DE3884702T2 - Verfahren zur Herstellung von Silan. - Google Patents

Verfahren zur Herstellung von Silan.

Info

Publication number
DE3884702T2
DE3884702T2 DE88111068T DE3884702T DE3884702T2 DE 3884702 T2 DE3884702 T2 DE 3884702T2 DE 88111068 T DE88111068 T DE 88111068T DE 3884702 T DE3884702 T DE 3884702T DE 3884702 T2 DE3884702 T2 DE 3884702T2
Authority
DE
Germany
Prior art keywords
silane
production
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE88111068T
Other languages
English (en)
Other versions
DE3884702D1 (de
Inventor
Joseph Augustin Bossier
Douglas Morse Richards
Lloyd Titus Crasto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SunEdison Inc
Original Assignee
Ethyl Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ethyl Corp filed Critical Ethyl Corp
Publication of DE3884702D1 publication Critical patent/DE3884702D1/de
Application granted granted Critical
Publication of DE3884702T2 publication Critical patent/DE3884702T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/04Hydrides of silicon
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/04Hydrides of silicon
    • C01B33/043Monosilane
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01FCOMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F7/00Compounds of aluminium
    • C01F7/48Halides, with or without other cations besides aluminium
    • C01F7/50Fluorides
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01FCOMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F7/00Compounds of aluminium
    • C01F7/48Halides, with or without other cations besides aluminium
    • C01F7/50Fluorides
    • C01F7/54Double compounds containing both aluminium and alkali metals or alkaline-earth metals
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01FCOMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F7/00Compounds of aluminium
    • C01F7/78Compounds containing aluminium and two or more other elements, with the exception of oxygen and hydrogen
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S423/00Chemistry of inorganic compounds
    • Y10S423/05Automatic, including computer, control
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S423/00Chemistry of inorganic compounds
    • Y10S423/06Temperature control

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • Silicon Compounds (AREA)
DE88111068T 1987-07-20 1988-07-11 Verfahren zur Herstellung von Silan. Expired - Lifetime DE3884702T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/075,367 US4847061A (en) 1987-07-20 1987-07-20 Process for preparation of silane

Publications (2)

Publication Number Publication Date
DE3884702D1 DE3884702D1 (de) 1993-11-11
DE3884702T2 true DE3884702T2 (de) 1994-02-03

Family

ID=22125240

Family Applications (1)

Application Number Title Priority Date Filing Date
DE88111068T Expired - Lifetime DE3884702T2 (de) 1987-07-20 1988-07-11 Verfahren zur Herstellung von Silan.

Country Status (6)

Country Link
US (1) US4847061A (de)
EP (1) EP0300320B1 (de)
JP (1) JP2644292B2 (de)
KR (1) KR960005507B1 (de)
CA (1) CA1303817C (de)
DE (1) DE3884702T2 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5075092A (en) * 1987-07-20 1991-12-24 Ethyl Corporation Process for preparation of silane
US7541015B2 (en) 2005-11-25 2009-06-02 Vesta Research, Ltd. Process for producing a silicon nitride compound
DE102009056731A1 (de) 2009-12-04 2011-06-09 Rev Renewable Energy Ventures, Inc. Halogenierte Polysilane und Polygermane
US8529860B2 (en) * 2009-12-30 2013-09-10 Memc Electronics Materials, Inc. Methods for producing silicon tetrafluoride
US8834825B2 (en) * 2011-06-28 2014-09-16 Sunedison, Inc. Processes for producing silane in a bubble column

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB823496A (en) * 1957-12-27 1959-11-11 Metal Hydrides Inc Improvements in method of preparing high purity silicon
GB851962A (en) * 1958-06-09 1960-10-19 Allied Chem Production of pure silane
US3050366A (en) * 1959-07-15 1962-08-21 Du Pont Production of silane by the use of a zinc catalyst
US4374111A (en) * 1980-11-21 1983-02-15 Allied Corporation Production of silane
US4407783A (en) * 1982-08-16 1983-10-04 Allied Corporation Producing silane from silicon tetrafluoride
FR2532293A1 (fr) * 1982-08-31 1984-03-02 Rhone Poulenc Spec Chim Procede continu de preparation de silane
FR2533906A1 (fr) * 1982-09-30 1984-04-06 Rhone Poulenc Spec Chim Procede et dispositif pour la preparation de silane pur par reaction de chlorosilanes avec l'hydrure de lithium
US4632816A (en) * 1982-12-13 1986-12-30 Ethyl Corporation Process for production of silane
JPS60500251A (ja) * 1982-12-13 1985-02-28 エシル コ−ポレ−シヨン シランの製造方法

Also Published As

Publication number Publication date
KR890001871A (ko) 1989-04-06
CA1303817C (en) 1992-06-23
US4847061A (en) 1989-07-11
JPS6456314A (en) 1989-03-03
EP0300320B1 (de) 1993-10-06
KR960005507B1 (ko) 1996-04-25
JP2644292B2 (ja) 1997-08-25
EP0300320A3 (en) 1990-05-23
DE3884702D1 (de) 1993-11-11
EP0300320A2 (de) 1989-01-25

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: ALBEMARLE CORP., RICHMOND, VA., US

8327 Change in the person/name/address of the patent owner

Owner name: MEMC ELECTRONIC MATERIALS, INC., ST. PETERS, MO.,