DE3173163D1 - Alignment apparatus - Google Patents

Alignment apparatus

Info

Publication number
DE3173163D1
DE3173163D1 DE8181100559T DE3173163T DE3173163D1 DE 3173163 D1 DE3173163 D1 DE 3173163D1 DE 8181100559 T DE8181100559 T DE 8181100559T DE 3173163 T DE3173163 T DE 3173163T DE 3173163 D1 DE3173163 D1 DE 3173163D1
Authority
DE
Germany
Prior art keywords
alignment apparatus
alignment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8181100559T
Other languages
English (en)
Inventor
Edward H Phillips
Karl-Heinz Johannsmeier
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eaton Optimetrix Inc
Original Assignee
Eaton Optimetrix Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eaton Optimetrix Inc filed Critical Eaton Optimetrix Inc
Application granted granted Critical
Publication of DE3173163D1 publication Critical patent/DE3173163D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7069—Alignment mark illumination, e.g. darkfield, dual focus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Projection-Type Copiers In General (AREA)
DE8181100559T 1980-02-29 1981-01-27 Alignment apparatus Expired DE3173163D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US12600780A 1980-02-29 1980-02-29

Publications (1)

Publication Number Publication Date
DE3173163D1 true DE3173163D1 (en) 1986-01-23

Family

ID=22422511

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8181100559T Expired DE3173163D1 (en) 1980-02-29 1981-01-27 Alignment apparatus

Country Status (5)

Country Link
EP (1) EP0035113B1 (de)
JP (1) JPS56134737A (de)
CA (1) CA1197327A (de)
DE (1) DE3173163D1 (de)
IE (1) IE51237B1 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3318980C2 (de) * 1982-07-09 1986-09-18 Perkin-Elmer Censor Anstalt, Vaduz Vorrichtung zum Justieren beim Projektionskopieren von Masken
JPS59161815A (ja) * 1983-03-07 1984-09-12 Nippon Kogaku Kk <Nikon> 投影露光装置
US4620785A (en) * 1982-12-01 1986-11-04 Canon Kabushiki Kaisha Sheet-like member having alignment marks and an alignment apparatus for the same
US4585337A (en) * 1985-01-14 1986-04-29 Phillips Edward H Step-and-repeat alignment and exposure system
US4592648A (en) * 1985-01-23 1986-06-03 Perkin-Elmer Censor Anstalt Device for projection copying of masks onto a workpiece
JPS63118A (ja) * 1986-01-31 1988-01-05 Canon Inc 位置合わせ方法
JPS62199031A (ja) * 1986-02-27 1987-09-02 Rohm Co Ltd 露光装置
GB8803171D0 (en) * 1988-02-11 1988-03-09 English Electric Valve Co Ltd Imaging apparatus
JPH0652705B2 (ja) * 1988-05-12 1994-07-06 キヤノン株式会社 露光装置
JPH02298016A (ja) * 1989-05-12 1990-12-10 Matsushita Electric Ind Co Ltd 露光装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7002828A (de) * 1969-02-27 1970-08-31
EP0097380A3 (de) * 1979-04-02 1984-08-29 Eaton-Optimetrix Inc. System für die Positionierung einer Benutzungsvorrichtung
EP0017759B1 (de) * 1979-04-03 1985-09-04 Eaton-Optimetrix Inc. Verbessertes System der Ausrichtung und Belichtung durch schrittweise Projektion

Also Published As

Publication number Publication date
EP0035113A1 (de) 1981-09-09
IE51237B1 (en) 1986-11-12
CA1197327A (en) 1985-11-26
JPS56134737A (en) 1981-10-21
EP0035113B1 (de) 1985-12-11
IE810420L (en) 1981-08-29

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee