッド
US4873653A (en) * 1986-04-09 1989-10-10 Carl-Zeiss-Stiftung Microscope system for providing three-dimensional resolution
US4947413A (en) * 1988-07-26 1990-08-07 At&T Bell Laboratories Resolution doubling lithography technique
US5253110A (en) * 1988-12-22 1993-10-12 Nikon Corporation Illumination optical arrangement
JP2995820B2 (ja) * 1990-08-21 1999-12-27 株式会社ニコン 露光方法及び方法，並びにデバイス製造方法
US5168157A (en) * 1990-11-20 1992-12-01 Fuji Photo Film Co., Ltd. Scanning microscope with means for detecting a first and second polarized light beams along first and second optical receiving paths
US5264912A (en) * 1992-02-07 1993-11-23 Tencor Instruments Speckle reduction track filter apparatus for optical inspection of patterned substrates

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007009661A1 (de) * 2006-08-31 2008-03-13 Carl Zeiss Sms Gmbh Verfahren und Vorrichtung zur ortsaufgelösten Bestimmung der Phase und Amplitude des elektromagnetischen Feldes in der Bildebene einer Abbildung eines Objektes

Also Published As

Publication number Publication date
US5440426A (en) 1995-08-08
DE69224514D1 (de) 1998-04-02
EP0562133A1 (de) 1993-09-29
JP3429802B2 (ja) 2003-07-28
KR930020570A (ko) 1993-10-20
JPH0643393A (ja) 1994-02-18
KR100299420B1 (ko) 2001-11-30
EP0562133B1 (de) 1998-02-25

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Free format text: NOETH UND KOLLEGEN, 80336 MUENCHEN

8339 Ceased/non-payment of the annual fee