CN2196122Y - Electric arc evaporation source with cylindrical magnetic control cathod - Google Patents
Electric arc evaporation source with cylindrical magnetic control cathod Download PDFInfo
- Publication number
- CN2196122Y CN2196122Y CN 94218432 CN94218432U CN2196122Y CN 2196122 Y CN2196122 Y CN 2196122Y CN 94218432 CN94218432 CN 94218432 CN 94218432 U CN94218432 U CN 94218432U CN 2196122 Y CN2196122 Y CN 2196122Y
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- CN
- China
- Prior art keywords
- magnet
- evaporation source
- cathode
- arc evaporation
- arc
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Abstract
The utility model relates to a cathode electric arc evaporation source with a cylindrical magnetic control, wherein, the magnets in the electric arc source are disposed in a helical line shape along the axial direction of the cathode. When the utility model is used, the entire cathode surface has the advantages of uniform electric discharge, uniform etching, large electric discharge area, high utilization rate of target materials, and long service life, and the utility model can be widely used in various vacuum film plating devices.
Description
The utility model relates to physical vapor deposition, especially for the column magnetron cathode electric arc evaporation source of vacuum plating.
Vacuum Coating method is a kind of metal or non-metal workpiece to be placed vacuum chamber, utilizes glow discharge or arc discharge workpiece surface to be plated the method for metal or its compound film.
The cathodic arc evaporation source is to utilize the arc discharge method, makes evaporation of negative electrode Coating Materials and ionization, produces the device of the required plasma flow of vacuum plating.
Arc process relates to the ion of the cathode substance of emitting from the cathode arc highlight, and the cathode arc highlight is a kind of phenomenon that is present in minimum spatial high current density, changes at a high speed.Under vacuum state, the metal ion that is drawn onto cathode surface forms space charge layer, produces highfield thus and makes the point that work function is little on the cathode surface (crystal boundary or tiny crack) beginning emitting electrons.Indivedual high points of emitting electrons density produce highdensity electric current, and the heat that this electric current produces rises this temperature, and further heat of emission electronics, this retroactive effect makes the electric current concentration of local.Emitting electrons and ion stay the discharge trace then because the heat that the electric current concentration of local produces makes cathode material produce the plasma of explosive ground in this part, emit fused cathode material particle simultaneously.The sucked back cathode surface of a part in the ion of emission forms space charge layer once more, produces highfield, makes the little point of new work function begin emitting electrons again.
In order to improve the performance of arc evaporation source, generally in system, be provided with magnetic field.Magnetic field energy is fixed electron, ion more effectively, prolongs the electronic motion track, thereby has improved the probability of ionization by collision.Magnetic field can make arc plasma accelerated motion, increases emission of cathode electronics and amount of ions, improves the density and the directional property of line, reduces the content of small (molten drop).This has just correspondingly improved the quality of sedimentation rate and rete.So there is crucial effect in magnetic field.
CN91230847.8 discloses a kind of Style Columu Talget, and a permanent magnet is arranged in Style Columu Talget, during work, under the effect of this magnet, forms a cyclic arc, and magnet moves up and down along post target axle simultaneously, and cyclic arc is moved up and down.The shortcoming of this arc source is little, the inefficiency of machining area, and needs complicated running gear.
The purpose of this utility model provides a kind of novel column magnetron cathode electric arc evaporation source, and this arc source has overcome above-mentioned defective.
The designed arc source of the utility model comprises arc power, cylindrical cathode, be enclosed within the matrix of the shielding case of cathode end, negative electrode inner magnet, fixed magnets, make the transmission mechanism of magnet rotation, cooling channel and the arc initiation device in the negative electrode, and wherein said magnet is arranged to line style in the shape of a spiral along cathode axis.
Magnet is preferably arranged for the duplex line style in the utility model, and wherein a spiral line type magnet N is extremely outside, and another S is extremely outside.Described magnet preferably is the duplex line style of closed at both ends and arranges.
Further preferred scheme is that matrix is a column, band spiral line type groove on the surface, and block magnet arrangements is in groove.
Further preferred scheme is a band duplex line style groove on the matrix surface, and block magnet arrangements is in groove, and is extremely outside along the magnet block N that a spiral-shaped groove is arranged, extremely outside along the magnet block S of another layout.
The discharge of described arc source evenly, etching is even, and machining area is big, and the target utilization height can 360 ° and while evaporation up and down, high efficiency, long service life, and the device structure supporting with it simplified greatly, improve the vacuum chamber utilization ratio, saved material, reduced cost.
Be described further below in conjunction with drawings and Examples.
Accompanying drawing is the vacuum coater synoptic diagram that is provided with arc source described in the utility model.
Number in the figure 1 is a negative electrode, and it is partly cut open, and 2,2 ' is shielding case, 3 is the matrix of fixed magnets, and 4 for being arranged to the magnet of duplex line style, and 5 is arc initiation device, 6 for making the turning axle of magnet rotation, and 7 are cathode surface discharge track, and 8 is the workpiece bias power supply, 9 is arc power, and 10 is inlet mouth, and 11 is vacuum orifice, 12 is flange, 13 is work rest, and 14 is vacuum-chamber wall, and 15 is the cooling channel.
Embodiment
Press the accompanying drawing preparation and arc source and film coating apparatus are installed, wherein cylindric negative electrode external diameter is 64mm, long 500mm, thick 10mm, have the duplex line style groove of closed at both ends (with identical shown in the discharge track among the figure) on the cylindric matrix, the plurality of small blocks permanent magnet is arranged in the groove, wherein the magnet piece N in spiral line type groove is extremely outside, another middle S is extremely outside, with tackiness agent magnet is fixed in the groove, and the magneticstrength horizontal component that magneticstrength is controlled to be at the cathode surface place is 20-50 Gauss, discharge parameter is: 20V, 50A-200A, the highest 400A, workpiece temperature 200-400 ℃.During plated film, the workpiece after will cleaning earlier is stuck on the work rest, after vacuumizing, charges into gas, and short-circuit arc makes evaporation of negative electrode Coating Materials and ionization, and the surface that speeds away forms plasma flow, film forming on workpiece.During arc source work, magnet is uniform rotation under external force, and whole cathode target surface discharge is even, and etching is even, and target utilization reaches more than 70%.
Claims (5)
1, a kind of column magnetron cathode electric arc evaporation source, comprise arc power, cylindrical cathode, be enclosed within shielding case, the negative electrode inner magnet of cathode end, the matrix of fixed magnets, the transmission mechanism that makes the magnet rotation, cooling channel and the arc initiation device in the negative electrode, it is characterized in that described magnet arranges to line style in the shape of a spiral along cathode axis.
2, arc evaporation source as claimed in claim 1 is characterized in that described magnet arrangement becomes the duplex line style, and wherein a spiral line type magnet N is extremely outside, and another S is extremely outside.
3, arc evaporation source as claimed in claim 2 is characterized in that described magnet is the duplex line style layout of closed at both ends.
4, arc evaporation source as claimed in claim 1 is characterized in that described matrix is a column, band spiral line type groove on the surface, and block magnet arrangements is in groove.
5, arc evaporation source as claimed in claim 4 is characterized in that band duplex line style groove on the described matrix surface, and block magnet arrangements is in groove, and is extremely outside along the magnet block N that a spiral-shaped groove is arranged, extremely outside along the magnet block S of another layout.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 94218432 CN2196122Y (en) | 1994-08-18 | 1994-08-18 | Electric arc evaporation source with cylindrical magnetic control cathod |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 94218432 CN2196122Y (en) | 1994-08-18 | 1994-08-18 | Electric arc evaporation source with cylindrical magnetic control cathod |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN2196122Y true CN2196122Y (en) | 1995-05-03 |
Family
ID=33833597
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 94218432 Expired - Lifetime CN2196122Y (en) | 1994-08-18 | 1994-08-18 | Electric arc evaporation source with cylindrical magnetic control cathod |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN2196122Y (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1040235C (en) * | 1994-08-18 | 1998-10-14 | 王福贞 | Cylindrical helical magnetic control cathode arc evaporation source |
-
1994
- 1994-08-18 CN CN 94218432 patent/CN2196122Y/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1040235C (en) * | 1994-08-18 | 1998-10-14 | 王福贞 | Cylindrical helical magnetic control cathode arc evaporation source |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C53 | Correction of patent for invention or patent application | ||
| COR | Change of bibliographic data |
Free format text: CORRECT: PATENTEE; FROM: MA ZHIJIAN TO: WANG FUZHEN |
|
| CP03 | Change of name, title or address |
Address after: 07, 100027, 3, 401, Xinyuan street, Beijing, Chaoyang District Patentee after: Wang Fuzhen Address before: 100020 No. 2, building 101, building 3, Kanto store, Beijing, Chaoyang District Patentee before: Ma Zhijian |
|
| AV01 | Patent right actively abandoned | ||
| C20 | Patent right or utility model deemed to be abandoned or is abandoned |