DE69004275D1 - Verfahren zum Läppen beider Flächen einer Titanscheibe. - Google Patents

Verfahren zum Läppen beider Flächen einer Titanscheibe.

Info

Publication number
DE69004275D1
DE69004275D1 DE90101093T DE69004275T DE69004275D1 DE 69004275 D1 DE69004275 D1 DE 69004275D1 DE 90101093 T DE90101093 T DE 90101093T DE 69004275 T DE69004275 T DE 69004275T DE 69004275 D1 DE69004275 D1 DE 69004275D1
Authority
DE
Germany
Prior art keywords
lapping
titanium disc
titanium
disc
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Revoked
Application number
DE90101093T
Other languages
English (en)
Other versions
DE69004275T2 (de
Inventor
Hiroyoshi Suenaga
Takeshi Ito
Maskuni Takagi
Hiroyoshi Takeuchi
Hideaki Fukai
Kuninori Minakawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Engineering Corp
Original Assignee
NKK Corp
Nippon Kokan Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=11727276&utm_source=***_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69004275(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by NKK Corp, Nippon Kokan Ltd filed Critical NKK Corp
Publication of DE69004275D1 publication Critical patent/DE69004275D1/de
Application granted granted Critical
Publication of DE69004275T2 publication Critical patent/DE69004275T2/de
Anticipated expiration legal-status Critical
Revoked legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/27Work carriers
    • B24B37/28Work carriers for double side lapping of plane surfaces

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
DE90101093T 1989-01-20 1990-01-19 Verfahren zum Läppen beider Flächen einer Titanscheibe. Revoked DE69004275T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1009692A JPH02190258A (ja) 1989-01-20 1989-01-20 チタン板の両面研磨方法

Publications (2)

Publication Number Publication Date
DE69004275D1 true DE69004275D1 (de) 1993-12-09
DE69004275T2 DE69004275T2 (de) 1994-04-14

Family

ID=11727276

Family Applications (1)

Application Number Title Priority Date Filing Date
DE90101093T Revoked DE69004275T2 (de) 1989-01-20 1990-01-19 Verfahren zum Läppen beider Flächen einer Titanscheibe.

Country Status (5)

Country Link
US (1) US5159787A (de)
EP (1) EP0379214B1 (de)
JP (1) JPH02190258A (de)
CA (1) CA2008193A1 (de)
DE (1) DE69004275T2 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5389579A (en) * 1993-04-05 1995-02-14 Motorola, Inc. Method for single sided polishing of a semiconductor wafer
JP3107480B2 (ja) * 1993-06-16 2000-11-06 日本鋼管株式会社 磁気ディスク用チタン製基板
US6236542B1 (en) 1994-01-21 2001-05-22 International Business Machines Corporation Substrate independent superpolishing process and slurry
KR0171092B1 (ko) * 1995-07-06 1999-05-01 구자홍 기판 제조방법
US6197209B1 (en) 1995-10-27 2001-03-06 Lg. Philips Lcd Co., Ltd. Method of fabricating a substrate
KR0180850B1 (ko) * 1996-06-26 1999-03-20 구자홍 유리기판 에칭장치
TW404875B (en) * 1996-07-24 2000-09-11 Komatsu Denshi Kinzoku Kk Method for lapping semiconductor wafers
JPH10180624A (ja) * 1996-12-19 1998-07-07 Shin Etsu Handotai Co Ltd ラッピング装置及び方法
KR100265556B1 (ko) 1997-03-21 2000-11-01 구본준 식각장치
US6327011B2 (en) 1997-10-20 2001-12-04 Lg Electronics, Inc. Liquid crystal display device having thin glass substrate on which protective layer formed and method of making the same
KR100272513B1 (ko) 1998-09-08 2001-01-15 구본준 유리기판의 식각장치
KR100308157B1 (ko) 1998-10-22 2001-11-15 구본준, 론 위라하디락사 액정표시소자용 유리기판
DE10023002B4 (de) * 2000-05-11 2006-10-26 Siltronic Ag Satz von Läuferscheiben sowie dessen Verwendung

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2973605A (en) * 1959-11-09 1961-03-07 Carman Lab Inc Lapping machine
US3089292A (en) * 1961-04-14 1963-05-14 Norton Co Lapping machine
NL7010086A (de) * 1969-07-18 1971-01-20
DE2828102A1 (de) * 1978-06-27 1980-01-10 Bosch Gmbh Robert Einrichtung zur luftmengenmessung
JPS58143954A (ja) * 1982-02-23 1983-08-26 Citizen Watch Co Ltd 精密研磨加工用キヤリア−
US4435247A (en) * 1983-03-10 1984-03-06 International Business Machines Corporation Method for polishing titanium carbide
US4475981A (en) * 1983-10-28 1984-10-09 Ampex Corporation Metal polishing composition and process
US4593495A (en) * 1983-11-25 1986-06-10 Toshiba Machine Co., Ltd. Polishing machine
KR860008003A (ko) * 1985-04-08 1986-11-10 제이·로렌스 킨 양면 포리싱 작업용 캐리어 조립체
DE3524978A1 (de) * 1985-07-12 1987-01-22 Wacker Chemitronic Verfahren zum beidseitigen abtragenden bearbeiten von scheibenfoermigen werkstuecken, insbesondere halbleiterscheiben
US4645561A (en) * 1986-01-06 1987-02-24 Ampex Corporation Metal-polishing composition and process
JPH072298B2 (ja) * 1989-01-20 1995-01-18 日本鋼管株式会社 チタン板の鏡面研磨方法

Also Published As

Publication number Publication date
JPH02190258A (ja) 1990-07-26
EP0379214A2 (de) 1990-07-25
DE69004275T2 (de) 1994-04-14
EP0379214B1 (de) 1993-11-03
US5159787A (en) 1992-11-03
CA2008193A1 (en) 1990-07-20
EP0379214A3 (en) 1990-10-31

Similar Documents

Publication Publication Date Title
DE69032824D1 (de) Verfahren zum Laseraufdampfen
DE69022604D1 (de) Verfahren zum Herstellen von Unterwasserbauwerken.
DE68911621D1 (de) Verfahren zum Herstellen einer Einrichtung.
DE58908247D1 (de) Verfahren zur Reinigung von Kakao-Nahrungsfaser-reichem Material.
DE58900407D1 (de) Verfahren zur reinigung von rohargon.
DE68912633D1 (de) Verfahren zum Auftragsschweissen.
DE58903633D1 (de) Verfahren zum fuegen von keramikteilen.
DE68918245D1 (de) Verfahren zum Herstellen von Schmuckstücken.
DE69004275D1 (de) Verfahren zum Läppen beider Flächen einer Titanscheibe.
DE69024893D1 (de) Verfahren zum Herstellen einer Fotodiode
DE69219063D1 (de) Verfahren zum Regenerieren von Ätzmitteln
DE69502187D1 (de) Verfahren zum Verbessern der Glätte einer Oberfläche
DE68913172D1 (de) Verfahren zum Verbinden von keramischen Fasergefügen mit metallischen Substraten.
DE59304686D1 (de) Verfahren zum herstellen einer bremsscheibe für eine scheibenbremse
DE69031719D1 (de) Verfahren zum automatischen Entwurf einer Programmstruktur
DE69000325D1 (de) Verfahren zum herstellen einer scheibenbremsbacke.
HU908159D0 (en) Process for the production of optically clean diastereoisomers of tetrahydropholate derivatives
DE3788874D1 (de) Verfahren zum Schützen der Integrität von kodierten Signalen.
DE3881140D1 (de) Verfahren zum herstellen einer muttermatrize zum herstellen von projektionsschirmen sowie werkzeug zum durchfuehren des verfahrens.
DE59006471D1 (de) Verfahren zum Schleifen von Nocken einer Nockenwelle.
DE69114048D1 (de) Verfahren zum Schützen von keramischen Oberflächen.
DE69019168D1 (de) Verfahren zum feuerschweissen oder dergleichen.
DE3891295T1 (de) Verfahren zur spanabhebenden bearbeitung der walzenoberflaeche
DE59010807D1 (de) Verfahren zum Herstellen von Bremsscheiben
DE68923394D1 (de) Verfahren zum Bestimmen einer Bildnummer.

Legal Events

Date Code Title Description
8363 Opposition against the patent
8331 Complete revocation