DE60121468D1 - Zusammensetzung mit einer oxidierenden und komplexierenden verbindung - Google Patents

Zusammensetzung mit einer oxidierenden und komplexierenden verbindung

Info

Publication number
DE60121468D1
DE60121468D1 DE60121468T DE60121468T DE60121468D1 DE 60121468 D1 DE60121468 D1 DE 60121468D1 DE 60121468 T DE60121468 T DE 60121468T DE 60121468 T DE60121468 T DE 60121468T DE 60121468 D1 DE60121468 D1 DE 60121468D1
Authority
DE
Germany
Prior art keywords
composition
compound
complexing
oxidative
present
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60121468T
Other languages
English (en)
Other versions
DE60121468T2 (de
Inventor
Rita Vos
Paul Mertens
Albrecht Fester
Oliver Doll
Bernd Kolbesen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Interuniversitair Microelektronica Centrum vzw IMEC
Air Products and Chemicals Inc
Original Assignee
Interuniversitair Microelektronica Centrum vzw IMEC
Air Products and Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Interuniversitair Microelektronica Centrum vzw IMEC, Air Products and Chemicals Inc filed Critical Interuniversitair Microelektronica Centrum vzw IMEC
Application granted granted Critical
Publication of DE60121468D1 publication Critical patent/DE60121468D1/de
Publication of DE60121468T2 publication Critical patent/DE60121468T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B15/00Peroxides; Peroxyhydrates; Peroxyacids or salts thereof; Superoxides; Ozonides
    • C01B15/01Hydrogen peroxide
    • C01B15/037Stabilisation by additives
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K15/00Anti-oxidant compositions; Compositions inhibiting chemical change
    • C09K15/04Anti-oxidant compositions; Compositions inhibiting chemical change containing organic compounds
    • C09K15/30Anti-oxidant compositions; Compositions inhibiting chemical change containing organic compounds containing heterocyclic ring with at least one nitrogen atom as ring member
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16Organic compounds
    • C11D3/26Organic compounds containing nitrogen
    • C11D3/28Heterocyclic compounds containing nitrogen in the ring
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/39Organic or inorganic per-compounds
    • C11D3/3902Organic or inorganic per-compounds combined with specific additives
    • DTEXTILES; PAPER
    • D06TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06LDRY-CLEANING, WASHING OR BLEACHING FIBRES, FILAMENTS, THREADS, YARNS, FABRICS, FEATHERS OR MADE-UP FIBROUS GOODS; BLEACHING LEATHER OR FURS
    • D06L4/00Bleaching fibres, filaments, threads, yarns, fabrics, feathers or made-up fibrous goods; Bleaching leather or furs
    • D06L4/10Bleaching fibres, filaments, threads, yarns, fabrics, feathers or made-up fibrous goods; Bleaching leather or furs using agents which develop oxygen
    • D06L4/12Bleaching fibres, filaments, threads, yarns, fabrics, feathers or made-up fibrous goods; Bleaching leather or furs using agents which develop oxygen combined with specific additives
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10Objects to be cleaned
    • C11D2111/14Hard surfaces
    • C11D2111/22Electronic devices, e.g. PCBs or semiconductors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Textile Engineering (AREA)
  • Detergent Compositions (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Agricultural Chemicals And Associated Chemicals (AREA)
  • Cleaning By Liquid Or Steam (AREA)
DE60121468T 2000-12-22 2001-12-21 Zusammensetzung mit einer oxidierenden und komplexierenden verbindung Expired - Lifetime DE60121468T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US25792800P 2000-12-22 2000-12-22
US257928P 2000-12-22
PCT/BE2001/000219 WO2002051961A2 (en) 2000-12-22 2001-12-21 Composition comprising an oxidizing and complexing compound

Publications (2)

Publication Number Publication Date
DE60121468D1 true DE60121468D1 (de) 2006-08-24
DE60121468T2 DE60121468T2 (de) 2007-03-29

Family

ID=22978385

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60121468T Expired - Lifetime DE60121468T2 (de) 2000-12-22 2001-12-21 Zusammensetzung mit einer oxidierenden und komplexierenden verbindung

Country Status (11)

Country Link
US (1) US7160482B2 (de)
EP (1) EP1345848B1 (de)
JP (1) JP3958687B2 (de)
KR (1) KR100863159B1 (de)
CN (1) CN100515928C (de)
AT (1) ATE332873T1 (de)
AU (1) AU2002218892A1 (de)
DE (1) DE60121468T2 (de)
IL (1) IL156551A0 (de)
TW (1) TW583310B (de)
WO (1) WO2002051961A2 (de)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090325362A1 (en) * 2003-01-07 2009-12-31 Nabil Chhaimi Method of recycling an epitaxied donor wafer
DE602004009584T2 (de) * 2003-06-27 2008-08-07 Interuniversitair Microelektronica Centrum (Imec) Halbleiterreinigungslösung
KR101331747B1 (ko) * 2005-01-27 2013-11-20 어드밴스드 테크놀러지 머티리얼즈, 인코포레이티드 반도체 기판 처리 조성물
US7939482B2 (en) 2005-05-25 2011-05-10 Freescale Semiconductor, Inc. Cleaning solution for a semiconductor wafer
US8034227B2 (en) * 2005-06-30 2011-10-11 Akzo Nobel N.V. Chemical process
US20070012578A1 (en) * 2005-06-30 2007-01-18 Akzo Nobel N.V. Chemical process
JP2009512194A (ja) * 2005-10-05 2009-03-19 アドバンスド テクノロジー マテリアルズ,インコーポレイテッド ポストエッチング残渣を除去するための酸化性水性洗浄剤
GB0520380D0 (en) 2005-10-07 2005-11-16 Unilever Plc Stain removal
KR100663375B1 (ko) * 2006-01-18 2007-01-02 삼성전자주식회사 금속질화막을 게이트전극으로 채택하는 반도체소자의제조방법
DE602006014551D1 (de) * 2006-10-31 2010-07-08 Soitec Silicon On Insulator Verfahren zur Charakterisierung von Defekten auf Silizium-Oberflächen, Ätzlösung für Silizium-Oberflächen und Verfahren zur Behandlung von Silizium-Oberflächen mit der Ätzlösung
CN101270325A (zh) * 2007-03-23 2008-09-24 安集微电子(上海)有限公司 一种清洗液及其应用
TWI426125B (zh) * 2007-11-20 2014-02-11 Anji Microelectronics Co Ltd 清洗液及其應用
CN102051836A (zh) * 2009-10-29 2011-05-11 海茂株式会社 纸浆制造排水的处理方法
WO2012019688A2 (de) * 2010-07-27 2012-02-16 Clariant International Ltd Zusammensetzungen enthaltend wasserstoffperoxid oder wasserstoffperoxid freisetzende substanzen
BR112013001953A2 (pt) 2010-07-27 2018-05-15 Clariant Finance Bvi Ltd uso de hidroxipiridonas ou sais dos mesmos para a estabilização de peróxido de hidrogênio ou substâncias doadoras de peróxido de hidrogênio
US20120295447A1 (en) * 2010-11-24 2012-11-22 Air Products And Chemicals, Inc. Compositions and Methods for Texturing of Silicon Wafers
DE102010054866A1 (de) * 2010-12-17 2011-08-18 Clariant International Ltd. Zusammensetzungen enthaltend Wasserstoffperoxid oder Wasserstoffperoxid freisetzende Substanzen
EP2697352A1 (de) * 2011-04-12 2014-02-19 The Procter and Gamble Company Metallbleichkatalysatoren
WO2013018015A2 (en) * 2011-08-01 2013-02-07 Basf Se A PROCESS FOR THE MANUFACTURE OF SEMICONDUCTOR DEVICES COMPRISING THE CHEMICAL MECHANICAL POLISHING OF ELEMENTAL GERMANIUM AND/OR Si1-XGeX MATERIAL IN THE PRESENCE OF A CMP COMPOSITION COMPRISING A SPECIFIC ORGANIC COMPOUND
CN103717725A (zh) * 2011-08-15 2014-04-09 宝洁公司 包含吡啶酚-n-氧化物化合物的洗涤剂组合物
DE102013217034A1 (de) * 2013-08-27 2015-03-05 Henkel Ag & Co. Kgaa Wasch- und Reinigungsmittel mit verbesserter Leistung
CN107076716A (zh) * 2015-01-14 2017-08-18 栗田工业株式会社 氧化剂浓度的测定方法及测定装置以及电子材料洗净装置
CN107530739B (zh) * 2015-03-26 2021-04-27 生命技术公司 用于处理半导体传感器阵列装置的方法
CN110965086A (zh) * 2019-11-21 2020-04-07 武汉奥邦表面技术有限公司 一种酸性镀锌除杂剂及其应用

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2624655A (en) * 1949-10-13 1953-01-06 Buffalo Electro Chem Co Stable aqueous hydrogen peroxide and method of preparing same
US3903244A (en) * 1973-02-02 1975-09-02 Fmc Corp Stabilized hydrogen peroxide
US4239643A (en) * 1979-01-02 1980-12-16 Monsanto Company Peroxide stabilization
GB8308054D0 (en) * 1983-03-24 1983-05-05 Hider R C Pharmaceutical compositions
CA2059841A1 (en) * 1991-01-24 1992-07-25 Ichiro Hayashida Surface treating solutions and cleaning method
JP3075290B2 (ja) * 1991-02-28 2000-08-14 三菱瓦斯化学株式会社 半導体基板の洗浄液
GB9217099D0 (en) * 1992-08-12 1992-09-23 British Tech Group Pharmaceutical compositions
US5419847A (en) * 1993-05-13 1995-05-30 The Procter & Gamble Company Translucent, isotropic aqueous liquid bleach composition
DE19631363C1 (de) * 1996-08-02 1998-02-12 Siemens Ag Wässrige Reinigungslösung für ein Halbleitersubstrat
EP1006112A1 (de) * 1998-12-01 2000-06-07 Cerebrus Pharmaceuticals Limited 3-Hydroxy-2(1H)-pyridinon- oder 3-hydroxy-4(1H)-pyridinon- Derivate verwendbar als reaktive Sauerstoffspezies-Fänger (ROS)
EP1091395A1 (de) 1999-09-30 2001-04-11 Interuniversitair Microelektronica Centrum Vzw Reinigungslösung für Behandlung von Halbleitersubstraten

Also Published As

Publication number Publication date
US20050009207A1 (en) 2005-01-13
DE60121468T2 (de) 2007-03-29
JP3958687B2 (ja) 2007-08-15
AU2002218892A1 (en) 2002-07-08
ATE332873T1 (de) 2006-08-15
EP1345848B1 (de) 2006-07-12
WO2002051961A3 (en) 2002-10-17
CN100515928C (zh) 2009-07-22
KR20030091950A (ko) 2003-12-03
KR100863159B1 (ko) 2008-10-13
TW583310B (en) 2004-04-11
US7160482B2 (en) 2007-01-09
CN1486279A (zh) 2004-03-31
WO2002051961A2 (en) 2002-07-04
EP1345848A2 (de) 2003-09-24
IL156551A0 (en) 2004-01-04
JP2004534862A (ja) 2004-11-18

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Legal Events

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