DE3884899D1 - Implantierungsgerät für Metallionen. - Google Patents
Implantierungsgerät für Metallionen.Info
- Publication number
- DE3884899D1 DE3884899D1 DE88201587T DE3884899T DE3884899D1 DE 3884899 D1 DE3884899 D1 DE 3884899D1 DE 88201587 T DE88201587 T DE 88201587T DE 3884899 T DE3884899 T DE 3884899T DE 3884899 D1 DE3884899 D1 DE 3884899D1
- Authority
- DE
- Germany
- Prior art keywords
- metal ions
- implantation device
- implantation
- ions
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/08—Ion sources; Ion guns using arc discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Electron Sources, Ion Sources (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR8711130A FR2619247A1 (fr) | 1987-08-05 | 1987-08-05 | Implanteur d'ions metalliques |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3884899D1 true DE3884899D1 (de) | 1993-11-18 |
DE3884899T2 DE3884899T2 (de) | 1994-04-28 |
Family
ID=9353914
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE88201587T Expired - Fee Related DE3884899T2 (de) | 1987-08-05 | 1988-07-21 | Implantierungsgerät für Metallionen. |
Country Status (5)
Country | Link |
---|---|
US (1) | US4994164A (de) |
EP (1) | EP0307017B1 (de) |
JP (1) | JPH0197363A (de) |
DE (1) | DE3884899T2 (de) |
FR (1) | FR2619247A1 (de) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB9021629D0 (en) * | 1990-10-04 | 1990-11-21 | Superion Ltd | Apparatus for and method of producing ion beams |
US5089707A (en) * | 1990-11-14 | 1992-02-18 | Ism Technologies, Inc. | Ion beam generating apparatus with electronic switching between multiple cathodes |
EP0596924A1 (de) * | 1991-07-11 | 1994-05-18 | The Regents Of The University Of California | Ionenquelle für breiten vakuumbogenstrahl |
JP3365643B2 (ja) * | 1992-07-06 | 2003-01-14 | 株式会社神戸製鋼所 | イオン注入装置 |
US5646482A (en) * | 1995-05-30 | 1997-07-08 | Matsushita Electric Industrial Co., Ltd. | ADC gas discharge image display device having cathode material dimensional constraints |
US5587582A (en) * | 1995-05-19 | 1996-12-24 | Cornell Research Foundation, Inc. | Self-aligning liquid junction |
US5738768A (en) * | 1995-10-31 | 1998-04-14 | Caterpillar Inc. | Process for reducing particle defects in arc vapor deposition coatings |
AU9410498A (en) * | 1997-11-26 | 1999-06-17 | Vapor Technologies, Inc. | Apparatus for sputtering or arc evaporation |
US5997705A (en) * | 1999-04-14 | 1999-12-07 | Vapor Technologies, Inc. | Rectangular filtered arc plasma source |
US6296741B1 (en) * | 1999-06-25 | 2001-10-02 | International Business Machines Corporation | Method of making oxide barrier layer for a spin tunnel junction |
JP3826108B2 (ja) * | 2002-04-24 | 2006-09-27 | キヤノン株式会社 | 成膜装置及び成膜方法 |
DE10317027A1 (de) * | 2003-04-11 | 2004-11-11 | Leybold Optics Gmbh | Hochfrequenz-Plasmastrahlquelle und Verfahren zum Bestrahlen einer Oberfläche |
US7498587B2 (en) * | 2006-05-01 | 2009-03-03 | Vapor Technologies, Inc. | Bi-directional filtered arc plasma source |
US10128082B2 (en) * | 2015-07-24 | 2018-11-13 | Varian Semiconductor Equipment Associates, Inc. | Apparatus and techniques to treat substrates using directional plasma and point of use chemistry |
CN107437522B (zh) * | 2017-07-24 | 2019-11-26 | 武汉华星光电半导体显示技术有限公司 | 传送装置、基板离子植入***以及方法 |
CN111120112B (zh) * | 2019-12-04 | 2022-06-14 | 中国人民解放军空军工程大学 | 基于燃烧室二次流的多阳极滑动弧等离子体点火器及点火方法 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2239642A (en) * | 1936-05-27 | 1941-04-22 | Bernhard Berghaus | Coating of articles by means of cathode disintegration |
US3117022A (en) * | 1960-09-06 | 1964-01-07 | Space Technhology Lab Inc | Deposition arrangement |
FR2129996B1 (de) * | 1971-03-25 | 1975-01-17 | Centre Nat Etd Spatiales | |
BE791921A (fr) * | 1971-11-27 | 1973-03-16 | Dso Isot | Procede et dispositif pour accumulation locale par etincelle electriquede metaux et d'alliages a l'aide d'une electrode tournante |
US3961103A (en) * | 1972-07-12 | 1976-06-01 | Space Sciences, Inc. | Film deposition |
US4142958A (en) * | 1978-04-13 | 1979-03-06 | Litton Systems, Inc. | Method for fabricating multi-layer optical films |
US4251725A (en) * | 1979-08-06 | 1981-02-17 | Honeywell Inc. | Programmed sample pyrolysis for mass spectrometer |
US4634331A (en) * | 1982-05-24 | 1987-01-06 | Varian Associates, Inc. | Wafer transfer system |
JPS59113175A (ja) * | 1982-12-20 | 1984-06-29 | Nisshin Haiboruteeji Kk | 負イオン源 |
JPS6020440A (ja) * | 1983-07-14 | 1985-02-01 | Tokyo Daigaku | イオンビ−ム加工装置 |
US4714860A (en) * | 1985-01-30 | 1987-12-22 | Brown Ian G | Ion beam generating apparatus |
US4620913A (en) * | 1985-11-15 | 1986-11-04 | Multi-Arc Vacuum Systems, Inc. | Electric arc vapor deposition method and apparatus |
US4693760A (en) * | 1986-05-12 | 1987-09-15 | Spire Corporation | Ion implanation of titanium workpieces without surface discoloration |
US4722298A (en) * | 1986-05-19 | 1988-02-02 | Machine Technology, Inc. | Modular processing apparatus for processing semiconductor wafers |
US4717461A (en) * | 1986-09-15 | 1988-01-05 | Machine Technology, Inc. | System and method for processing workpieces |
-
1987
- 1987-08-05 FR FR8711130A patent/FR2619247A1/fr active Pending
-
1988
- 1988-07-21 DE DE88201587T patent/DE3884899T2/de not_active Expired - Fee Related
- 1988-07-21 EP EP88201587A patent/EP0307017B1/de not_active Expired - Lifetime
- 1988-08-02 JP JP63192174A patent/JPH0197363A/ja active Pending
-
1989
- 1989-12-11 US US07/453,032 patent/US4994164A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
FR2619247A1 (fr) | 1989-02-10 |
JPH0197363A (ja) | 1989-04-14 |
DE3884899T2 (de) | 1994-04-28 |
EP0307017A1 (de) | 1989-03-15 |
EP0307017B1 (de) | 1993-10-13 |
US4994164A (en) | 1991-02-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: PHILIPS ELECTRONICS N.V., EINDHOVEN, NL |
|
8339 | Ceased/non-payment of the annual fee |