DE60228943D1 - Mikrolinse zur projektionslithographie und ihr herstellungsverfahren - Google Patents

Mikrolinse zur projektionslithographie und ihr herstellungsverfahren

Info

Publication number
DE60228943D1
DE60228943D1 DE60228943T DE60228943T DE60228943D1 DE 60228943 D1 DE60228943 D1 DE 60228943D1 DE 60228943 T DE60228943 T DE 60228943T DE 60228943 T DE60228943 T DE 60228943T DE 60228943 D1 DE60228943 D1 DE 60228943D1
Authority
DE
Germany
Prior art keywords
pattern
image
microlens arrays
features
size
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60228943T
Other languages
English (en)
Inventor
Ming-Hsien Wu
George M Whitesides
Kateri E Paul
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Harvard College
Original Assignee
Harvard College
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Harvard College filed Critical Harvard College
Application granted granted Critical
Publication of DE60228943D1 publication Critical patent/DE60228943D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0012—Arrays characterised by the manufacturing method
    • G02B3/0031—Replication or moulding, e.g. hot embossing, UV-casting, injection moulding
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/002—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials
    • G02B1/005—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials made of photonic crystals or photonic band gap materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0012—Arrays characterised by the manufacturing method
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0012—Arrays characterised by the manufacturing method
    • G02B3/0018—Reflow, i.e. characterized by the step of melting microstructures to form curved surfaces, e.g. manufacturing of moulds and surfaces for transfer etching
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/0056—Arrays characterized by the distribution or form of lenses arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/025—Mountings, adjusting means, or light-tight connections, for optical elements for lenses using glue
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/027—Mountings, adjusting means, or light-tight connections, for optical elements for lenses the lens being in the form of a sphere or ball
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Nanotechnology (AREA)
  • Composite Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Materials Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Immobilizing And Processing Of Enzymes And Microorganisms (AREA)
DE60228943T 2001-04-10 2002-04-10 Mikrolinse zur projektionslithographie und ihr herstellungsverfahren Expired - Lifetime DE60228943D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US28310201P 2001-04-10 2001-04-10
PCT/US2002/011623 WO2002084340A1 (en) 2001-04-10 2002-04-10 Microlens for projection lithography and method of preparation thereof

Publications (1)

Publication Number Publication Date
DE60228943D1 true DE60228943D1 (de) 2008-10-30

Family

ID=23084524

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60228943T Expired - Lifetime DE60228943D1 (de) 2001-04-10 2002-04-10 Mikrolinse zur projektionslithographie und ihr herstellungsverfahren

Country Status (5)

Country Link
US (2) US7057832B2 (de)
EP (1) EP1377853B1 (de)
AT (1) ATE408850T1 (de)
DE (1) DE60228943D1 (de)
WO (1) WO2002084340A1 (de)

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* Cited by examiner, † Cited by third party
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EP1377853B1 (de) 2008-09-17
US20040027675A1 (en) 2004-02-12
US20070019306A1 (en) 2007-01-25
US7403338B2 (en) 2008-07-22
WO2002084340A1 (en) 2002-10-24
EP1377853A1 (de) 2004-01-07
WO2002084340B1 (en) 2003-04-03
US7057832B2 (en) 2006-06-06

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