DE69024452D1 - UV-Lichtempfindliche Fotoinitiatorzusammensetzungen, ihre Verwendung und strahlungsempfindliche Zusammensetzungen - Google Patents

UV-Lichtempfindliche Fotoinitiatorzusammensetzungen, ihre Verwendung und strahlungsempfindliche Zusammensetzungen

Info

Publication number
DE69024452D1
DE69024452D1 DE69024452T DE69024452T DE69024452D1 DE 69024452 D1 DE69024452 D1 DE 69024452D1 DE 69024452 T DE69024452 T DE 69024452T DE 69024452 T DE69024452 T DE 69024452T DE 69024452 D1 DE69024452 D1 DE 69024452D1
Authority
DE
Germany
Prior art keywords
compositions
radiation sensitive
photosensitive photoinitiator
photosensitive
photoinitiator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69024452T
Other languages
English (en)
Other versions
DE69024452T2 (de
Inventor
Edward Darko Babich
Jeffrey Donald Gelorme
Michael Hatzakis
Jane Margaret Shaw
Kevin Jay Stewart
David Frank Witman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of DE69024452D1 publication Critical patent/DE69024452D1/de
Application granted granted Critical
Publication of DE69024452T2 publication Critical patent/DE69024452T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/127—Spectral sensitizer containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S502/00—Catalyst, solid sorbent, or support therefor: product or process of making
    • Y10S502/522—Radiant or wave energy activated

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Epoxy Resins (AREA)
  • Silicon Polymers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
DE69024452T 1989-10-10 1990-10-08 UV-Lichtempfindliche Fotoinitiatorzusammensetzungen, ihre Verwendung und strahlungsempfindliche Zusammensetzungen Expired - Fee Related DE69024452T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/419,047 US5059512A (en) 1989-10-10 1989-10-10 Ultraviolet light sensitive photoinitiator compositions, use thereof and radiation sensitive compositions

Publications (2)

Publication Number Publication Date
DE69024452D1 true DE69024452D1 (de) 1996-02-08
DE69024452T2 DE69024452T2 (de) 1996-07-11

Family

ID=23660582

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69024452T Expired - Fee Related DE69024452T2 (de) 1989-10-10 1990-10-08 UV-Lichtempfindliche Fotoinitiatorzusammensetzungen, ihre Verwendung und strahlungsempfindliche Zusammensetzungen

Country Status (4)

Country Link
US (1) US5059512A (de)
EP (1) EP0422570B1 (de)
JP (1) JPH0641521B2 (de)
DE (1) DE69024452T2 (de)

Families Citing this family (65)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR950002874B1 (ko) * 1990-06-25 1995-03-27 마쯔시다덴시고오교오 가부시기가이샤 광 또는 방사선감응성 조성물과 패턴형성방법과 포토마스크의 제조방법 및 반도체
US5457003A (en) * 1990-07-06 1995-10-10 Nippon Telegraph And Telephone Corporation Negative working resist material, method for the production of the same and process of forming resist patterns using the same
EP0466025B1 (de) * 1990-07-06 1999-03-10 Nippon Telegraph And Telephone Corporation Resistmaterial, Methode zu seiner Herstellung und Verfahren zum Herstellen von Resistbildern mit diesem Material
JP2752786B2 (ja) * 1990-11-19 1998-05-18 三菱電機株式会社 カラーフィルターの表面保護膜
US5229251A (en) * 1991-04-29 1993-07-20 International Business Machines Corp. Dry developable photoresist containing an epoxide, organosilicon and onium salt
US5286599A (en) * 1991-09-26 1994-02-15 International Business Machines Corporation Base developable negative photoresist composition and use thereof
US5414069A (en) * 1993-02-01 1995-05-09 Polaroid Corporation Electroluminescent polymers, processes for their use, and electroluminescent devices containing these polymers
DE69511141T2 (de) * 1994-03-28 2000-04-20 Matsushita Electric Industrial Co., Ltd. Resistzusammensetzung für tiefe Ultraviolettbelichtung
DE4435487A1 (de) * 1994-10-04 1996-04-11 Hoechst Ag Mit Silikonen kompatible Photoinitiatoren und diese enthaltende lichtempfindliche Gemische
JP2697680B2 (ja) * 1995-05-31 1998-01-14 日本電気株式会社 珪素含有高分子化合物および感光性樹脂組成物
US5707780A (en) * 1995-06-07 1998-01-13 E. I. Du Pont De Nemours And Company Photohardenable epoxy composition
US5583195A (en) * 1995-09-29 1996-12-10 General Electric Company Photocurable epoxy silicones functionalized with fluorescent or photosensitizing marker dyes
US6136498A (en) * 1996-06-28 2000-10-24 International Business Machines Corporation Polymer-bound sensitizer
US5919601A (en) * 1996-11-12 1999-07-06 Kodak Polychrome Graphics, Llc Radiation-sensitive compositions and printing plates
US5976770A (en) * 1998-01-15 1999-11-02 Shipley Company, L.L.C. Dyed photoresists and methods and articles of manufacture comprising same
US6383712B1 (en) 1998-06-05 2002-05-07 International Business Machines Corporation Polymer-bound sensitizer
US6087064A (en) * 1998-09-03 2000-07-11 International Business Machines Corporation Silsesquioxane polymers, method of synthesis, photoresist composition, and multilayer lithographic method
JP4130030B2 (ja) 1999-03-09 2008-08-06 富士フイルム株式会社 感光性組成物および１，３−ジヒドロ−１−オキソ−２ｈ−インデン誘導体化合物
US6824879B2 (en) 1999-06-10 2004-11-30 Honeywell International Inc. Spin-on-glass anti-reflective coatings for photolithography
WO2000077575A1 (en) 1999-06-10 2000-12-21 Alliedsignal Inc. Spin-on-glass anti-reflective coatings for photolithography
EP1215254B1 (de) * 2000-12-13 2007-08-29 Shin-Etsu Chemical Co., Ltd. Strahlenhärtbare Siliconzusammensetzungen
US6582890B2 (en) 2001-03-05 2003-06-24 Sandia Corporation Multiple wavelength photolithography for preparing multilayer microstructures
DE10148894A1 (de) * 2001-10-04 2003-04-30 Fraunhofer Ges Forschung Photochemisch und/oder thermisch strukturierbare Harze auf Silanbasis, einstufiges Verfahren zu deren Herstellung, dabei einzetzbare Ausgangsverbindungen und Herstellungsverfahren für diese
GR1004163B (el) * 2001-11-01 2003-02-21 Πολυκυκλικα παραγωγα τροποποιησης των οπτικων ιδιοτητων και των ιδιοτητων αντοχης στο πλασμα των πολυμερων λιθογραφιας
KR20040066124A (ko) 2001-11-15 2004-07-23 허니웰 인터내셔널 인코포레이티드 포토리소그라피용 스핀온 반사 방지 피막
EP1343048A3 (de) * 2002-03-08 2004-01-14 JSR Corporation Anthracenderivate und strahlungsempfindliche Harzzusammensetzung
US20050074981A1 (en) * 2003-10-06 2005-04-07 Meagley Robert P. Increasing the etch resistance of photoresists
US8053159B2 (en) 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
JP4452572B2 (ja) 2004-07-06 2010-04-21 富士フイルム株式会社 感光性組成物およびそれを用いた画像記録方法
EP1701213A3 (de) 2005-03-08 2006-11-22 Fuji Photo Film Co., Ltd. Lichtempfindliche Zusammensetzung
JP4474317B2 (ja) 2005-03-31 2010-06-02 富士フイルム株式会社 平版印刷版の作製方法
JP5276264B2 (ja) 2006-07-03 2013-08-28 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、平版印刷版の製造方法
JP5028937B2 (ja) * 2006-10-04 2012-09-19 川崎化成工業株式会社 新規なアントラセン化合物、その製造方法およびその用途
US8541063B2 (en) 2007-02-06 2013-09-24 Fujifilm Corporation Undercoat solution, ink-jet recording method and ink-jet recording device
EP1955850B1 (de) 2007-02-07 2011-04-20 FUJIFILM Corporation Tintenstrahlaufzeichnungsvorrichtung mit Wartungsvorrichtung für Tintenstrahldruckkopf und Wartungsverfahren für einen Tintenstrahldruckkopf
US8642246B2 (en) 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
JP5227521B2 (ja) 2007-02-26 2013-07-03 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、インクセット
JP5224699B2 (ja) 2007-03-01 2013-07-03 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び平版印刷版
JP5243072B2 (ja) 2007-03-30 2013-07-24 富士フイルム株式会社 インク組成物、並びに、それを用いた画像記録方法及び画像記録物
JP5306681B2 (ja) 2007-03-30 2013-10-02 富士フイルム株式会社 重合性化合物、重合体、インク組成物、印刷物及びインクジェット記録方法
DE102007063698B4 (de) * 2007-09-13 2010-10-28 Carl Zeiss Vision Gmbh Optisches Bauelement mit Oberflächenbeschichtung
JP4898618B2 (ja) 2007-09-28 2012-03-21 富士フイルム株式会社 インクジェット記録方法
JP5227560B2 (ja) 2007-09-28 2013-07-03 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、成形印刷物の製造方法
JP5265165B2 (ja) 2007-09-28 2013-08-14 富士フイルム株式会社 塗布装置及びこれを用いるインクジェット記録装置
JP5254632B2 (ja) 2008-02-07 2013-08-07 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、成形印刷物
US20090214797A1 (en) 2008-02-25 2009-08-27 Fujifilm Corporation Inkjet ink composition, and inkjet recording method and printed material employing same
JP5583329B2 (ja) 2008-03-11 2014-09-03 富士フイルム株式会社 顔料組成物、インク組成物、印刷物、インクジェット記録方法、及びポリアリルアミン誘導体
JP4914862B2 (ja) 2008-03-26 2012-04-11 富士フイルム株式会社 インクジェット記録方法、及び、インクジェット記録装置
JP5414367B2 (ja) 2008-06-02 2014-02-12 富士フイルム株式会社 顔料分散物及びそれを用いたインク組成物
JP5383133B2 (ja) 2008-09-19 2014-01-08 富士フイルム株式会社 インク組成物、インクジェット記録方法及び印刷物成形体の製造方法
JP2010077228A (ja) 2008-09-25 2010-04-08 Fujifilm Corp インク組成物、インクジェット記録方法、及び、印刷物
JP2010180330A (ja) 2009-02-05 2010-08-19 Fujifilm Corp 非水系インク、インクセット、画像記録方法、画像記録装置、および記録物
JP5350827B2 (ja) 2009-02-09 2013-11-27 富士フイルム株式会社 インク組成物、及び、インクジェット記録方法
JP5349095B2 (ja) 2009-03-17 2013-11-20 富士フイルム株式会社 インク組成物、及び、インクジェット記録方法
JP5349097B2 (ja) 2009-03-19 2013-11-20 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、成形印刷物の製造方法
JP5383289B2 (ja) 2009-03-31 2014-01-08 富士フイルム株式会社 インク組成物、インクジェット用であるインク組成物、インクジェット記録方法、およびインクジェット法による印刷物
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
JP5572026B2 (ja) 2009-09-18 2014-08-13 富士フイルム株式会社 インク組成物、及び、インクジェット記録方法
JP5530141B2 (ja) 2009-09-29 2014-06-25 富士フイルム株式会社 インク組成物及びインクジェット記録方法
JP5343067B2 (ja) * 2010-12-28 2013-11-13 日東電工株式会社 光硬化性樹脂組成物および光学材料
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
EP2644664B1 (de) 2012-03-29 2015-07-29 Fujifilm Corporation Durch aktinische Strahlung härtbare Tintenzusammensetzung, Tintenstrahlaufzeichnungsverfahren, Dekorfolie, Dekorfolienformprodukt, Verfahren zur Herstellung eines In-Mold-Formartikels sowie In-Mold-Formartikel
JP5980702B2 (ja) 2013-03-07 2016-08-31 富士フイルム株式会社 インクジェットインク組成物、インクジェット記録方法、及び、成型印刷物の製造方法
JP5939644B2 (ja) 2013-08-30 2016-06-22 富士フイルム株式会社 画像形成方法、インモールド成型品の製造方法、及び、インクセット
WO2016167892A1 (en) 2015-04-13 2016-10-20 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3294717A (en) * 1963-12-23 1966-12-27 Gen Electric Process and composition for producing organopolysiloxanes
US4318766A (en) * 1975-09-02 1982-03-09 Minnesota Mining And Manufacturing Company Process of using photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials
US4069054A (en) * 1975-09-02 1978-01-17 Minnesota Mining And Manufacturing Company Photopolymerizable composition containing a sensitized aromatic sulfonium compound and a cationacally polymerizable monomer
US4100134A (en) * 1977-03-28 1978-07-11 Minnesota Mining And Manufacturing Company Storage-stable epoxy-terminated silane prepolymer
US4173476A (en) * 1978-02-08 1979-11-06 Minnesota Mining And Manufacturing Company Complex salt photoinitiator
US4218531A (en) * 1978-02-08 1980-08-19 Minnesota Mining And Manufacturing Company Addition of ethylenically unsaturated materials to control odor in photopolymerizable epoxy compositions
US4291114A (en) * 1978-10-18 1981-09-22 Minnesota Mining And Manufacturing Co. Imageable, composite-dry transfer sheet and process of using same
JPS5760330A (en) * 1980-09-27 1982-04-12 Fujitsu Ltd Resin composition
DE3278567D1 (en) * 1981-10-03 1988-07-07 Japan Synthetic Rubber Co Ltd Solvent-soluble organopolysilsesquioxanes, processes for producing the same, and compositions and semiconductor devices using the same
US4640967A (en) * 1982-05-06 1987-02-03 General Electric Company Ultraviolet radiation-curable silicone release compositions with epoxy and/or acrylic functionality
GB2137626B (en) * 1983-03-31 1986-10-15 Sericol Group Ltd Water based photopolymerisable compositions and their use
DE3561155D1 (de) * 1984-02-10 1988-01-21 Ciba-Geigy Ag
KR900002364B1 (ko) * 1984-05-30 1990-04-12 후지쓰가부시끼가이샤 패턴 형성재의 제조방법
US4623676A (en) * 1985-01-18 1986-11-18 Minnesota Mining And Manufacturing Company Protective coating for phototools
US4745169A (en) * 1985-05-10 1988-05-17 Hitachi, Ltd. Alkali-soluble siloxane polymer, silmethylene polymer, and polyorganosilsesquioxane polymer
US4689289A (en) * 1986-04-30 1987-08-25 General Electric Company Block polymer compositions
US4760013A (en) * 1987-02-17 1988-07-26 International Business Machines Corporation Sulfonium salt photoinitiators
US4882201A (en) * 1988-03-21 1989-11-21 General Electric Company Non-toxic aryl onium salts, UV curable coating compositions and food packaging use

Also Published As

Publication number Publication date
JPH03237106A (ja) 1991-10-23
US5059512A (en) 1991-10-22
EP0422570A2 (de) 1991-04-17
EP0422570A3 (en) 1991-10-16
EP0422570B1 (de) 1995-12-27
JPH0641521B2 (ja) 1994-06-01
DE69024452T2 (de) 1996-07-11

Similar Documents

Publication Publication Date Title
DE69024452D1 (de) UV-Lichtempfindliche Fotoinitiatorzusammensetzungen, ihre Verwendung und strahlungsempfindliche Zusammensetzungen
DE69326184D1 (de) Strahlungsempfindliche Zusammensetzungen
DE69517547D1 (de) Strahlungsempfindliche Mischung
DE58907082D1 (de) Strahlungsempfindliche Gemische und deren Verwendung.
DE3381562D1 (de) Bis-kronetherderivate und ihre verwendung.
DE69009822D1 (de) Zusammensetzung und ihre Verwendung.
DE69408761D1 (de) Strahlungsempfindliche Zusammensetzung
DE69518196D1 (de) Verbesserungen von Strahlungsthermometern
DE69333697D1 (de) Härtbare Zusammensetzungen und Verwendung derselben
DE69210941D1 (de) Bohrloch-Zementierungszusammensetzungen und ihre Verwendung
DE59109218D1 (de) Polymerisierbare Kieselsäureheteropolykondensate und deren Verwendung
DE69003397D1 (de) Cyclische Aminverbindungen und ihre Verwendung.
DE59102431D1 (de) Ungesättigte Phenonderivate und ihre Verwendung als Haftklebstoffe.
DE69638056D1 (de) Azeotropähnliche zusammensetzungen und ihre verwendung
DE69115182D1 (de) Polymerzusammensetzung und ihre Verwendung.
DE69216079D1 (de) Infrarotsensitive, photopolymerisierbare zusammensetzungen
DE69506999D1 (de) Strahlungsempfindliche Zusammensetzung
DE69703902D1 (de) Strahlungsempfindliche Zusammensetzung
DE69109852D1 (de) Ausrichtungskontrollvorrichtung und ihre verwendung.
DE59309790D1 (de) Strahlungsempfindliches Gemisch
DE3776962D1 (de) Lichtempfindliche harzzusammensetzung und ihre verwendung.
DE69418203D1 (de) Zementiermittel und ihre verwendung
DE69226600D1 (de) Strahlungsempfindliche positiv-arbeitende Resistzusammensetzung
DE69419142D1 (de) Lageempfindlicher strahlungsdetektor
DE3886139D1 (de) Oligomere Benzilketale und ihre Verwendung als Photoinitiatoren.

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee