DE602006004890D1 - Beleuchtungsvorrichtung einer fotolithographievorrichtung - Google Patents
Beleuchtungsvorrichtung einer fotolithographievorrichtungInfo
- Publication number
- DE602006004890D1 DE602006004890D1 DE602006004890T DE602006004890T DE602006004890D1 DE 602006004890 D1 DE602006004890 D1 DE 602006004890D1 DE 602006004890 T DE602006004890 T DE 602006004890T DE 602006004890 T DE602006004890 T DE 602006004890T DE 602006004890 D1 DE602006004890 D1 DE 602006004890D1
- Authority
- DE
- Germany
- Prior art keywords
- shutter
- light beam
- plate
- photolithography
- microlenses
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70083—Non-homogeneous intensity distribution in the mask plane
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70125—Use of illumination settings tailored to particular mask patterns
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Display Devices Of Pinball Game Machines (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Control Of Motors That Do Not Use Commutators (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0509036A FR2890461B1 (fr) | 2005-09-05 | 2005-09-05 | Obturateur et illuminateur d'un dispositif de photolithographie |
PCT/EP2006/066032 WO2007028793A1 (fr) | 2005-09-05 | 2006-09-05 | Illuminateur d'un dispositif de photolithographie |
Publications (1)
Publication Number | Publication Date |
---|---|
DE602006004890D1 true DE602006004890D1 (de) | 2009-03-05 |
Family
ID=36501946
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE602006004890T Active DE602006004890D1 (de) | 2005-09-05 | 2006-09-05 | Beleuchtungsvorrichtung einer fotolithographievorrichtung |
Country Status (9)
Country | Link |
---|---|
US (1) | US7982855B2 (de) |
EP (1) | EP1924889B1 (de) |
JP (1) | JP5113753B2 (de) |
KR (1) | KR101274159B1 (de) |
CN (1) | CN101273304B (de) |
AT (1) | ATE421114T1 (de) |
DE (1) | DE602006004890D1 (de) |
FR (1) | FR2890461B1 (de) |
WO (1) | WO2007028793A1 (de) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20090233456A1 (en) * | 2008-03-17 | 2009-09-17 | Sony Corporation | Irradiation optical system, irradiation apparatus and fabrication method for semiconductor device |
JP5326928B2 (ja) * | 2009-08-19 | 2013-10-30 | 株式会社ニコン | 照明光学系、露光装置、およびデバイス製造方法 |
FR2996016B1 (fr) * | 2012-09-25 | 2014-09-19 | Sagem Defense Securite | Illuminateur de photolithographie telecentrique selon deux directions |
FR2996015B1 (fr) * | 2012-09-25 | 2014-09-12 | Sagem Defense Securite | Illuminateur de dispositif de photolithographie permettant la diffraction controlee |
KR101809343B1 (ko) * | 2013-03-13 | 2017-12-14 | 칼 짜이스 에스엠테 게엠베하 | 마이크로리소그래픽 장치 |
CN103412465B (zh) | 2013-07-01 | 2015-04-15 | 中国科学院上海光学精密机械研究所 | 步进扫描投影光刻机的照明*** |
CN103399463B (zh) | 2013-07-19 | 2015-07-29 | 中国科学院上海光学精密机械研究所 | 投影光刻机照明装置和使用方法 |
Family Cites Families (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2848425B2 (ja) * | 1992-06-02 | 1999-01-20 | 富士通株式会社 | 光露光方法 |
JPS58147708A (ja) | 1982-02-26 | 1983-09-02 | Nippon Kogaku Kk <Nikon> | 照明用光学装置 |
JPS6247124A (ja) * | 1985-08-27 | 1987-02-28 | Canon Inc | 露光装置用高速シヤツタ− |
JPH01175730A (ja) * | 1987-12-29 | 1989-07-12 | Matsushita Electric Ind Co Ltd | 露光装置 |
AT393334B (de) * | 1988-01-22 | 1991-09-25 | Ims Ionen Mikrofab Syst | Anordnung zur stabilisierung einer bestrahlten maske |
US5130213A (en) * | 1989-08-07 | 1992-07-14 | At&T Bell Laboratories | Device manufacture involving lithographic processing |
JP3368654B2 (ja) * | 1994-03-23 | 2003-01-20 | 株式会社ニコン | 照明光学装置及び転写方法 |
JP3428055B2 (ja) * | 1992-11-05 | 2003-07-22 | 株式会社ニコン | 照明光学装置、露光装置、半導体製造方法および露光方法 |
US5591958A (en) * | 1993-06-14 | 1997-01-07 | Nikon Corporation | Scanning exposure method and apparatus |
US5815248A (en) * | 1993-04-22 | 1998-09-29 | Nikon Corporation | Illumination optical apparatus and method having a wavefront splitter and an optical integrator |
US5854671A (en) * | 1993-05-28 | 1998-12-29 | Nikon Corporation | Scanning exposure method and apparatus therefor and a projection exposure apparatus and method which selectively chooses between static exposure and scanning exposure |
JPH07120850A (ja) * | 1993-10-26 | 1995-05-12 | Adtec Eng:Kk | 露光装置光源用シャッタ装置 |
JP2723081B2 (ja) * | 1995-05-15 | 1998-03-09 | 日本電気株式会社 | スキャン露光方式における照度むら検出方法 |
JP2674578B2 (ja) * | 1995-08-29 | 1997-11-12 | 株式会社ニコン | 走査露光装置及び露光方法 |
JP3286184B2 (ja) * | 1996-09-25 | 2002-05-27 | キヤノン株式会社 | 走査露光装置および方法 |
JPH10104546A (ja) * | 1996-09-27 | 1998-04-24 | Nikon Corp | オプティカルインテグレータおよび該オプティカルインテグレータを備えた照明装置 |
JP2830868B2 (ja) * | 1997-01-23 | 1998-12-02 | 株式会社ニコン | 投影露光装置及び走査露光方法 |
US6930754B1 (en) * | 1998-06-30 | 2005-08-16 | Canon Kabushiki Kaisha | Multiple exposure method |
AU4015500A (en) * | 1999-03-17 | 2000-10-04 | Rochester Institute Of Technology | A projection imaging system with a non-circular aperture and a method thereof |
US6219171B1 (en) * | 1999-06-03 | 2001-04-17 | Taiwan Semiconductor Manufacturing Company, Ltd | Apparatus and method for stepper exposure control in photography |
AU2001292355A1 (en) * | 2000-10-05 | 2002-04-15 | Nikon Corporation | Method of determining exposure conditions, exposure method, device producing method and recording medium |
WO2002088843A2 (en) * | 2001-04-24 | 2002-11-07 | Canon Kabushiki Kaisha | Exposure method and apparatus |
JP2004037429A (ja) * | 2002-07-08 | 2004-02-05 | Nikon Corp | シアリング干渉計の校正方法、投影光学系の製造方法、投影光学系、及び投影露光装置 |
EP1434092A1 (de) * | 2002-12-23 | 2004-06-30 | ASML Netherlands B.V. | Lithographischer Apparat, Verfahren zur Herstellung eines Artikels und damit erzeugter Artikel |
-
2005
- 2005-09-05 FR FR0509036A patent/FR2890461B1/fr not_active Expired - Fee Related
-
2006
- 2006-09-05 CN CN2006800325219A patent/CN101273304B/zh not_active Expired - Fee Related
- 2006-09-05 AT AT06793241T patent/ATE421114T1/de not_active IP Right Cessation
- 2006-09-05 EP EP06793241A patent/EP1924889B1/de not_active Not-in-force
- 2006-09-05 KR KR1020087008298A patent/KR101274159B1/ko active IP Right Grant
- 2006-09-05 JP JP2008529623A patent/JP5113753B2/ja not_active Expired - Fee Related
- 2006-09-05 DE DE602006004890T patent/DE602006004890D1/de active Active
- 2006-09-05 US US11/991,497 patent/US7982855B2/en not_active Expired - Fee Related
- 2006-09-05 WO PCT/EP2006/066032 patent/WO2007028793A1/fr active Application Filing
Also Published As
Publication number | Publication date |
---|---|
JP2009507387A (ja) | 2009-02-19 |
ATE421114T1 (de) | 2009-01-15 |
WO2007028793A1 (fr) | 2007-03-15 |
US7982855B2 (en) | 2011-07-19 |
US20090257041A1 (en) | 2009-10-15 |
CN101273304A (zh) | 2008-09-24 |
JP5113753B2 (ja) | 2013-01-09 |
CN101273304B (zh) | 2011-05-11 |
FR2890461B1 (fr) | 2008-12-26 |
KR20080071550A (ko) | 2008-08-04 |
KR101274159B1 (ko) | 2013-06-13 |
FR2890461A1 (fr) | 2007-03-09 |
EP1924889A1 (de) | 2008-05-28 |
EP1924889B1 (de) | 2009-01-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |