CS170666B1 - - Google Patents
Info
- Publication number
- CS170666B1 CS170666B1 CS5113A CS511374A CS170666B1 CS 170666 B1 CS170666 B1 CS 170666B1 CS 5113 A CS5113 A CS 5113A CS 511374 A CS511374 A CS 511374A CS 170666 B1 CS170666 B1 CS 170666B1
- Authority
- CS
- Czechoslovakia
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CS5113A CS170666B1 (it) | 1974-07-18 | 1974-07-18 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CS5113A CS170666B1 (it) | 1974-07-18 | 1974-07-18 |
Publications (1)
Publication Number | Publication Date |
---|---|
CS170666B1 true CS170666B1 (it) | 1976-09-15 |
Family
ID=5395367
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CS5113A CS170666B1 (it) | 1974-07-18 | 1974-07-18 |
Country Status (1)
Country | Link |
---|---|
CS (1) | CS170666B1 (it) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0226009A2 (en) * | 1985-12-17 | 1987-06-24 | International Business Machines Corporation | Photoresist compositions of controlled dissolution rate in alkaline developers |
-
1974
- 1974-07-18 CS CS5113A patent/CS170666B1/cs unknown
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0226009A2 (en) * | 1985-12-17 | 1987-06-24 | International Business Machines Corporation | Photoresist compositions of controlled dissolution rate in alkaline developers |
EP0226009A3 (en) * | 1985-12-17 | 1988-01-07 | International Business Machines Corporation | Photoresist compositions of controlled dissolution rate in alkaline developers |