DD128165A1 - DEVICE FOR COVERING MASKS AND SUBSTRATE DISCS - Google Patents

DEVICE FOR COVERING MASKS AND SUBSTRATE DISCS

Info

Publication number
DD128165A1
DD128165A1 DD19567476A DD19567476A DD128165A1 DD 128165 A1 DD128165 A1 DD 128165A1 DD 19567476 A DD19567476 A DD 19567476A DD 19567476 A DD19567476 A DD 19567476A DD 128165 A1 DD128165 A1 DD 128165A1
Authority
DD
German Democratic Republic
Prior art keywords
substrate discs
covering masks
masks
covering
discs
Prior art date
Application number
DD19567476A
Other languages
German (de)
Other versions
DD128165B1 (en
Inventor
Erhard Jaksch
Original Assignee
Erhard Jaksch
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Erhard Jaksch filed Critical Erhard Jaksch
Priority to DD19567476A priority Critical patent/DD128165B1/en
Priority to DE19772747439 priority patent/DE2747439A1/en
Priority to SU777770029A priority patent/SU911439A1/en
Publication of DD128165A1 publication Critical patent/DD128165A1/en
Priority to FR7733802A priority patent/FR2375631A1/en
Publication of DD128165B1 publication Critical patent/DD128165B1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DD19567476A 1976-11-09 1976-11-09 DEVICE FOR COVERING MASKS AND SUBSTRATE DISCS DD128165B1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
DD19567476A DD128165B1 (en) 1976-11-09 1976-11-09 DEVICE FOR COVERING MASKS AND SUBSTRATE DISCS
DE19772747439 DE2747439A1 (en) 1976-11-09 1977-10-21 DEVICE FOR COVERING MASKS AND SUBSTRATE DISCS
SU777770029A SU911439A1 (en) 1976-11-09 1977-11-02 Device for aligning masks and substrates of microcircuits
FR7733802A FR2375631A1 (en) 1976-11-09 1977-11-09 Aligning device for semiconductor and mask - is mounted on support on table for rapid alignment with successive independent steps in photolithography prodn. unit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD19567476A DD128165B1 (en) 1976-11-09 1976-11-09 DEVICE FOR COVERING MASKS AND SUBSTRATE DISCS

Publications (2)

Publication Number Publication Date
DD128165A1 true DD128165A1 (en) 1977-11-02
DD128165B1 DD128165B1 (en) 1979-12-27

Family

ID=5506232

Family Applications (1)

Application Number Title Priority Date Filing Date
DD19567476A DD128165B1 (en) 1976-11-09 1976-11-09 DEVICE FOR COVERING MASKS AND SUBSTRATE DISCS

Country Status (4)

Country Link
DD (1) DD128165B1 (en)
DE (1) DE2747439A1 (en)
FR (1) FR2375631A1 (en)
SU (1) SU911439A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0111661A3 (en) * 1979-04-03 1984-09-26 Eaton-Optimetrix Inc. Photometric printing apparatus
US4473293A (en) * 1979-04-03 1984-09-25 Optimetrix Corporation Step-and-repeat projection alignment and exposure system
US4573791A (en) * 1979-04-03 1986-03-04 Optimetrix Corporation Step-and-repeat projection alignment and exposure system
US4452526A (en) * 1980-02-29 1984-06-05 Optimetrix Corporation Step-and-repeat projection alignment and exposure system with auxiliary optical unit
RU191704U1 (en) * 2019-06-03 2019-08-19 Открытое Акционерное Общество "Научно-Исследовательский Институт Полупроводникового Машиностроения (Оао "Ниипм") Block for centering semiconductor wafers on a vacuum stage in a photolithography cluster line before carrying out technological operations

Also Published As

Publication number Publication date
DE2747439A1 (en) 1978-06-01
SU911439A1 (en) 1982-03-07
DD128165B1 (en) 1979-12-27
FR2375631A1 (en) 1978-07-21

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