DE3579059D1 - Apparat zur beschichtung von kernbrennstoffpartikeln mit einem brennbaren absorber. - Google Patents

Apparat zur beschichtung von kernbrennstoffpartikeln mit einem brennbaren absorber.

Info

Publication number
DE3579059D1
DE3579059D1 DE8585106630T DE3579059T DE3579059D1 DE 3579059 D1 DE3579059 D1 DE 3579059D1 DE 8585106630 T DE8585106630 T DE 8585106630T DE 3579059 T DE3579059 T DE 3579059T DE 3579059 D1 DE3579059 D1 DE 3579059D1
Authority
DE
Germany
Prior art keywords
nuclear fuel
fuel particles
combustible absorber
coating nuclear
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8585106630T
Other languages
English (en)
Inventor
Kenneth Charles Radford
Herbert Willard Keller
Beryl Hugh Parks
Robert Ray Fuller
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CBS Corp
Original Assignee
Westinghouse Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Westinghouse Electric Corp filed Critical Westinghouse Electric Corp
Application granted granted Critical
Publication of DE3579059D1 publication Critical patent/DE3579059D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21C—NUCLEAR REACTORS
    • G21C3/00—Reactor fuel elements and their assemblies; Selection of substances for use as reactor fuel elements
    • G21C3/42—Selection of substances for use as reactor fuel
    • G21C3/58—Solid reactor fuel Pellets made of fissile material
    • G21C3/62—Ceramic fuel
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/223—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating specially adapted for coating particles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21C—NUCLEAR REACTORS
    • G21C3/00—Reactor fuel elements and their assemblies; Selection of substances for use as reactor fuel elements
    • G21C3/42—Selection of substances for use as reactor fuel
    • G21C3/58—Solid reactor fuel Pellets made of fissile material
    • G21C3/62—Ceramic fuel
    • G21C3/626—Coated fuel particles
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E30/00—Energy generation of nuclear origin
    • Y02E30/30—Nuclear fission reactors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Plasma & Fusion (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Physical Vapour Deposition (AREA)
  • Monitoring And Testing Of Nuclear Reactors (AREA)
  • Paints Or Removers (AREA)
DE8585106630T 1984-06-22 1985-05-30 Apparat zur beschichtung von kernbrennstoffpartikeln mit einem brennbaren absorber. Expired - Fee Related DE3579059D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/623,747 US4560462A (en) 1984-06-22 1984-06-22 Apparatus for coating nuclear fuel pellets with a burnable absorber

Publications (1)

Publication Number Publication Date
DE3579059D1 true DE3579059D1 (de) 1990-09-13

Family

ID=24499254

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8585106630T Expired - Fee Related DE3579059D1 (de) 1984-06-22 1985-05-30 Apparat zur beschichtung von kernbrennstoffpartikeln mit einem brennbaren absorber.

Country Status (7)

Country Link
US (1) US4560462A (de)
EP (1) EP0166256B1 (de)
JP (1) JPS6114593A (de)
KR (1) KR930005575B1 (de)
CA (1) CA1245182A (de)
DE (1) DE3579059D1 (de)
ES (1) ES8703039A1 (de)

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DE3520924A1 (de) * 1984-06-12 1985-12-12 Toyoda Gosei Co., Ltd., Haruhi, Aichi Plasmaverfahrensanlage
US4661233A (en) * 1985-07-05 1987-04-28 Westinghouse Electric Corp. Cathode/ground shield arrangement in a sputter coating apparatus
US4610775A (en) * 1985-07-26 1986-09-09 Westinghouse Electric Corp. Method and apparatus for clearing short-circuited, high-voltage cathodes in a sputtering chamber
US6103055A (en) * 1986-04-18 2000-08-15 Applied Materials, Inc. System for processing substrates
US4717461A (en) * 1986-09-15 1988-01-05 Machine Technology, Inc. System and method for processing workpieces
WO1990002216A1 (en) * 1988-08-25 1990-03-08 Vac-Tec Systems, Inc. Physical vapor deposition dual coating apparatus and process
US5234561A (en) * 1988-08-25 1993-08-10 Hauzer Industries Bv Physical vapor deposition dual coating process
US4960559A (en) * 1989-05-17 1990-10-02 Westinghouse Electric Corp. Capture row storage tray for holding collated rows of nuclear fuel pellets
EP0707663A4 (de) * 1993-06-17 1998-01-14 Deposition Sciences Inc Sputtervorrichtung
DE4413655A1 (de) * 1994-04-20 1995-10-26 Leybold Ag Beschichtungsanlage
US6355146B1 (en) * 1996-04-03 2002-03-12 The Regents Of The University Of California Sputtering process and apparatus for coating powders
DE29616846U1 (de) * 1996-09-27 1996-11-07 METAPLAS IONON Oberflächenveredelungstechnik GmbH, 51427 Bergisch Gladbach Anlage zur Beschichtung von Schraubenköpfen
US5755937A (en) * 1996-11-13 1998-05-26 Patterson; James A. Apparatus for applying layers of metal onto a surface
EP0992605A3 (de) * 1998-10-02 2002-11-13 Sumitomo Special Metals Co., Ltd. Tragelement, Haltevorrichtung, Prozess und Apparat im Anwendungsbereich der Oberflächenbehandlung
KR20010087664A (ko) * 2000-03-08 2001-09-21 손명호 전자파 차폐막 코팅방법 및 그 장치
KR101480971B1 (ko) * 2006-10-10 2015-01-09 에이에스엠 아메리카, 인코포레이티드 전구체 전달 시스템
US8671872B2 (en) * 2009-02-16 2014-03-18 Thomas Engineering Inc. Production coater with exchangeable drums
EP2593051A2 (de) 2010-05-24 2013-05-22 Akyüz, Safa Stützfläche für hohe schuhe
RU2472709C1 (ru) * 2011-08-11 2013-01-20 Открытое акционерное общество "Сибирский химический комбинат" Способ приготовления порошка диоксида урана
KR101141394B1 (ko) 2011-11-25 2012-07-12 김용철 드럼형 멀티코팅층 및 오염방지코팅층 형성장치
DE102013112861B4 (de) * 2013-01-15 2018-11-15 VON ARDENNE Asset GmbH & Co. KG Magnetronanordnung und Target für eine Magnetronanordnung
US9328410B2 (en) 2013-10-25 2016-05-03 First Solar, Inc. Physical vapor deposition tile arrangement and physical vapor deposition arrangement
US10876205B2 (en) 2016-09-30 2020-12-29 Asm Ip Holding B.V. Reactant vaporizer and related systems and methods
US11926894B2 (en) 2016-09-30 2024-03-12 Asm Ip Holding B.V. Reactant vaporizer and related systems and methods
JP7376278B2 (ja) 2018-08-16 2023-11-08 エーエスエム・アイピー・ホールディング・ベー・フェー 固体原料昇華器
CN110438459B (zh) * 2019-08-14 2023-08-22 湖南众源科技有限公司 一种卧式真空镀膜机
US11624113B2 (en) 2019-09-13 2023-04-11 Asm Ip Holding B.V. Heating zone separation for reactant evaporation system
CN113249694B (zh) * 2021-05-12 2022-03-15 中国工程物理研究院激光聚变研究中心 溅射内镀黑腔及其制备方法

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GB813251A (en) * 1956-06-11 1959-05-13 Standard Telephones Cables Ltd Improvements in or relating to vacuum deposition equipment
CH311230A (de) * 1953-01-13 1955-11-30 Ackermann Adolf Hochvakuumapparat zur Aufbringung von Überzügen auf Gegenstände.
US3427222A (en) * 1965-10-15 1969-02-11 Westinghouse Electric Corp Nuclear fuel elements
US3562140A (en) * 1967-10-23 1971-02-09 Eversharp Inc Sequential sputtering apparatus
US3635811A (en) * 1967-11-06 1972-01-18 Warner Lambert Co Method of applying a coating
US3583899A (en) * 1968-12-18 1971-06-08 Norton Co Sputtering apparatus
US3905887A (en) * 1973-01-12 1975-09-16 Coulter Information Systems Thin film deposition method using segmented plasma
US3829373A (en) * 1973-01-12 1974-08-13 Coulter Information Systems Thin film deposition apparatus using segmented target means
US4026787A (en) * 1974-01-25 1977-05-31 Coulter Information Systems, Inc. Thin film deposition apparatus using segmented target means
DE2434652A1 (de) * 1974-07-18 1976-01-29 Siemens Ag Verfahren und vorrichtung zum belegen von traegerkoerpern als schuettgut innerhalb einer vakuumbedampfungsapparatur
US4014779A (en) * 1974-11-01 1977-03-29 Coulter Information Systems, Inc. Sputtering apparatus
GB1497782A (en) * 1975-02-13 1978-01-12 Atomic Energy Authority Uk Apparatus for depositing material
US4080281A (en) * 1976-04-09 1978-03-21 Tsunehiko Endo Apparatus for making metal films
US4046666A (en) * 1976-05-07 1977-09-06 The United States Of America As Represented By The United States Energy Research And Development Administration Device for providing high-intensity ion or electron beam
JPS5399762A (en) * 1977-02-12 1978-08-31 Futaba Denshi Kogyo Kk Device for producing compound semiconductor film
US4325776A (en) * 1977-06-20 1982-04-20 Siemens Aktiengesellschaft Method for preparing coarse-crystal or single-crystal metal films
US4137142A (en) * 1977-12-27 1979-01-30 Stork Brabant B.V. Method and apparatus for sputtering photoconductive coating on endless flexible belts or cylinders
US4151064A (en) * 1977-12-27 1979-04-24 Coulter Stork U.S.A., Inc. Apparatus for sputtering cylinders
FR2423065A1 (fr) * 1978-04-12 1979-11-09 Battelle Memorial Institute Procede de fabrication d'electrodes pour piles a combustible, dispositif pour la mise en oeuvre du procede et electrodes resultant de ce procede
DE2919191A1 (de) * 1978-05-17 1979-11-22 Rotring Werke Riepe Kg Verfahren zum aufbringen einer beschichtung aus abriebfestem material auf rohre, insbesondere schreibroehrchen fuer roehrchenschreiber
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US4204936A (en) * 1979-03-29 1980-05-27 The Perkin-Elmer Corporation Method and apparatus for attaching a target to the cathode of a sputtering system
US4268374A (en) * 1979-08-09 1981-05-19 Bell Telephone Laboratories, Incorporated High capacity sputter-etching apparatus
US4331526A (en) * 1979-09-24 1982-05-25 Coulter Systems Corporation Continuous sputtering apparatus and method
US4252626A (en) * 1980-03-10 1981-02-24 United Technologies Corporation Cathode sputtering with multiple targets
US4304983A (en) * 1980-06-26 1981-12-08 Rca Corporation Plasma etching device and process
JPS5754269A (en) * 1980-09-17 1982-03-31 Matsushita Electric Ind Co Ltd Apparatus for forming film in vacuum
US4308126A (en) * 1980-09-18 1981-12-29 United Technologies Corporation Cathode sputtering apparatus

Also Published As

Publication number Publication date
EP0166256A3 (en) 1986-10-01
US4560462A (en) 1985-12-24
KR860000662A (ko) 1986-01-30
EP0166256B1 (de) 1990-08-08
CA1245182A (en) 1988-11-22
JPS647356B2 (de) 1989-02-08
KR930005575B1 (ko) 1993-06-23
ES8703039A1 (es) 1987-01-16
ES544324A0 (es) 1987-01-16
JPS6114593A (ja) 1986-01-22
EP0166256A2 (de) 1986-01-02

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee