DE202008018474U1 - Layer with hierarchical micro- and nanostructured surface and composition for its production - Google Patents
Layer with hierarchical micro- and nanostructured surface and composition for its production Download PDFInfo
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- DE202008018474U1 DE202008018474U1 DE202008018474.6U DE202008018474U DE202008018474U1 DE 202008018474 U1 DE202008018474 U1 DE 202008018474U1 DE 202008018474 U DE202008018474 U DE 202008018474U DE 202008018474 U1 DE202008018474 U1 DE 202008018474U1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1262—Process of deposition of the inorganic material involving particles, e.g. carbon nanotubes [CNT], flakes
- C23C18/127—Preformed particles
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
- C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
- C23C18/1212—Zeolites, glasses
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
- C23C18/1216—Metal oxides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/122—Inorganic polymers, e.g. silanes, polysilazanes, polysiloxanes
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1225—Deposition of multilayers of inorganic material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1229—Composition of the substrate
- C23C18/1241—Metallic substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1229—Composition of the substrate
- C23C18/1245—Inorganic substrates other than metallic
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2601/00—Inorganic fillers
- B05D2601/20—Inorganic fillers used for non-pigmentation effect
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/23—Mixtures
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
Abstract
Beschichtungszusammensetzung zur Herstellung einer Schicht mit hierarchischer mikro- und nanostrukturierter Oberfläche, umfassend ein Gemisch von nanokristallinen Metalloxidpartikeln, Titandioxidsol und eine oder mehrere Verbindungen von glasbildenden Elementen in gelöster oder dispergierter Form, wobei die glasbildenden Elemente in oxidischer Form zur Glasbildung befähigt sind.Coating composition for producing a layer with a hierarchical micro- and nanostructured surface, comprising a mixture of nanocrystalline metal oxide particles, titanium dioxide sol and one or more compounds of glass-forming elements in dissolved or dispersed form, the glass-forming elements being capable of forming glass in oxidic form.
Description
Die Erfindung betrifft eine Schicht mit hierarchischer mikro- und nanostrukturierter Oberfläche sowie eine Zusammensetzung zum Herstellen einer derartigen Schicht. Bei einer hierarchischen mikro- und nanostrukturierten Oberfläche handelt es sich um eine doppelt strukturierte Oberfläche, bei der eine Strukturebene (Rauheit) im Mikrometerbereich von einer zweiten Strukturebene in Nanometerbereich überlagert wird.The invention relates to a layer with a hierarchical microstructured and nanostructured surface and to a composition for producing such a layer. A hierarchical micro- and nanostructured surface is a doubly structured surface in which a micron-level structural plane (roughness) is superimposed by a second nanoscale structure level.
Von Neinhuis und Barthlott (Neinhuis, C., Barthlott, W., (1997): Characterization and Distribution of Waterrepellent, Selfcleaning Plant Surfaces, Annals of Botany 79) wurde auf die Bedeutung von Strukturhierarchien für die Unbenetzbarkeit von Oberflächen hingewiesen. Doppeltstrukturierte Oberflächen führen zu energetisch bevorzugtem Cassie-Baxter-Verhalten einer Oberfläche, wenn diese gleichzeitig die Materialeigenschaft der Wasserabweisung besitzt. Das ist zum Beispiel bei dem Lotusblatt der Fall, bei dem die doppelt strukturierte Oberfläche aus Wachs als stark hydrophobem Material besteht. Wasser kann unter diesen Gegebenheiten nicht in die Vertiefungen auf der Oberfläche eindringen und die dort befindliche Luft verdrängen. Ergebnis ist eine extreme Unbenetzbarkeit und ein sehr geringer Abrollwinkel von Wassertropfen. Hierarchische Mikro- und Nanostrukturen sind deshalb in Kombination mit einem ausreichenden wasserabweisenden Verhalten dazu geeignet, der betreffenden Oberfläche superhydrophobe Eigenschaften zu verleihen. Die erfindungsgemäße Schicht kann aufgrund ihrer Mikro- und Nanostruktur sowohl superhydrophobe Eigenschaften, mit einem Wasserrandwinkel oberhalb 150°, als auch superhydrophile Eigenschaften, mit einem Wasserrandwinkel nahe 0°, annehmen. Diese Schicht ist deshalb besonders vorteilhaft in Anwendungen einsetzbar, bei denen entweder ein extremes Wasserbenetzungsverhalten der Gesamtschicht realisiert werden soll oder bei denen Oberflächenbereiche mit großen Unterschieden des Wasserbenetzungsverhaltens unmittelbar nebeneinander existieren sollen. Der Einsatz der erfindungsgemäßen Schicht kann deshalb zum Beispiel in biologischen Arrays erfolgen. Ein weiterer Anwendungsbereich der erfindungsgemäßen Schicht sind Brennstoffzellen, bei denen diese Schicht sowohl im superhydrophoben als auch im superhydrophilen Zustand eingesetzt werden kann, um das im Verbrennungsprozess entstehende Wasser aus der Reaktionszone zu beseitigen. In weiteren Anwendungen der erfindungsgemäßen Schicht kann diese im superhydrophoben Zustand genutzt werden, um damit beschichteten Gegenständen oder Flächen selbstreinigende, eisabweisende und kalkabweisende Eigenschaften zu verleihen.Nohuis and Barthlott (Nohuis, C., Barthlott, W., (1997): Characterization and Distribution of Waterrepellent, Selfcleaning Plant Surfaces, Annals of Botany 79) noted the importance of structural hierarchies for the non-wettability of surfaces. Double-structured surfaces lead to energetically favored Cassie-Baxter behavior of a surface, if it also possesses the material property of water repellency. This is the case, for example, with the lotus leaf, in which the doubly structured surface of wax consists of a strongly hydrophobic material. Under these conditions, water can not penetrate into the depressions on the surface and displace the air located there. The result is an extreme non-wettability and a very low rolling angle of water droplets. Hierarchical micro- and nanostructures are therefore, in combination with a sufficient water-repellent behavior, suitable for imparting superhydrophobic properties to the surface in question. Because of its microstructure and nanostructure, the layer according to the invention can assume both superhydrophobic properties, with a water edge angle above 150 °, and superhydrophilic properties, with a water edge angle near 0 °. This layer can therefore be used particularly advantageously in applications in which either an extreme water wetting behavior of the overall layer is to be realized or in which surface regions with large differences in the water wetting behavior should exist directly next to one another. The use of the layer according to the invention can therefore be carried out, for example, in biological arrays. Another area of application of the layer according to the invention is fuel cells, in which this layer can be used both in the superhydrophobic and in the superhydrophilic state in order to eliminate the water formed in the combustion process from the reaction zone. In further applications of the layer according to the invention, it can be used in the superhydrophobic state in order to impart self-cleaning, ice-repellent and lime-repellent properties to objects or surfaces coated therewith.
Gegenwärtig existieren bereits zahlreiche Methoden zur Schaffung geometrischer, chaotischer oder selbstorganisierender Mikro- und Nanostrukturen auf Oberflächen unterschiedlicher Materialien. Bekannt sind Prägeverfahren, bei denen zunächst eine Masterstruktur hergestellt wird, deren Struktur anschließend auf eine formbare Oberfläche übertragen wird. In
- 1. Das Aufbringen der Schicht auf ein Substrat und die anschließende Hydrophobierung der Schichtoberfläche,
- 2. Die Übertragung der hierarchischen Mikro- und Nanostruktur von der Oberfläche der erfindungsgemäßen Schicht auf eine Materialoberfläche, die bereits die Materialeigenschaft der Hydrophobie aufweist und infolge der von der erfindungsgemäßen Schicht übertragenen Struktur die Eigenschaft der Superhydrophobie erlangt.
- 1. The application of the layer to a substrate and the subsequent hydrophobing of the layer surface,
- 2. The transfer of the hierarchical micro- and nanostructure from the surface of the layer according to the invention to a material surface which already has the material property of the hydrophobicity and acquires the property of superhydrophobicity as a result of the structure transferred by the layer according to the invention.
Die Hydrophobierung von oxidischen Schichtoberflächen ist bereits bekannt und wird zum Beispiel in
Wenn zur Herstellung der erfindungsgemäßen Schichten hochdisperse TiO2-Materialien, wie das kommerziell erhältliche Produkt P25 (Degussa AG), eingesetzt werden, besitzen die Schichten eine besonders hohe photokatalytische Aktivität. Ein derartiger Photokatalysator kann beispielsweise vorteilhaft zur Vernichtung von Schadstoffen in Luft oder Wasser durch photokatalytische Oxidation eingesetzt werden. Ein weiteres mögliches Anwendungsgebiet dieses Photokatalysators ist der Einsatz als photoaktives Material für Solarzellen. Die hierarchische Mikro- und Nanostruktur der erfindungsgemäßen Schicht trägt im besonderen Maße dazu bei, die wirksame Oberfläche der Photokatalysatorschicht im Vergleich zu einer glatten Photokatalysatoroberfläche zu vergrößern. Durch Dotierung mit geeigneten Metallionen, zum Beispiel von Platinmetallen oder Ag, kann eine deutliche Steigerung der photokatalytischen Aktivität der erfindungsgemäßen Schicht erreicht werden.If highly disperse TiO 2 materials, such as the commercially available product P25 (Degussa AG), are used to produce the layers according to the invention, the layers have a particularly high photocatalytic activity. Such a photocatalyst can be used, for example, advantageously for the destruction of pollutants in air or water by photocatalytic oxidation. Another possible application of this photocatalyst is the use as a photoactive material for solar cells. The hierarchical micro- and nanostructure of the layer of the present invention contributes particularly to increasing the effective surface area of the photocatalyst layer as compared to a smooth photocatalyst surface. By doping with suitable metal ions, for example of platinum metals or Ag, a significant increase in the photocatalytic activity of the layer according to the invention can be achieved.
Unmittelbar nach der Herstellung weist die Schicht superhydrophile Eigenschaften mit einem Wasserkontaktwinkel von 0° auf Durch Behandlung mit einem bereits bekannten Hydrophobierungsmittel kann die Schicht in den superhydrophoben Zustand überführt werden. Dass kann zum Beispiel durch Spülen mit einer 2%igen n-Octyltriethoxysilanlösung in Toluol mit anschließender Trocknung und Wärmebehandlung für 10 Minuten bei 120°C erfolgen. Im Anschluss an diese Behandlung besitzt die Schichtoberfläche superhydrophobe Eigenschaften mit einem Wasserkontaktwinkel von 160°. In diesem Zustand besitzt die Oberfläche die Eigenschaft der Selbstreinigung. Für vergleichende Untersuchungen wurde unter den oben aufgeführten Bedingungen eine Schicht unter Verwendung der genannten Basismischung mit Titandioxidsol und nanokristallinem TiO2 (ohne Zusatz eines Glasbildners) hergestellt. Die lichtmikroskopische Untersuchung zeigt, dass diese Schicht Mikrorisse (Breite bis ca. 1 um, Länge ca. 5–15 μm) aufweist. Die Oberfläche dieser Schicht ist mit einer großen Zahl von schollenähnlichen Struktureinheiten besetzt, die mehr oder weniger dicht miteinander verwachsen sind. Die beschriebene Schichtbeschaffenheit führt zu inhomogenen Schichteigenschaften und beeinflusst die mechanischen Eigenschaften der Schicht negativ. Der Zusatz von Glasbildnern wirkt der Entstehung von Rissen in der Schichtoberfläche entgegen und bewirkt eine höhere Homogenität und Dichte der Schicht. Eine erfindungsgemäße Schicht mit 5% Silicium weist im Vergleich zur Schicht, welche aus der Basismischung hergestellt wurde, eine deutliche Verringerung der Zahl bestehender Mikrorisse bei gleichzeitiger Verfeinerung der Mikrorisse auf. Eine erfindungsgemäße Schicht mit 2,5% Bismut besitzt eine homogene Struktur ohne Mikrorisse und besitzt eine maximale Rautiefe im Mikrometerbereich und einen Rz-Wert von 0,36 μm. Eine erfindungsgemäße Schicht mit 5% Bor besitzt ebenfalls eine homogene Oberflächenbeschaffenheit ohne Mikrorisse und eine maximale Rautiefe im Mikrometerbereich und einen Rz-Wert von 0,31 μm. Eine erfindungsgemäße Schicht, welche 5% Antimon enthält, weist ebenfalls keine Mikrorisse auf und besitzt ebenfalls eine maximale Rautiefe im Mikrometerbereich und einen Rz-Wert von 0,33 μm.Immediately after the preparation, the layer has superhydrophilic properties with a water contact angle of 0 °. By treatment with an already known hydrophobizing agent, the layer can be converted to the superhydrophobic state. This can be done for example by rinsing with a 2% n-Octyltriethoxysilanlösung in toluene followed by drying and heat treatment for 10 minutes at 120 ° C. Following this treatment, the layer surface has superhydrophobic properties with a water contact angle of 160 °. In this state, the surface has the property of self-cleaning. For comparative studies, a layer was prepared under the conditions mentioned above using the mentioned base mixture with titanium dioxide sol and nanocrystalline TiO 2 (without the addition of a glass former). The light microscopic examination shows that this layer has microcracks (width up to about 1 μm, length about 5-15 μm). The surface of this layer is occupied by a large number of lump-like structural units, which are more or less densely fused together. The layer structure described leads to inhomogeneous layer properties and negatively influences the mechanical properties of the layer. The addition of glass formers counteracts the formation of cracks in the layer surface and causes a higher homogeneity and density of the layer. A layer according to the invention with 5% silicon has a significant reduction in the number of existing microcracks with simultaneous refinement of the microcracks in comparison with the layer which was produced from the base mixture. A 2.5% bismuth layer according to the invention has a homogeneous structure without microcracks and has a maximum roughness in the micrometer range and an Rz value of 0.36 μm. A layer according to the invention with 5% boron likewise has a homogeneous surface finish without microcracks and a maximum roughness depth in the micrometer range and an Rz value of 0.31 μm. A layer according to the invention which contains 5% of antimony likewise has no microcracks and likewise has a maximum roughness in the micrometer range and an Rz value of 0.33 μm.
ZITATE ENTHALTEN IN DER BESCHREIBUNG QUOTES INCLUDE IN THE DESCRIPTION
Diese Liste der vom Anmelder aufgeführten Dokumente wurde automatisiert erzeugt und ist ausschließlich zur besseren Information des Lesers aufgenommen. Die Liste ist nicht Bestandteil der deutschen Patent- bzw. Gebrauchsmusteranmeldung. Das DPMA übernimmt keinerlei Haftung für etwaige Fehler oder Auslassungen.This list of the documents listed by the applicant has been generated automatically and is included solely for the better information of the reader. The list is not part of the German patent or utility model application. The DPMA assumes no liability for any errors or omissions.
Zitierte PatentliteraturCited patent literature
- DE 10158347 A1 [0003] DE 10158347 A1 [0003]
- DE 10138036 A1 [0003] DE 10138036 A1 [0003]
- DE 10064520 A1 [0003] DE 10064520 A1 [0003]
- DE 10210671 A1 [0003] DE 10210671 A1 [0003]
- WO 2003/101913 [0004] WO 2003/101913 [0004]
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DE10064520A1 (en) | 2000-12-22 | 2002-07-04 | Daimler Chrysler Ag | Method for producing structured surface with self-cleaning effect on vehicles, comprises producing micro- or nano-structure on carrier by anodic oxidation and transferring this structure to the surface |
DE10138036A1 (en) | 2001-08-03 | 2003-02-20 | Creavis Tech & Innovation Gmbh | Structured self-cleaning surface is hydrophobic, and has a pattern of raised surfaces with lower burrs linking neighboring projections |
DE10158347A1 (en) | 2001-11-28 | 2003-06-12 | Tesa Ag | Process for the production of nano- and micro-structured polymer films |
DE10210671A1 (en) | 2002-03-12 | 2003-09-25 | Creavis Tech & Innovation Gmbh | Mold release agent which has hydrophobic, nanoscale particles and use of these mold release agents |
WO2003101913A1 (en) | 2002-05-29 | 2003-12-11 | Erlus Aktiengesellschaft | Ceramic moulded body comprising a photocatalytic coating and method for producing the same |
-
2008
- 2008-11-26 DE DE202008018474.6U patent/DE202008018474U1/en not_active Expired - Lifetime
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10064520A1 (en) | 2000-12-22 | 2002-07-04 | Daimler Chrysler Ag | Method for producing structured surface with self-cleaning effect on vehicles, comprises producing micro- or nano-structure on carrier by anodic oxidation and transferring this structure to the surface |
DE10138036A1 (en) | 2001-08-03 | 2003-02-20 | Creavis Tech & Innovation Gmbh | Structured self-cleaning surface is hydrophobic, and has a pattern of raised surfaces with lower burrs linking neighboring projections |
DE10158347A1 (en) | 2001-11-28 | 2003-06-12 | Tesa Ag | Process for the production of nano- and micro-structured polymer films |
DE10210671A1 (en) | 2002-03-12 | 2003-09-25 | Creavis Tech & Innovation Gmbh | Mold release agent which has hydrophobic, nanoscale particles and use of these mold release agents |
WO2003101913A1 (en) | 2002-05-29 | 2003-12-11 | Erlus Aktiengesellschaft | Ceramic moulded body comprising a photocatalytic coating and method for producing the same |
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