DE69027717D1 - Licht- und wärmeempfindliches Aufzeichnungsmaterial - Google Patents

Licht- und wärmeempfindliches Aufzeichnungsmaterial

Info

Publication number
DE69027717D1
DE69027717D1 DE69027717T DE69027717T DE69027717D1 DE 69027717 D1 DE69027717 D1 DE 69027717D1 DE 69027717 T DE69027717 T DE 69027717T DE 69027717 T DE69027717 T DE 69027717T DE 69027717 D1 DE69027717 D1 DE 69027717D1
Authority
DE
Germany
Prior art keywords
light
recording material
sensitive recording
heat sensitive
heat
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69027717T
Other languages
English (en)
Other versions
DE69027717T2 (de
Inventor
Jun C O Fuji Photo F Yamaguchi
Shintaro Washizu
Hirotaka Matsumoto
Ken Iwakura
Yuuichi Fukushige
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP20931889A external-priority patent/JPH0372358A/ja
Priority claimed from JP22493089A external-priority patent/JPH0387827A/ja
Priority claimed from JP1298144A external-priority patent/JP2588782B2/ja
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Application granted granted Critical
Publication of DE69027717D1 publication Critical patent/DE69027717D1/de
Publication of DE69027717T2 publication Critical patent/DE69027717T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/002—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/28—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using thermochromic compounds or layers containing liquid crystals, microcapsules, bleachable dyes or heat- decomposable compounds, e.g. gas- liberating
    • B41M5/287—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using thermochromic compounds or layers containing liquid crystals, microcapsules, bleachable dyes or heat- decomposable compounds, e.g. gas- liberating using microcapsules or microspheres only

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
  • Materials For Photolithography (AREA)
DE69027717T 1989-08-11 1990-08-10 Licht- und wärmeempfindliches Aufzeichnungsmaterial Expired - Fee Related DE69027717T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP20931889A JPH0372358A (ja) 1989-08-11 1989-08-11 感光・感熱性記録材料
JP22493089A JPH0387827A (ja) 1989-08-31 1989-08-31 感光・感熱性記録材料
JP1298144A JP2588782B2 (ja) 1989-11-16 1989-11-16 感光・感熱性記録材料
JP1971090 1990-01-30

Publications (2)

Publication Number Publication Date
DE69027717D1 true DE69027717D1 (de) 1996-08-14
DE69027717T2 DE69027717T2 (de) 1996-11-28

Family

ID=27457235

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69027717T Expired - Fee Related DE69027717T2 (de) 1989-08-11 1990-08-10 Licht- und wärmeempfindliches Aufzeichnungsmaterial

Country Status (4)

Country Link
US (1) US5091280A (de)
EP (1) EP0412570B1 (de)
CA (1) CA2023112C (de)
DE (1) DE69027717T2 (de)

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5288586A (en) * 1990-06-20 1994-02-22 Fuji Photo Film Co., Ltd. Image-foring process using microcapsules
US5376495A (en) * 1990-11-29 1994-12-27 Fuji Photo Film Co., Ltd. Light-sensitive heat-sensitive recording material
DE69225990T2 (de) * 1991-03-15 1998-10-22 Fuji Photo Film Co Ltd Lichtempfindliche Bistrihalomethyl-s-triazin-Verbindung und photopolymerisierbare Zusammensetzung, dieselbe enthaltend
JPH04345886A (ja) * 1991-05-23 1992-12-01 Toppan Printing Co Ltd 可逆性感熱記録媒体及びその製造方法
EP0551796B1 (de) * 1992-01-03 1997-08-13 Novartis AG Suspension von Mikrokapseln und Verfahren zu ihrer Herstellung
DE69419629T2 (de) * 1993-02-05 1999-12-02 Eastman Kodak Co Mit einer Sauerstoff-Barriere beschichtetes photographisches Mittel, durch Vermahlen erhaltene Teilchendispersion für erhöhte Farbstoffstabilität
WO1995034845A1 (en) * 1994-06-10 1995-12-21 Cycolor, Inc. Self-contained imaging assembly and method for forming images therein
TW438786B (en) * 1995-03-28 2001-06-07 Nippon Zoki Pharmaceutical Co Novel benzothiazole derivatives
US5595590A (en) * 1995-05-31 1997-01-21 Nocopi Technologies, Inc. Method and compositions for authenticating a product or document
JPH10226174A (ja) * 1996-11-19 1998-08-25 Fuji Photo Film Co Ltd 感光感熱記録材料
CA2245600A1 (en) * 1997-08-28 1999-02-28 Minoru Suzuki Image-forming substrate
US6127084A (en) * 1998-10-23 2000-10-03 Cycolor, Inc. Photosensitive material employing microcapsules containing a hygroscopic polymer in the internal phase
JP3920485B2 (ja) * 1999-02-19 2007-05-30 富士フイルム株式会社 画像記録方法
US6080520A (en) * 1999-05-26 2000-06-27 Cycolor, Inc. Imaging system having opaque support
DE60043974D1 (de) * 1999-12-07 2010-04-22 Du Pont Photoentfärbbare Verbindungen enthaltende, photopolymerisierbare Zusammensetzungen und ihre Verwendung in flexographischen Druckplatten
EP1152293A3 (de) 2000-05-01 2002-10-02 Fuji Photo Film Co., Ltd. Bildaufzeichnungsgerät
PT1151707E (pt) 2000-05-04 2004-10-29 Nestle Sa Dipositivo para a extraccao de uma substancia com uma peca movel
JP2002229194A (ja) 2001-02-01 2002-08-14 Fuji Photo Film Co Ltd 光重合性組成物及び記録材料
US6964836B2 (en) 2002-03-15 2005-11-15 Eastman Kodak Company Photosensitive microcapsules containing a synthetic viscosity modifier in the continuous phase
US20080103222A1 (en) * 2002-04-26 2008-05-01 Albemarle Corporation New Class of Amine Coinitiators in Photoinitiated Polymerizations
JP2003322968A (ja) * 2002-05-01 2003-11-14 Fuji Photo Film Co Ltd 光重合性組成物及びそれを用いた記録材料
US20040224249A1 (en) * 2003-03-10 2004-11-11 Paulson Bradley A. Self-contained imaging assembly with increased resistance to peeling
US20040198859A1 (en) * 2003-04-03 2004-10-07 Nguyen Chau K. Photopolymerization systems and their use
US20060293404A1 (en) * 2003-04-24 2006-12-28 Santobianco John G New class of amine coinitiators in photoinitiated polymerizations
US20060024487A1 (en) * 2004-07-27 2006-02-02 Eastman Kodak Company Creating stencils using microencapsulated material
US20060024488A1 (en) * 2004-07-27 2006-02-02 Eastman Kodak Company Creating stencils using microencapsulated material
JP2008509906A (ja) * 2004-08-11 2008-04-03 フジフィルム マニュファクチャリング ユーロプ ビー．ブイ． アミノブタジエン系ｕｖスクリーン
TWI391424B (zh) * 2005-01-12 2013-04-01 Taiyo Holdings Co Ltd A hardened resin composition for inkjet and a hardened product thereof, and a printed circuit board using the same
US20070116910A1 (en) * 2005-11-23 2007-05-24 Polykarpov Alexander Y Multilayer laminated structures
WO2007081209A1 (en) * 2006-01-12 2007-07-19 Fujifilm Manufacturing Europe B.V. Uv-absorbing polymers consisting of gelatin and aminobutadiene
JP2010539230A (ja) 2007-09-18 2010-12-16 フジフィルム マニュファクチャリング ユーロプ ビー．ブイ． Ｕｖ吸収性化合物
US20110186589A1 (en) * 2010-02-03 2011-08-04 Lanny Lee Strip arrayed gloves and dispensing apparatus
US8399533B2 (en) * 2010-11-15 2013-03-19 Eastman Kodak Company Photocurable compositions containing N-oxyazinium salt photoinitiators
US20120121815A1 (en) * 2010-11-15 2012-05-17 Deepak Shukla Method of photopolymerizing of acrylates
US9365658B2 (en) 2010-11-15 2016-06-14 Eastman Kodak Company Method of photocuring acrylate compositions
US8664287B2 (en) * 2011-05-16 2014-03-04 Eastman Kodah Company Photocuring methods and articles prepared therefrom
US20120295999A1 (en) * 2011-05-16 2012-11-22 Deepak Shukla Photoinitiator and photocurable compositions and uses
US9475889B2 (en) * 2011-05-16 2016-10-25 Eastman Kodak Company Photoinitiator and photocurable compositions and uses

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3615432A (en) * 1968-10-09 1971-10-26 Eastman Kodak Co Energy-sensitive systems
US3954475A (en) * 1971-09-03 1976-05-04 Minnesota Mining And Manufacturing Company Photosensitive elements containing chromophore-substituted vinyl-halomethyl-s-triazines
US3987037A (en) * 1971-09-03 1976-10-19 Minnesota Mining And Manufacturing Company Chromophore-substituted vinyl-halomethyl-s-triazines
US4189323A (en) * 1977-04-25 1980-02-19 Hoechst Aktiengesellschaft Radiation-sensitive copying composition
JPS5815503A (ja) * 1981-07-20 1983-01-28 Fuji Photo Film Co Ltd 光重合性組成物
US4440846A (en) * 1981-11-12 1984-04-03 Mead Corporation Photocopy sheet employing encapsulated radiation sensitive composition and imaging process
US4399209A (en) * 1981-11-12 1983-08-16 The Mead Corporation Transfer imaging system
JPS5991438A (ja) * 1982-11-17 1984-05-26 Fuji Photo Film Co Ltd 感光感熱記録材料
DE3337024A1 (de) * 1983-10-12 1985-04-25 Hoechst Ag, 6230 Frankfurt Lichtempfindliche, trichlormethylgruppen aufweisende verbindungen, verfahren zu ihrer herstellung und diese verbindungen enthaltendes lichtempfindliches gemisch
US4576891A (en) * 1984-06-15 1986-03-18 The Mead Corporation Photosensitive microcapsules useful in polychromatic imaging having radiation absorber
JPS61118749A (ja) * 1984-11-14 1986-06-06 Konishiroku Photo Ind Co Ltd ハロゲン化銀カラ−写真感光材料の処理方法
US4587194A (en) * 1984-11-20 1986-05-06 The Mead Corporation Photosensitive material employing microcapsules having different photographic speeds
JPS61244587A (ja) * 1985-04-23 1986-10-30 Fuji Photo Film Co Ltd 感熱記録材料
DE3630693A1 (de) * 1985-09-09 1987-03-12 Fuji Photo Film Co Ltd Photochemisch abbaubare mikrokapseln
JPS62232637A (ja) * 1986-04-02 1987-10-13 Brother Ind Ltd 感光感圧記録シ−ト
JPH01172973A (ja) * 1987-12-28 1989-07-07 Konica Corp 静電像現像剤
JP3031931B2 (ja) * 1989-12-21 2000-04-10 新光電気工業株式会社 無電解金めっき液およびこれを用いた無電解金めっき方法

Also Published As

Publication number Publication date
CA2023112C (en) 2000-09-26
DE69027717T2 (de) 1996-11-28
EP0412570B1 (de) 1996-07-10
US5091280A (en) 1992-02-25
EP0412570A2 (de) 1991-02-13
EP0412570A3 (en) 1991-07-31
CA2023112A1 (en) 1991-02-12

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee