DE19882793T1 - Reinigungselement - Google Patents
ReinigungselementInfo
- Publication number
- DE19882793T1 DE19882793T1 DE19882793T DE19882793T DE19882793T1 DE 19882793 T1 DE19882793 T1 DE 19882793T1 DE 19882793 T DE19882793 T DE 19882793T DE 19882793 T DE19882793 T DE 19882793T DE 19882793 T1 DE19882793 T1 DE 19882793T1
- Authority
- DE
- Germany
- Prior art keywords
- cleaning element
- cleaning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 238000004140 cleaning Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
- B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning In General (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/967,162 US6006391A (en) | 1997-11-10 | 1997-11-10 | Workpiece cleaning element with improved rib configuration |
PCT/US1998/022622 WO1999024176A1 (en) | 1997-11-10 | 1998-10-27 | Workpiece cleaning element with improved rib configuration |
Publications (1)
Publication Number | Publication Date |
---|---|
DE19882793T1 true DE19882793T1 (de) | 2001-03-08 |
Family
ID=25512382
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19882793T Ceased DE19882793T1 (de) | 1997-11-10 | 1998-10-27 | Reinigungselement |
Country Status (7)
Country | Link |
---|---|
US (1) | US6006391A (de) |
JP (1) | JP2001522718A (de) |
KR (1) | KR20010031927A (de) |
DE (1) | DE19882793T1 (de) |
GB (1) | GB2348121B (de) |
MY (1) | MY133179A (de) |
WO (1) | WO1999024176A1 (de) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW353784B (en) * | 1996-11-19 | 1999-03-01 | Tokyo Electron Ltd | Apparatus and method for washing substrate |
DE19860190A1 (de) * | 1998-02-04 | 1999-08-05 | Heidelberger Druckmasch Ag | Vorrichtung zur Reinigung eines Zylinders in einer Druckmaschine |
JP3200036B2 (ja) * | 1998-05-22 | 2001-08-20 | アイオン株式会社 | 洗浄用回転ブラシ |
US6273100B1 (en) * | 1998-08-27 | 2001-08-14 | Micron Technology, Inc. | Surface cleaning apparatus and method |
US6620257B1 (en) * | 1999-06-30 | 2003-09-16 | Hoya Corporation | Scrub cleaning method for substrate and manufacturing method for information recording medium |
US6818604B2 (en) | 2001-10-04 | 2004-11-16 | Speedfam-Ipec Corporation | System and method for cleaning workpieces |
CN1863645B (zh) | 2003-08-08 | 2011-11-30 | 安格斯公司 | 用于制作浇注在可旋转基体上的整体式多孔垫的方法和材料 |
US7814613B1 (en) | 2003-10-23 | 2010-10-19 | R.E. Whittaker Company, Inc. | Rollers and disks for carpet cleaning |
USD622920S1 (en) | 2007-05-02 | 2010-08-31 | Entegris Corporation | Cleaning sponge roller |
US20100186180A1 (en) * | 2009-01-23 | 2010-07-29 | Xyratex Corporation | Support structure for multiple workpiece support rollers |
US20110182653A1 (en) * | 2010-01-26 | 2011-07-28 | Miller Kenneth C | Variable Pressure Brush/Pad |
US9333046B2 (en) * | 2012-10-22 | 2016-05-10 | Steven Scott Rauch | Surgical instrument tip cleaner |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1775186A (en) * | 1925-12-16 | 1930-09-09 | Sewall Paint & Varnish Company | Rubbing machine |
BE347609A (de) * | 1927-12-29 | |||
US1809907A (en) * | 1930-01-31 | 1931-06-16 | Frank E Newcomb | Rubbing or sanding pad |
FR798265A (fr) * | 1935-10-22 | 1936-05-13 | Appareil de nettoyage des habitations | |
FR856480A (fr) * | 1939-02-28 | 1940-06-14 | Paulstra Sa | Disque élastique pour touret à polir |
US2289545A (en) * | 1940-04-06 | 1942-07-14 | Trico Products Corp | Windshield wiper |
US2677142A (en) * | 1952-03-27 | 1954-05-04 | Louis J Mundo | Rotary scrub brush head |
US2757491A (en) * | 1953-01-16 | 1956-08-07 | Pittsburgh Plate Glass Co | Plastic polishing runner |
US2880432A (en) * | 1956-02-02 | 1959-04-07 | Louis M Schnider | Egg cleaning machine |
US2880443A (en) * | 1956-09-04 | 1959-04-07 | Stanley Home Products Inc | Mop having interior means for a handle or the like |
CH374154A (de) * | 1958-06-13 | 1963-12-31 | Minnesota Mining & Mfg | Umlaufmitnehmerkissen für Umlaufschleifkörper |
US3418675A (en) * | 1967-10-17 | 1968-12-31 | Mirror Bright Polish Co | Buffing wheel |
JPS598352Y2 (ja) * | 1979-05-28 | 1984-03-15 | 富士通株式会社 | ガラスマスクの洗浄装置 |
NL191018C (nl) * | 1985-09-17 | 1994-12-16 | Gerrit Broersz | Werktuig voor het verwijderen van aangroeiingen op constructies beneden de zeespiegel. |
JP2701862B2 (ja) * | 1988-04-04 | 1998-01-21 | 鐘紡株式会社 | スクラブ洗浄用回転ブラシ |
US5144711A (en) * | 1991-03-25 | 1992-09-08 | Westech Systems, Inc. | Cleaning brush for semiconductor wafer |
US5311634A (en) * | 1993-02-03 | 1994-05-17 | Nicholas Andros | Sponge cleaning pad |
FR2728183B1 (fr) * | 1994-12-15 | 1997-03-21 | Rollando Didier Francisque | Outil de nettoyage et recurage des surfaces sensibles en matiere plastique |
US5461750A (en) * | 1995-02-02 | 1995-10-31 | Kaiser; Richard A. | Double curved backing plate with cushioned support for rotary buffing pads |
US5778481A (en) * | 1996-02-15 | 1998-07-14 | International Business Machines Corporation | Silicon wafer cleaning and polishing pads |
-
1997
- 1997-11-10 US US08/967,162 patent/US6006391A/en not_active Expired - Fee Related
-
1998
- 1998-10-27 JP JP2000520245A patent/JP2001522718A/ja active Pending
- 1998-10-27 DE DE19882793T patent/DE19882793T1/de not_active Ceased
- 1998-10-27 WO PCT/US1998/022622 patent/WO1999024176A1/en active Application Filing
- 1998-10-27 GB GB0010453A patent/GB2348121B/en not_active Expired - Fee Related
- 1998-10-27 KR KR1020007005032A patent/KR20010031927A/ko not_active Application Discontinuation
- 1998-11-06 MY MYPI98005054A patent/MY133179A/en unknown
Also Published As
Publication number | Publication date |
---|---|
GB2348121B (en) | 2001-08-08 |
KR20010031927A (ko) | 2001-04-16 |
JP2001522718A (ja) | 2001-11-20 |
US6006391A (en) | 1999-12-28 |
WO1999024176A1 (en) | 1999-05-20 |
MY133179A (en) | 2007-10-31 |
GB2348121A (en) | 2000-09-27 |
GB0010453D0 (en) | 2000-06-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
OP8 | Request for examination as to paragraph 44 patent law | ||
8607 | Notification of search results after publication | ||
8131 | Rejection |