DE69202782D1 - Feldemissions-Elektronenkanone geringer Aberration. - Google Patents

Feldemissions-Elektronenkanone geringer Aberration.

Info

Publication number
DE69202782D1
DE69202782D1 DE69202782T DE69202782T DE69202782D1 DE 69202782 D1 DE69202782 D1 DE 69202782D1 DE 69202782 T DE69202782 T DE 69202782T DE 69202782 T DE69202782 T DE 69202782T DE 69202782 D1 DE69202782 D1 DE 69202782D1
Authority
DE
Germany
Prior art keywords
field emission
electron gun
emission electron
low aberration
aberration field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69202782T
Other languages
English (en)
Other versions
DE69202782T2 (de
Inventor
Mark A Gesley
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Etec Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Etec Systems Inc filed Critical Etec Systems Inc
Publication of DE69202782D1 publication Critical patent/DE69202782D1/de
Application granted granted Critical
Publication of DE69202782T2 publication Critical patent/DE69202782T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
    • H01J3/02—Electron guns
    • H01J3/021—Electron guns using a field emission, photo emission, or secondary emission electron source
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06308—Thermionic sources
    • H01J2237/06316—Schottky emission

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
DE69202782T 1991-03-04 1992-02-24 Feldemissions-Elektronenkanone geringer Aberration. Expired - Fee Related DE69202782T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/671,425 US5196707A (en) 1991-03-04 1991-03-04 Low aberration field emission electron gun

Publications (2)

Publication Number Publication Date
DE69202782D1 true DE69202782D1 (de) 1995-07-13
DE69202782T2 DE69202782T2 (de) 1995-10-12

Family

ID=24694462

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69202782T Expired - Fee Related DE69202782T2 (de) 1991-03-04 1992-02-24 Feldemissions-Elektronenkanone geringer Aberration.

Country Status (6)

Country Link
US (1) US5196707A (de)
EP (1) EP0502401B1 (de)
JP (1) JPH0589813A (de)
KR (1) KR0137199B1 (de)
CA (1) CA2061160C (de)
DE (1) DE69202782T2 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5304888A (en) * 1992-01-24 1994-04-19 Etec Systems, Inc. Mechanically stable field emission gun
DE19638109A1 (de) * 1995-09-25 1997-03-27 Jeol Ltd Elektronenstrahl-Lithographie-System
EP0851460B1 (de) * 1996-12-24 1999-11-03 Advantest Corporation Kanonenlinse zur Partikelstrahlerzeugung
US6137110A (en) * 1998-08-17 2000-10-24 The United States Of America As Represented By The United States Department Of Energy Focused ion beam source method and apparatus
WO2000079565A1 (en) * 1999-06-22 2000-12-28 Philips Electron Optics B.V. Particle-optical apparatus including a particle source that can be switched between high brightness and large beam current
US6469433B1 (en) 2000-01-28 2002-10-22 Extreme Devices Incorporated Package structure for mounting a field emitting device in an electron gun
AU2002216639A1 (en) * 2000-10-18 2002-04-29 Fei Company Focused ion beam system
US6617597B2 (en) * 2001-11-30 2003-09-09 Hewlett-Packard Development Company, L.P. Circuits and methods for electron-beam control
US20040245224A1 (en) * 2003-05-09 2004-12-09 Nano-Proprietary, Inc. Nanospot welder and method
JP4317779B2 (ja) * 2004-03-26 2009-08-19 株式会社日立ハイテクノロジーズ 電界放出型電子銃およびそれを用いた電子ビーム応用装置
US7391034B1 (en) * 2005-03-16 2008-06-24 Kla-Tencor Technologies Corporation Electron imaging beam with reduced space charge defocusing
JP5872541B2 (ja) 2010-04-09 2016-03-01 イー エイ フィシオネ インストルメンツ インコーポレーテッドＥ．Ａ．Ｆｉｓｃｈｉｏｎｅ Ｉｎｓｔｒｕｍｅｎｔｓ， Ｉｎｃ． 改良型イオン源
CN103000479B (zh) * 2012-12-24 2015-07-15 中国科学院大连化学物理研究所 一种新型电子枪

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4426582A (en) * 1980-01-21 1984-01-17 Oregon Graduate Center Charged particle beam apparatus and method utilizing liquid metal field ionization source and asymmetric three element lens system

Also Published As

Publication number Publication date
CA2061160C (en) 2000-04-04
US5196707A (en) 1993-03-23
KR920018818A (ko) 1992-10-22
DE69202782T2 (de) 1995-10-12
JPH0589813A (ja) 1993-04-09
EP0502401B1 (de) 1995-06-07
EP0502401A2 (de) 1992-09-09
KR0137199B1 (ko) 1998-04-24
CA2061160A1 (en) 1992-09-05
EP0502401A3 (de) 1992-09-16

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: APPLIED MATERIALS, INC. (N.D.GES.D. STAATES DELAWA

8339 Ceased/non-payment of the annual fee