DE20120721U1 - Assembly to treat workpiece surface with UV radiation, has recess in workpiece which is filled with carbon dioxide gas, and is further away from UV lamp than surface areas not covered by gas - Google Patents

Assembly to treat workpiece surface with UV radiation, has recess in workpiece which is filled with carbon dioxide gas, and is further away from UV lamp than surface areas not covered by gas

Info

Publication number
DE20120721U1
DE20120721U1 DE20120721U DE20120721U DE20120721U1 DE 20120721 U1 DE20120721 U1 DE 20120721U1 DE 20120721 U DE20120721 U DE 20120721U DE 20120721 U DE20120721 U DE 20120721U DE 20120721 U1 DE20120721 U1 DE 20120721U1
Authority
DE
Germany
Prior art keywords
workpiece
recess
gas
radiation
lamp
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE20120721U
Other languages
German (de)
Other versions
DE20120721U8 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
HOENLE AG DR
Original Assignee
HOENLE AG DR
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by HOENLE AG DR filed Critical HOENLE AG DR
Priority to DE20120721U priority Critical patent/DE20120721U1/en
Publication of DE20120721U1 publication Critical patent/DE20120721U1/en
Publication of DE20120721U8 publication Critical patent/DE20120721U8/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • B01J19/122—Incoherent waves
    • B01J19/123—Ultraviolet light

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

Assembly to treat workpiece surface with UV radiation has UV lamp (2) to illuminate workpiece (4). The workpiece being treated has at least one recess (5) containing carbon dioxide (CO 2) gas. The UV lamp and the workpiece are positioned in relation to each other so that the areas covered with the inert gas are further away from the UV lamp than the areas which are not shrouded by the gas. Assembly to treat a workpiece surface with UV radiation has a UV lamp (2) to illuminate the workpiece (4) with UV rays. The workpiece being treated has at least one recess (5), containing carbon dioxide (CO 2) gas. The UV lamp and the workpiece are positioned in relation to each other so that the areas covered with the inert gas are further away from the UV lamp than the areas which are not shrouded by the gas. The inert gas remains within the recess, as it is heavier than air.

Description

Der Beschreibungstext wurde nicht elektronisch erfaßt The description text was not recorded electronically  

Der Beschreibungstext wurde nicht elektronisch erfaßt The description text was not recorded electronically  

Der Beschreibungstext wurde nicht elektronisch erfaßt The description text was not recorded electronically  

Der Beschreibungstext wurde nicht elektronisch erfaßt The description text was not recorded electronically  

Der Beschreibungstext wurde nicht elektronisch erfaßt The description text was not recorded electronically  

Der Beschreibungstext wurde nicht elektronisch erfaßt The description text was not recorded electronically  

Der Beschreibungstext wurde nicht elektronisch erfaßtThe description text was not recorded electronically

Claims (7)

1. Bestrahlungssystem (1) zum Bestrahlen von Objekten mit ultravioletter (UV) Strahlung, mit
einer UV-Bestrahlungseinrichtung (2) zum Erzeugen und Abgeben von UV-Strahlung auf ein zu bestrahlendes Objekt (4), und
ein zu bestrahlendes Objekt (4), wobei das zu bestrahlende Objekt zumindest eine Vertiefung (5) aufweist, in der gasförmiges CO2 (8) gehalten ist, wobei
die UV-Bestrahlungseinrichtung (2) und das zu bestrahlende Objekt (4) dergestalt zueinander angeordnet sind, daß diejenigen Teile des zu bestrahlenden Objektes (4), die mit gasförmigem CO2 bedeckt sind, weiter von der UV-Bestrahlungseinrichtung (2) entfernt sind als diejenigen Teile (7) des zu bestrahlenden Objektes (4), die nicht bzw. nicht ständig mit gasförmigem CO2 (8) bedeckt sind.1. Irradiation system ( 1 ) for irradiating objects with ultraviolet (UV) radiation, with
a UV irradiation device ( 2 ) for generating and emitting UV radiation onto an object ( 4 ) to be irradiated, and
an object to be irradiated ( 4 ), the object to be irradiated having at least one recess ( 5 ) in which gaseous CO 2 ( 8 ) is held, wherein
the UV irradiation device ( 2 ) and the object ( 4 ) to be irradiated are arranged in such a way that those parts of the object ( 4 ) to be irradiated which are covered with gaseous CO 2 are further away from the UV irradiation device ( 2 ) as those parts ( 7 ) of the object ( 4 ) to be irradiated which are not or not always covered with gaseous CO 2 ( 8 ). 2. Bestrahlungssystem (1) zum Bestrahlen von Objekten mit UV-Strahlung gemäß Anspruch 1, dadurch gekennzeichnet, daß das gasförmige CO2 (8) aufgrund seines im Vergleich zu Luft größeren spezifischen Gewichtes in der Vertiefung (5) gehalten ist.2. Irradiation system ( 1 ) for irradiating objects with UV radiation according to claim 1, characterized in that the gaseous CO 2 ( 8 ) is held in the recess ( 5 ) due to its greater specific weight compared to air. 3. Bestrahlungssystem (1) zum Bestrahlen von Objekten mit UV-Strahlung gemäß Anspruch 1 oder 2, dadurch gekennzeichnet, daß die Vertiefung (5) wannenförmig ist.3. Irradiation system ( 1 ) for irradiating objects with UV radiation according to claim 1 or 2, characterized in that the recess ( 5 ) is trough-shaped. 4. Bestrahlungssystem (1) zum Bestrahlen von Objekten mit UV-Strahlung gemäß Anspruch 1 oder 2, dadurch gekennzeichnet, daß die Vertiefung schüsselförmig ist.4. Irradiation system ( 1 ) for irradiating objects with UV radiation according to claim 1 or 2, characterized in that the recess is bowl-shaped. 5. Bestrahlungssystem (1) zum Bestrahlen von Objekten mit UV-Strahlung gemäß einem der Ansprüche 1 bis 4, dadurch gekennzeichnet, daß die UV-Bestrahlungseinrichtung (2) im wesentlichen länglich ausgebildet ist und das zu bestrahlende Objekt (4) während der Bestrahlung überfährt. 5. Irradiation system ( 1 ) for irradiating objects with UV radiation according to one of claims 1 to 4, characterized in that the UV irradiation device ( 2 ) is substantially elongated and the object to be irradiated ( 4 ) runs over during the irradiation , 6. Bestrahlungssystem (1) zum Bestrahlen von Objekten mit UV-Strahlung gemäß einem der Ansprüche 1 bis 4, dadurch gekennzeichnet, daß die UV-Bestrahlungseinrichtung im wesentlichen flächig ausgebildet ist und das zu bestrahlende Objekt in seiner Erstreckung überdeckt.6. Irradiation system ( 1 ) for irradiating objects with UV radiation according to one of claims 1 to 4, characterized in that the UV irradiation device is substantially flat and covers the object to be irradiated in its extent. 7. Bestrahlungssystem (1) zum Bestrahlen von Objekten mit UV-Strahlung gemäß einem der Ansprüche 1 bis 6, dadurch gekennzeichnet, daß die UV-Bestrahlungseinrichtung (2) aus einer Anzahl einzelner UV-Lampen besteht.7. Irradiation system ( 1 ) for irradiating objects with UV radiation according to one of claims 1 to 6, characterized in that the UV irradiation device ( 2 ) consists of a number of individual UV lamps.
DE20120721U 2001-10-21 2001-10-21 Assembly to treat workpiece surface with UV radiation, has recess in workpiece which is filled with carbon dioxide gas, and is further away from UV lamp than surface areas not covered by gas Expired - Lifetime DE20120721U1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE20120721U DE20120721U1 (en) 2001-10-21 2001-10-21 Assembly to treat workpiece surface with UV radiation, has recess in workpiece which is filled with carbon dioxide gas, and is further away from UV lamp than surface areas not covered by gas

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE20120721U DE20120721U1 (en) 2001-10-21 2001-10-21 Assembly to treat workpiece surface with UV radiation, has recess in workpiece which is filled with carbon dioxide gas, and is further away from UV lamp than surface areas not covered by gas

Publications (2)

Publication Number Publication Date
DE20120721U1 true DE20120721U1 (en) 2003-03-06
DE20120721U8 DE20120721U8 (en) 2005-08-04

Family

ID=7965491

Family Applications (1)

Application Number Title Priority Date Filing Date
DE20120721U Expired - Lifetime DE20120721U1 (en) 2001-10-21 2001-10-21 Assembly to treat workpiece surface with UV radiation, has recess in workpiece which is filled with carbon dioxide gas, and is further away from UV lamp than surface areas not covered by gas

Country Status (1)

Country Link
DE (1) DE20120721U1 (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19957900A1 (en) * 1999-12-01 2001-06-07 Basf Ag Light curing of radiation-curable compositions under protective gas

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19957900A1 (en) * 1999-12-01 2001-06-07 Basf Ag Light curing of radiation-curable compositions under protective gas

Also Published As

Publication number Publication date
DE20120721U8 (en) 2005-08-04

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Legal Events

Date Code Title Description
R163 Identified publications notified
R207 Utility model specification

Effective date: 20030410

R150 Term of protection extended to 6 years

Effective date: 20050511

R151 Term of protection extended to 8 years

Effective date: 20080328

R158 Lapse of ip right after 8 years

Effective date: 20100701