CN2788350Y - Diffuser frame - Google Patents
Diffuser frame Download PDFInfo
- Publication number
- CN2788350Y CN2788350Y CN 200520002794 CN200520002794U CN2788350Y CN 2788350 Y CN2788350 Y CN 2788350Y CN 200520002794 CN200520002794 CN 200520002794 CN 200520002794 U CN200520002794 U CN 200520002794U CN 2788350 Y CN2788350 Y CN 2788350Y
- Authority
- CN
- China
- Prior art keywords
- diffuser
- frame
- cavity
- frame body
- utility
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000463 material Substances 0.000 claims abstract description 6
- 238000000034 method Methods 0.000 claims description 31
- 230000008021 deposition Effects 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 5
- 238000002048 anodisation reaction Methods 0.000 claims description 5
- 238000007789 sealing Methods 0.000 claims description 3
- 238000000151 deposition Methods 0.000 abstract description 10
- 239000000758 substrate Substances 0.000 description 21
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 19
- 238000009792 diffusion process Methods 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 210000002381 plasma Anatomy 0.000 description 3
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 3
- 230000002277 temperature effect Effects 0.000 description 3
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910010293 ceramic material Inorganic materials 0.000 description 2
- 239000003792 electrolyte Substances 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- NHDHVHZZCFYRSB-UHFFFAOYSA-N pyriproxyfen Chemical compound C=1C=CC=NC=1OC(C)COC(C=C1)=CC=C1OC1=CC=CC=C1 NHDHVHZZCFYRSB-UHFFFAOYSA-N 0.000 description 2
- 238000000427 thin-film deposition Methods 0.000 description 2
- 241000208340 Araliaceae Species 0.000 description 1
- 235000005035 Panax pseudoginseng ssp. pseudoginseng Nutrition 0.000 description 1
- 235000003140 Panax quinquefolius Nutrition 0.000 description 1
- 229910004205 SiNX Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000003670 easy-to-clean Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229920002313 fluoropolymer Polymers 0.000 description 1
- 239000004811 fluoropolymer Substances 0.000 description 1
- 235000008434 ginseng Nutrition 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000001947 vapour-phase growth Methods 0.000 description 1
Abstract
The utility model relates to a diffuser frame which is used for a diffuser in a depositing cavity, wherein the depositing cavity carries out depositing preparation on base materials, and the diffuser diffuses prepared gas into the depositing cavity and forms a plurality of pin holes on the circumference of the diffuser, the utility model is characterized in that the diffuser frame is provided with a frame body forming a rectangular closed shape, the frame body is provided with a frame opening with the length of at least 1550 millimeters and the width of at least 1350 millimeters, a plurality of holes corresponding to pin holes of the diffuser are formed on the frame body and the surface of the frame body is carried out with anodized treatment.
Description
Technical field
The utility model relates to a kind of diffuser frame, especially a kind of diffuser in the deposit cavity and the diffuser frame that can conveniently install and clean of being used for.
Background technology
In the processing procedure of flat-panel screens,, therefore in processing procedure, need to plate different materials, such as SiO owing to need on glass substrate, make transistor component
2, film such as SiNx, a-Si and n+a-Si.Present many using plasmas assistant chemical vapor phase deposition system (PECVD, Plasma Enhanced Chemical VaporDeposition) grows up.PECVD is in a vacuum system, after feeding process gas, activate its reaction, and quicken processing procedure speed because of the process gas ion after dissociating can utilize electric field etc. to make it have directivity with a plasma board activated plasma, the process gas that dissociates.
Be used for this kind deposition manufacture process deposit cavity 10 structure as shown in Figure 4, this deposit cavity 10 is hedged off from the outer world to form reaction compartment.This deposit cavity 10 comprises a loam cake 12 and a cavity 14.One O type ring 16 is to be arranged between this loam cake 12 and the cavity 14, so that present airtight state between the deposit cavity 10 and the external world.
This loam cake 12 is to be hedged off from the outer world by cavity lid 22.Be horizontally arranged with backer board (Backing Plate) 34 and one diffuser (Diffuser) 30 in this cavity lid 22.
Process gas is arranged on the outer process gas source of deposit cavity 10 via a gas line 71 with one, again via a gas access 70, and passes through the centre of backer board 34, and in the injected space of going under this backer board 34.After this injected process gas can be positioned at the dividing plate (not shown) diffusion of these backer board 34 belows via one earlier, and below dividing plate and backer board 34, via on diffuser 30, profile is a shower nozzle dull and stereotyped and the many apertures 32 of formation it on and sprayed to the upper surface of a substrate (S), and this substrate (S) is to be configured on the pedestal (susceptor) 60.
One radio frequency (radio frequency) power supply 80 is to be connected to this backer board 34 and diffuser 30, and the process gas that excites injected process gas and activate this diffuser 30 of flowing through is provided, thereby is deposited as film on substrate (S).That is this backer board 34 and diffuser 30 are as a upper electrode.
The side system of cavity 14 covers 22 with the cavity of loam cake 12 and combines, and as above-mentioned, O type ring 16 is to be arranged between this loam cake 12 and the cavity 14.Pedestal 60 is provided in a side of in this cavity 14.Pedestal 60 is apart from diffuser 30 1 segment distances, and towards diffuser 30, and substrate (S) is the upper surface that is placed on this pedestal 60.Be provided with a heater 62 in this pedestal 60, be used for the substrate (S) that is placed on this pedestal 60 is heated to a suitable temperature, in deposition manufacture process, to carry out thin film deposition.Simultaneously, pedestal 60 is grounded, thereby as a below electrode.In order to prevent that the processing procedure material is deposited over the periphery of substrate (S), one hides frame (Shadow Frame) 64 is configured on this pedestal 60, and hides the periphery of substrate (S).
These cavity 14 bottom sides, pedestal 60 belows form an outlet 52, with after finishing deposition manufacture process, process gas system are detached to the external world.
As shown in the figure, as top electrode, and be to mutually combine, and be electrically connected to each other via the bolt 42 that is arranged on the edge with diffuser 30 and the backer board 34 that process gas is injected into substrate (S) upper surface.A plurality of insulating parts 44,46,48 are to be arranged between the peripheral part and cavity lid 22 that diffuser 30 and backer board 34 mutually combine, and so that cavity lid 22 and diffuser 30 and backer board 34 are electrically insulated each other, and keep vacuum state in the deposit cavity 10.
In the above-mentioned insulating part 44,46,48, insulating part 46 is frameworks that a ceramic material is made, and is fixed to cavity by the mode that fixes and covers 22 peripheries.Because cavity lid 22 generally is to be made by aluminum metal, thus may be subjected to the heat energy that is produced by pedestal 60 and be positioned at the substrate (S) on the pedestal 60 heat energy influence and expand.Especially for making the deposit cavity of large substrate, thereby the increasing change in volume when being subjected to temperature effect, insulating part 46 may be increased from cavity lid 22 possibilities of unclamping.
Summary of the invention
In order to unclamp from the cavity lid because of cavity lid is subjected to temperature effect insulating part in season preventing, the utility model provides a kind of diffuser frame, especially a kind of diffuser that is applicable in the deposit cavity of making large substrate, and the diffuser frame that can conveniently install and clean can further fix insulating part between cavity lid and diffuser.
The technical scheme that its technical problem that solves the utility model adopts is, a kind of diffuser frame, be used for the diffuser in the deposit cavity, this deposit cavity carries out deposition manufacture process on base material, this diffuser diffuses to process gas in this deposit cavity and at its periphery and forms several keyholes, it is characterized in that having: the frame body of a rectangular sealing profile, have at least 1550 millimeters long, at least 1350 millimeters wide frame openings, keyhole place at corresponding diffuser on this frame body forms several holes, and the aluminum metal that this framework system handles (anodized) by the surface through anodization is made.
According to the utility model, this frame body has at least 20 millimeters frame wall thickness along the direction of length and width.
According to the utility model, this diffuser frame system is fixed to the periphery of this diffuser by bolt.
The beneficial effects of the utility model are that owing to be the periphery that a diffuser frame is fixed to diffuser, the periphery of self-diffusion device extends to the cavity lid, so can further insulating part be fixed between cavity lid and diffuser.
Description of drawings
Below in conjunction with drawings and Examples the utility model is further specified.
Fig. 1 is the generalized section of utilization deposit cavity of the present utility model.
Fig. 2 is the exploded perspective view of the loam cake among Fig. 1.
Fig. 3 is the zoomed-in view of the part A among Fig. 1.
Fig. 4 is the generalized section of a known deposit cavity.
Embodiment
Fig. 1 is the generalized section of utilization deposit cavity 100 of the present utility model.As shown in Figure 1, this deposit cavity 100 is hedged off from the outer world to form reaction compartment.This deposit cavity 100 comprises a loam cake 112 and a cavity 114.One O type ring 116 is to be arranged between this loam cake 112 and the cavity 114, so that present airtight state between the deposit cavity 100 and the external world.
This loam cake 112 is to be hedged off from the outer world by cavity lid 122.Be horizontally arranged with a backer board 134 and a diffuser 130 in this cavity lid 122.
Process gas is arranged on the outer process gas source of deposit cavity 100 via a gas line 171 with one, again via a gas access 170, and passes through the centre of backer board 134, and in the injected space of going under this backer board 134.After this injected process gas can be positioned at the dividing plate (not shown) diffusion of these backer board 134 belows via one earlier, and below dividing plate and backer board 134, via on diffuser 130, profile is a shower nozzle dull and stereotyped and the many apertures 132 of formation it on and sprayed to the upper surface of a substrate (S), and this substrate (S) is to be configured on the pedestal 160.
One radio frequency (radio frequency) power supply 180 is to be connected to this backer board 134 and diffuser 130, and the process gas that excites injected process gas and activate this diffuser 130 of flowing through is provided, thereby is deposited as film on substrate (S).That is this backer board 134 and diffuser 130 are as a upper electrode.
As shown in Figure 1, the side of cavity 114 system covers 122 with the cavity of loam cake 112 and combines, and as above-mentioned, O type ring 116 (Fig. 3) is to be arranged between this loam cake 112 and the cavity 114.Pedestal 160 is provided in a side of in this cavity 114.Pedestal 160 is apart from diffuser 130 1 segment distances, and towards diffuser 130, and substrate (S) is the upper surface that is placed on this pedestal 160.Be provided with a heater 162 in this pedestal 160, be used for the substrate (S) that is placed on this pedestal 160 is heated to a suitable temperature, in deposition manufacture process, to carry out thin film deposition.Simultaneously, pedestal 160 is grounded, thereby as a below electrode.In order to prevent that the processing procedure material is deposited over the periphery of substrate (S), one hides frame (ShadowFrame) 164 is configured on this pedestal 160, and hides the periphery of substrate (S).
Form a top on this cavity lid 122 and detach outlet 152,, process gas system is detached to the external world with after finishing deposition manufacture process.
Fig. 2 is the exploded perspective view of the loam cake 112 among Fig. 1.Fig. 3 is the zoomed-in view of the part A among Fig. 1.As shown in Figure 3, as top electrode, and diffuser 130 and the backer board 134 that process gas is injected into substrate (S) upper surface mutually combined, and be electrically connected to each other.A plurality of insulating parts 144,146,148 are to be arranged between the peripheral part and cavity lid 122 that diffuser 130 and backer board 134 mutually combine, so that cavity lid 122 and diffuser 130 and backer board 134 are electrically insulated each other, and keep vacuum state in the deposit cavity 100.
In the above-mentioned insulating part 144,146,148, insulating part 144,148 all is by the made framework of fluoropolymer, and insulating part 146 is frameworks of being made by ceramic material, is fixed to cavity by the mode that fixes and covers 122 peripheries.
With reference to figure 2 and Fig. 3, in order to unclamp from cavity lid 122 because of cavity lid 122 is subjected to temperature effect insulating part 146 in season preventing, the utility model provides a kind of diffuser frame 200, is fixed to this diffuser 130, and these diffuser 130 peripheries form several keyholes 131.
According to the utility model, this diffuser frame 200 has the frame body 202 of a rectangular sealing profile, it is the frame openings of at least 1550 millimeters long (L) and at least 1350 millimeters wide (W), and these frame body 202 preferable directions along length and width respectively have at least 20 millimeters frame wall thickness (T) (ginseng Fig. 3).Keyhole 131 places at corresponding diffuser 130 on this frame body 202 form several holes 210, by this, can be the hole 131 that is fixed to the periphery of this diffuser 130 by several bolts 205 with this diffuser frame 200, frame body 202 is extended to cavity lid 122 to the periphery of diffuser 130, thereby a plurality of insulating parts 144,146,148 are arranged between the peripheral part and cavity lid 122 that diffuser 130 and backer board 134 mutually combine securely, as person illustrated in Fig. 2.
In order to strengthen anti-corrosion, insulation, antistatic and characteristic easy to clean, the diffuser frame 200 in the utility model is to be made through the aluminum metal of anodization processing (anodized) by the surface.That is, frame body 202 is inserted in the electrolyte through cleaning and after etching (etching), with electric current this electrolyte of flowing through, to form an oxide layer on the frame body surface, this is to have the knack of the known person of skill personage that anodization is handled.
Only owing to coming off easily after using in the frequent phase through the aluminum metal surface of anodization processing (anodized) or destroying, thereby need regularly replace diffuser frame 200, in the utility model, can be by the bolt 205 convenient diffuser frames 200 of removing and more renewing.
By above-mentioned utility model embodiment as can be known, the beneficial effects of the utility model are, owing to be the periphery that a diffuser frame is fixed to diffuser, the periphery of self-diffusion device extends to the cavity lid, even so handle in the deposit cavity of large substrate, this diffuser frame can further fix insulating part between cavity lid and diffuser also convenient periodic replacement.
Though the utility model discloses as above with preferred embodiment; right its is not in order to limit utility model; anyly have the knack of this skill person; in the spirit and scope that do not break away from utility model; when can being used for a variety of modifications and variations, so the protection range of utility model is when being as the criterion according to claims person of defining.
Claims (3)
1. a diffuser frame is used for the diffuser in the deposit cavity, and this deposit cavity carries out deposition manufacture process on base material, and this diffuser diffuses to process gas in this deposit cavity and at its periphery and forms several keyholes, it is characterized in that having:
The frame body of one rectangular sealing profile, have at least 1550 millimeters long frame openings that reach at least 1350 millimeters wide, keyhole place at corresponding diffuser on this frame body forms several holes, and the aluminum metal that this frame body system is handled through anodization by the surface is made.
2. diffuser frame according to claim 1 is characterized in that: this frame body has at least 20 millimeters frame wall thickness along the direction of length and width.
3. diffuser frame according to claim 1 is characterized in that: this frame body system is fixed to the periphery of this diffuser by bolt.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200520002794 CN2788350Y (en) | 2005-03-18 | 2005-03-18 | Diffuser frame |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200520002794 CN2788350Y (en) | 2005-03-18 | 2005-03-18 | Diffuser frame |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN2788350Y true CN2788350Y (en) | 2006-06-14 |
Family
ID=36786646
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200520002794 Expired - Lifetime CN2788350Y (en) | 2005-03-18 | 2005-03-18 | Diffuser frame |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN2788350Y (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101655315B (en) * | 2008-08-22 | 2011-10-12 | 三星移动显示器株式会社 | Inner plate and crucible assembly for deposition having the same |
| CN102918180A (en) * | 2010-05-21 | 2013-02-06 | 应用材料公司 | Tightly fitted ceramic insulator on large area electrode |
-
2005
- 2005-03-18 CN CN 200520002794 patent/CN2788350Y/en not_active Expired - Lifetime
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101655315B (en) * | 2008-08-22 | 2011-10-12 | 三星移动显示器株式会社 | Inner plate and crucible assembly for deposition having the same |
| US8137470B2 (en) | 2008-08-22 | 2012-03-20 | Samsung Mobile Display Co., Ltd. | Inner plate and crucible assembly for deposition having the same |
| CN102918180A (en) * | 2010-05-21 | 2013-02-06 | 应用材料公司 | Tightly fitted ceramic insulator on large area electrode |
| CN102918180B (en) * | 2010-05-21 | 2014-12-17 | 应用材料公司 | Tightly fitted ceramic insulator on large area electrode |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C56 | Change in the name or address of the patentee | ||
| CP01 | Change in the name or title of a patent holder |
Address after: American California Patentee after: Applied Materials Inc. Address before: American California Patentee before: Applied Materials Inc. |
|
| C17 | Cessation of patent right | ||
| CX01 | Expiry of patent term |
Expiration termination date: 20150318 Granted publication date: 20060614 |