DE59107831D1 - Ionenquelle - Google Patents

Ionenquelle

Info

Publication number
DE59107831D1
DE59107831D1 DE59107831T DE59107831T DE59107831D1 DE 59107831 D1 DE59107831 D1 DE 59107831D1 DE 59107831 T DE59107831 T DE 59107831T DE 59107831 T DE59107831 T DE 59107831T DE 59107831 D1 DE59107831 D1 DE 59107831D1
Authority
DE
Germany
Prior art keywords
ion source
ion
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE59107831T
Other languages
English (en)
Inventor
Juergen Dr Mueller
Roland Dr Gesche
Manfred Dipl Ing Zipf
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Balzers und Leybold Deutschland Holding AG
Original Assignee
Leybold AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold AG filed Critical Leybold AG
Application granted granted Critical
Publication of DE59107831D1 publication Critical patent/DE59107831D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Plasma Technology (AREA)
DE59107831T 1990-06-21 1991-04-25 Ionenquelle Expired - Fee Related DE59107831D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE4019729A DE4019729A1 (de) 1990-06-21 1990-06-21 Ionenquelle

Publications (1)

Publication Number Publication Date
DE59107831D1 true DE59107831D1 (de) 1996-06-27

Family

ID=6408764

Family Applications (2)

Application Number Title Priority Date Filing Date
DE4019729A Withdrawn DE4019729A1 (de) 1990-06-21 1990-06-21 Ionenquelle
DE59107831T Expired - Fee Related DE59107831D1 (de) 1990-06-21 1991-04-25 Ionenquelle

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE4019729A Withdrawn DE4019729A1 (de) 1990-06-21 1990-06-21 Ionenquelle

Country Status (4)

Country Link
US (1) US5124526A (de)
EP (1) EP0462377B1 (de)
JP (1) JPH06342637A (de)
DE (2) DE4019729A1 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5308461A (en) * 1992-01-14 1994-05-03 Honeywell Inc. Method to deposit multilayer films
US5216330A (en) * 1992-01-14 1993-06-01 Honeywell Inc. Ion beam gun
DE4242894A1 (de) * 1992-12-18 1994-06-23 Leybold Ag Vorrichtung zur Mehrfacheinspeisung von HF-Leistung in Kathodenkörpern
KR100456465B1 (ko) * 2000-03-20 2004-11-10 현대종합금속 주식회사 내균열성이 우수한 페라이트계 스테인레스 스틸 용접용플럭스 충전 와이어
US7459899B2 (en) 2005-11-21 2008-12-02 Thermo Fisher Scientific Inc. Inductively-coupled RF power source
WO2011123125A1 (en) 2010-03-31 2011-10-06 Colorado State University Research Foundation Liquid-gas interface plasma device
US8994270B2 (en) 2008-05-30 2015-03-31 Colorado State University Research Foundation System and methods for plasma application
WO2009146439A1 (en) 2008-05-30 2009-12-03 Colorado State University Research Foundation System, method and apparatus for generating plasma
JP2011522381A (ja) 2008-05-30 2011-07-28 コロラド ステート ユニバーシティ リサーチ ファンデーション プラズマに基づく化学源装置およびその使用方法
US8222822B2 (en) 2009-10-27 2012-07-17 Tyco Healthcare Group Lp Inductively-coupled plasma device
AU2010349784B2 (en) 2010-03-31 2015-01-15 Colorado State University Research Foundation Liquid-gas interface plasma device
US9532826B2 (en) 2013-03-06 2017-01-03 Covidien Lp System and method for sinus surgery
US9555145B2 (en) 2013-03-13 2017-01-31 Covidien Lp System and method for biofilm remediation

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3530335A (en) * 1969-02-03 1970-09-22 Humphreys Corp Induction plasma generator with high velocity sheath
US3814983A (en) * 1972-02-07 1974-06-04 C Weissfloch Apparatus and method for plasma generation and material treatment with electromagnetic radiation
US3958883A (en) * 1974-07-10 1976-05-25 Baird-Atomic, Inc. Radio frequency induced plasma excitation of optical emission spectroscopic samples
US4381453A (en) * 1980-12-31 1983-04-26 International Business Machines Corporation System and method for deflecting and focusing a broad ion beam
US4629940A (en) * 1984-03-02 1986-12-16 The Perkin-Elmer Corporation Plasma emission source
DE3729347A1 (de) * 1986-09-05 1988-03-17 Mitsubishi Electric Corp Plasmaprozessor
US4795880A (en) * 1986-09-11 1989-01-03 Hayes James A Low pressure chemical vapor deposition furnace plasma clean apparatus
DE3632340C2 (de) * 1986-09-24 1998-01-15 Leybold Ag Induktiv angeregte Ionenquelle

Also Published As

Publication number Publication date
DE4019729A1 (de) 1992-01-02
EP0462377B1 (de) 1996-05-22
EP0462377A3 (en) 1992-05-13
JPH06342637A (ja) 1994-12-13
US5124526A (en) 1992-06-23
EP0462377A2 (de) 1991-12-27

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Legal Events

Date Code Title Description
8327 Change in the person/name/address of the patent owner

Owner name: BALZERS UND LEYBOLD DEUTSCHLAND HOLDING AG, 63450

8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee