DE4102285A1 - Membrane diode used as radiation sensor with improved selectivity - consists of a back-etched diode with front and back surface implantations and a thickness depending on energy range to be detected - Google Patents
Membrane diode used as radiation sensor with improved selectivity - consists of a back-etched diode with front and back surface implantations and a thickness depending on energy range to be detectedInfo
- Publication number
- DE4102285A1 DE4102285A1 DE4102285A DE4102285A DE4102285A1 DE 4102285 A1 DE4102285 A1 DE 4102285A1 DE 4102285 A DE4102285 A DE 4102285A DE 4102285 A DE4102285 A DE 4102285A DE 4102285 A1 DE4102285 A1 DE 4102285A1
- Authority
- DE
- Germany
- Prior art keywords
- membrane
- diode
- detected
- radiation
- diodes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 239000012528 membrane Substances 0.000 title claims abstract description 14
- 230000005855 radiation Effects 0.000 title claims abstract description 11
- 238000002513 implantation Methods 0.000 title claims 3
- 238000005530 etching Methods 0.000 claims abstract description 10
- 238000000034 method Methods 0.000 claims abstract description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 2
- 239000002178 crystalline material Substances 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- 239000007943 implant Substances 0.000 abstract description 4
- LBDSXVIYZYSRII-IGMARMGPSA-N alpha-particle Chemical compound [4He+2] LBDSXVIYZYSRII-IGMARMGPSA-N 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
- 238000010561 standard procedure Methods 0.000 abstract 1
- 230000006978 adaptation Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
- G01T1/16—Measuring radiation intensity
- G01T1/24—Measuring radiation intensity with semiconductor detectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0352—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
- H01L31/035272—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions characterised by at least one potential jump barrier or surface barrier
- H01L31/035281—Shape of the body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
- H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
- H01L31/102—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier
- H01L31/103—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier the potential barrier being of the PN homojunction type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
- H01L31/115—Devices sensitive to very short wavelength, e.g. X-rays, gamma-rays or corpuscular radiation
- H01L31/118—Devices sensitive to very short wavelength, e.g. X-rays, gamma-rays or corpuscular radiation of the surface barrier or shallow PN junction detector type, e.g. surface barrier alpha-particle detectors
- H01L31/1185—Devices sensitive to very short wavelength, e.g. X-rays, gamma-rays or corpuscular radiation of the surface barrier or shallow PN junction detector type, e.g. surface barrier alpha-particle detectors of the shallow PN junction detector type
Landscapes
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- High Energy & Nuclear Physics (AREA)
- Molecular Biology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Measuring Fluid Pressure (AREA)
- Micromachines (AREA)
Abstract
Description
Die Erfindung bezieht sich auf die Herstellung einer Membrandiode mit tels Planar- und Ätztechnik gemäß dem Gattungsbegriff des Anspruches 1.The invention relates to the manufacture of a membrane diode planar and etching technology according to the preamble of claim 1.
Durch die Druckschrift "Technical Digest of the 7th Sensorsymposium", 1988, Seiten 1 bis 6, von Seidel & Csepregi, ist es bekanntgeworden, piezoresistive Druckaufnehmer durch ätztechnische Herstellung einer Mem branstruktur herzustellen. Alle bisherigen zum Stand der Technik zählen den Verfahren vorgenannter Art erfordern jedoch relativ hohe Betriebs spannungen und Kapazitäten.Through the publication "Technical Digest of the 7th Sensor Symposium", 1988, pages 1 to 6, by Seidel & Csepregi, it became known Piezoresistive pressure transducers through the etching production of a mem industry structure. All previous state of the art However, the methods of the aforementioned type require relatively high levels of operation tensions and capacities.
Der vorliegenden Erfindung liegt die Aufgabe zugrunde, ein Verfahren der eingangs genannten Art aufzuzeigen, durch das eine Membrandiode herge stellt werden kann, die die vorgenannten Nachteile nicht mehr aufweist, optimal an die zu untersuchende Strahlenart anpaßbar ist und in bezug auf das Hintergrundrauschen durch andere Strahlungen optimierte Eigen schaften aufweist.The present invention has for its object a method of point out the type mentioned, through which a membrane diode can be provided, which no longer has the aforementioned disadvantages, is optimally adaptable to the type of radiation to be examined and in relation Eigen optimized for background noise by other radiations features.
Diese Aufgabe wird durch die im Anspruch 1 aufgezeigten Maßnahmen in überraschend einfacher Weise gelöst. Im Unteranspruch ist eine Weiter bildung aufgezeigt und in der nachfolgenden Beschreibung ist ein Ausfüh rungsbeispiel erläutert sowie in der einzigen Figur der Zeichnung darge stellt. Diese Figur zeigt einen Querschnitt einer nach dem vorgeschlage nen Verfahren hergestellten Membrandiode in vergrößerter Darstellung.This object is achieved by the measures indicated in claim 1 solved surprisingly simple way. Another is in the subclaim education shown and in the description below is an execution Example explained and Darge in the single figure of the drawing poses. This figure shows a cross section according to the proposed NEN method manufactured diaphragm diode in an enlarged view.
Die dargestellte mikromechanisch hergestellte Diode ist monolithisch aus einem einkristallinen Material - im vorliegenden Falle aus "n-Typ" Sili zium (100) Orientierung - mit Hilfe von an sich bekannter Planar- und Ätztechniken (etched Backside) herausgearbeitet. Durch die verwendete mikromechanische Ätztechnik wird eine Membranstruktur hergestellt - wie aus der Figur der Zeichnung deutlich veranschaulicht ist - die auf der Vorder- und Rückseite in entgegengesetztem Typus implantiert wurde. Wie in der Zeichnung dargestellt, erfährt die Vorderseite eine "p+-Implanta tion" und die Rückseite eine "n+-Implantation". Die Tiefe dieser rück seitigen Ätzung richtet sich nun nach der zu untersuchenden Strahlung, beispielsweise ist für Alpha-Teilchen mit Energien zwischen 3 bis 10 MeV z. B. ²³⁸U, ²³⁵U, ²³⁹Pu, ²⁴⁰Pu, ²⁴³Am u. v. m.) eine Restsub stratdicke (Substratdicke minus Ätztiefe) von 10 bis 50 µm optimal.The micromechanically produced diode shown is monolithic a single-crystal material - in the present case from "n-type" sili zium (100) Orientation - with the help of known planar and Etching techniques (etched backside) worked out. By the used micromechanical etching technology creates a membrane structure - like is clearly illustrated from the figure of the drawing - which on the Front and back were implanted in opposite types. How shown in the drawing, the front undergoes a "p + implant tion "and the back of an" n + implant ". The depth of this back side etching now depends on the radiation to be examined, for example, for alpha particles with energies between 3 to 10 MeV e.g. B. ²³⁸U, ²³⁵U, ²³⁹Pu, ²⁴⁰Pu, ²⁴³Am u. v. m.) a residual sub stratdicke (substrate thickness minus etching depth) of 10 to 50 µm optimal.
Durch diese optimale Anpassung der Membran an die Strahlungsart kann der Detektor bei minimaler Betriebsspannung und Kapazität arbeiten und die ses Prinzip der mikrostrukturierten Membrandiode kann auf weitere der bekannten Diodenanwendungen übertragen werden, ohne daß die hier erziel ten Vorteile beeinträchtigt würden.Through this optimal adaptation of the membrane to the type of radiation, the Detector and operate at minimum operating voltage and capacity This principle of the microstructured membrane diode can be applied to the known diode applications are transmitted without achieving the here advantages would be impaired.
Durch diese optimale Anpassung an die zu untersuchende oder zu detektie rende Strahlungsart wird der Rauschhintergrund anderer Strahlungen er heblich verringert, da Teilchen mit Reichweiten, die größer als das rückgeätzte Substrat sind, nur noch beschränkt zum Rauschen beitragen.Through this optimal adaptation to the investigated or to be detected The type of radiation is the background noise of other radiation significantly reduced since particles with ranges greater than that etched-back substrates are only contributing to the noise to a limited extent.
Mehrere solcher mikrostrukturierter Membrandioden können nun zu einem Array zusammengefaßt werden und liefern so einen Energiediskriminator.Several such microstructured membrane diodes can now be combined into one Array can be summarized and thus provide an energy discriminator.
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE4102285A DE4102285A1 (en) | 1991-01-26 | 1991-01-26 | Membrane diode used as radiation sensor with improved selectivity - consists of a back-etched diode with front and back surface implantations and a thickness depending on energy range to be detected |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE4102285A DE4102285A1 (en) | 1991-01-26 | 1991-01-26 | Membrane diode used as radiation sensor with improved selectivity - consists of a back-etched diode with front and back surface implantations and a thickness depending on energy range to be detected |
Publications (1)
Publication Number | Publication Date |
---|---|
DE4102285A1 true DE4102285A1 (en) | 1992-08-06 |
Family
ID=6423752
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE4102285A Ceased DE4102285A1 (en) | 1991-01-26 | 1991-01-26 | Membrane diode used as radiation sensor with improved selectivity - consists of a back-etched diode with front and back surface implantations and a thickness depending on energy range to be detected |
Country Status (1)
Country | Link |
---|---|
DE (1) | DE4102285A1 (en) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1999027325A2 (en) * | 1997-11-25 | 1999-06-03 | Robert Bosch Gmbh | Thermal membrane sensor and method for the production thereof |
US6579740B2 (en) * | 2000-10-13 | 2003-06-17 | Denso Corporation | Method of making a thin film sensor |
EP1548836A1 (en) * | 2002-08-09 | 2005-06-29 | Hamamatsu Photonics K. K. | Photodiode array, production method therefor, and radiation detector |
EP0771475B1 (en) * | 1995-05-19 | 2005-12-21 | Dr. Johannes Heidenhain GmbH | Radiation-sensitive detector element |
EP1648036A1 (en) * | 2003-07-23 | 2006-04-19 | Hamamatsu Photonics K.K. | Backside-illuminated photodetector |
EP1653520A1 (en) * | 2003-07-29 | 2006-05-03 | Hamamatsu Photonics K.K. | Backside-illuminated photodetector |
US7888761B2 (en) | 2004-05-27 | 2011-02-15 | Isis Innovation Limited | Direct electron detector |
DE102010055633A1 (en) * | 2010-12-22 | 2012-06-28 | MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. | Semiconductor detector with offset bonding contact |
DE102020132289A1 (en) | 2020-12-04 | 2022-06-09 | Vishay Semiconductor Gmbh | METHOD OF MAKING A PHOTODIODE |
-
1991
- 1991-01-26 DE DE4102285A patent/DE4102285A1/en not_active Ceased
Non-Patent Citations (1)
Title |
---|
JP 2-241066 (A). In: Patents Abstr. of Japan, Sect. E, Vol. 14 (1990), Nr. 557 (E-1011) * |
Cited By (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0771475B1 (en) * | 1995-05-19 | 2005-12-21 | Dr. Johannes Heidenhain GmbH | Radiation-sensitive detector element |
WO1999027325A3 (en) * | 1997-11-25 | 1999-08-12 | Bosch Gmbh Robert | Thermal membrane sensor and method for the production thereof |
WO1999027325A2 (en) * | 1997-11-25 | 1999-06-03 | Robert Bosch Gmbh | Thermal membrane sensor and method for the production thereof |
US6579740B2 (en) * | 2000-10-13 | 2003-06-17 | Denso Corporation | Method of making a thin film sensor |
US7148464B2 (en) | 2002-08-09 | 2006-12-12 | Hamamatsu Photonics K.K. | Photodiode array with a plurality of depressions |
EP1835539A3 (en) * | 2002-08-09 | 2007-09-26 | Hamamatsu Photonics K.K. | Photodiode array, method of manufacturing the same, and radiation detector |
EP1548836A1 (en) * | 2002-08-09 | 2005-06-29 | Hamamatsu Photonics K. K. | Photodiode array, production method therefor, and radiation detector |
EP1548836A4 (en) * | 2002-08-09 | 2006-10-18 | Hamamatsu Photonics Kk | Photodiode array, production method therefor, and radiation detector |
EP1648036A4 (en) * | 2003-07-23 | 2007-03-21 | Hamamatsu Photonics Kk | Backside-illuminated photodetector |
EP1648036A1 (en) * | 2003-07-23 | 2006-04-19 | Hamamatsu Photonics K.K. | Backside-illuminated photodetector |
US7420257B2 (en) | 2003-07-23 | 2008-09-02 | Hamamatsu Photonics K.K. | Backside-illuminated photodetector |
EP1653520A1 (en) * | 2003-07-29 | 2006-05-03 | Hamamatsu Photonics K.K. | Backside-illuminated photodetector |
EP1653520A4 (en) * | 2003-07-29 | 2007-03-21 | Hamamatsu Photonics Kk | Backside-illuminated photodetector |
US7768086B2 (en) | 2003-07-29 | 2010-08-03 | Hamamatsu Photonics K.K. | Backside-illuminated photodetector |
US7888761B2 (en) | 2004-05-27 | 2011-02-15 | Isis Innovation Limited | Direct electron detector |
DE102010055633A1 (en) * | 2010-12-22 | 2012-06-28 | MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. | Semiconductor detector with offset bonding contact |
WO2012084186A2 (en) | 2010-12-22 | 2012-06-28 | MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. | Semiconductor detector having offset bonding contact |
DE102020132289A1 (en) | 2020-12-04 | 2022-06-09 | Vishay Semiconductor Gmbh | METHOD OF MAKING A PHOTODIODE |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
OP8 | Request for examination as to paragraph 44 patent law | ||
8127 | New person/name/address of the applicant |
Owner name: DEUTSCHE AEROSPACE AG, 8000 MUENCHEN, DE |
|
8131 | Rejection |