DE3564291D1 - Steel article having a disordered silicon carboxynitride coating, and method of preparing the coating - Google Patents

Steel article having a disordered silicon carboxynitride coating, and method of preparing the coating

Info

Publication number
DE3564291D1
DE3564291D1 DE8585106686T DE3564291T DE3564291D1 DE 3564291 D1 DE3564291 D1 DE 3564291D1 DE 8585106686 T DE8585106686 T DE 8585106686T DE 3564291 T DE3564291 T DE 3564291T DE 3564291 D1 DE3564291 D1 DE 3564291D1
Authority
DE
Germany
Prior art keywords
coating
steel article
preparing
silicon carboxynitride
disordered silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8585106686T
Other languages
English (en)
Inventor
Erwin Eichen
John Keem
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ovonic Synthetic Materials Co Inc
Original Assignee
Ovonic Synthetic Materials Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=24504401&utm_source=***_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE3564291(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Ovonic Synthetic Materials Co Inc filed Critical Ovonic Synthetic Materials Co Inc
Application granted granted Critical
Publication of DE3564291D1 publication Critical patent/DE3564291D1/de
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Treatment Of Metals (AREA)
  • Chemical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Physical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
  • Paints Or Removers (AREA)
DE8585106686T 1984-06-27 1985-05-30 Steel article having a disordered silicon carboxynitride coating, and method of preparing the coating Expired DE3564291D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/625,058 US4568614A (en) 1984-06-27 1984-06-27 Steel article having a disordered silicon oxide coating thereon and method of preparing the coating

Publications (1)

Publication Number Publication Date
DE3564291D1 true DE3564291D1 (en) 1988-09-15

Family

ID=24504401

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8585106686T Expired DE3564291D1 (en) 1984-06-27 1985-05-30 Steel article having a disordered silicon carboxynitride coating, and method of preparing the coating

Country Status (11)

Country Link
US (1) US4568614A (de)
EP (1) EP0172325B2 (de)
JP (1) JPS6119772A (de)
KR (1) KR920003779B1 (de)
AT (1) ATE36353T1 (de)
AU (1) AU567853B2 (de)
CA (1) CA1247042A (de)
DE (1) DE3564291D1 (de)
IL (2) IL75611A0 (de)
PH (1) PH21176A (de)
ZA (1) ZA854451B (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU595251B2 (en) * 1985-10-23 1990-03-29 Canon Kabushiki Kaisha Method for forming deposited film
US5300951A (en) * 1985-11-28 1994-04-05 Kabushiki Kaisha Toshiba Member coated with ceramic material and method of manufacturing the same
CH664377A5 (de) * 1986-01-16 1988-02-29 Balzers Hochvakuum Dekorative schwarze verschleissschutzschicht.
US4783374A (en) * 1987-11-16 1988-11-08 Ovonic Synthetic Materials Company Coated article and method of manufacturing the article
DE3923390A1 (de) * 1988-07-14 1990-01-25 Canon Kk Vorrichtung zur bildung eines grossflaechigen aufgedampften films unter verwendung von wenigstens zwei getrennt gebildeten aktivierten gasen
DE3832692A1 (de) * 1988-09-27 1990-03-29 Leybold Ag Dichtungselement mit einem absperrkoerper aus einem metallischen oder nichtmetallischen werkstoff und verfahren zum auftragen von hartstoffschichten auf den absperrkoerper
FR2661688B1 (fr) * 1990-05-02 1992-07-17 Air Liquide Revetement multicouche pour substrat polycarbonate et procede d'elaboration d'un tel revetement.
JP3139031B2 (ja) * 1991-02-21 2001-02-26 日本板硝子株式会社 熱線遮蔽ガラス
FR2714917B1 (fr) * 1994-01-07 1996-03-01 Pechiney Recherche Bande à base d'aluminium revêtue, résistant à la corrosion et déformable, procédé d'obtention et applications.
US6610362B1 (en) * 2000-11-20 2003-08-26 Intel Corporation Method of forming a carbon doped oxide layer on a substrate
JP2005500969A (ja) * 2001-08-28 2005-01-13 ツェアー、アンドレアス スピネル構造を有するシリコンカルボニトリド
CN104379775B (zh) * 2012-05-03 2017-03-08 麦格纳国际公司 由涂覆有非金属涂层的金属板形成的机动车部件
DE102014207447A1 (de) * 2014-04-17 2015-10-22 Magna International Inc. Beschichtetes Stahlbauteil, Verfahren zur Herstellung des Stahlbauteils und Herstellungsanlage

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1104935A (en) * 1964-05-08 1968-03-06 Standard Telephones Cables Ltd Improvements in or relating to a method of forming a layer of an inorganic compound
US3424661A (en) * 1966-09-01 1969-01-28 Bell Telephone Labor Inc Method of conducting chemical reactions in a glow discharge
US3655438A (en) * 1969-10-20 1972-04-11 Int Standard Electric Corp Method of forming silicon oxide coatings in an electric discharge
DE2538300B2 (de) * 1975-08-28 1977-06-30 Dornier System Gmbh, 7990 Friedrichshafen Verfahren zur herstellung einer solarabsorberschicht
JPS5856033B2 (ja) * 1978-04-13 1983-12-13 三菱マテリアル株式会社 被覆超硬合金部材
JPS5617988A (en) * 1979-07-24 1981-02-20 Toshio Hirai Electroconductive si3n44c type noncrystalline material by chemical gas phase deposition and its manufacture
CH640886A5 (de) * 1979-08-02 1984-01-31 Balzers Hochvakuum Verfahren zum aufbringen harter verschleissfester ueberzuege auf unterlagen.
JPS5662961A (en) * 1979-10-26 1981-05-29 Mitsubishi Metal Corp Surface coated sintered hard alloy member for cutting tool
US4363828A (en) * 1979-12-12 1982-12-14 International Business Machines Corp. Method for depositing silicon films and related materials by a glow discharge in a disiland or higher order silane gas
JPS5842126B2 (ja) * 1980-10-31 1983-09-17 鐘淵化学工業株式会社 アモルファスシリコンの製造方法
US4645715A (en) * 1981-09-23 1987-02-24 Energy Conversion Devices, Inc. Coating composition and method
AT377786B (de) * 1981-12-24 1985-04-25 Plansee Metallwerk Verschleissteil, insbesondere hartmetall -schneideinsatz zur spanabhebenden bearbeitung
JPS5833256A (ja) * 1982-05-10 1983-02-26 Canon Inc 光導電部材
JPS5833257A (ja) * 1982-05-10 1983-02-26 Canon Inc 光導電部材
US4517223A (en) * 1982-09-24 1985-05-14 Sovonics Solar Systems Method of making amorphous semiconductor alloys and devices using microwave energy
AU560521B2 (en) * 1982-10-18 1987-04-09 Energy Conversion Devices Inc. Layered amorphous semiconductor alloys
US4716083A (en) * 1983-09-23 1987-12-29 Ovonic Synthetic Materials Company Disordered coating

Also Published As

Publication number Publication date
IL75611A0 (en) 1985-10-31
ATE36353T1 (de) 1988-08-15
PH21176A (en) 1987-08-07
JPS6119772A (ja) 1986-01-28
IL75611A (en) 1988-11-30
AU567853B2 (en) 1987-12-03
KR860000407A (ko) 1986-01-28
EP0172325B2 (de) 1995-08-09
EP0172325A1 (de) 1986-02-26
AU4347285A (en) 1986-01-02
US4568614A (en) 1986-02-04
ZA854451B (en) 1986-02-26
CA1247042A (en) 1988-12-20
KR920003779B1 (ko) 1992-05-14
EP0172325B1 (de) 1988-08-10

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Legal Events

Date Code Title Description
8363 Opposition against the patent
8366 Restricted maintained after opposition proceedings
8339 Ceased/non-payment of the annual fee