DE602004029223D1 - Grossflächiges Substrat für die Photolithographie - Google Patents

Grossflächiges Substrat für die Photolithographie

Info

Publication number
DE602004029223D1
DE602004029223D1 DE602004029223T DE602004029223T DE602004029223D1 DE 602004029223 D1 DE602004029223 D1 DE 602004029223D1 DE 602004029223 T DE602004029223 T DE 602004029223T DE 602004029223 T DE602004029223 T DE 602004029223T DE 602004029223 D1 DE602004029223 D1 DE 602004029223D1
Authority
DE
Germany
Prior art keywords
photolithography
large area
area substrate
substrate
area
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602004029223T
Other languages
English (en)
Inventor
Daisuke Kusabiraki
Yukio Shibano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Publication of DE602004029223D1 publication Critical patent/DE602004029223D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D13/00—Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor
    • B24D13/02—Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor acting by their periphery
    • B24D13/10—Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor acting by their periphery comprising assemblies of brushes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24777—Edge feature
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31—Surface property or characteristic of web, sheet or block
    • Y10T428/315—Surface modified glass [e.g., tempered, strengthened, etc.]

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Nonlinear Science (AREA)
  • Sustainable Development (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Surface Treatment Of Glass (AREA)
  • Cleaning In General (AREA)
  • Glass Melting And Manufacturing (AREA)
DE602004029223T 2003-07-18 2004-07-19 Grossflächiges Substrat für die Photolithographie Active DE602004029223D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003199004A JP4206850B2 (ja) 2003-07-18 2003-07-18 露光用大型合成石英ガラス基板の製造方法

Publications (1)

Publication Number Publication Date
DE602004029223D1 true DE602004029223D1 (de) 2010-11-04

Family

ID=33475522

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004029223T Active DE602004029223D1 (de) 2003-07-18 2004-07-19 Grossflächiges Substrat für die Photolithographie

Country Status (7)

Country Link
US (1) US8012563B2 (de)
EP (1) EP1498775B1 (de)
JP (1) JP4206850B2 (de)
KR (1) KR100853613B1 (de)
CN (1) CN100514162C (de)
DE (1) DE602004029223D1 (de)
TW (1) TW200510260A (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4362732B2 (ja) * 2005-06-17 2009-11-11 信越化学工業株式会社 フォトマスク用大型ガラス基板及びその製造方法、コンピュータ読み取り可能な記録媒体、並びにマザーガラスの露光方法
JP5484649B2 (ja) * 2006-01-27 2014-05-07 古河電気工業株式会社 薄板ガラスの製造方法
JP5414079B2 (ja) * 2006-05-15 2014-02-12 Ｈｏｙａ株式会社 Ｆｐｄデバイス製造用マスクブランク、フォトマスク、及びｆｐｄデバイス製造用マスクブランクの設計方法
KR101221834B1 (ko) 2006-10-10 2013-01-15 니폰 덴키 가라스 가부시키가이샤 강화 유리 기판
US8062732B2 (en) * 2007-05-22 2011-11-22 Corning Incorporated Glass article having improved edge
US7666508B2 (en) * 2007-05-22 2010-02-23 Corning Incorporated Glass article having a laser melted surface
CN102701596B (zh) * 2007-12-18 2015-11-18 Hoya株式会社 便携式终端用防护玻璃及其制造方法、以及便携式终端装置
KR101168712B1 (ko) * 2009-02-13 2012-09-13 호야 가부시키가이샤 마스크블랭크용 기판, 마스크블랭크 및 포토마스크
CN102341214B (zh) * 2009-03-10 2015-01-28 日本电气硝子株式会社 玻璃基板及其制造方法
JP2014023196A (ja) * 2012-07-13 2014-02-03 Denso Corp モータ制御装置
JP6727170B2 (ja) * 2017-06-30 2020-07-22 クアーズテック株式会社 フォトマスク用基板

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5646227A (en) 1979-09-21 1981-04-27 Shin Etsu Chem Co Ltd Mask substrate for electronic device
JPH02204345A (ja) 1989-01-31 1990-08-14 Hoya Corp ガラス基板
ES2120467T3 (es) * 1992-11-19 1998-11-01 Shinetsu Quartz Prod Procedimiento para fabricar un tubo de vidrio de cuarzo de gran tamaño, una preforma y una fibra optica.
WO1996019345A1 (fr) * 1994-12-22 1996-06-27 Dai Nippon Printing Co., Ltd. Film composite
US5961197A (en) * 1995-12-14 1999-10-05 Enplas Corporation Surface light source device
US5643365A (en) 1996-07-25 1997-07-01 Ceram Optec Industries Inc Method and device for plasma vapor chemical deposition of homogeneous films on large flat surfaces
US5816897A (en) 1996-09-16 1998-10-06 Corning Incorporated Method and apparatus for edge finishing glass
JP2000218481A (ja) * 1999-01-27 2000-08-08 Nippon Sheet Glass Co Ltd ガラス板表面の筋状凹凸の除去方法および筋状凹凸を減じたガラス板
JP2000267253A (ja) 1999-03-12 2000-09-29 Seiko Epson Corp 露光マスクの形成方法および液晶装置の製造方法
US6506289B2 (en) * 2000-08-07 2003-01-14 Symmorphix, Inc. Planar optical devices and methods for their manufacture
JP3516233B2 (ja) * 2000-11-06 2004-04-05 日本板硝子株式会社 情報記録媒体用ガラス基板の製造方法
JP4561950B2 (ja) 2001-08-08 2010-10-13 信越化学工業株式会社 角形基板
JP2003089550A (ja) * 2001-09-13 2003-03-28 Fujikura Ltd ガラス材の研磨方法およびそれを用いたファイバ母材の製造方法
JP2003173015A (ja) 2001-09-28 2003-06-20 Hoya Corp グレートーンマスクの製造方法
TWI250133B (en) * 2002-01-31 2006-03-01 Shinetsu Chemical Co Large-sized substrate and method of producing the same
JP3934115B2 (ja) 2003-03-26 2007-06-20 Ｈｏｙａ株式会社 フォトマスク用基板、フォトマスクブランク、及びフォトマスク
US7323276B2 (en) 2003-03-26 2008-01-29 Hoya Corporation Substrate for photomask, photomask blank and photomask
US6910953B2 (en) * 2003-07-24 2005-06-28 Corning Incorporated Methods and apparatus for edge finishing glass sheets

Also Published As

Publication number Publication date
TWI353968B (de) 2011-12-11
CN1577029A (zh) 2005-02-09
KR100853613B1 (ko) 2008-08-22
EP1498775B1 (de) 2010-09-22
US8012563B2 (en) 2011-09-06
JP2005037580A (ja) 2005-02-10
JP4206850B2 (ja) 2009-01-14
KR20050009690A (ko) 2005-01-25
US20050013972A1 (en) 2005-01-20
CN100514162C (zh) 2009-07-15
TW200510260A (en) 2005-03-16
EP1498775A3 (de) 2006-10-04
EP1498775A2 (de) 2005-01-19

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