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(de)
|
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2011-02-17 |
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|
US10503084B2
(en)
|
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2019-12-10 |
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Lithographic apparatus and device manufacturing method
|
CN101349876B
(zh)
|
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2010-12-01 |
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|
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(en)
|
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2006-03-11 |
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|
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(en)
|
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2006-09-19 |
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|
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(en)
|
2002-11-12 |
2016-11-01 |
Asml Netherlands B.V. |
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|
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(zh)
|
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2009-03-18 |
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|
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(en)
|
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2006-05-26 |
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|
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|
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|
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(de)
|
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|
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(ko)
|
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|
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|
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|
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(ja)
|
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|
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(de)
|
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|
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(en)
|
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|
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|
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|
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|
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|
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(de)
|
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|
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(zh)
|
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|
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(ko)
|
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|
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(de)
|
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2009-05-07 |
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|
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(en)
|
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2004-10-28 |
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|
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(en)
|
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2004-10-28 |
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|
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(de)
|
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2017-12-20 |
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|
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(de)
|
2003-04-10 |
2017-10-18 |
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|
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(en)
|
2003-04-11 |
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|
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(en)
|
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2018-06-28 |
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|
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(ja)
|
2003-04-11 |
2010-11-17 |
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|
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(de)
|
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2012-02-15 |
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|
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(en)
|
2003-05-13 |
2008-04-01 |
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|
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(zh)
|
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2018-02-16 |
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|
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(zh)
|
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2018-01-21 |
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曝光方法及曝光裝置以及元件製造方法
|
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(zh)
|
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2009-09-16 |
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曝光方法、曝光装置以及器件制造方法
|
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(en)
|
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|
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(en)
|
2003-06-09 |
2007-05-08 |
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|
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(en)
|
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|
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(ko)
|
2003-06-13 |
2015-05-14 |
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|
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(zh)
|
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2011-08-17 |
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|
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(en)
|
2003-06-19 |
2005-03-15 |
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|
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(de)
|
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2005-01-19 |
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|
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(en)
|
2003-06-27 |
2004-10-26 |
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|
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(de)
|
2003-06-27 |
2006-09-06 |
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|
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(de)
|
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|
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(de)
|
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|
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(de)
|
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2016-11-16 |
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|
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(de)
|
2003-07-09 |
2010-11-24 |
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|
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(ko)
|
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2013-08-13 |
가부시키가이샤 니콘 |
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|
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(ja)
|
2003-07-09 |
2010-07-28 |
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|
US7738074B2
(en)
|
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|
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(de)
|
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|
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(de)
|
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2018-07-11 |
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|
US7175968B2
(en)
|
2003-07-28 |
2007-02-13 |
Asml Netherlands B.V. |
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|
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(zh)
|
2003-07-28 |
2014-08-13 |
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|
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(de)
|
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2005-02-02 |
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|
US7779781B2
(en)
|
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2010-08-24 |
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|
US8149381B2
(en)
|
2003-08-26 |
2012-04-03 |
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|
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(ja)
|
2003-08-26 |
2010-06-09 |
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|
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(ja)
|
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2005-03-10 |
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|
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(en)
|
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|
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(en)
|
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2006-10-11 |
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|
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(de)
|
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2014-07-09 |
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|
US6954256B2
(en)
|
2003-08-29 |
2005-10-11 |
Asml Netherlands B.V. |
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|
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(ko)
|
2003-09-03 |
2013-07-19 |
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|
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(ja)
|
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2005-03-31 |
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|
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(de)
|
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|
US7158211B2
(en)
|
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2007-01-02 |
Asml Netherlands B.V. |
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|
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(ko)
|
2003-09-29 |
2014-07-18 |
가부시키가이샤 니콘 |
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|
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(de)
|
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2005-12-21 |
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|
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(de)
|
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2008-10-15 |
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Substrat-transport-vorrichtung und -verfahren, belichtungs-vorrichtung und -verfahren und bauelementherstellungsverfahren
|
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(ja)
|
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2009-08-26 |
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|
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(zh)
|
2003-10-09 |
2017-11-01 |
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|
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(de)
|
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|
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(de)
|
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2005-04-20 |
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|
US7411653B2
(en)
|
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2008-08-12 |
Asml Netherlands B.V. |
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|
WO2005041276A1
(ja)
|
2003-10-28 |
2005-05-06 |
Nikon Corporation |
露光装置、露光方法、デバイスの製造方法
|
US7352433B2
(en)
|
2003-10-28 |
2008-04-01 |
Asml Netherlands B.V. |
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|
JP4295712B2
(ja)
|
2003-11-14 |
2009-07-15 |
エーエスエムエル ネザーランズ ビー.ブイ. |
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|
US7545481B2
(en)
|
2003-11-24 |
2009-06-09 |
Asml Netherlands B.V. |
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|
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(zh)
|
2003-12-03 |
2017-11-11 |
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|
JP2007516613A
(ja)
|
2003-12-15 |
2007-06-21 |
カール・ツアイス・エスエムテイ・アーゲー |
少なくとも1つの液体レンズを備えるマイクロリソグラフィー投影対物レンズとしての対物レンズ
|
KR101681852B1
(ko)
|
2003-12-15 |
2016-12-01 |
가부시키가이샤 니콘 |
스테이지 장치, 노광 장치, 및 노광 방법
|
US7589818B2
(en)
|
2003-12-23 |
2009-09-15 |
Asml Netherlands B.V. |
Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus
|
US7394521B2
(en)
|
2003-12-23 |
2008-07-01 |
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|
ATE459898T1
(de)
*
|
2004-01-20 |
2010-03-15 |
Zeiss Carl Smt Ag |
Belichtungsvorrichtung und messeinrichtung für eine projektionslinse
|
US7589822B2
(en)
|
2004-02-02 |
2009-09-15 |
Nikon Corporation |
Stage drive method and stage unit, exposure apparatus, and device manufacturing method
|
JP4506674B2
(ja)
|
2004-02-03 |
2010-07-21 |
株式会社ニコン |
露光装置及びデバイス製造方法
|
US7050146B2
(en)
|
2004-02-09 |
2006-05-23 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US20070165198A1
(en)
*
|
2004-02-13 |
2007-07-19 |
Carl Zeiss Smt Ag |
Projection objective for a microlithographic projection exposure apparatus
|
CN100592210C
(zh)
*
|
2004-02-13 |
2010-02-24 |
卡尔蔡司Smt股份公司 |
微平版印刷投影曝光装置的投影物镜
|
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(zh)
|
2004-03-25 |
2017-11-21 |
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|
US7227619B2
(en)
|
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2007-06-05 |
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|
US7034917B2
(en)
|
2004-04-01 |
2006-04-25 |
Asml Netherlands B.V. |
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|
US7295283B2
(en)
|
2004-04-02 |
2007-11-13 |
Asml Netherlands B.V. |
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|
US7898642B2
(en)
|
2004-04-14 |
2011-03-01 |
Asml Netherlands B.V. |
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|
WO2005104195A1
(ja)
|
2004-04-19 |
2005-11-03 |
Nikon Corporation |
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|
US7379159B2
(en)
|
2004-05-03 |
2008-05-27 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US8054448B2
(en)
|
2004-05-04 |
2011-11-08 |
Nikon Corporation |
Apparatus and method for providing fluid for immersion lithography
|
US20060244938A1
(en)
*
|
2004-05-04 |
2006-11-02 |
Karl-Heinz Schuster |
Microlitographic projection exposure apparatus and immersion liquid therefore
|
US7616383B2
(en)
|
2004-05-18 |
2009-11-10 |
Asml Netherlands B.V. |
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|
US7486381B2
(en)
|
2004-05-21 |
2009-02-03 |
Asml Netherlands B.V. |
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|
JP4845880B2
(ja)
|
2004-06-04 |
2011-12-28 |
カール・ツァイス・エスエムティー・ゲーエムベーハー |
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|
KR101422964B1
(ko)
|
2004-06-09 |
2014-07-24 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
US8717533B2
(en)
|
2004-06-10 |
2014-05-06 |
Nikon Corporation |
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|
US8508713B2
(en)
|
2004-06-10 |
2013-08-13 |
Nikon Corporation |
Exposure apparatus, exposure method, and method for producing device
|
KR101699965B1
(ko)
|
2004-06-10 |
2017-01-25 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법 및 디바이스 제조 방법
|
KR20070026603A
(ko)
|
2004-06-10 |
2007-03-08 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법, 및 디바이스 제조 방법
|
US8373843B2
(en)
|
2004-06-10 |
2013-02-12 |
Nikon Corporation |
Exposure apparatus, exposure method, and method for producing device
|
US7481867B2
(en)
|
2004-06-16 |
2009-01-27 |
Edwards Limited |
Vacuum system for immersion photolithography
|
US7463330B2
(en)
|
2004-07-07 |
2008-12-09 |
Asml Netherlands B.V. |
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|
JP4894515B2
(ja)
|
2004-07-12 |
2012-03-14 |
株式会社ニコン |
露光装置、デバイス製造方法、及び液体検出方法
|
US7161663B2
(en)
|
2004-07-22 |
2007-01-09 |
Asml Netherlands B.V. |
Lithographic apparatus
|
US7304715B2
(en)
|
2004-08-13 |
2007-12-04 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
KR20070048164A
(ko)
|
2004-08-18 |
2007-05-08 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
US7701550B2
(en)
|
2004-08-19 |
2010-04-20 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
KR101618493B1
(ko)
|
2004-09-17 |
2016-05-04 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법 및 디바이스 제조 방법
|
US7133114B2
(en)
|
2004-09-20 |
2006-11-07 |
Asml Netherlands B.V. |
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|
US7522261B2
(en)
|
2004-09-24 |
2009-04-21 |
Asml Netherlands B.V. |
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|
US7355674B2
(en)
|
2004-09-28 |
2008-04-08 |
Asml Netherlands B.V. |
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|
US7894040B2
(en)
|
2004-10-05 |
2011-02-22 |
Asml Netherlands B.V. |
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|
US7209213B2
(en)
|
2004-10-07 |
2007-04-24 |
Asml Netherlands B.V. |
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|
US7119876B2
(en)
|
2004-10-18 |
2006-10-10 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7379155B2
(en)
|
2004-10-18 |
2008-05-27 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
KR101285951B1
(ko)
|
2004-10-26 |
2013-07-12 |
가부시키가이샤 니콘 |
기판 처리 방법, 노광 장치 및 디바이스 제조 방법
|
US7423720B2
(en)
|
2004-11-12 |
2008-09-09 |
Asml Netherlands B.V. |
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|
US7414699B2
(en)
|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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(ja)
|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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(en)
*
|
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|
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|
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|
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|
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|
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|
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|
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(ko)
|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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(en)
|
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|
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|
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|
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|
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|
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|
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|
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(en)
|
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|
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(en)
|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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(en)
|
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|
US20070127135A1
(en)
*
|
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2007-06-07 |
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|
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(en)
|
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|
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(en)
|
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|
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(en)
|
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|
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(en)
|
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|
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|
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|
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|
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|
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(en)
|
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|
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(en)
|
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|
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(en)
|
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|
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(ko)
|
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|
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(en)
|
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|
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(de)
|
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2007-11-15 |
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|
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(zh)
|
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2011-10-26 |
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|
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(en)
|
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|
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(zh)
|
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|
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(zh)
|
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|
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(zh)
|
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|
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(en)
|
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|
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(en)
|
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2017-04-25 |
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|
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(en)
|
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|
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(en)
|
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2010-09-07 |
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|
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(en)
|
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2012-08-07 |
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|
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(en)
|
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2011-03-08 |
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|
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(en)
|
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2015-02-03 |
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|
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(en)
|
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2011-01-11 |
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|
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(en)
|
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2012-04-24 |
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|
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(nl)
|
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2009-06-11 |
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|
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(ja)
|
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2012-12-12 |
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|
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(en)
|
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|
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(de)
|
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2015-05-06 |
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|
JP6809928B2
(ja)
*
|
2017-02-09 |
2021-01-06 |
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|