CN220040927U - Electrochromic device, electrochromic device and end product - Google Patents

Abstract

The application provides an electrochromic device, a color-changing device and a terminal product, relates to the technical field of electronic products, and is used for solving the technical problem that an edge area of the electrochromic device, which is close to a bus, fails in advance. The electrochromic device includes an electrochromic stack layer, a bus bar, and two conductive layers; in the thickness direction of the electrochromic stack layer, two conductive layers are respectively arranged at two sides of the electrochromic stack layer; a bus bar is disposed between the conductive layer and the electrochromic stack layer; the area of at least one conductive layer corresponding to the bus bar is provided with a concave part and/or a convex part, wherein the concave part at least partially penetrates through the conductive layer along the thickness direction of the conductive layer; the protrusion is disposed between the conductive layer and the bus bar and is configured to block contact of the conductive layer with the bus bar. The application can prolong the service life of the electrochromic device.

Description

Electrochromic device, electrochromic device and end product

Technical Field

The embodiment of the application relates to the technical field of electrochromic, in particular to an electrochromic device, a electrochromic device and a terminal product.

Background

Electrochromic refers to a phenomenon that optical properties (reflectivity, transmittance, absorptivity, etc.) of a material undergo a stable and reversible color change under the action of an applied electric field, and is represented by a reversible change in color and transparency in appearance.

The electrochromic device in the prior art is generally provided with a bus bar at an edge area of the electrochromic device, and is connected with an external power supply through the bus bar to supply power to the electrochromic device. However, in the current charging and discharging process of the electrochromic device, the conductive layer close to the bus is aged in advance, so that the edge area of the electrochromic device cannot reach the preset transmittance and fails in advance.

Disclosure of Invention

In view of the above problems, the embodiment of the utility model provides an electrochromic device, a color changing device and a terminal product, solves the technical problem that an area of the electrochromic device close to a bus fails in advance in the prior art, and has the advantage of prolonging the service life of the electrochromic device.

In order to achieve the above object, the embodiment of the present utility model provides the following technical solutions:

a first aspect of an embodiment of the utility model provides an electrochromic device, an electrochromic stack layer, a bus bar, and two conductive layers; in the thickness direction of the electrochromic stack layer, two conductive layers are respectively arranged at two sides of the electrochromic stack layer; the bus bar is arranged between the conductive layer and the electrochromic stack layer;

at least one region of the conductive layer corresponding to the bus bar is provided with a concave part and/or a convex part, wherein the concave part at least partially penetrates through the conductive layer along the thickness direction of the conductive layer; the protrusion is disposed between the conductive layer and the bus bar and is configured to block the conductive layer from contacting the bus bar.

In one possible implementation manner, a plurality of concave portions are provided, and a plurality of concave portions are arranged at intervals along the attaching direction of the bus bar.

In one possible implementation, the recess includes a first etched groove that penetrates the conductive layer in a thickness direction of the conductive layer.

In one possible implementation manner, the first etching groove includes a first sub etching groove and a second sub etching groove, an extending direction of the first sub etching groove intersects with an extending direction of the second sub etching groove, one end of the first sub etching groove is connected with one end of the second sub etching groove, and the other end of the first sub etching groove is arranged at intervals with the other end of the second sub etching groove.

In one possible implementation manner, the first etching groove further comprises a third sub etching groove and a fourth sub etching groove, the third sub etching groove is arranged between the first sub etching groove and the second sub etching groove, and two ends of the third sub etching groove are respectively connected with one end of the first sub etching groove and one end of the second sub etching groove; the fourth sub-etching groove is arranged between the first sub-etching groove and the second sub-etching groove, and two ends of the fourth sub-etching groove are respectively connected with the other end of the first sub-etching groove and the other end of the second sub-etching groove.

In one possible implementation, the electrochromic device further includes a wire disposed between adjacent ones of the recesses, and the wire extends toward a central region of the conductive layer.

In one possible implementation, the protrusion includes an insulating layer disposed between the conductive layer and the bus bar.

In one possible implementation, the protrusion further includes a reinforcing layer disposed between the conductive layer and the bus bar at a spacing from the insulating layer; or the reinforcing layer is arranged between the conductive layer and the insulating layer

A second aspect of an embodiment of the present application provides a color-changing device, including a substrate layer and the electrochromic device of the first aspect stacked with the substrate layer.

A third aspect of an embodiment of the present application provides an end product, including the electrochromic device of the first aspect, or including the color changing device of the second aspect, where the end product includes any one of a rearview mirror, a curtain wall, a sunroof, a side window of an automobile, a windshield of an automobile, a housing of an electronic product, glasses, a vehicle, and a display panel.

In the electrochromic device, the electrochromic device and the terminal product provided by the embodiment of the application, the concave part and/or the convex part are/is arranged on the area of the conductive layer corresponding to the bus bar. The concave part penetrates through at least part of the conductive layer along the thickness direction of the conductive layer, when the concave part penetrates through part of the conductive layer, namely, the thickness of the conductive layer is reduced, the local resistance of the conductive layer is increased, or when the concave part penetrates through all the conductive layer, namely, the effective contact area of the bus bar and the conductive layer is reduced, and then the area of the bus bar for conducting current to the conductive layer is reduced, so that the area, close to the bus bar, of the electrochromic device is not overcharged or overdischarged in the charging and discharging process, and the area, close to the bus bar, of the conductive layer is effectively reduced or even avoided, which is close to the bus bar, is aged and invalid in advance.

In addition, the protruding part is arranged between the conducting layer and the bus bar and is configured to block the conducting layer from contacting the bus bar, so that the contact area of the bus bar and the conducting layer can be reduced, which is equivalent to reducing the conduction area of the bus bar and the conducting layer, reducing the area of the bus bar conducting current to the conducting layer, and preventing the area close to the bus bar from being overcharged and overdischarged in the charging and discharging process of the electrochromic device, thereby effectively reducing or even avoiding the risk of premature aging failure of the corresponding area of the conducting layer and the bus bar.

In addition to the technical problems, technical features constituting the technical solutions, and beneficial effects caused by the technical features of the technical solutions described above, the electrochromic device, and the terminal product provided in the embodiments of the present application solve other technical problems, other technical features included in the technical solutions, and beneficial effects caused by the technical features, which are described in detail in the detailed description of the embodiments.

Drawings

In order to more clearly illustrate the embodiments of the present application or the technical solutions of the prior art, the following description will briefly explain the drawings used in the embodiments or the description of the prior art, and it is obvious that the drawings in the following description are some embodiments of the present application, and other drawings can be obtained according to these drawings without inventive effort for a person skilled in the art.

Fig. 1 is a top view of an electrochromic device provided in the related art;

FIG. 2 is a cross-sectional view taken along the direction M-M in FIG. 1;

fig. 3 is a cross-sectional view of an electrochromic device provided in an embodiment of the application;

FIG. 4 is a diagram showing a first etched trench on a conductive layer according to an embodiment of the present application;

FIG. 5 is an enlarged schematic view of the N region in FIG. 4;

FIG. 6 is a schematic diagram showing a first partial pattern of a first etching trench on a conductive layer according to an embodiment of the present application;

FIG. 7 is a partial cross-sectional view of a first substrate layer and a conductive layer provided in accordance with an embodiment of the present application;

FIG. 8 is a partial cross-sectional view of a second embodiment of the present application of a first substrate layer and a conductive layer;

FIG. 9 is a second partial pattern of a first etch trench on a conductive layer according to an embodiment of the present application;

fig. 10 is a partial cross-sectional view of an electrochromic device provided by an embodiment of the application;

fig. 11 to 13 are top views of electrochromic devices provided in embodiments of the present application;

fig. 14 to 20 are diagrams showing a first etching groove on a conductive layer according to an embodiment of the present application;

fig. 21 to 24 are graphs showing distribution patterns of a first etching groove and a second etching groove on a conductive layer according to an embodiment of the present application;

FIG. 25 is a diagram showing a first etched trench and a conductive line on a conductive layer according to an embodiment of the present application;

FIG. 26 is an enlarged schematic view of area C of FIG. 25;

fig. 27 is a diagram showing the distribution patterns of the first etching groove, the third etching groove and the conductive line on the conductive layer according to the embodiment of the present application;

fig. 28 is a second cross-sectional view of an electrochromic device provided by an embodiment of the application;

Fig. 29 to fig. 34 are diagrams showing an insulating layer on a conductive layer according to an embodiment of the present application;

fig. 35 is a partial cross-sectional view of a fourth embodiment of an electrochromic device provided by the present application;

FIG. 36 is a diagram showing the pattern of an insulating layer and a reinforcing layer on a conductive layer according to an embodiment of the present application;

FIG. 37 is a diagram showing a pattern of a high-resistance layer on a conductive layer according to an embodiment of the present application;

fig. 38 is a third cross-sectional view of an electrochromic device provided by an embodiment of the application.

Reference numerals illustrate:

1: a bus; 2: a first conductive layer; 3: a second conductive layer; 4: electrochromic stack layers;

100: a conductive layer; 110: a projection area; 112: a second region; 113: a third region; 114: an effective contact area; 120: a central region; 130: a first etching groove; 131: a first sub-etched trench; 132: a second sub-etching groove; 133: a third sub-etching groove; 134: a fourth sub-etching groove; 135: a fifth sub-etching groove; 140: a second etching groove; 150: a third etching groove;

200: a bus bar;

300: electrochromic stack layers;

400: a first substrate layer;

500: a second substrate layer;

600: an insulating layer;

610: an insulating strip;

700: a wire;

800: a reinforcing layer;

900: a high resistance layer.

Detailed Description

As described in the background art, the electrochromic device in the related art has a problem that a part of the region is aged and failed in advance. Referring to fig. 1 and 2, the inventor has found that the reason for this problem is that the bus bar 1 is typically arranged at an edge region of the electrochromic device, and the electrochromic device is powered by the bus bar, e.g. the bus bar 1 is arranged at an edge region of the first and/or second conductive layer 3 facing the electrochromic stack layer 4. In view of the fact that the material of the bus bar 1 is generally smaller in resistance and higher in conductivity, and the opposite surfaces of the bus bar 1 and the first conductive layer 2 and/or the second conductive layer 3 are all in contact and fit, the area resistance of the bus bar 1 corresponding to the first conductive layer 2 and/or the second conductive layer 3 is smaller than that of other areas, and therefore the effective voltage of the edge area of the electrochromic device is larger than that of the central area. In the long-term charge and discharge process, the area of the first conductive layer 2 and/or the second conductive layer 3 corresponding to the bus bar 1 has the defect of overcharge and overdischarge, so that the edge area of the first conductive layer 2 and/or the second conductive layer 3 corresponding to the bus bar 1 is aged and disabled in advance, and the edge area of the electrochromic device cannot reach the preset transmittance to be disabled in advance. In fig. 1, only one bus bar 1 can be seen, but for convenience, the installation position of two bus bars 1 is shown in fig. 1 by a broken line, and the position of the other bus bar 1 is shown in fig. 1.

Aiming at the technical problems, the embodiment of the application provides an electrochromic device, a color changing device and a terminal product, wherein a concave part and/or a convex part are/is arranged on a region of a conductive layer corresponding to a bus bar. The concave part penetrates through at least part of the conductive layer along the thickness direction of the conductive layer, when the concave part penetrates through part of the conductive layer, namely, the thickness of the conductive layer is reduced, the local resistance of the conductive layer is increased, or when the concave part penetrates through all the conductive layer, namely, the effective contact area of the bus bar and the conductive layer is reduced, and then the area of the bus bar for conducting current to the conductive layer is reduced, so that the area, close to the bus bar, of the electrochromic device is not overcharged or overdischarged in the charging and discharging process, and the area, close to the bus bar, of the conductive layer is effectively reduced or even avoided, which is close to the bus bar, is aged and invalid in advance.

In addition, the protruding part is arranged between the conducting layer and the bus bar and is configured to block the conducting layer from contacting the bus bar, so that the contact area of the bus bar and the conducting layer can be reduced, which is equivalent to reducing the conduction area of the bus bar and the conducting layer, reducing the current conducting area of the bus bar to the conducting layer, and preventing the area close to the bus bar from being overcharged and overdischarged in the charging and discharging process of the electrochromic device, thereby effectively reducing the current conducting area of the bus bar to the conducting layer, and effectively reducing or even avoiding the advanced aging failure risk of the corresponding area of the conducting layer and the bus bar.

In order to make the above objects, features and advantages of the embodiments of the present application more comprehensible, the technical solutions of the embodiments of the present application will be described clearly and completely with reference to the accompanying drawings. It will be apparent that the described embodiments are only some, but not all, embodiments of the application. All other embodiments, which can be made by those skilled in the art based on the embodiments of the application without making any inventive effort, are intended to be within the scope of the application.

The embodiment of the application provides an electrochromic device, which is applied to electronic equipment. For example, electrochromic devices are applied to curtain wall glass, anti-glare rearview mirrors, vehicle-mounted dimming skylights/backdrop/side windows, and the like.

Referring to fig. 3, the electrochromic device includes an electrochromic stack layer 300 and two conductive layers 100, wherein the two conductive layers 100 are disposed at both sides of the electrochromic stack layer 300 in a thickness direction. Taking the orientation shown in fig. 3 as an example, one of the conductive layers 100 is located on the upper surface of the electrochromic stack 300 and the other conductive layer 100 is located on the lower surface of the electrochromic stack. Wherein the electrochromic stack 300 includes an electrochromic layer, an electrolyte layer, and an ion storage layer, which are sequentially stacked.

The materials of the conductive layer 100 may each include transparent conductive oxide material, for example, indium Tin Oxide (ITO); alternatively, the reflective conductive material having a specular effect, for example, includes chromium (Cr) or nickel (Ni). When a voltage is applied to each of the two conductive layers 100, the electrochromic layers in the electrochromic stack 300 undergo a reversible, stable color change in response to the change in voltage.

It should be noted that the electrochromic device further includes a first substrate layer 400 and a second substrate layer 500. The first substrate layer 400 is disposed on a side of one of the conductive layers 100 facing away from the electrochromic stack 300 for providing support and protection to that conductive layer 100. The second substrate layer 500 is disposed on a side of the other conductive layer 100 facing away from the electrochromic stack 300 for providing support and protection to the conductive layer 100.

Referring to fig. 3, 6 and 7, the electrochromic device further includes a bus bar 200, the bus bar 200 being disposed between the conductive layer 100 and the electrochromic stack 300. The bus bar 200 is used to connect an external power source and the conductive layer, and to supply voltage to the conductive layer 100. The bus bar 200 may be made of conductive materials such as silver and copper foil. In the present embodiment, the bus bar 200 may be disposed in various ways, for example, the bus bar 200 may be disposed between the conductive layer 100 and the electrochromic stack 300 by coating. For another example, the bus bar 200 may be disposed between the conductive layer 100 and the electrochromic stack 300 by bonding.

For convenience of description of the arrangement position of the bus bar 200, the two conductive layers 100 may be referred to as a first conductive layer and a second conductive layer, respectively, and the first conductive layer is disposed on the upper surface of the electrochromic stack layer 300 and the second conductive layer is disposed on the lower surface of the electrochromic stack layer 300, taking the orientation of fig. 3 as an example. The number of bus bars 200 is two, with one bus bar 200 being disposed between the first conductive layer and the electrochromic stack 300. Another bus bar 200 is disposed between the second conductive layer and the electrochromic stack 300. At least one region of the conductive layer 100 corresponding to the bus bar 200 is provided with a recess and/or a protrusion. That is, at least one of the region of the first conductive layer corresponding to the bus bar 200 and the region of the second conductive layer corresponding to the bus bar 200 is provided with a concave portion and/or a convex portion.

In addition, the concave part and the convex part can exist at the same time or alternatively exist. In an example, only the concave portion may be provided on the region of the conductive layer 100 corresponding to the bus bar 200, or only the convex portion may be provided. In another example, the concave portion and the convex portion may be simultaneously provided on the region of the conductive layer 100 corresponding to the bus bar 200.

Referring to fig. 4 and 5, the area of the conductive layer 100 corresponding to the bus bar 200 can be understood as a projection area 110 of the bus bar 200 on the conductive layer 100. Wherein the distance of the projection area 110 from the edge of the conductive layer 100 is smaller than the distance of the projection area 110 from the center of the conductive layer 100.

In the present application, the recess portion penetrates at least part of the conductive layer 100 along the thickness direction of the conductive layer 100, on the one hand, when the recess portion penetrates part of the conductive layer, that is, by reducing the thickness of the partial conductive layer 100, the resistance of the conductive layer 100 is increased; on the other hand, when the recess portion penetrates the conductive layer, that is, the effective contact area between the bus bar 200 and the conductive layer 100 is reduced, that is, the current transmission channel between the bus bar and the conductive layer is reduced, so that the area resistance of the conductive layer 100 and the bus bar 200 is increased, and the risk of premature aging failure of the conductive layer 100 and the bus bar 200 is effectively reduced or even avoided. In this embodiment, the surface resistance may refer to a resistance per unit area.

In other embodiments of the present application, the protrusion is disposed between the conductive layer 100 and the bus bar 200, and is configured to block contact of the conductive layer 100 and the bus bar 200. The resistance of the protruding portion is greater than that of the bus bar, or the protruding portion is an insulating material. By the arrangement, the contact area between the bus bar 200 and the conductive layer 100 can be reduced, the conduction area between the bus bar 200 and the conductive layer 100 is reduced, and the risk of premature aging failure of the conductive layer 100 and the corresponding area of the bus bar 200 is effectively reduced or even avoided.

In one possible embodiment, the plurality of concave portions are provided, that is, the number of concave portions is plural, and the plurality of concave portions are provided at intervals along the attaching direction of the bus bar 200. The bus bar 200 is attached along the edge of the conductive layer 100, that is, the attaching direction of the bus bar 200 is the circumferential direction of the conductive layer. Specifically, when the shape of the electrochromic device is a regular shape, for example, please refer to fig. 11, the shape of the electrochromic device is square, and the shape of the bus bar 200 is a bar, at this time, the attaching direction of the bus bar 200 is a single direction, and the attaching direction of the bus bar 200 may be the length direction of the electrochromic device, i.e. the X direction in fig. 11, or the width direction of the electrochromic device, i.e. the Y direction in fig. 11.

For another example, referring to fig. 12 and 13, when the shape of the electrochromic device is square and the shape of the bus bar 200 may be "L", the attaching direction of the bus bar 200 is bidirectional, i.e., the bus bar 200 extends in the length direction of the electrochromic device and then in the width direction of the electrochromic device.

When the number of the bus bars 200 is two and the bus bars 200 are respectively arranged on the two conductive layers, the two bus bars 200 are respectively L-shaped, and the projection intervals of the opposite ends of the two bus bars 200 on the plane where the electrochromic layers are located are arranged, so that the projection of the two bus bars 200 on the plane where the electrochromic layers are located is enclosed into a ring shape. Referring to fig. 13, the two bus bars 200 are respectively L-shaped, and the two bus bars 200 are connected at opposite ends of the projection of the plane of the electrochromic layer, such that the two bus bars 200 enclose a ring shape.

When the electrochromic device is irregularly shaped, the bus bar 200 is attached in a direction similar to the circumferential shape of the electrochromic device.

Each recess extends toward the central region 120 of the conductive layer 100. By providing the plurality of concave portions, the thickness of the conductive layer 100 can be reduced as much as possible, and the resistance of the conductive layer 100 can be increased; the conducting area between the bus bar 200 and the conductive layer 100 can be reduced, and the risk of premature aging failure of the conductive layer 100 and the corresponding area of the bus bar 200 can be reduced or even avoided.

In addition, the size of the recess in the direction toward the central region of the conductive layer 100 may be increased, so that the area of the recess is increased as much as possible, thereby increasing the resistance of the conductive layer 100 and reducing the risk of overcharging and overdischarging the region of the electrochromic device, which is close to the bus bar 200, during charging.

In the present embodiment, the central region 120 of the conductive layer 100 may be understood that a region where the bus bar is attached to the conductive layer 100 is an edge region, a region adjacent to the edge region, and a region located inside the edge region is a central region. I.e. the area indicated by 120 in fig. 4 and 5, can also be considered as the visible area of the electrochromic device. In addition, some of the drawings in the present application show only the structure of a partial region, and thus are drawn with a dotted line frame to represent the region outside the dotted line frame as well as other structures not shown.

With continued reference to fig. 4-6, the recess includes a first etched trench 130. It should be noted that, for convenience in describing the distribution of the etching grooves clearly, in fig. 4 to fig. 6, pattern filling is performed only at the positions where the etching grooves are located, and fig. 4 and fig. 5 show partial areas of the conductive layer, and the conductive layer is still located outside the dotted line.

The first etched groove 130 penetrates the conductive layer 100 at least partially in a thickness direction of the conductive layer 100. As a possible embodiment of the first etched trench 130, please refer to fig. 7, the first etched trench 130 extends through the entire thickness of the conductive layer 100 along the thickness direction of the conductive layer 100, i.e. the trench depth of the first etched trench 130 is equal to or greater than the thickness of the conductive layer 100. For example, in one example, when the electrochromic device further includes the first base layer 400, the first etching groove 130 may also penetrate the conductive layer 100 in the thickness direction of the conductive layer 100 and extend into the first base layer 400, and at this time, the groove depth of the first etching groove 130 is greater than the thickness of the conductive layer 100.

Referring to fig. 8 and 9, in another possible embodiment of the first etched trench 130, the first etched trench 130 extends into the conductive layer 100, i.e., the trench depth of the first etched trench 130 is smaller than the thickness of the conductive layer 100. It should be noted that the dashed lines in fig. 9 are only used to more clearly describe the relative positions of the edge region 110 and the center region 120.

The notch of the first etched groove 130 may be located on a surface of the conductive layer 100 facing the first substrate layer 400, or may be located on a surface of the conductive layer 100 facing away from the first substrate layer 400.

Alternatively, when the number of the first etching grooves 130 is plural, the notch of a part of the first etching grooves 130 may be located on the surface of the conductive layer 100 facing the first base layer 400. The notch of the remaining portion of the first etch groove 130 is located at the surface of the conductive layer 100 facing away from the first substrate layer 400.

Referring to fig. 10, in the above embodiment, by forming the first etching groove 130 on the conductive layer 100, the thickness direction of the conductive layer 100 of the first etching groove 130 penetrates through the conductive layer 100 or extends into the conductive layer 100, the thickness of the conductive layer 100 is reduced by the first etching groove 130, and the corresponding conductive layer 100 is ablated after the conductive layer 100 is coated by laser, so that the method is simple and easy to control. And the laser manner facilitates controlling the thickness of the cut, the remaining conductive layer 100 also serves to strengthen the adhesion with the corresponding bus bar 200. In addition, by the arrangement, the thickness of the conductive layer 100 can be reduced, and the resistance of the conductive layer 100 can be increased; the conducting area between the bus bar 200 and the conductive layer 100 can be reduced, and the risk of premature aging failure of the conductive layer 100 and the corresponding area of the bus bar 200 can be reduced or even avoided.

The bus bar 200 may be formed by a deposition coating process, coating silver, or other materials, or by a lamination process, such as lamination of copper foil. When the bus bar 200 is formed through a deposition coating process, the bus bar 200 is formed on the surface of the conductive layer 100 exposed to the first etching groove 130. When the bus bar 200 is formed through the paste process, the bus bar 200 spans the first etching groove 130, and the non-recessed region of the conductive layer 100 is in contact with and electrically connected to the bus bar 200.

When the first etching groove 130 penetrates the conductive layer 100 along the thickness direction of the conductive layer 100, and the bus bar 200 is formed on the conductive layer 100 by a deposition coating process or a pasting process, the contact area between the bus bar 200 and the conductive layer 100 can be reduced, so that the conduction area between the bus bar 200 and the conductive layer 100 is reduced, and the risk of premature aging failure of the conductive layer 100 and the corresponding area of the bus bar 200 is reduced or even avoided.

When the first etching groove 130 extends into the conductive layer 100 and the bus bar 200 is formed on the conductive layer 100 by the attaching process, the contact area between the bus bar 200 and the conductive layer 100 can be reduced, so as to reduce the conduction area between the bus bar 200 and the conductive layer 100, and reduce or even avoid the risk of premature aging failure in the area corresponding to the conductive layer 100 and the bus bar 200.

In this embodiment, by forming the first etching groove 130 in the conductive layer 100, the bus bar 200 is disposed on the surface of the conductive layer 100 facing the electrochromic stack layer 300, and the contact area of the bus bar 200 with the conductive layer 100 is smaller than the projection area of the bus bar 200 on the conductive layer 100, for example, the contact area of the bus bar 200 with the conductive layer 100 occupies within 40% of the perimeter of the conductive layer 100 opposite to the bus bar 200.

In this embodiment, the first etching groove 130 is a planar structure, that is, the entire first etching groove 130 is non-conductive, for example, the conductive layer in the corresponding region is laser etched by using an infrared laser to form an insulated region. In other words, the conductive layers 100 located at both sides of the first etching groove 130 are not connected in the attaching direction of the bus bar 200, so that the conductive layers 100 located at both sides of the first etching groove 130 are not conductive. Referring to fig. 14 to 20, the shape of the first etched groove 130 may include a polygon, a circle, or an ellipse, wherein the polygon may be a triangle, a rectangle, or a trapezoid. The width of the first etching groove 130 ranges from 5 μm to 30 μm. The width of the first etched groove 130 may be understood as the dimension in the direction in which the projected area 110 of the bus bar 200 on the conductive layer 100 points to the central area 120.

As an example, please continue to refer to fig. 15, the projection area of the first etching groove 130 on the first substrate layer is trapezoidal in shape, and the distance between the shorter side of the trapezoid and the central area 120 is smaller than the distance between the longer side of the trapezoid and the central area 120. That is, the shorter side in the first etch bath abuts the shoulder center region. For convenience of description, a region of the conductive layer 100 opposite to the bus bar 200 may be divided into a first region and a second region 112, wherein the first region is a region where the first etching groove 130 is located, and the second region 112 is other regions except the first region among the regions of the conductive layer 100 opposite to the bus bar 200. The present embodiment can adjust the area ratio of the first region and the second region 112 by adjusting the shape and the area of the first etching groove 130, thereby realizing fine control of different regions in the region of the conductive layer 100 opposite to the bus bar 200, and realizing adjustment of the color change speed. In addition, in the present application, the width of the first etched groove 130 near the central region 120 is smaller than the width of the first etched groove 130 away from the central region 120, and the width of the first etched groove 130 gradually increases toward a direction away from the central region 120. In this way, the first etched trenches 130 with the same area have more paths for effectively conducting current, which reduces the surface resistance of the conductive layer 100 and increases the color-changing speed of the electrochromic device.

It should be noted that, the projection area 110 and the central area 120 in fig. 14 to 20 are only shown in part, and not the entire projection area 110 and central area 120. In order to conveniently show the etching depth of the first etching groove 130 and the film layer that the first etching groove 130 can expose, other positions of the projection area 110 except for the first etching groove 130 are not filled.

As another example, referring to fig. 16 and 17, the first etched grooves 130 have a rectangular shape, and the first etched grooves 130 extend into the central region 120 of the conductive layer 100 to conduct current in a direction in which the first etched grooves 130 extend, and thus, the conducting speed of the current can be controlled by controlling the length of each first etched groove 130, and the conducting direction of the current can be controlled by controlling the extending direction of each first etched groove 130. So configured, the first etching groove 130 can divide the projection area 110 and the central area 120 into a plurality of areas to control the color changing speed and the color changing effect of each area.

Referring to fig. 18, the first etching groove 130 includes a first sub-etching groove 131 and a second sub-etching groove 132, wherein an extending direction of the first sub-etching groove 131 and an extending direction of the second sub-etching groove 132 are intersected, and one end of the first sub-etching groove 131 is connected with one end of the second sub-etching groove 132 and communicated with each other.

The other end of the first sub-etching groove 131 and the other end of the second sub-etching groove 132 are disposed at intervals, i.e., the other end of the first sub-etching groove 131 and the other end of the second sub-etching groove 132 are not connected. The configuration is such that the first etched groove 130 has a "V" shape.

The first and second sub-etched grooves 131 and 132 divide the region of the conductive layer 100 opposite to the bus bar 200, i.e., the projection region 110, into at least two regions that are relatively independent. For example, the conductive layer 100 located in the area surrounded by the first sub-etched trench 131 and the second sub-etched trench 132 forms a first area with the edge of the membrane. The conductive layer 100 outside the first and second sub-etched grooves 131 and 132 is separated, and the central region of the membrane encloses a second region formed by the edges of the first and second sub-etched grooves 131 and 132. When a voltage is provided to the conductive layer 100, due to the existence of the first sub-etching grooves 131 and the second sub-etching grooves 132, current in the first area where the first sub-etching grooves 131 and the second sub-etching grooves 132 are located is blocked by the first sub-etching grooves 131 and the second sub-etching grooves 132 when being transmitted to the second area, and the current is not transmitted to the central area 120, so that the adjustment of the color changing speed of the electrochromic device can be realized.

The first sub-etched groove 131 and the second sub-etched groove 132 are connected to form a blocking portion for blocking current conduction. And the distance between the first sub etching groove 131 and the second sub etching groove 132 is larger at one end of the first sub etching groove 131 and the second sub etching groove 132, namely the first sub etching groove 131 and the second sub etching groove 132 are arranged obliquely to each other, so that the two areas formed by the first etching groove and the second etching groove with smaller widths can realize large-area blocking current transmission, and large-efficiency blocking can be realized without etching the conductive layer 100 with larger area, thereby ensuring large-efficiency effective voltage for reducing edges, greatly reducing the possibility of edge failure, simultaneously, not needing larger energy and reducing the production cost.

Referring to fig. 19, the first etching groove 130 further includes a third sub-etching groove 133 and a fourth sub-etching groove 134. The third sub-etching groove 133 is arranged between the first sub-etching groove 131 and the second sub-etching groove 132, and two ends of the third sub-etching groove 133 are respectively connected with one end of the first sub-etching groove 131 and one end of the second sub-etching groove 132; the fourth sub-etching groove 134 is disposed between the first sub-etching groove 131 and the second sub-etching groove 132, and two ends of the fourth sub-etching groove 134 are respectively connected with the other end of the first sub-etching groove 131 and the other end of the second sub-etching groove 132, so that the first etching groove 130 forms a hollow ring structure. The hollow annular structure may include a hollow trapezoid structure or a hollow square structure, among others.

In this embodiment, on the one hand, the area ratio of the first region 111 and the second region 112 may be adjusted by adjusting the shape and the area of the first etching groove 130, so as to implement fine control on different regions of the region (the projection region 110) where the conductive layer 100 and the bus bar 200 are opposite to each other, and to implement adjustment of the color change speed. On the other hand, the first etched groove 130 forms an annular closed region, which corresponds to a blocking region, and current in a region surrounded by the first etched groove 130 is not transferred to the central region 120, so that an effective voltage of a region of the conductive layer opposite to the bus bar can be reduced.

Referring to fig. 20, the first etching groove 130 further includes a plurality of fifth sub-etching grooves 135, and the plurality of fifth sub-etching grooves 135 are disposed at intervals along the attaching direction of the bus bar 200, that is, along the X direction in fig. 20, and the distances between adjacent fifth sub-etching grooves 135 may be the same or different.

Each fifth sub-etched groove 135 extends to the central region 120 of the conductive layer 100, two adjacent fifth sub-etched grooves 135 intersect with two sides of the projection region of the bus bar on the conductive layer 100 and enclose to form a new third region 113, and the extending direction of the first sub-etched groove 131 intersects with the extending direction of the fifth sub-etched groove 135, so that the first sub-etched groove 131 divides each third region 113 into a relatively independent region a and a relatively independent region B. It should be noted that the dashed box in fig. 20 represents a third region 113.

Along the attaching direction of the bus bar 200, and in the direction from one end of the first sub etching groove 131 to the other end of the first sub etching groove 131, the area of the area a is gradually increased, the area of the area B is gradually reduced, and the color changing speed and effect of the electrochromic device are further improved and controlled by reasonably adjusting the area ratio of the area a and the area B. It should be understood that the other end of the first sub-etched trench 131 in this embodiment faces the central region 120 of the conductive layer 100.

The projected area 110 of the bus bar 200 on the conductive layer 100 includes oppositely disposed first and second edges, the second edge being located between the first edge and the central area 120 of the conductive layer 100. The end of the fifth sub-etching groove 135, which is close to the central area 120 of the conductive layer 100, is flush with the second edge, so that the size of the fifth sub-etching groove 135 in the direction pointing to the central area 120 is ensured to be maximum, the resistance of the conductive layer 100 is increased to the greatest extent, and the risk of advanced aging failure caused by larger field intensity of the conductive layer 100 and the corresponding area of the bus bar 200 in the charging and discharging process is reduced or even avoided.

In one possible embodiment, referring to fig. 21 to 24, with the premise that the first etched trench 130 extends into the conductive layer 100, the electrochromic device further includes a second etched trench 140, and the second etched trench 140 penetrates through the conductive layer 100 along the thickness direction of the conductive layer 100. The shape of the second etched groove 140 may be the same as the shape of the first etched groove 130 penetrating the conductive layer 100.

In this embodiment, the recess portion includes the first etching groove 130 and the second etching groove 140, the first etching groove 130 does not penetrate the conductive layer 100 in the thickness direction of the conductive layer 100, and the second etching groove 140 penetrates the conductive layer 100 in the thickness direction of the conductive layer 100, so that the recess portion includes the first etching groove 130, which can reduce the contact area between the conductive layer 100 and the bus bar 200, and reduce the conductive channels between the conductive layer 100 and the bus bar 200. Meanwhile, the recess portion further includes the second etching groove 140, which can reduce the thickness of the conductive layer 100, thereby increasing the surface resistance of the conductive layer 100. In addition, the presence of the first etching groove 130 and the second etching groove 140 may increase the roughness of the conductive layer 100, and may increase the connection strength between the conductive layer 100 and the bus bar 200.

The shape and layout of the first and second etch grooves 130 and 140 may be selected in various ways. As an example, referring to fig. 21, the first etching groove 130 and the first etching groove 130 are both circular in shape, and the number of the first etching groove 130 and the second etching groove 140 is plural. One of the first etched trenches 130 is located between adjacent second etched trenches 140. One of the second etch grooves 140 is located between adjacent first etch grooves 130.

As another example, referring to fig. 22 and 23, the number of the second etching grooves 140 is one, the shape of the second etching groove 140 is semi-annular or ring-shaped, the shape of the first etching groove 130 is circular, the number of the first etching grooves 130 is plural, a plurality of the first etching grooves 130 are arranged at intervals in an area surrounded by the second etching grooves 140, and the remaining first etching grooves 130 are arranged at intervals outside the area surrounded by the second etching grooves 140.

As yet another example, referring to fig. 24, the number of the second etching grooves 140 is one, the shape of the second etching groove 140 is polygonal, the shape of the first etching groove 130 is circular, the number of the first etching grooves 130 is plural, and the plural first etching grooves 130 are spaced apart from the area surrounded by the second etching groove 140.

In one possible embodiment, referring to fig. 25 and 26, the electrochromic device further includes a conductive line 700, the conductive line 700 is disposed between adjacent recesses, and the conductive line 700 extends toward a central region of the conductive layer 100.

Taking the recess portion including the first etching grooves 130 extending into the conductive layer 100, and the shape of the first etching grooves 130 is a bar shape as an example, the conductive lines 700 are disposed between adjacent first etching grooves 130. Wherein the wires 700 extend towards the central region 120 of the conductive layer 100. The length direction of the conductive line 700 may be parallel to the length of the first etching groove 130 or may be different from the length direction. Illustratively, the length direction of the wire 700 may be parallel to the length of the first etching groove 130.

The wire 700 may include copper wire or silk screened silver wire. The conductive lines 700 can reduce the resistance of the conductive layer 100 between adjacent first etch grooves 130, improving the color change speed and/or color change uniformity of the electrochromic device. In addition, since the conductive wire 700 extends toward the central region 120, the resistances of the central region 120 and the projection region 110 are relatively close, and the electric field intensity received by the projection region 110 is relatively close to the electric field intensity received by the central region 120 in the charging and discharging process, so that the possibility of failure of the edge region is reduced.

In addition to fig. 25, this embodiment further improves the electrochromic device, for example, referring to fig. 27 and 28, the first etching grooves 130 extend from the projection area 110 to the central area 120, and a third etching groove 150 is further disposed between any adjacent first etching grooves 130. The third etching groove 150 penetrates the conductive layer 100 in the thickness direction of the conductive layer 100.

The length direction of each third etching groove 150 may be parallel to the attaching direction of the bus bar 200, wherein, among the two adjacent first etching grooves 130, one end of the third etching groove 150 is connected to one of the first etching grooves 130, the other end of the third etching groove 150 is connected to the other first etching groove 130, and the third etching groove forms the effective contact area 114 with the first etching groove and the inner edge of the projection area.

The third etching groove 150 corresponds to a blocking area, and divides the area between the adjacent first etching grooves 130 in the projection area 110 into two areas, so that the area near the central area 120 is the effective contact area 114, and the bus bar 200 is in effective contact with the conductive layer 100 in the effective contact area 114, so that the area of the effective contact area 114 between the bus bar 200 and the projection area 110 can be reduced, and the local color change speed of the projection area 110 is adjusted. Further, adjustment of the color change speed and the color change effect of each region of the electrochromic device can be achieved.

It should be understood that the center lines of the plurality of third etching grooves 150 may be parallel to the mounting direction of the bus bar 200. However, the distribution of the third etching grooves 150 is not limited to the above description.

For example, please continue to refer to fig. 27 and fig. 28, any adjacent third etching grooves 150 are offset in the attaching direction of the bus bar 200. In the attaching direction of the bus bar 200, the distance between the third etching groove 150 and the central region 120 tends to decrease and then increase, so that the central line of all the third etching grooves 150 has a structure similar to a V shape. By such arrangement, the color change speed and the color change effect of each region of the electrochromic device can be more effectively adjusted by changing the area ratio of the adjacent effective contact regions 114.

In one possible embodiment, referring to fig. 29, the protrusion includes an insulating layer 600, and the insulating layer 600 is disposed between the conductive layer 100 and the bus bar 200. The insulating layer 600 can avoid the contact of the bus bar 200 and the surface opposite to the conductive layer 100, so that the bus bar 200 and the conductive layer 100 are in spaced contact, the contact area of the bus bar 200 and the conductive layer 100 is reduced, the conduction area of the bus bar 200 and the conductive layer 100 is reduced, the field intensity of the edge portion of the electrochromic device is relatively smaller, the risk of aging of the conductive layer 100 and the area corresponding to the bus bar 200 is reduced, and the risk of early failure of the edge area of the electrochromic stack 300 is further reduced.

The number of the insulating layers 600 may be one or more. Referring to fig. 30, a plurality of insulating layers 600 are disposed between the conductive layer 100 and the bus bar 200 at intervals, wherein the insulating layers 600 are made of non-conductive ink, so that the conductive layer 100 and the bus bar 200 are in a non-conductive state in the region where the insulating layers 600 are located, the effective conductive area of the conductive layer 100 and the bus bar 200 is reduced, the failure risk of the region corresponding to the conductive layer 100 and the bus bar 200 is reduced or even avoided, and the failure risk of the region corresponding to the electrochromic stack 300 and the bus bar 200 is reduced or even avoided, thereby ensuring that the edge region of the electrochromic device can reach the preset transmittance.

The shape of the insulating layer 600 may be set according to actual requirements. In an example, referring to fig. 30, the insulating layers 600 are in a shape of a waist-shaped hole, the plurality of insulating layers 600 are disposed at intervals, and an extending direction of each insulating layer 600 is disposed obliquely with respect to an attaching direction of the bus bar 200. The material of the insulating layer 600 includes insulating varnish. An insulating varnish is coated on the conductive layer 100 by coating to form a plurality of insulating layers 600.

In another example, referring to fig. 31, the insulating layer 600 is in a strip shape, for example, the insulating layer 600 is rectangular, and the length direction of the insulating layer 600 intersects the attaching direction of the bus bar 200 and extends toward the central region 120. The plurality of insulating layers 600 divide the projection area 110 into a plurality of independent areas, and thus, adjustment of the color changing speed and the color changing effect of each area can be achieved.

In the present embodiment, the widths of the plurality of insulating layers 600 are not equal in the attaching direction of the bus bar 200, and the distances between the adjacent insulating layers 600 are not equal. Illustratively, the width of the insulating layer 600 tends to increase and decrease in the mounting direction of the bus bar 200. By such arrangement, the area ratio of the adjacent insulating layers 600 can be reasonably controlled, or alternatively, the area of all the insulating layers 600 can be reasonably controlled, the area ratio of the region remaining after the insulating layer 600 is removed in the region opposite to the conductive layer 100 and the bus bar 200 achieves fine adjustment of the color change speed of the electrochromic device.

The electrochromic device further includes an extraction structure, the extraction structure is adhered to the bus bar 200, and the width of the insulating layer 600 gradually decreases along the direction away from the extraction structure, and the effective voltage is greater at the position closer to the extraction structure due to the influence of the voltage drop of the conductive layer 100 during charge and discharge, so that the greater the width of the insulating layer 600 closer to the extraction structure is, the resistance at the position closer to the extraction structure is increased, thereby reducing the effective voltage at the position, and making the electric field intensity of each region of the whole device relatively uniform.

Further, in a direction toward the central region 120, at least one opposite end of the plurality of insulating layers 600 are connected together. For example, referring to fig. 32, the insulating layers 600 further include insulating strips 610, and the insulating strips 610 extend along the attaching direction of the bus bar 200 and are connected to each insulating layer 600 such that the ends of the plurality of insulating layers 600 are connected together. So set up, on the one hand can make all insulating layer 600 set up as an organic whole, be convenient for paste all insulating layer 600 to conducting layer 100 on, do not need each insulating layer 600 to paste to go to reduce the time of production, improved production efficiency. On the other hand, the area of the insulating layer 600 can be increased, and the conduction area between the conductive layer 100 and the bus bar 200 can be reduced as much as possible while ensuring the conductivity of the conductive layer 100. Wherein the width of the insulating layer 600 is greater than 0.1mm in the attaching direction of the bus bar 200.

In one possible embodiment, the insulating layer 600 may be disposed at a corner position of the electrochromic device, for example, referring to fig. 33 and 34, the electrochromic device may be triangular in shape, and the insulating layer 600 may be disposed around one vertex of the electrochromic device. In order to facilitate the definition of the layout of the insulating layer 600, the edges of the electrochromic device may be divided into a first side a1, a second side a2 and a third side a3, and the width of the insulating layer 600 gradually decreases along the extending direction of the first side a 1. Meanwhile, the width of the insulating layer 600 gradually decreases along the extension direction of the second side a 2.

In one possible embodiment, referring to fig. 35 and 36, the protrusion further includes a reinforcing layer 800. In an example, the reinforcing layer 800 is disposed between the conductive layer 100 and the bus bar 200 at a distance from the insulating layer 600. That is, the reinforcing layer 800 and the insulating layer 600 are disposed at a distance from each other.

In another example, the reinforcing layer 800 is disposed between the conductive layer 100 and one of the insulating layers 600. In other words, the number of the reinforcing layers 800 and the number of the insulating layers 600 are plural, the plurality of reinforcing layers 800 are disposed in one-to-one correspondence with the plurality of insulating layers 600, and one reinforcing layer 800 is disposed between the conductive layer 100 and the insulating layer 600 corresponding thereto, that is, the position of the reinforcing layer 800 coincides with the position of the insulating layer 600.

The reinforcing layer 800 may be made of a conductive material or a nonconductive material. When the reinforcing layer 800 is a non-conductive material, a primer paint may be included to increase adhesion between the insulating layer 600 and the conductive layer 100, or between the bus bar 200 and the conductive layer 100.

When the reinforcing layer 800 is a conductive material, the conductive performance of the reinforcing layer 800 is inferior to that of the bus bar 200.

In one possible embodiment, referring to fig. 37 and 38, the protrusion further includes a high resistance layer 900, the high resistance layer 900 being disposed between the conductive layer 100 and the bus bar 200. The layout of the high-resistance layer 900 may be similar to that of the insulating layer, and the description of this embodiment is omitted herein.

The resistance value of the high-resistance layer 900 is greater than that of the conductive layer 100, and the high-resistance layer 900 can increase the local contact resistance between the conductive layer 100 and the bus bar 200, reduce the field intensity of the edge of the conductive layer in the charge and discharge process to be too large, reduce or even avoid the aging risk of the region corresponding to the conductive layer 100 and the bus bar 200, and further reduce or even avoid the failure risk of the region corresponding to the electrochromic stack layer 300 and the bus bar 200.

It should be noted that the high-resistance layer 900 may be used in combination with the insulating layer 600, for example, the high-resistance layer 900 is disposed on one side of the insulating layer 600. The high-resistance layer 900 may be in direct contact with the insulating layer 600 or in indirect contact with the insulating layer. For another example, the high-resistance layer 900 is disposed on the conductive layer 100 at a distance from the insulating layer 600.

The embodiment of the disclosure also provides a color changing device, which comprises a substrate layer and the electrochromic device of any embodiment, wherein the electrochromic device and the substrate layer are stacked, that is, the electrochromic device is arranged on the substrate layer, and the substrate layer is used for providing support for the electrochromic device. The substrate layer may include any one or a combination of two or more of a plexiglass, a transparent acrylic plate, a transparent PVC (Polyvinyl chloride ) plate, a transparent pc (polycarbonate) plate, or a transparent ps (Polystyrene) plate.

In view of the fact that the color-changing device includes the electrochromic device of any one of the above embodiments, the color-changing device has the beneficial effects of any one of the above embodiments, and the description of this embodiment is not repeated here.

The embodiment of the disclosure also provides an end product comprising the color changing device or the color changing device of any embodiment. The terminal products comprise any one of rearview mirrors, curtain walls, automobile skylights, automobile side windows, automobile windshields, shells of electronic products, glasses, vehicles and display panels.

In this specification, each embodiment or implementation is described in a progressive manner, and each embodiment focuses on a difference from other embodiments, and identical and similar parts between the embodiments are all enough to refer to each other.

It should be noted that references in the specification to "one embodiment," "an example embodiment," "some embodiments," etc., indicate that the embodiment described may include a particular feature, structure, or characteristic, but every embodiment may not necessarily include the particular feature, structure, or characteristic. Moreover, such phrases are not necessarily referring to the same embodiment. Furthermore, when a particular feature, structure, or characteristic is described in connection with an embodiment, it is submitted that it is within the knowledge of one skilled in the art to effect such feature, structure, or characteristic in connection with other embodiments whether or not explicitly described.

Finally, it should be noted that: the above embodiments are only for illustrating the technical solution of the present application, and not for limiting the same; although the application has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical scheme described in the foregoing embodiments can be modified or some or all of the technical features thereof can be replaced by equivalents; such modifications and substitutions do not depart from the spirit of the application.

Claims (10)

1. An electrochromic device comprising an electrochromic stack layer, a bus bar, and two conductive layers; in the thickness direction of the electrochromic stack layer, two conductive layers are respectively arranged at two sides of the electrochromic stack layer; the bus bar is disposed between the conductive layer and the electrochromic stack layer;

At least one region of the conductive layer corresponding to the bus bar is provided with a concave part and/or a convex part, wherein the concave part at least partially penetrates through the conductive layer along the thickness direction of the conductive layer; the protrusion is disposed between the conductive layer and the bus bar and is configured to block the conductive layer from contacting the bus bar.

2. The electrochromic device according to claim 1, wherein a plurality of the recessed portions are provided, and a plurality of the recessed portions are provided at intervals along the attaching direction of the bus bar.

3. The electrochromic device according to claim 1 or 2, wherein the recess comprises a first etched groove penetrating the conductive layer in a thickness direction of the conductive layer.

4. The electrochromic device according to claim 3, wherein the first etching groove comprises a first sub etching groove and a second sub etching groove, the extending direction of the first sub etching groove is intersected with the extending direction of the second sub etching groove, one end of the first sub etching groove is connected with one end of the second sub etching groove, and the other end of the first sub etching groove is arranged at intervals with the other end of the second sub etching groove.

5. The electrochromic device according to claim 4, wherein the first etched trench further comprises a third sub-etched trench and a fourth sub-etched trench, the third sub-etched trench being disposed between the first sub-etched trench and the second sub-etched trench, two ends of the third sub-etched trench being connected to one end of the first sub-etched trench and one end of the second sub-etched trench, respectively; the fourth sub-etching groove is arranged between the first sub-etching groove and the second sub-etching groove, and two ends of the fourth sub-etching groove are respectively connected with the other end of the first sub-etching groove and the other end of the second sub-etching groove.

6. The electrochromic device according to claim 1, further comprising a wire disposed between adjacent ones of the recesses, the wire extending toward a central region of the conductive layer.

7. The electrochromic device according to claim 1, wherein the protrusion comprises an insulating layer disposed between the conductive layer and the bus bar.

8. The electrochromic device according to claim 7, wherein the bulge further comprises a stiffening layer disposed between the conductive layer and the bus bar in spaced relation to the insulating layer; or the reinforcing layer is arranged between the conducting layer and the insulating layer.

9. A color changing device comprising a substrate layer and the electrochromic device of any one of claims 1 to 8 laminated to the substrate layer.

10. An end product comprising an electrochromic device according to any one of claims 1 to 8 or a color changing device according to claim 9, wherein the end product comprises any one of a rear view mirror, a curtain wall, a sunroof, a side window of an automobile, a windshield of an automobile, a housing of an electronic product, eyeglasses, a vehicle, and a display panel.