DE69020754D1 - Doppelfokusdetektor unter Ausnutzung der chromatischen Aberration. - Google Patents

Doppelfokusdetektor unter Ausnutzung der chromatischen Aberration.

Info

Publication number
DE69020754D1
DE69020754D1 DE69020754T DE69020754T DE69020754D1 DE 69020754 D1 DE69020754 D1 DE 69020754D1 DE 69020754 T DE69020754 T DE 69020754T DE 69020754 T DE69020754 T DE 69020754T DE 69020754 D1 DE69020754 D1 DE 69020754D1
Authority
DE
Germany
Prior art keywords
chromatic aberration
focus detector
double focus
double
detector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69020754T
Other languages
English (en)
Other versions
DE69020754T2 (de
Inventor
Tsutomu Miyatake
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Heavy Industries Ltd
Original Assignee
Sumitomo Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Heavy Industries Ltd filed Critical Sumitomo Heavy Industries Ltd
Publication of DE69020754D1 publication Critical patent/DE69020754D1/de
Application granted granted Critical
Publication of DE69020754T2 publication Critical patent/DE69020754T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Automatic Focus Adjustment (AREA)
DE69020754T 1989-02-27 1990-02-22 Doppelfokusdetektor unter Ausnutzung der chromatischen Aberration. Expired - Fee Related DE69020754T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1043292A JP2699282B2 (ja) 1989-02-27 1989-02-27 色収差を利用した二重焦点検出装置

Publications (2)

Publication Number Publication Date
DE69020754D1 true DE69020754D1 (de) 1995-08-17
DE69020754T2 DE69020754T2 (de) 1995-12-07

Family

ID=12659720

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69020754T Expired - Fee Related DE69020754T2 (de) 1989-02-27 1990-02-22 Doppelfokusdetektor unter Ausnutzung der chromatischen Aberration.

Country Status (4)

Country Link
US (1) US5026976A (de)
EP (1) EP0385272B1 (de)
JP (1) JP2699282B2 (de)
DE (1) DE69020754T2 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5200230A (en) * 1987-06-29 1993-04-06 Dunfries Investments Limited Laser coating process
EP0461254B1 (de) * 1989-12-28 1995-08-09 Sumitomo Heavy Industries, Ltd Verfahren zur beleuchtung mit zusammengesetzten farben sowie beleuchtung in vorgegebener wellenlänge in einem doppelfokusdetektor unter verwendung chromatischer aberration
US5072126A (en) * 1990-10-31 1991-12-10 International Business Machines Corporation Promixity alignment using polarized illumination and double conjugate projection lens
TWI370894B (en) * 2007-02-26 2012-08-21 Corning Inc Method for measuring distortion
JP2012216728A (ja) * 2011-04-01 2012-11-08 V Technology Co Ltd 露光装置のアライメント装置
DE102011018311B4 (de) 2011-04-20 2018-09-13 Conti Temic Microelectronic Gmbh Optische Vorrichtung mit Temperaturkompensation, Kraftfahrzeug mit einer derartigen optischen Vorrichtung und Verfahren zur Bildverarbeitung

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57158826A (en) * 1981-03-27 1982-09-30 Nippon Kogaku Kk <Nikon> Automatic focusing device for stereoscopical microscope
JPS57172730A (en) * 1981-04-17 1982-10-23 Toshiba Corp Relative location detecting device of mask substrate and wafer
JPS5895707A (ja) * 1981-12-02 1983-06-07 Olympus Optical Co Ltd 内視鏡の自動集点検出機構
US4614864A (en) * 1984-05-29 1986-09-30 The Perkin-Elmer Corporation Apparatus for detecting defocus
JPH0744138B2 (ja) * 1985-09-17 1995-05-15 株式会社ニコン 位置合わせ装置
JPS6441805A (en) * 1987-08-07 1989-02-14 Sumitomo Heavy Industries Position detecting apparatus of two bodies, which are separated by minute distance
JP2649391B2 (ja) * 1988-02-10 1997-09-03 住友重機械工業株式会社 色収差を利用した２重焦点検出装置における複色照明方法および帯域光照明方法

Also Published As

Publication number Publication date
EP0385272A2 (de) 1990-09-05
EP0385272B1 (de) 1995-07-12
JPH02223806A (ja) 1990-09-06
JP2699282B2 (ja) 1998-01-19
EP0385272A3 (de) 1991-08-28
DE69020754T2 (de) 1995-12-07
US5026976A (en) 1991-06-25

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee