DE3462141D1 - Photopolymerization initiator and method of photopolymerization by use of said initiator - Google Patents

Photopolymerization initiator and method of photopolymerization by use of said initiator

Info

Publication number
DE3462141D1
DE3462141D1 DE8484302473T DE3462141T DE3462141D1 DE 3462141 D1 DE3462141 D1 DE 3462141D1 DE 8484302473 T DE8484302473 T DE 8484302473T DE 3462141 T DE3462141 T DE 3462141T DE 3462141 D1 DE3462141 D1 DE 3462141D1
Authority
DE
Germany
Prior art keywords
photopolymerization
initiator
photopolymerization initiator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8484302473T
Other languages
English (en)
Inventor
Komai Takeshi
Shimizu Mamoru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NOF Corp
Original Assignee
Nippon Oil and Fats Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Oil and Fats Co Ltd filed Critical Nippon Oil and Fats Co Ltd
Application granted granted Critical
Publication of DE3462141D1 publication Critical patent/DE3462141D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C409/00—Peroxy compounds
    • C07C409/38—Peroxy compounds the —O—O— group being bound between a >C=O group and a carbon atom, not further substituted by oxygen atoms, i.e. esters of peroxy acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
DE8484302473T 1983-04-26 1984-04-11 Photopolymerization initiator and method of photopolymerization by use of said initiator Expired DE3462141D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58072277A JPS59197401A (ja) 1983-04-26 1983-04-26 光重合開始剤

Publications (1)

Publication Number Publication Date
DE3462141D1 true DE3462141D1 (en) 1987-02-26

Family

ID=13484625

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8484302473T Expired DE3462141D1 (en) 1983-04-26 1984-04-11 Photopolymerization initiator and method of photopolymerization by use of said initiator

Country Status (4)

Country Link
US (2) US4970244A (de)
EP (1) EP0126541B1 (de)
JP (1) JPS59197401A (de)
DE (1) DE3462141D1 (de)

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CN101903483B (zh) * 2007-12-18 2014-09-10 陶氏环球技术公司 对玻璃粘合剂具有增强的粘合性的窗玻璃用保护涂层
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US9051397B2 (en) 2010-10-05 2015-06-09 Basf Se Oxime ester
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US9365980B2 (en) 2010-11-05 2016-06-14 International Paper Company Packaging material having moisture barrier and methods for preparing same
US9358576B2 (en) 2010-11-05 2016-06-07 International Paper Company Packaging material having moisture barrier and methods for preparing same
US9310677B2 (en) 2011-01-28 2016-04-12 Basf Polymerizable composition comprising an oxime sulfonate as thermal curing agent
US8816211B2 (en) 2011-02-14 2014-08-26 Eastman Kodak Company Articles with photocurable and photocured compositions
US20120208914A1 (en) 2011-02-14 2012-08-16 Deepak Shukla Photoinitiator compositions and uses
US20120207935A1 (en) 2011-02-14 2012-08-16 Deepak Shukla Photocurable inks and methods of use
JP5659189B2 (ja) * 2011-05-13 2015-01-28 富士フイルム株式会社 非共鳴２光子吸収材料、非共鳴２光子吸収記録材料、記録媒体、記録再生方法及び非共鳴２光子吸収化合物
CN103998427A (zh) 2011-12-07 2014-08-20 巴斯夫欧洲公司 肟酯光敏引发剂
CN105294537A (zh) 2012-05-09 2016-02-03 巴斯夫欧洲公司 肟酯光敏引发剂
KR101804646B1 (ko) 2012-10-19 2017-12-04 바스프 에스이 하이브리드 광개시제
EP2935289B1 (de) 2012-12-19 2019-06-26 IGM Group B.V. Derivate von bisacylphosphinsäure, ihre herstellung und verwendung als photoinitiatoren
KR102257105B1 (ko) 2013-07-08 2021-05-28 아이지엠 그룹 비.브이. 액체 비스아실포스핀 옥시드 광개시제
WO2015004565A1 (en) 2013-07-08 2015-01-15 Basf Se Oxime ester photoinitiators
JP6530410B2 (ja) 2013-09-10 2019-06-12 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ オキシムエステル光開始剤
CN106164206B (zh) 2014-03-27 2019-12-10 3M创新有限公司 填充的包含聚二有机硅氧烷的组合物及其使用方法
KR20170048422A (ko) 2014-08-29 2017-05-08 바스프 에스이 옥심 술포네이트 유도체
ES2798135T5 (es) 2014-09-04 2023-11-16 Igm Group B V Fotoiniciadores policíclicos
KR102537349B1 (ko) 2015-02-02 2023-05-26 바스프 에스이 잠재성 산 및 그의 용도
CN109790137B (zh) 2016-09-02 2020-10-30 Igm集团公司 多环乙醛酸酯作为光引发剂
CN109689624B (zh) * 2016-12-13 2021-10-12 日油株式会社 过氧化肉桂酸酯衍生物、含有该化合物的聚合性组合物
KR102542689B1 (ko) 2017-06-01 2023-06-12 니치유 가부시키가이샤 트리아진퍼옥사이드 유도체, 그 화합물을 함유하는 중합성 조성물
JP6923130B2 (ja) * 2017-08-31 2021-08-18 学校法人東京理科大学 ペルオキシエステル基を有するベンゾフェノン誘導体、該化合物を含有する重合性組成物およびその硬化物、当該硬化物の製造方法
JP7416701B2 (ja) 2018-02-23 2024-01-17 ビーエーエスエフ ソシエタス・ヨーロピア 有機修飾金属酸化物または半金属酸化物高分子膜
JP7408909B2 (ja) 2018-09-07 2024-01-09 アイジーエム レシンス イタリア ソチエタ レスポンサビリタ リミタータ 多機能性ビスアシルホスフィンオキシド光開始剤
JP7421169B2 (ja) * 2018-09-26 2024-01-24 日油株式会社 チオキサントン骨格を有するジアルキルペルオキシド、該化合物を含有する重合性組成物
JP7472429B2 (ja) 2018-12-28 2024-04-23 アイジーエム レシンス イタリア ソチエタ レスポンサビリタ リミタータ 光開始剤
US20220121113A1 (en) 2019-01-23 2022-04-21 Basf Se Oxime ester photoinitiators having a special aroyl chromophore
EP4041719A1 (de) 2019-10-11 2022-08-17 IGM Resins Italia S.r.l. Cumarin-glyoxylate für led-lichthärtung
TW202138351A (zh) 2020-03-04 2021-10-16 德商巴地斯顏料化工廠 肟酯光起始劑
IT202000023815A1 (it) 2020-10-09 2022-04-09 Igm Resins Italia Srl Ketoquinolones as photonitiators
IT202100014885A1 (it) 2021-06-08 2022-12-08 Igm Resins Italia Srl Fotoiniziatori a base di silicio bifunzionali
IT202100025868A1 (it) 2021-10-08 2023-04-08 Igm Resins Italia Srl Nuovi fotoiniziatori
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JPS6147727A (ja) * 1984-10-29 1986-03-08 Toyobo Co Ltd 硬化型樹脂組成物

Also Published As

Publication number Publication date
EP0126541A1 (de) 1984-11-28
JPH0360322B2 (de) 1991-09-13
US4970244A (en) 1990-11-13
EP0126541B1 (de) 1987-01-21
JPS59197401A (ja) 1984-11-09
US4777191A (en) 1988-10-11

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee