DE112008001216A5 - Magnetronplasmaanlage - Google Patents
Magnetronplasmaanlage Download PDFInfo
- Publication number
- DE112008001216A5 DE112008001216A5 DE112008001216T DE112008001216T DE112008001216A5 DE 112008001216 A5 DE112008001216 A5 DE 112008001216A5 DE 112008001216 T DE112008001216 T DE 112008001216T DE 112008001216 T DE112008001216 T DE 112008001216T DE 112008001216 A5 DE112008001216 A5 DE 112008001216A5
- Authority
- DE
- Germany
- Prior art keywords
- magnetronplasmaanlage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02M—APPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
- H02M3/00—Conversion of dc power input into dc power output
- H02M3/22—Conversion of dc power input into dc power output with intermediate conversion into ac
- H02M3/24—Conversion of dc power input into dc power output with intermediate conversion into ac by static converters
- H02M3/28—Conversion of dc power input into dc power output with intermediate conversion into ac by static converters using discharge tubes with control electrode or semiconductor devices with control electrode to produce the intermediate ac
- H02M3/285—Single converters with a plurality of output stages connected in parallel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3444—Associated circuits
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102007011230.2 | 2007-03-06 | ||
DE102007011230A DE102007011230A1 (de) | 2007-03-06 | 2007-03-06 | Magnetronplasmaanlage |
PCT/DE2008/000393 WO2008106956A2 (de) | 2007-03-06 | 2008-03-06 | Spannungsversorgung für eine sputteranlage |
Publications (1)
Publication Number | Publication Date |
---|---|
DE112008001216A5 true DE112008001216A5 (de) | 2010-02-04 |
Family
ID=39677916
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE102007011230A Withdrawn DE102007011230A1 (de) | 2007-03-06 | 2007-03-06 | Magnetronplasmaanlage |
DE202008018481.9U Expired - Lifetime DE202008018481U1 (de) | 2007-03-06 | 2008-03-06 | Magnetronplasmaanlage |
DE112008001216T Withdrawn DE112008001216A5 (de) | 2007-03-06 | 2008-03-06 | Magnetronplasmaanlage |
Family Applications Before (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE102007011230A Withdrawn DE102007011230A1 (de) | 2007-03-06 | 2007-03-06 | Magnetronplasmaanlage |
DE202008018481.9U Expired - Lifetime DE202008018481U1 (de) | 2007-03-06 | 2008-03-06 | Magnetronplasmaanlage |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP2140543A2 (de) |
DE (3) | DE102007011230A1 (de) |
WO (1) | WO2008106956A2 (de) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102008021912C5 (de) * | 2008-05-01 | 2018-01-11 | Cemecon Ag | Beschichtungsverfahren |
US8040068B2 (en) * | 2009-02-05 | 2011-10-18 | Mks Instruments, Inc. | Radio frequency power control system |
DE102010002687C5 (de) * | 2010-03-09 | 2015-09-10 | Federal-Mogul Burscheid Gmbh | Verfahren zur Beschichtung zumindest der Innenfläche eines Kolbenrings sowie Kolbenring |
DE102010038603B4 (de) * | 2010-07-29 | 2016-06-02 | Trumpf Huettinger Sp. Z O. O. | DC-Plasmaanordnung |
DE102010047963A1 (de) * | 2010-10-08 | 2012-04-12 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Magnetron-Vorrichtung und Verfahren zum gepulsten Betreiben einer Magnetron-Vorrichtung |
DE102012206553A1 (de) * | 2012-04-20 | 2013-10-24 | Von Ardenne Anlagentechnik Gmbh | Verfahren und Vorrichtung zum Steuern der Schichtdickenverteilung in einer Vakuumbeschichtung |
DE102012110040A1 (de) | 2012-06-22 | 2013-12-24 | Von Ardenne Anlagentechnik Gmbh | Verfahren zur Abscheidung einer Schicht mittels Hochenergiesputtern |
DE102014207877A1 (de) * | 2014-04-25 | 2015-11-19 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und Vorrichtung zur geregelten, gepulsten ionisierten Beschichtung von Substraten in einer Beschichtungskammer |
CN109811324B (zh) * | 2019-03-14 | 2021-02-09 | 哈尔滨工业大学 | 基于异质双靶高功率脉冲磁控溅射制备掺杂类薄膜的装置及方法 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4006404A (en) * | 1976-01-30 | 1977-02-01 | The United States Of America As Represented By The Secretary Of The Navy | Pulsed plasma probe |
DE4014302A1 (de) | 1990-05-04 | 1991-11-07 | Boehringer Andreas | Einrichtung zur versorgung eines verbraucherzweipols mit einem eingepraegten, jedoch in einer anzahl von stufen einstellbaren gleichstrom |
DE4438463C1 (de) * | 1994-10-27 | 1996-02-15 | Fraunhofer Ges Forschung | Verfahren und Schaltung zur bipolaren pulsförmigen Energieeinspeisung in Niederdruckplasmen |
JP3060876B2 (ja) * | 1995-02-15 | 2000-07-10 | 日新電機株式会社 | 金属イオン注入装置 |
CA2192891C (en) * | 1996-01-16 | 2000-02-22 | Jon O. Reynolds | Plasma cutting or arc welding power supply with phase staggered secondary switchers |
US5917286A (en) * | 1996-05-08 | 1999-06-29 | Advanced Energy Industries, Inc. | Pulsed direct current power supply configurations for generating plasmas |
ATE468420T1 (de) * | 1997-02-20 | 2010-06-15 | Shibaura Mechatronics Corp | Stromversorgungseinheit für sputtervorrichtung |
DE10018879B4 (de) | 2000-04-17 | 2013-02-28 | Melec Gmbh | Stromversorgungsgerät zur bipolaren Stromversorgung |
US7169255B2 (en) * | 2002-02-15 | 2007-01-30 | Hitachi High-Technologies Corporation | Plasma processing apparatus |
JP2004064817A (ja) * | 2002-07-25 | 2004-02-26 | Shibaura Mechatronics Corp | 電源、スパッタ用電源及びスパッタ装置 |
DE10306347A1 (de) * | 2003-02-15 | 2004-08-26 | Hüttinger Elektronik GmbH & Co. KG | Leistungszufuhrregeleinheit |
DE10312549B3 (de) * | 2003-03-21 | 2004-08-26 | Hüttinger Elektronik Gmbh + Co. Kg | Gasentladungsprozess-Spannungsversorgungseinheit |
SE0302045D0 (sv) * | 2003-07-10 | 2003-07-10 | Chemfilt R & D Ab | Work piece processing by pulsed electric discharges in solid-gas plasmas |
EP1852959A1 (de) * | 2006-05-05 | 2007-11-07 | HÜTTINGER Elektronik GmbH + Co. KG | Stromversorgung für einen Mittelfrequenz-Plasmagenerator |
-
2007
- 2007-03-06 DE DE102007011230A patent/DE102007011230A1/de not_active Withdrawn
-
2008
- 2008-03-06 DE DE202008018481.9U patent/DE202008018481U1/de not_active Expired - Lifetime
- 2008-03-06 WO PCT/DE2008/000393 patent/WO2008106956A2/de active Application Filing
- 2008-03-06 DE DE112008001216T patent/DE112008001216A5/de not_active Withdrawn
- 2008-03-06 EP EP08715542A patent/EP2140543A2/de not_active Ceased
Also Published As
Publication number | Publication date |
---|---|
WO2008106956A2 (de) | 2008-09-12 |
DE102007011230A1 (de) | 2008-09-11 |
DE202008018481U1 (de) | 2014-06-10 |
WO2008106956A3 (de) | 2009-10-22 |
EP2140543A2 (de) | 2010-01-06 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE602008006301D1 (de) | Koaxialnadelanordnung | |
BRPI0821573A2 (pt) | benzofuropirimidonas | |
ATE501136T1 (de) | Imidazopyridinone | |
DK2159224T3 (da) | Bromphenylsubstituerede thiazolyldihydropyrimidiner | |
ATE514696T1 (de) | Diphenyl-dihydro-imidazopyridinone | |
DE602008002772D1 (de) | Polyvinylpyrrolidonpulverzusammensetzungen | |
DE112008003636A5 (de) | Mehrzuggruppierer | |
DE502007001207D1 (de) | Elektrosaugkopf | |
BRPI0814519A2 (pt) | Organopolissiloxano | |
BRPI0811451A2 (pt) | Exopolissacarídeo | |
DE602008000749D1 (de) | Buschschneider | |
DE602008000923D1 (de) | Einzelwaferätzgerät | |
BRPI0812840A2 (pt) | 2-imidazolinas | |
AT505058A3 (de) | Türschliesssystem | |
BRPI0815547A2 (pt) | Depsipeptídeos cícliocos | |
DE602008004695D1 (de) | Katalysatorträgerwabe | |
BRPI0812994A2 (pt) | Microbiocidas | |
DE602008001234D1 (de) | Bandmaterialzuführvorrichtung | |
DE602008005950D1 (de) | Münzvereinzeler | |
DE112008001216A5 (de) | Magnetronplasmaanlage | |
DE502008001694D1 (de) | Mitfahrhubwagen | |
DE602008001674D1 (de) | Wimpernwickler | |
DE112008003094A5 (de) | Geomatte | |
DE602008005589D1 (de) | Rliganden | |
DE502008003063D1 (de) | Magnetventilinjektor |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8139 | Disposal/non-payment of the annual fee |