DE10344538A1 - Verfahren und Vorrichtung zur Schwingungsisolation, insbesondere für Elektronenstrahl-Meßwerkzeuge - Google Patents

Verfahren und Vorrichtung zur Schwingungsisolation, insbesondere für Elektronenstrahl-Meßwerkzeuge Download PDF

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Publication number
DE10344538A1
DE10344538A1 DE10344538A DE10344538A DE10344538A1 DE 10344538 A1 DE10344538 A1 DE 10344538A1 DE 10344538 A DE10344538 A DE 10344538A DE 10344538 A DE10344538 A DE 10344538A DE 10344538 A1 DE10344538 A1 DE 10344538A1
Authority
DE
Germany
Prior art keywords
measuring instrument
sample
mechanical vibrations
vibration isolation
measuring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE10344538A
Other languages
English (en)
Inventor
Peter Heiland
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Integrated Dynamics Engineering GmbH
Original Assignee
Integrated Dynamics Engineering GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Integrated Dynamics Engineering GmbH filed Critical Integrated Dynamics Engineering GmbH
Priority to DE10344538A priority Critical patent/DE10344538A1/de
Priority to EP04019373A priority patent/EP1519400A3/de
Priority to TW093125810A priority patent/TWI265396B/zh
Priority to US10/949,069 priority patent/US7269995B2/en
Priority to JP2004276748A priority patent/JP2005121645A/ja
Priority to KR1020040077369A priority patent/KR100814141B1/ko
Publication of DE10344538A1 publication Critical patent/DE10344538A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/16—Vessels; Containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3476—Testing and control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/0216—Means for avoiding or correcting vibration effects

Landscapes

  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Vibration Prevention Devices (AREA)
  • Electron Beam Exposure (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
  • Measurement Of Radiation (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)

Abstract

Die Erfindung betrifft ein Verfahren und eine Vorrichtung zum Isolieren mechanischer Schwingungen, die auf Strahlmeßinstrumente einwirken. DOLLAR A Es ist eine Aufgabe der vorliegenden Erfindung, eine neue und verbesserte Möglichkeit einer mechanischen Schwingungsisolation von Meßwerkzeugen bereitzustellen, durch welche insbesondere Standardinstrumente mit kleinerer Modifikation sowie auch die Reaktion auf Beschränkungen und spezielle Schwächen von tatsächlichen Instrumenten ermöglicht werden können. DOLLAR A Die Erfindung schlägt die Isolation insbesondere auf akustischem Geräusch beruhender mechanischer Schwingungen, die auf ein Meßwerkzeug einwirken, das eine Außenstruktur zum Unterstützen eines Meßinstrumentes und eines Einspannkopfes zum Halten einer Probe in Bezug auf das Meßinstrument in einer gewünschten definierten Position zum Durchführen von Messungen auf der Probe durch das Meßinstrument aufweist, dahingehend vor, daß ein Versatz der Position als Reaktion auf mechanische Schwingungen detektiert und eine aktive Modifikation der Position des Einspannkopfes als Antwort auf die Detektion bewirkt wird, um einer relativen Verschiebung zwischen der Probe und dem Meßinstrument entgegenzuwirken.
DE10344538A 2003-09-25 2003-09-25 Verfahren und Vorrichtung zur Schwingungsisolation, insbesondere für Elektronenstrahl-Meßwerkzeuge Withdrawn DE10344538A1 (de)

Priority Applications (6)

Application Number Priority Date Filing Date Title
DE10344538A DE10344538A1 (de) 2003-09-25 2003-09-25 Verfahren und Vorrichtung zur Schwingungsisolation, insbesondere für Elektronenstrahl-Meßwerkzeuge
EP04019373A EP1519400A3 (de) 2003-09-25 2004-08-16 Verfahren und Vorrichtung zur Schwingungsisolierung, insbesondere für Elektronenstrahlmetrologie Instrumenten
TW093125810A TWI265396B (en) 2003-09-25 2004-08-27 Method and apparatus of vibration isolation for electron beam metrology tools
US10/949,069 US7269995B2 (en) 2003-09-25 2004-09-24 Method and apparatus of vibration isolation, in particular for electron beam metrology tools
JP2004276748A JP2005121645A (ja) 2003-09-25 2004-09-24 電子ビーム測定ツールのための振動絶縁方法および装置
KR1020040077369A KR100814141B1 (ko) 2003-09-25 2004-09-24 전자 빔 측정 툴을 위한 진동 절연 방법 및 진동 절연 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE10344538A DE10344538A1 (de) 2003-09-25 2003-09-25 Verfahren und Vorrichtung zur Schwingungsisolation, insbesondere für Elektronenstrahl-Meßwerkzeuge

Publications (1)

Publication Number Publication Date
DE10344538A1 true DE10344538A1 (de) 2005-05-12

Family

ID=34177951

Family Applications (1)

Application Number Title Priority Date Filing Date
DE10344538A Withdrawn DE10344538A1 (de) 2003-09-25 2003-09-25 Verfahren und Vorrichtung zur Schwingungsisolation, insbesondere für Elektronenstrahl-Meßwerkzeuge

Country Status (6)

Country Link
US (1) US7269995B2 (de)
EP (1) EP1519400A3 (de)
JP (1) JP2005121645A (de)
KR (1) KR100814141B1 (de)
DE (1) DE10344538A1 (de)
TW (1) TWI265396B (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7387040B2 (en) * 2005-08-19 2008-06-17 Honeywell International Inc. Methods and systems for mounting sensors for use in a harsh vibration environment
US8474782B2 (en) * 2010-04-26 2013-07-02 Baker Hughes Incorporated System and method for effective isolation of an interferometer
US9449805B2 (en) * 2014-09-23 2016-09-20 Agilent Technologies Inc. Isolation of charged particle optics from vacuum chamber deformations
JP6604704B2 (ja) * 2014-12-22 2019-11-13 アプライド マテリアルズ インコーポレイテッド 基板の検査装置、基板の検査方法、大面積基板検査装置、及びその操作方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE29612349U1 (de) * 1996-07-16 1997-11-20 Heiland Peter Aktives Schwingungsdämpfungs- und Schwingungsisolationssystem
DE20102333U1 (de) * 2001-02-09 2001-05-23 Halcyonics Gmbh Schwingungsdämpfungssystem
US6518721B2 (en) * 2000-03-24 2003-02-11 Canon Kabushiki Kaisha Oscillation isolator
US6521891B1 (en) * 1999-09-03 2003-02-18 Applied Materials, Inc. Focusing method and system

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4665313A (en) * 1985-06-28 1987-05-12 International Business Machines Corporation Apparatus and method for displaying hole-electron pair distributions induced by electron bombardment
JPH01284793A (ja) * 1988-05-11 1989-11-16 Canon Inc 基板支持装置
JP2896794B2 (ja) 1988-09-30 1999-05-31 キヤノン株式会社 走査型トンネル電流検出装置，走査型トンネル顕微鏡，及び記録再生装置
US5660255A (en) * 1994-04-04 1997-08-26 Applied Power, Inc. Stiff actuator active vibration isolation system
JPH10288618A (ja) * 1997-04-16 1998-10-27 Seiko Instr Inc 表面分析装置
KR20000070446A (ko) * 1997-11-25 2000-11-25 마에다 시게루 스테이지의 위치결정장치
WO1999030346A1 (en) * 1997-12-11 1999-06-17 Philips Electron Optics B.V. Particle-optical apparatus provided with an acceleration sensor for the compensation of specimen vibrations
KR19990086239A (ko) * 1998-05-26 1999-12-15 윤종용 주사전자현미경을 구비하는 시료분석장치 및 그 구동방법
TW479156B (en) * 1999-01-08 2002-03-11 Asm Lithography Bv Lithographic projection apparatus, method of controlling the position of a moveable table in a lithographic projection apparatus, integrated circuits device manufacturing method, and integrated circuits device made by the manufacturing method
JP2001043562A (ja) * 1999-08-03 2001-02-16 Sony Corp 光情報記録媒体の製造方法及び光情報記録媒体の製造装置
EP1304717A4 (de) 2000-07-27 2009-12-09 Ebara Corp Sheet-beam-testvorrichtung
JP2003217501A (ja) 2002-01-24 2003-07-31 Hirata Corp 位置補正装置及び電子ビーム加工装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE29612349U1 (de) * 1996-07-16 1997-11-20 Heiland Peter Aktives Schwingungsdämpfungs- und Schwingungsisolationssystem
US6521891B1 (en) * 1999-09-03 2003-02-18 Applied Materials, Inc. Focusing method and system
US6518721B2 (en) * 2000-03-24 2003-02-11 Canon Kabushiki Kaisha Oscillation isolator
DE20102333U1 (de) * 2001-02-09 2001-05-23 Halcyonics Gmbh Schwingungsdämpfungssystem

Also Published As

Publication number Publication date
EP1519400A2 (de) 2005-03-30
EP1519400A3 (de) 2007-08-15
JP2005121645A (ja) 2005-05-12
KR100814141B1 (ko) 2008-03-14
US7269995B2 (en) 2007-09-18
TWI265396B (en) 2006-11-01
US20050076725A1 (en) 2005-04-14
TW200532412A (en) 2005-10-01
KR20050030613A (ko) 2005-03-30

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