DE3860768D1 - Verfahren zur herstellung von hochduktilem tantal-halbzeug. - Google Patents

Verfahren zur herstellung von hochduktilem tantal-halbzeug.

Info

Publication number
DE3860768D1
DE3860768D1 DE8888100151T DE3860768T DE3860768D1 DE 3860768 D1 DE3860768 D1 DE 3860768D1 DE 8888100151 T DE8888100151 T DE 8888100151T DE 3860768 T DE3860768 T DE 3860768T DE 3860768 D1 DE3860768 D1 DE 3860768D1
Authority
DE
Germany
Prior art keywords
ductant
tantale
semi
finished products
producing highly
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8888100151T
Other languages
English (en)
Inventor
Michael Dr Hoermann
Otto Bach
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
WC Heraus GmbH and Co KG
Original Assignee
WC Heraus GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by WC Heraus GmbH and Co KG filed Critical WC Heraus GmbH and Co KG
Priority to DE8888100151T priority Critical patent/DE3860768D1/de
Application granted granted Critical
Publication of DE3860768D1 publication Critical patent/DE3860768D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22D—CASTING OF METALS; CASTING OF OTHER SUBSTANCES BY THE SAME PROCESSES OR DEVICES
    • B22D27/00—Treating the metal in the mould while it is molten or ductile ; Pressure or vacuum casting
    • B22D27/15—Treating the metal in the mould while it is molten or ductile ; Pressure or vacuum casting by using vacuum
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/16—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of other metals or alloys based thereon
    • C22F1/18—High-melting or refractory metals or alloys based thereon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacture And Refinement Of Metals (AREA)
  • Forging (AREA)
DE8888100151T 1987-04-10 1988-01-08 Verfahren zur herstellung von hochduktilem tantal-halbzeug. Expired - Lifetime DE3860768D1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE8888100151T DE3860768D1 (de) 1987-04-10 1988-01-08 Verfahren zur herstellung von hochduktilem tantal-halbzeug.

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19873712281 DE3712281A1 (de) 1987-04-10 1987-04-10 Verfahren zur herstellung von hochduktilem tantal-halbzeug
DE8888100151T DE3860768D1 (de) 1987-04-10 1988-01-08 Verfahren zur herstellung von hochduktilem tantal-halbzeug.

Publications (1)

Publication Number Publication Date
DE3860768D1 true DE3860768D1 (de) 1990-11-15

Family

ID=6325394

Family Applications (2)

Application Number Title Priority Date Filing Date
DE19873712281 Granted DE3712281A1 (de) 1987-04-10 1987-04-10 Verfahren zur herstellung von hochduktilem tantal-halbzeug
DE8888100151T Expired - Lifetime DE3860768D1 (de) 1987-04-10 1988-01-08 Verfahren zur herstellung von hochduktilem tantal-halbzeug.

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE19873712281 Granted DE3712281A1 (de) 1987-04-10 1987-04-10 Verfahren zur herstellung von hochduktilem tantal-halbzeug

Country Status (3)

Country Link
US (1) US4844746A (de)
EP (1) EP0285741B1 (de)
DE (2) DE3712281A1 (de)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5411611A (en) * 1993-08-05 1995-05-02 Cabot Corporation Consumable electrode method for forming micro-alloyed products
US6323055B1 (en) * 1998-05-27 2001-11-27 The Alta Group, Inc. Tantalum sputtering target and method of manufacture
US6348139B1 (en) * 1998-06-17 2002-02-19 Honeywell International Inc. Tantalum-comprising articles
CN1066367C (zh) * 1998-11-12 2001-05-30 北京有色金属研究总院 一种制造用于生产钼电极坯和钼流口坯的金属钼棒的方法
US6348113B1 (en) * 1998-11-25 2002-02-19 Cabot Corporation High purity tantalum, products containing the same, and methods of making the same
US20040072009A1 (en) * 1999-12-16 2004-04-15 Segal Vladimir M. Copper sputtering targets and methods of forming copper sputtering targets
US6878250B1 (en) * 1999-12-16 2005-04-12 Honeywell International Inc. Sputtering targets formed from cast materials
US7517417B2 (en) * 2000-02-02 2009-04-14 Honeywell International Inc. Tantalum PVD component producing methods
US6331233B1 (en) 2000-02-02 2001-12-18 Honeywell International Inc. Tantalum sputtering target with fine grains and uniform texture and method of manufacture
CN1257998C (zh) 2001-01-11 2006-05-31 卡伯特公司 钽和铌的坯料及其制造方法
US7416697B2 (en) 2002-06-14 2008-08-26 General Electric Company Method for preparing a metallic article having an other additive constituent, without any melting
US7897103B2 (en) * 2002-12-23 2011-03-01 General Electric Company Method for making and using a rod assembly
US7228722B2 (en) * 2003-06-09 2007-06-12 Cabot Corporation Method of forming sputtering articles by multidirectional deformation
EP1639620A2 (de) * 2003-06-20 2006-03-29 Cabot Corporation Verfahren und entwurf für die sputter-target-anbringung an eine rückplatte
US7531021B2 (en) 2004-11-12 2009-05-12 General Electric Company Article having a dispersion of ultrafine titanium boride particles in a titanium-base matrix
US7371022B2 (en) 2004-12-22 2008-05-13 Sokudo Co., Ltd. Developer endpoint detection in a track lithography system
US7651306B2 (en) 2004-12-22 2010-01-26 Applied Materials, Inc. Cartesian robot cluster tool architecture
US7798764B2 (en) 2005-12-22 2010-09-21 Applied Materials, Inc. Substrate processing sequence in a cartesian robot cluster tool
US7819079B2 (en) 2004-12-22 2010-10-26 Applied Materials, Inc. Cartesian cluster tool configuration for lithography type processes
US7699021B2 (en) 2004-12-22 2010-04-20 Sokudo Co., Ltd. Cluster tool substrate throughput optimization
US7998287B2 (en) * 2005-02-10 2011-08-16 Cabot Corporation Tantalum sputtering target and method of fabrication
US20070084527A1 (en) * 2005-10-19 2007-04-19 Stephane Ferrasse High-strength mechanical and structural components, and methods of making high-strength components
CN101374611B (zh) 2006-03-07 2015-04-08 卡伯特公司 制备变形金属制品的方法
US20070251818A1 (en) * 2006-05-01 2007-11-01 Wuwen Yi Copper physical vapor deposition targets and methods of making copper physical vapor deposition targets

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2825641A (en) * 1955-09-21 1958-03-04 Robert A Beall Method for melting refractory metals for casting purposes
NL252366A (de) * 1958-06-13
US3285716A (en) * 1964-07-20 1966-11-15 Kawecki Chemical Company Etched tantalum foil
US3497402A (en) * 1966-02-03 1970-02-24 Nat Res Corp Stabilized grain-size tantalum alloy
RO76187A2 (ro) * 1980-11-14 1983-08-03 Institutul De Cercetare Stiintifica Inginerie Tehnologica Si Proiectare Sectoare Calde,Ro Procedeu si instalatie pentru topirea si turnarea metalelor greu fuzibile
JPS6066425A (ja) * 1983-09-22 1985-04-16 Nippon Telegr & Teleph Corp <Ntt> Ｌｓｉ電極用の高純度モリブデンタ−ゲツトならびに高純度モリブデンシリサイドタ−ゲツトおよびその製造方法
JPS60124452A (ja) * 1983-12-07 1985-07-03 Hitachi Ltd 高純度金属スリ−ブの製造方法
US4722756A (en) * 1987-02-27 1988-02-02 Cabot Corp Method for deoxidizing tantalum material

Also Published As

Publication number Publication date
US4844746A (en) 1989-07-04
DE3712281C2 (de) 1989-09-14
EP0285741A1 (de) 1988-10-12
DE3712281A1 (de) 1988-10-27
EP0285741B1 (de) 1990-10-10

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee