DE69223281D1 - Poly(para-t-butyloxycarbonyl-oxystyrol) und Verfahren zu seiner Herstellung - Google Patents
Poly(para-t-butyloxycarbonyl-oxystyrol) und Verfahren zu seiner HerstellungInfo
- Publication number
- DE69223281D1 DE69223281D1 DE69223281T DE69223281T DE69223281D1 DE 69223281 D1 DE69223281 D1 DE 69223281D1 DE 69223281 T DE69223281 T DE 69223281T DE 69223281 T DE69223281 T DE 69223281T DE 69223281 D1 DE69223281 D1 DE 69223281D1
- Authority
- DE
- Germany
- Prior art keywords
- oxystyrene
- butyloxycarbonyl
- para
- poly
- preparation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F12/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F12/02—Monomers containing only one unsaturated aliphatic radical
- C08F12/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F12/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing heteroatoms
- C08F12/22—Oxygen
Landscapes
- Health & Medical Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Emergency Medicine (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3163786A JPH04359906A (ja) | 1991-06-07 | 1991-06-07 | ポリ(パラ−t−ブトキシカルボニルオキシスチレン)及びその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69223281D1 true DE69223281D1 (de) | 1998-01-08 |
DE69223281T2 DE69223281T2 (de) | 1998-05-20 |
Family
ID=15780683
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69223281T Expired - Lifetime DE69223281T2 (de) | 1991-06-07 | 1992-05-28 | Poly(para-t-butyloxycarbonyl-oxystyrol) und Verfahren zu seiner Herstellung |
Country Status (4)
Country | Link |
---|---|
US (1) | US5523370A (de) |
EP (1) | EP0517428B1 (de) |
JP (1) | JPH04359906A (de) |
DE (1) | DE69223281T2 (de) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5395871A (en) * | 1994-05-06 | 1995-03-07 | Hoechst Celanese Corporation | Process of making a stable solution of poly(hydroxystyrene) functionalized with t-butyloxycarbonyl groups |
US5700624A (en) * | 1995-05-09 | 1997-12-23 | Shipley Company, L.L.C. | Positive acid catalyzed resists having an alkali soluble resin with acid labile groups and inert blocking groups |
DE825927T1 (de) | 1996-04-23 | 1998-07-16 | Horsell, Graphic Industries Ltd., Leeds | Warmeempfindliche zusammensetzung und verfahren zur herstellung einer lithographischen druckform damit |
KR0183901B1 (ko) * | 1996-07-03 | 1999-04-01 | 삼성전자 주식회사 | 레지스트 조성물 |
US6117610A (en) * | 1997-08-08 | 2000-09-12 | Kodak Polychrome Graphics Llc | Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use |
US6090532A (en) * | 1997-03-21 | 2000-07-18 | Kodak Polychrome Graphics Llc | Positive-working infrared radiation sensitive composition and printing plate and imaging method |
US6063544A (en) * | 1997-03-21 | 2000-05-16 | Kodak Polychrome Graphics Llc | Positive-working printing plate and method of providing a positive image therefrom using laser imaging |
WO1999001796A2 (en) | 1997-07-05 | 1999-01-14 | Kodak Polychrome Graphics Llc | Pattern-forming methods |
US5958654A (en) * | 1997-08-25 | 1999-09-28 | Lucent Technologies Inc. | Lithographic process and energy-sensitive material for use therein |
US6060217A (en) * | 1997-09-02 | 2000-05-09 | Kodak Polychrome Graphics Llc | Thermal lithographic printing plates |
US6107425A (en) * | 1998-02-06 | 2000-08-22 | Shipley Company, L.L.C. | Narrow molecular weight distribution polymers and use of same as resin binders for negative-acting photoresists |
KR100576201B1 (ko) | 2000-01-17 | 2006-05-03 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 화학 증폭형 레지스트 재료 |
CN115260348B (zh) * | 2022-09-30 | 2023-08-15 | 上海八亿时空先进材料有限公司 | 一种高分子量且窄分布phs树脂及其制备方法与应用 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA603164A (en) * | 1960-08-09 | J.T. Baker Chemical Company | Polymerization of alpha-acyloxystyrenes and alkyl methacrylates | |
US2531355A (en) * | 1946-06-22 | 1950-11-21 | Monsanto Chemicals | Para-vinylbenzyl compounds |
US2534193A (en) * | 1949-04-22 | 1950-12-12 | Monsanto Chemicals | Copolymers of styrene and paravinylbenzyl compounds |
NL261699A (de) * | 1960-02-29 | |||
US4491628A (en) * | 1982-08-23 | 1985-01-01 | International Business Machines Corporation | Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone |
US4810601A (en) * | 1984-12-07 | 1989-03-07 | International Business Machines Corporation | Top imaged resists |
JPS6210005A (ja) * | 1985-07-08 | 1987-01-19 | Nippon Shiken Kogyo Kk | 抗歯髄等組織刺激性及び抗為害性組成物 |
US4657845A (en) * | 1986-01-14 | 1987-04-14 | International Business Machines Corporation | Positive tone oxygen plasma developable photoresist |
EP0277721A3 (de) * | 1987-01-28 | 1989-03-15 | Hoechst Celanese Corporation | Emulsionspolymerisation von 4-Acetoxystyren und Hydrolyse zu Poly(p-vinylphenol) |
JP2540199B2 (ja) * | 1988-02-25 | 1996-10-02 | アメリカン テレフォン アンド テレグラフ カムパニー | デバイスの製造方法 |
JPH0413707A (ja) * | 1990-05-08 | 1992-01-17 | Idemitsu Kosan Co Ltd | スチレン系マクロモノマー、その重合体及び該重合体の製造方法 |
CA2020746A1 (en) * | 1990-07-09 | 1992-01-10 | Gary R. Marchand | Blanking process for reaction mixture |
US5145928A (en) * | 1991-01-28 | 1992-09-08 | Hoechst Celanese Corp. | Side chain polymers as ultraviolet protecting agents |
-
1991
- 1991-06-07 JP JP3163786A patent/JPH04359906A/ja active Pending
-
1992
- 1992-05-28 DE DE69223281T patent/DE69223281T2/de not_active Expired - Lifetime
- 1992-05-28 EP EP92304860A patent/EP0517428B1/de not_active Expired - Lifetime
-
1995
- 1995-04-12 US US08/420,798 patent/US5523370A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE69223281T2 (de) | 1998-05-20 |
US5523370A (en) | 1996-06-04 |
EP0517428B1 (de) | 1997-11-26 |
EP0517428A1 (de) | 1992-12-09 |
JPH04359906A (ja) | 1992-12-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
R071 | Expiry of right |
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