CN85100569A - Single source vacuum deposition method of variable refractivity film - Google Patents
Single source vacuum deposition method of variable refractivity film Download PDFInfo
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- CN85100569A CN85100569A CN 85100569 CN85100569A CN85100569A CN 85100569 A CN85100569 A CN 85100569A CN 85100569 CN85100569 CN 85100569 CN 85100569 A CN85100569 A CN 85100569A CN 85100569 A CN85100569 A CN 85100569A
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Abstract
The invention belongs to the preparation method of film.
At present, more about the manufacture method of variable refractive index material (optical fiber, image-forming component, fiber waveguide etc.), chemical method sheerly mostly.Vacuum vapor deposition method and sputtering method can only obtain the homogeneous refractive index film again.The present invention adopts single electron beam evaporation source, carries out vacuum evaporation, obtains the variable refractivity film in substrate, is a kind of physics method.The key that this method obtains the variable refractivity film is the apolegamy technology of coating materials and adopts the heating of electron beam localization.This method is compared with chemical method, has the advantage of the bigger degree of freedom on preparation technology.
Description
The invention belongs to the preparation method of film.
At present, the preparation method of variable refractive index material (optical fiber, imageable element) is more, and chemical vapor deposition method, neutron irradiation method, ion-exchange, crystal growth, ion completion method etc. are arranged.(1) preparation of (2) (3) fiber waveguide has ion implantation, diffusion method or melt-phase epitaxy.(4) chemical method in the preparation of variable refractive index material (film) the employing said method in the majority.Its variable refractivity layer is subjected to mixing and the influence of substrate, can not form independently variable refractivity film.Existing vacuum vapor deposition method and sputtering method can only obtain the homogeneous refractive index film.
The objective of the invention is to propose a kind of new method of widening the variations in refractive index scope, not influenced by base material.
The present invention adopts single electron beam evaporation source, carries out vacuum evaporation, obtains certain thickness variable refractivity film in substrate, is a kind of physics method.The key that obtains the variable refractivity film is the apolegamy technology and the electron beam localization heating evaporation technology of coating materials.Adopt refractive index, the different coating materials of fusing point, mix, be hot pressed into cylinder piece material with certain proportion.In order to obtain the variable refractivity film, the garden cylindricality piece material to compression moulding uses the electron beam of certain area of beam to carry out the localization heating evaporation, and electron beam to from top to bottom, makes material heating evaporation gradually along the garden axis of a cylinder.Then, deposition forms the variable refractivity film in substrate.Mix the variable refractivity film that coating materials prepares according to difference, carry out Ageing Treatment.
The present invention compares with existing method has following advantage: (1) widens the variations in refractive index scope of film; (2) not limited by base material, in any substrate, form independently variable refractivity film; (3) technology is simple, manufacturing cycle is short; (4) Zhi Bei plane variable refractivity film looks optical axis direction can obtain respectively axially or variable refractivity characteristic radially.
The variable refractivity film of the present invention's preparation is applicable to the optical element in micro-optical component or the optics integrated package.For example, variable refractivity lens, optical coupler, fiber waveguide etc. substitute the homogeneous refractive index film with the variable refractivity film, can obtain special superior performance.
Fig. 1. variable refractivity film list source vacuum deposition method schematic diagram
1-cylinder piece material; 2-E type electron gun;
The 3-localization adds thermionic electron beam; The 4-deposition substrate.
The present invention can take following mode to implement: according to the refraction index profile of optical integrating element needs, and apolegamy coating materials briquet.The selection of refractive index has determined film refractive index contrast (△ n), △ n=0.01～0.2; The fusing point of coating materials is selected to have determined change of refractive trend, and is influenced the size of refractive index contrast.The fusing point difference range of two kinds of mixing coating materials is 500 ℃～1000 ℃; The mixed proportion of different coating materials influences the pace of change of film refractive index, and the mixed proportion of mixing coating materials is 1: 1～1: 0.5; Mix coating materials and can adopt the metal oxide that satisfies the vacuum evaporation condition, rare earth oxide, minority sulfide and fluoride; The hot fractionation effect of coating materials is decided by the size and the evaporating temperature of different coating materials fusing points.According to the column piece material of compacting, select the electron beam of certain area of beam to carry out the localization heating, electron beam can only not allow laterally to move along cylinder axis with heating evaporation from top to bottom; The axial heating evaporation speed of electron beam and the character that evaporating temperature is decided by to mix coating materials.The area of beam of electron beam should adjustable (4～8 square millimeters), and the heating-up temperature of electron beam is adjustable in 1000 ℃～2500 ℃ scopes.Determine the Ageing Treatment parameter of film: appropriate atmosphere (vacuum, atmosphere) condition, maximum temperature, the constant temperature time of selecting Ageing Treatment.Its objective is reduction stress, the mechanical strength of reinforcing membrane; Improve the structure of film, improve the stability of film; Reduce the wastage.
Embodiment: adopt 1: 1 (ZrO
2-TiO
2) mix the coating materials briquet, the employing area of beam is that 6mm, heating-up temperature are that 2000 ℃ electron beam carries out heating evaporation, the refractive index contrast that obtains film is △ n=0.1.
Documents:
(Jen Shanxi, 1 〕 Island field
, Guang Tong Xin Ji Intraoperative Reading basis, 1980
〔2〕Duncan T.Moore，Appl.Optics，vol.19，NO7，1980
(3 〕 Xi swamp Run one, オ Off ト ェ レ Network ト ロ ニ Network ス,, 1971
〔4〕P.K.Tien，Integrated Optics and New Wave Phenomena in Optical Waveguides，1977
Claims (6)
1, the preparation method of electron beam evaporation film.Feature of the present invention is to adopt single electron beam evaporation source, utilizes the electron beam of certain area of beam, and the cylinder piece material of selecting for use the compacting of different refractivity material mixing to form is carried out the localization evaporation, makes the variable refractivity film.
2, according to the method for claim 1, the area of beam that it is characterized in that electron beam is 4～8(mm)
2
3,, it is characterized in that heating-up temperature that electron beam can produce is 1000 ℃～2500 ℃ scopes according to the method for claim 1.
4,, it is characterized in that the hot path that adds of electron beam is to move from top to bottom along cylinder axis according to the method for claim 1.
5,, it is characterized in that mixing the mixed proportion 1: 1～1: 0.5 of coating materials according to the method for claim 1.
6, according to the method for claim 1, the fusing point difference range that it is characterized in that two kinds of mixing coating materials is 500 ℃～1000 ℃.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN85100569A CN85100569B (en) | 1985-04-01 | 1985-04-01 | Single source vacuum deposit method to make vario-refraction-index film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN85100569A CN85100569B (en) | 1985-04-01 | 1985-04-01 | Single source vacuum deposit method to make vario-refraction-index film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN85100569A true CN85100569A (en) | 1986-07-02 |
| CN85100569B CN85100569B (en) | 1988-06-01 |
Family
ID=4791269
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN85100569A Expired CN85100569B (en) | 1985-04-01 | 1985-04-01 | Single source vacuum deposit method to make vario-refraction-index film |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN85100569B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110718762A (en) * | 2019-09-17 | 2020-01-21 | 东南大学 | Single-beam 1-bit super surface excited by plane wave vertical incidence |
| CN110735121A (en) * | 2019-11-21 | 2020-01-31 | 江苏北方湖光光电有限公司 | method for preparing unconventional refractive index mixed film based on magnetron sputtering |
-
1985
- 1985-04-01 CN CN85100569A patent/CN85100569B/en not_active Expired
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110718762A (en) * | 2019-09-17 | 2020-01-21 | 东南大学 | Single-beam 1-bit super surface excited by plane wave vertical incidence |
| CN110735121A (en) * | 2019-11-21 | 2020-01-31 | 江苏北方湖光光电有限公司 | method for preparing unconventional refractive index mixed film based on magnetron sputtering |
| CN110735121B (en) * | 2019-11-21 | 2022-03-29 | 江苏北方湖光光电有限公司 | Preparation method of unconventional refractive index mixed film based on magnetron sputtering |
Also Published As
| Publication number | Publication date |
|---|---|
| CN85100569B (en) | 1988-06-01 |
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