CN219049600U - Centella mask - Google Patents
Centella mask Download PDFInfo
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- CN219049600U CN219049600U CN202222506556.0U CN202222506556U CN219049600U CN 219049600 U CN219049600 U CN 219049600U CN 202222506556 U CN202222506556 U CN 202222506556U CN 219049600 U CN219049600 U CN 219049600U
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Abstract
The utility model discloses a centella mask, which comprises a mask main body, wherein two eyelets, a nostril and a mouth hole are formed in the mask main body, ear hanging films are arranged on the left side and the right side of the mask main body, the two ear hanging films and the mask main body are integrally arranged, a nose pad is arranged at the nostril, and a middle diaphragm is arranged at one side of the nose pad, which is positioned at the tip of the nose. The utility model is stable when applied, has comprehensive application and good effect of inhibiting skin relaxation, edema and aging.
Description
Technical Field
The utility model relates to the technical field of facial mask cosmetology, in particular to a centella asiatica facial mask.
Background
The principle of the facial mask is that the facial mask is used for temporarily isolating the outside air and pollution, improving the skin temperature, expanding pores of the skin, promoting sweat gland secretion and metabolism, increasing the oxygen content of the skin, facilitating the skin to remove the products of epidermal cell metabolism and accumulated grease substances, and the moisture in the facial mask permeates into the cuticle of the epidermis, so that the skin becomes soft and the skin is natural and bright and elastic.
When the urban life rhythm is fast, a large part of people work, the people can stay up for a long time, the facial skin is easy to relax and edema and skin aging is accelerated, the effects of aging resistance, skin relaxation inhibition and edema of the common facial mask are not ideal, the loss of confidence of the facial mask is easy to cause a consumer, the septal cartilage between the two nostrils is exposed in the air and is not applied when the existing facial mask is applied, the application is incomplete, and the adsorption is carried out only by virtue of the molecular acting force between the facial mask and the face when the facial mask is applied, so that the adsorption stability is poor, some activities with large actions cannot be carried out slightly, and the application stability is poor.
Therefore, we propose an centella asiatica mask to solve the above problems.
Disclosure of Invention
The utility model aims to solve the problems of ageing resistance, skin relaxation inhibition and non-ideal edema of a mask in the prior art, and provides a centella asiatica mask.
In order to achieve the above purpose, the present utility model adopts the following technical scheme:
the centella asiatica mask comprises a mask main body, wherein two eyelets, a nostril and a mouth hole are formed in the mask main body, ear hanging films are arranged on the left side and the right side of the mask main body, the two ear hanging films and the mask main body are integrally arranged, a nose mask is arranged at the nostril, and a middle diaphragm is arranged on one side of the nose mask, which is located at the tip of the nose.
Preferably, the earhole is arranged on the eardrum, the lower side of the eardrum is connected with the part of the mask main body, which is positioned on the mandible, and the upper side of the eardrum is connected with the parts of the mask main body, which are positioned on the two sides of the forehead.
Preferably, the septum is in an inverted T-shaped arrangement, and corners of the nasal mask are all in chamfer arrangement.
Preferably, the mask body is arranged in a backward bending way at the position of the chin.
Preferably, two extension grooves are formed on the upper side of the edge of the mask body.
Preferably, the mask body consists of an centella asiatica application layer and a fabric, and the centella asiatica application layer is adhered to the fabric through an adhesive.
Compared with the prior art, the utility model has the beneficial effects that:
1. through setting up middle diaphragm and hangers membrane, can apply to the cartilage of centering when applying the mask, it is comparatively comprehensive to apply to the face, and when applying the mask, can be steady fix the mask on the face, has avoided the condition that the mask drops in the course of activity;
2. by adopting the centella asiatica applying layer, when a mask is applied, the skin is softer and softer, the skin collagen powder is promoted, free fatty acid is regenerated, a part of connection between the skin and the dermis is compacted, the skin is softer, the effect on skin relaxation treatment is good, the skin supporting force lines are reduced, the skin is compact, smooth and bright and ductile, heat is removed, dampness is removed, swelling is reduced, and edema is inhibited, so that the centella asiatica applying film is very effective for long-term night-decocting skin.
The utility model is stable when applied, has comprehensive application and good effect of inhibiting skin relaxation, edema and aging.
Drawings
Fig. 1 is a schematic diagram of the front structure of a centella asiatica mask according to the present utility model;
fig. 2 is a side structure perspective view of a centella asiatica mask according to the present utility model;
fig. 3 is a cross-sectional view of a mask body in the centella asiatica mask according to the present utility model.
In the figure: 1 mask body, 2 eyes, 3 nostrils, 4 mouth holes, 5 ear hanging films, 6 nose attaching films, 7 middle diaphragms, 8 ear holes, 9 extension grooves, 10 centella applying layers, 11 fabrics and 12 adhesives.
Detailed Description
The following description of the embodiments of the present utility model will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present utility model, but not all embodiments.
Referring to fig. 1-3, an centella mask, including mask main part 1, it is to be explained that mask main part 1 is located the position department of chin and is the backward bending setting, it is to be explained that through the bending setting, when applying, can hold the chin, borrow the power through the chin for the facial mask is laminated completely with the face, avoid droing, it is worth mentioning that the edge upside of mask main part 1 is provided with two extension grooves 9, be provided with two eyelets 2 on the mask main part 1, a nostril 3 and a mouth hole 4, the left and right sides of mask main part 1 all is equipped with the auricle 5, specifically, be provided with the auricle 8 on the auricle 5, the downside of auricle 5 links to each other with the position that mask main part 1 is located the mandible, it is to be explained that the connection scope of auricle 5 is wide, when hanging the ear, can carry out the power of borrowing on a large scale to mask main part 1, avoided pulling force to concentrate and lead to mask main part 1 to even produce the circumstances of breaking away from the face.
In the utility model, the upper sides of the ear hanging films 5 are connected with the parts of the mask main body 1 positioned at the two sides of the forehead, the two ear hanging films 5 and the mask main body 1 are integrally arranged, a nose film 6 is arranged at the nostril 3, a middle membrane 7 is arranged at one side of the nose film 6 positioned at the tip of the nose, the middle membrane 7 is reversely arranged in a T-shaped manner, corners of the nose film 6 are chamfered, the nose film 6 and the middle membrane 7 are integrally formed, the mask main body 1 is composed of a centella applying layer 10 and a fabric 11, and the centella applying layer 10 and the fabric 11 are adhered through an adhesive 12.
When the mask is applied, the mask body 1 is applied to the face, then the middle diaphragm 7 is applied to the middle cartilage and smoothed, the two ear hanging films 5 are respectively hung at the two ears, and the chin is covered by the curved part of the mask body 1.
The foregoing is only a preferred embodiment of the present utility model, but the scope of the present utility model is not limited thereto, and any person skilled in the art, who is within the scope of the present utility model, should make equivalent substitutions or modifications according to the technical scheme of the present utility model and the inventive concept thereof, and should be covered by the scope of the present utility model.
Claims (6)
1. The utility model provides a centella mask, includes mask main part (1), be provided with two eyelets (2) on mask main part (1), a nostril (3) and a mouth hole (4), its characterized in that, the left and right sides of mask main part (1) all is equipped with and hangs eardrum (5), two it all is integrated with mask main part (1) and sets up to hang eardrum (5), nostril (3) department is provided with nose pad (6), one side that nose pad (6) are located the nasal tip is provided with well diaphragm (7).
2. The centella mask according to claim 1, wherein the earhole (8) is formed in the ear hanging film (5), the lower side of the ear hanging film (5) is connected with the part of the mask main body (1) located on the mandible, and the upper side of the ear hanging film (5) is connected with the part of the mask main body (1) located on two sides of the forehead.
3. The centella mask according to claim 1, wherein the middle membrane (7) is inverted T-shaped, and corners of the nose mask (6) are chamfered.
4. The centella mask as claimed in claim 1, wherein the mask body (1) is provided in a backward curved manner at a chin position.
5. The centella mask according to claim 1, wherein two extension grooves (9) are provided on the upper side of the edge of the mask body (1).
6. The centella mask according to claim 1, wherein the mask body (1) is composed of a centella applying layer (10) and a fabric (11), and the centella applying layer (10) and the fabric (11) are adhered by an adhesive (12).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202222506556.0U CN219049600U (en) | 2022-09-21 | 2022-09-21 | Centella mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202222506556.0U CN219049600U (en) | 2022-09-21 | 2022-09-21 | Centella mask |
Publications (1)
Publication Number | Publication Date |
---|---|
CN219049600U true CN219049600U (en) | 2023-05-23 |
Family
ID=86364300
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202222506556.0U Active CN219049600U (en) | 2022-09-21 | 2022-09-21 | Centella mask |
Country Status (1)
Country | Link |
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CN (1) | CN219049600U (en) |
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2022
- 2022-09-21 CN CN202222506556.0U patent/CN219049600U/en active Active
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