CN218773825U - Base station system and cleaning system - Google Patents
Base station system and cleaning system Download PDFInfo
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- CN218773825U CN218773825U CN202123455719.9U CN202123455719U CN218773825U CN 218773825 U CN218773825 U CN 218773825U CN 202123455719 U CN202123455719 U CN 202123455719U CN 218773825 U CN218773825 U CN 218773825U
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Abstract
The utility model provides a base station system and clean system, base station system is used for cleaning device's automatically cleaning, base station system includes a plurality of basic stations, and is a plurality of the basic station separately sets up, cleaning device can be arbitrary the basic station carries out the automatically cleaning. Self-cleaning includes draining and/or washing the cleaning elements; in the technical scheme of this application, owing to set up the basic station in the position of difference to conveniently use the basic station to carry out the automatically cleaning nearby, improved user's use and experienced.
Description
Technical Field
The utility model relates to a clean technical field, in particular to base station system and clean system.
Background
The existing cleaning device has multiple choices of a floor washing machine, a cleaning robot and the like, the floor washing machine and the cleaning robot are provided with cleaning pieces for cleaning the ground, the cleaning pieces can become dirty gradually after working for a period of time, and meanwhile, sewage can be recovered in a sewage tank in the floor washing machine or the cleaning robot. The existing treatments for these situations are self-cleaning of the tank and the sanitary ware by means of a base station, which includes the discharge of sewage and the washing of the sanitary ware; the base station can also charge the cleaning device at the same time.
However, for users with large floor space or multiple users, the users need to frequently and repeatedly perform self-cleaning between the base station and the area to be cleaned during the cleaning process, which reduces the cleaning efficiency and the user experience.
SUMMERY OF THE UTILITY MODEL
The utility model aims at providing a basic station system and clean system aims at improving cleaning device's clean efficiency, promotes user experience.
In order to achieve the above object, the utility model provides a base station system for cleaning device's automatically cleaning, base station system includes a plurality of basic stations, and is a plurality of the basic station separately sets up, cleaning device can be arbitrary the basic station carries out the automatically cleaning.
In an embodiment, the plurality of base stations comprises at least one master base station and at least one slave base station, the master base station comprising a charging assembly for charging the cleaning device.
In one embodiment, the main base station further comprises a water injection assembly for replenishing the cleaning device with water;
and/or the main base station further comprises a liquid injection assembly for supplementing cleaning liquid for the cleaning device;
and/or the master base station further comprises a drying assembly for drying and/or seasoning the cleaning device;
and/or the main base station further comprises a sterilization component for sterilizing the cleaning device.
In one embodiment, the secondary base station is provided with a purge zone.
In an embodiment, the base station system comprises at least one pedestal and at least two carriers, the number of carriers being greater than the number of pedestals, the carriers being provided with a washing area; wherein, each said base bottom installs one said and holds the weight of thing to form one said master base station, every other said holds the weight of thing and forms one said sub-base station respectively.
In one embodiment, the bearing part is provided with a sewage draining outlet;
the sewage draining outlet is communicated with the cleaning area; and/or
The base is provided with a first sewage tank, and the sewage discharge port is communicated with the first sewage tank; and/or
The cleaning equipment is provided with a second sewage tank, and the sewage draining outlet is communicated with the second sewage tank.
In one embodiment, the primary base station is detachably connected to the secondary base station.
In an embodiment, the base station is provided with a positioning element for indicating the position of the base station.
The utility model discloses still include a clean system, clean system includes cleaning device and foretell base station system, the base station system is used for cleaning device's automatically cleaning, automatically cleaning include the blow off water or wash the cleaning member.
In an embodiment, the cleaning device is a floor washer or a cleaning robot.
The utility model discloses a base station system includes a plurality of basic stations, can set up a plurality of basic stations in the different positions of treating clean area, when cleaning device when treating clean area and carrying out the cleaning operation, alright carry out the automatically cleaning operation with going to the basic station that the distance is nearer, return previous position again and continue the operation. Compared with the traditional mode of only arranging one base station, the method and the device can reduce the round-trip distance and time of the cleaning device, so that the cleaning device can continue cleaning operation more quickly, and the cleaning efficiency is improved.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings needed to be used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the structures shown in the drawings without creative efforts.
Fig. 1 is a block diagram of an embodiment of a base station system of the present invention;
fig. 2 is a schematic structural diagram of a main base station according to the present invention;
fig. 3 is a schematic structural diagram of the secondary base station of the present invention.
The reference numbers illustrate:
| reference numerals | Name (R) | Reference numerals | Name (R) |
| 1000 | |
16 | |
| 100 | |
17 | |
| 10 | |
18 | |
| 11 | |
19 | |
| 12 | |
20 | |
| 13 | |
200 | |
| 14 | |
210 | |
| 15 | Sterilization component |
The objects, features and advantages of the present invention will be further described with reference to the accompanying drawings.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative efforts belong to the protection scope of the present invention.
It should be noted that all the directional indicators (such as up, down, left, right, front, back \8230;) in the embodiments of the present invention are only used to explain the relative position relationship between the components, the motion situation, etc. in a specific posture (as shown in the attached drawings), and if the specific posture is changed, the directional indicator is changed accordingly.
In the present application, unless expressly stated or limited otherwise, the terms "connected" and "fixed" are to be construed broadly, e.g., "fixed" may be fixedly connected or detachably connected, or integrally formed; can be mechanically or electrically connected; they may be directly connected or indirectly connected through intervening media, or they may be connected internally or in any other suitable relationship, unless expressly stated otherwise. The specific meaning of the above terms in the present invention can be understood according to specific situations by those of ordinary skill in the art.
In addition, descriptions in the present application as to "first", "second", and the like are for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicit to the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one of the feature. In addition, the technical solutions in the embodiments may be combined with each other, but it must be based on the realization of those skilled in the art, and when the technical solutions are contradictory or cannot be realized, the combination of the technical solutions should not be considered to exist, and is not within the protection scope of the present invention.
The utility model provides a base station system 100 for cleaning device 200's automatically cleaning.
Referring to fig. 1, in an embodiment of the base station system 100 of the present invention, the base station system 100 includes a plurality of base stations, the base stations are separately arranged, and the cleaning device 200 can perform self-cleaning at any base station; self-cleaning here includes draining of sewage and cleaning of the cleaning elements of the cleaning device 200.
Wherein the cleaning device 200 can be, but not limited to, a cleaning robot, a motor-driven floor washing machine, a hand-held floor washing machine, etc., it can be understood that when the cleaning device 200 performs a cleaning operation, cleaning members of the cleaning device 200 become increasingly dirty as the cleaning work continues, and if the cleaning device 200 has a waste water tank for recovering the waste water, the waste water generated during the cleaning work at any time is also increased. Therefore, in the cleaning process, the base station needs to be repeatedly reciprocated to clean the cleaning device 200 itself, and it should be noted that the self-cleaning operation of the cleaning device 200 at the base station may be a sewage draining operation, or may be a cleaning member of the cleaning device 200, and the cleaning member may be a rolling brush, a mop, or other members for rubbing and cleaning the floor.
For example, if the cleaning apparatus 200 is a floor washing machine, the roller brush of the floor washing machine will wipe the area to be cleaned during cleaning the area to be cleaned, and at the same time, the dust and the like in the area to be cleaned will be mixed with the water supplied to the roller brush to form sewage which is stored in the sewage tank of the cleaning apparatus 200 or adsorbed by the roller brush of the floor washing machine, and at this time, the sewage drained from the sewage tank is the self-cleaning operation of the floor washing machine, or the cleaning of the roller brush is also the self-cleaning operation of the floor washing machine.
By adopting the base station system 100 of the application, a plurality of base stations in the base station system 100 can be placed at different positions of an area to be cleaned, such as different rooms, upstairs and downstairs or different corners, so that when cleaning pieces need to be cleaned in the working process of the cleaning device 200, the cleaning device can go to the nearest base station to perform self-cleaning operation, thereby reducing the round-trip distance and time, enabling the cleaning device 200 to continue cleaning operation more quickly, and improving the working efficiency. The number of the base stations may be two or more, and the number of the base stations may be set according to the size of the area to be cleaned, the spatial layout, or the use habit of the user, which is not limited herein.
It should be noted that, the cleaning apparatus 200 goes to any base station for self-cleaning, which base station is selected and controlled by the user, or the cleaning apparatus 200 automatically detects the distance between the cleaning apparatus 200 and a plurality of base stations and compares the distances to automatically control the base stations, which is not limited herein.
Therefore, it can be understood that the base station system 100 of the present invention includes a plurality of base stations, and can set a plurality of base stations at different positions of the cleaning area, when the cleaning device 200 performs cleaning operation in the cleaning area, it can go to the base station with a short distance to perform self-cleaning operation, and then return to the previous position to continue the operation. Compared with the traditional mode of only arranging one base station, the cleaning device 200 can reduce the round trip distance and time of the cleaning device 200, so that the cleaning device 200 can continue cleaning operation more quickly, and the cleaning efficiency is improved.
Referring to fig. 1 to 3, in some embodiments of the base station system 100 of the present invention, a plurality of base stations include at least one main base station 10 and at least one sub-base station 20, and the main base station 10 includes a charging assembly 11 for charging the cleaning device 200.
In the present embodiment, it is defined that the plurality of base stations in the base station system 100 includes at least one main base station 10 and at least one sub base station 20, the cleaning apparatus 200 may perform self-cleaning at any one of the main base station 10 and the sub base station 20, and in addition, the charging component 11 is provided on the main base station 10, when the cleaning apparatus 200 is used in cooperation with the main base station 10 (the main base station 10 includes the base 16 and the carrier 17), that is, when the cleaning apparatus 200 enters the main base station 10, referring to fig. 2, self-cleaning may be performed on the main base station 10 or charging may be performed on the main base station 10, at this time, the charging component 11 on the main base station 10 may be a charging interface or charging contact or the like provided on the main base station 10, when the cleaning apparatus 200 enters the main base station 10 and charging is required, the main base station 10 may be connected with an external power supply to transfer power to the cleaning apparatus 200, at this time, the main base station 10 may be provided with a battery provided on the main base station 10, and the battery in the battery may be supplied to the cleaning apparatus 200. The charging assembly 11 may also be a wireless charging assembly 11, by providing a charging coil in the main base station 10, and providing a built-in coil in the cleaning apparatus 200, when the cleaning apparatus 200 enters the main base station 10 and needs to be charged, the built-in coil is coupled with the charging coil, and supplies power to the cleaning apparatus 200 by a magnetoelectric principle.
Referring to fig. 3, when the cleaning apparatus 200 is used with the secondary base station 20, the cleaning apparatus 200 may perform a self-cleaning operation at the secondary base station 20, and the self-cleaning manner of the cleaning apparatus 200 by the secondary base station 20 may be the same as the self-cleaning manner of the cleaning apparatus 200 by the main base station 10, or may be different from the self-cleaning manner of the cleaning apparatus 200 by the main base station 10, which is not limited herein. In some embodiments, the cleaning device 200 cleans the cleaning elements on the secondary base station 20, for example, a brush head or a groove is disposed on the cleaning area 18 of the secondary base station 20, so that the cleaning device 200 moves on the secondary base station 20 and is cleaned by the brush head or the groove on the secondary base station 20; or the cleaning device 200 automatically discharges sewage at the secondary base station 20, so that the secondary base station 20 does not need to be provided with devices such as a driving structure and a battery, the secondary base station 20 can get rid of the limitation of a power supply on the arrangement position, the weight of the secondary base station 20 can be reduced, and the secondary base station 20 is more portable.
Referring to fig. 1, in some embodiments of the base station system 100 of the present invention, the main base station 10 further includes a water filling assembly 12 for filling the cleaning device 200 with water.
In this embodiment, the cleaning device 200 is provided with a clean water chamber for storing water, so that the cleaning device 200 can supply water to the area to be cleaned or the cleaning member, if the cleaning device 200 only cleans the sundries and dust in the area to be cleaned, the cleaning chamber of the cleaning device 200 can supply water to the area to be cleaned, so as to avoid raising dust or better wiping the ground during the cleaning process; the cleaning device 200 may also be a floor scrubbing machine, the cleaning device 200 supplying water to the cleaning members and using the cleaning members to scrub the area to be cleaned to wash the area to be cleaned. In this embodiment, a water injection assembly 12 is disposed in the main base station 10, when the cleaning apparatus 200 enters the main base station 10 and the amount of water in the clean water cavity is insufficient, the main base station 10 may inject water into the clean water cavity of the cleaning apparatus 200, so that the cleaning apparatus 200 may perform subsequent cleaning, the water injection assembly 12 may include a water pump and a water tank, and water in the water tank is pumped out by the water pump and injected into the clean water cavity of the cleaning apparatus 200; the water injection assembly 12 may be a water injection channel and a valve directly communicated with an external water source, so that water of the external water source is injected into the clean water cavity of the cleaning device 200 through the water injection assembly 12; of course, the external water source may fill the water tank, and the water in the water tank is pumped by the water pump of the main base station 10 and is filled into the clean water cavity of the cleaning apparatus 200, and the specific manner of the water filling assembly 12 is not limited herein.
Referring to fig. 1, in some embodiments of the base station system 100 of the present invention, the main base station 10 further includes a liquid injection assembly 13 for supplementing the cleaning device 200 with cleaning liquid.
In this embodiment, a liquid storage cavity is formed in the cleaning device 200, and can store cleaning agent; it can be understood that when the cleaning device 200 cleans an area to be cleaned, a cleaning agent can be injected into the area to be cleaned or a cleaning member on the cleaning device 200, and the cleaning agent is mostly a chemical cleaning agent, so that the cleaning effect of the cleaning device 200 on the area to be cleaned can be improved, for example, the cleaning of some dirt which is not easy to clean can be accelerated; or the cleaning agent is only aromatic agent or the like so that the cleaning area emits fragrance after being cleaned. Due to the limited capacity of the reservoir of the cleaning device 200, when the cleaning agent in the reservoir is used up, the main base station 10 can replenish the reservoir with the cleaning agent through the liquid injection assembly 13.
Referring to fig. 1, in some embodiments of the base station system 100 of the present invention, the main base station 10 is further provided with a drying component 14, and the drying component 14 is used for drying and/or air-drying the cleaning members of the cleaning device 200.
In the present embodiment, the main base station 10 is further provided with a drying assembly 14, and when the cleaning device 200 enters the main base station 10, the main base station 10 can perform a drying process on the cleaning device 200; the drying assembly 14 may be, but is not limited to, a seasoning assembly, a drying assembly, or a combination thereof, for seasoning or drying the cleaning device 200.
Referring to fig. 1, in some embodiments of the base station system 100 of the present invention, the main base station 10 further includes a sterilization component 15, and the sterilization component 15 is used for sterilizing the cleaning device 200.
In the present embodiment, the main base station 10 further includes a sterilization assembly 15, and when the cleaning device 200 enters the main base station 10, the main base station 10 can perform sterilization processing on the cleaning device 200; the sterilization assembly 15 may be an ultraviolet lamp to irradiate ultraviolet light to the cleaning device 200 for sterilization; the sterilization assembly 15 may also be a steam generator to sterilize the cleaning device 200 by high-temperature steam, and the arrangement manner of the sterilization assembly 15 is not particularly limited herein.
In some embodiments of the base station system 100 of the present invention, the secondary base station 20 is provided with a purge zone 18.
The technical scheme of this application aims at making cleaning device 200 go to any base station and carry out self-cleaning operation. In this embodiment, the secondary base station 20 is provided with a cleaning area 18, and the cleaning area 18 can be used for containing clean water so as to enter the cleaning area 18 to clean the cleaning member when the cleaning device 200 enters the secondary base station 20; after the cleaning device 200 uses the cleaning area 18 to clean the cleaning members, sewage exists in the cleaning area 18, and at this time, the sewage in the cleaning area 18 can be manually dumped, or the cleaning device 200 can pump the sewage away and discharge the sewage at a proper position.
In some embodiments, referring to fig. 2, the main base station 10 may also be provided with a cleaning area 18, so that the cleaning device 200 can clean the cleaning members in the cleaning area 18 of the main base station 10, and after the cleaning device 200 cleans the cleaning members by using the cleaning area 18, sewage exists in the cleaning area 18, and at this time, the sewage in the cleaning area 18 can be dumped manually, or the cleaning device 200 can pump the sewage away and discharge the sewage at a proper position.
In some embodiments of the base station system 100 of the present invention, referring to fig. 2 and 3, the main base station 10 and/or the sub base station 20 is opened with a sewage draining outlet 19, and the sewage draining outlet 19 is communicated with the washing area 18 and/or the second sewage tank 210 of the cleaning apparatus 200. The base 16 of the main base station 10 may be provided with a first sewage tank, and at this time, if the main base station 10 is further provided with a sewage drain 19, the sewage drain 19 communicates with the first sewage tank for collecting the sewage in the second sewage tank 210 and/or the sewage in the washing section 18 of the cleaning apparatus 200 and discharging the sewage through the sewage drain 19. The drain outlet 19 can be directly communicated with a floor drain to discharge sewage into a sewer. The arrangement of the clean zone and the soil discharge outlet 19 of the main base station 10 and the subsidiary base station 20 may be set as desired, for example, only the clean zone or only the soil discharge outlet 19 or both the clean zone and the soil discharge outlet 19 of the main base station 10 may exist, and the soil discharge outlet 19 may be communicated with one or both of the first sewage tank (not necessarily) of the main base station 10 and the second sewage tank 210 and the clean zone of the cleaning apparatus 200; similarly, the subsidiary base station 20 may be provided such that only the clean area or only the soil discharge opening 19 or both the clean area and the soil discharge opening 19 exist, and the soil discharge opening 19 may communicate with the second wastewater tank 210 of the cleaning apparatus 200 and the clean area alternatively or simultaneously.
In the solution of the foregoing embodiment, the cleaning apparatus 200 can clean the cleaning members in the cleaning zone 18 of the main base station 10 or the sub base station 20, and the sewage generated in the cleaning zone can be directly or indirectly discharged through the sewage discharge outlet 19, or the sewage stored in the second sewage tank 210 itself can be discharged through the sewage discharge outlet 19. It is understood that, in any of the above operations, the cleaning device 200 can quickly return to the cleaning area to be cleaned after the base station in the base station system 100 completes self-cleaning, thereby improving the cleaning efficiency.
In one embodiment, whether the drain 19 and the clean zone are provided on the main base station 10 and the sub base station 20 at the same time is set by those skilled in the art according to actual situations;
for example, the main base station 10 may be provided with a clean area, and the sub base station 20 may have both the clean area and the soil discharge opening 19; this is applicable to the case where the main base station 10 is placed in a place where drainage is inconvenient such as a user's living room, and the sub base station 20 is placed on a balcony where drainage is convenient.
In summary, the main base station 10 can be provided with a cleaning zone 18 and/or a drain 19; the secondary base station 20 is also capable of providing a washing zone 18 and/or a waste outlet 19. Can be connected drain 19 and floor drain etc. can make the sewage in rinsing district 18 or cleaning device 200 or base 16 directly outwards discharge, need not the user and emptys, improves the convenience of use.
In some embodiments of the base station system 100 of the present invention, the base station system 100 comprises at least one base 16 and at least two supporting members 17, the number of the supporting members 17 is greater than the number of the base 16, the supporting members 17 are provided with a cleaning area 18 and/or a sewage draining exit 19;
wherein, each of the pedestals 16 is installed with one of the carriers 17 to form the main base station 10, and each of the rest of the carriers 17 forms one of the sub-base stations 20.
In one embodiment, the base station system 100 includes at least one base 16 and at least two carriers 17, the base 16 is provided with mounting positions for mounting the carriers 17, each base 16 and one carrier 17 are combined to form one main base station 10, and the carriers 17 not connected to the base 16 form the sub-base stations 20, so that the sub-base stations 20 can be used as spare parts of the carriers 17 on the main base station 10, so as to mount one of the sub-base stations 20 on the base 16 when the carrier 17 on the main base station 10 is damaged, thereby preventing the main base station 10 from being unusable. In addition, the main base station 10 and the sub base station 20 are provided with a sewage draining exit 19 and/or a cleaning area, so that the cleaning device 200 can be self-cleaned nearby, and the use convenience is improved.
In some embodiments of the base station system 100 of the present invention, a first sewage tank is disposed in the base 16, and the first sewage tank in the base 16 is communicated with the sewage draining outlet 19 of the bearing member 17 installed on the base 16.
In some embodiments, after the cleaning device 200 enters the main base station 10 for self-cleaning, the waste water in the cleaning region 18 enters the waste water tank of the base 16; so set up, can make the basic station break away from the restriction of positions such as floor drain, put wantonly. In addition, the sub base station 20 may be replaced with the carrier 17 on the main base station 10.
In some embodiments of the present invention, the main base station 10 and the sub base station 20 are detachably connected to each other. The detachable connection mode between the main base station 10 and the auxiliary base station 20 can be a snap connection, a magnetic connection or a bolt connection, and the like, and is not limited herein.
In some embodiments of the base station system 100 of the present invention, the base station is provided with a positioning element for indicating the position of the base station.
In this embodiment, the base station is provided with a positioning element, which is a signal generator and can send a position signal, such as a radio frequency signal or a bluetooth signal; the cleaning device 200 is provided with a detection component to detect the distance between the cleaning device 200 and each base station through the position signal sent by the base station, so that the nearest base station can be judged when the cleaning device 200 needs to clean itself, and the base station is moved to carry out self-cleaning, so that the distance and time of the cleaning device 200 to and from the base station are reduced, the cleaning device 200 can continue cleaning operation more quickly, and the working efficiency is improved.
Referring to fig. 1-3, the present invention further provides a cleaning system 1000, which includes a cleaning device 200 and the base station system 100 in any of the foregoing embodiments, and the specific structure of the base station system 100 refers to the foregoing embodiments, which are not described herein, and the cleaning device 200 may be, but is not limited to, a cleaning robot, an automatic floor washing machine or a handheld floor washing machine, which can perform a self-cleaning operation at any of the foregoing base stations. Since the cleaning system 1000 provided by the present application employs all technical solutions in all the aforementioned embodiments, at least all beneficial effects brought by the aforementioned technical solutions are provided, and are not described herein again.
The above only is the preferred embodiment of the present invention, not limiting the scope of the present invention, all the equivalent structure changes made by the contents of the specification and the drawings under the inventive concept of the present invention, or the direct/indirect application in other related technical fields are included in the patent protection scope of the present invention.
Claims (10)
1. A base station system for self-cleaning of a cleaning device, said base station system comprising a plurality of base stations, said plurality of base stations being separately located, said cleaning device being capable of self-cleaning at any one of said base stations;
the plurality of base stations comprises at least one main base station and at least one secondary base station, the main base station comprises a charging assembly for charging the cleaning device, the secondary base station is provided with a washing area, so that the cleaning device can discharge sewage at the secondary base station, and/or the washing area can be used for containing clean water for washing cleaning pieces of the cleaning device.
2. The base station system of claim 1,
the main base station further comprises a water filling assembly for replenishing water for the cleaning device;
and/or the main base station further comprises a liquid injection assembly for supplementing cleaning liquid for the cleaning device;
and/or the master base station further comprises a drying assembly for drying and/or seasoning the cleaning device;
and/or the main base station further comprises a sterilization component for sterilizing the cleaning device.
3. The base station system of claim 1, wherein the base station system comprises at least one pedestal and at least two carriers, the number of carriers being greater than the number of pedestals, the carriers being provided with a wash zone;
wherein, the bottom of each base is provided with one bearing piece to form the main base station, and the rest bearing pieces form the secondary base stations respectively.
4. The base station system of claim 3,
a sewage draining outlet is arranged on the bearing piece;
the sewage draining outlet is communicated with the cleaning area; and/or
The base is provided with a first sewage tank, and the sewage discharge port is communicated with the first sewage tank; and/or
The cleaning device is provided with a second sewage tank, and the sewage draining outlet is communicated with the second sewage tank.
5. The base station system of claim 1, wherein the primary base station is detachably connected to the secondary base station.
6. The base station system of claim 1, wherein only the master base station includes a power source and/or a battery.
7. The base station system of claim 4, wherein the drain is in communication with a floor drain.
8. A base station system as claimed in any one of claims 1 to 7, characterized in that the base stations are provided with locating elements for indicating the position of the base station.
9. A cleaning system, characterized in that the cleaning system comprises a base station system as claimed in any of claims 1 to 8 and a cleaning device.
10. The cleaning system of claim 9, wherein the cleaning apparatus is a floor scrubber or a cleaning robot.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202123455719.9U CN218773825U (en) | 2021-12-31 | 2021-12-31 | Base station system and cleaning system |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202123455719.9U CN218773825U (en) | 2021-12-31 | 2021-12-31 | Base station system and cleaning system |
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| CN218773825U true CN218773825U (en) | 2023-03-31 |
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| CN202123455719.9U Active CN218773825U (en) | 2021-12-31 | 2021-12-31 | Base station system and cleaning system |
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| CN (1) | CN218773825U (en) |
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