CN218614827U

CN218614827U - Rotary processing table and wafer processing equipment

Info

Publication number: CN218614827U
Application number: CN202222479436.6U
Authority: CN
Inventors: 郑磊荣; 李福海; 尹建刚; 高云峰
Original assignee: Shenzhen Hans Semiconductor Equipment Technology Co Ltd
Current assignee: Shenzhen Hans Semiconductor Equipment Technology Co Ltd
Priority date: 2022-09-19
Filing date: 2022-09-19
Publication date: 2023-03-14
Anticipated expiration: 2032-09-19

Abstract

The application provides a rotatory processing platform and wafer processing equipment, rotatory processing platform includes: a frame; the mounting plate is arranged on the rack; the carrying platform is rotatably arranged on the mounting plate; and the driving mechanism comprises a servo motor and a transmission assembly, the servo motor is arranged on the mounting plate and positioned on one side of the rack, and the transmission assembly is in transmission connection with the servo motor and the carrying platform and is used for transmitting the rotary driving force of the servo motor to the carrying platform so as to drive the carrying platform to rotate. The application provides a rotary machining platform, through setting up servo motor on the mounting panel and be located one side of frame to cooperation drive assembly, give the microscope carrier with servo motor's rotary driving power transmission, and then it is rotatory to drive the microscope carrier, can effectively reduce rotary machining platform's overall height, compact structure has avoided adopting directly to drive rotary motor and has leaded to the overall height increase of rotary machining platform and then lead to the space to occupy big problem.

Description

Rotary processing table and wafer processing equipment

Technical Field

The application belongs to the technical field of wafer processing, and particularly relates to a rotary processing table and wafer processing equipment.

Background

In the process of cutting, a wafer generally needs to be placed on a carrying table of a rotary processing table, and the carrying table is driven to rotate by a direct-drive rotating motor (commonly called a DD motor), so as to realize the reversing of the wafer. However, the adoption of the direct-drive rotating motor greatly increases the overall height of the rotary processing table, thereby causing large space occupation.

SUMMERY OF THE UTILITY MODEL

The application aims to provide a rotary processing table, which reduces the overall height of the rotary processing table.

In order to achieve the purpose, the technical scheme adopted by the application is as follows: provided is a rotary processing table including:

a frame;

the mounting plate is arranged on the rack;

the carrying platform is rotatably arranged on the mounting plate; and the number of the first and second groups,

the driving mechanism comprises a servo motor and a transmission assembly, the servo motor is arranged on the mounting plate and located on one side of the rack, and the transmission assembly is in transmission connection with the servo motor and the carrying platform and used for transmitting the rotary driving force of the servo motor to the carrying platform so as to drive the carrying platform to rotate.

Further, the mounting panel includes first installation department and with the second installation department that first installation department is connected, first installation department set up in the frame, the microscope carrier rotatable install in on the first installation department, the second installation department stretches out outside the frame, servo motor set up in on the second installation department.

Further, the transmission assembly comprises a driving belt wheel in transmission connection with the servo motor, a driven belt wheel in transmission connection with the carrying platform, and a synchronous belt in transmission connection between the driving belt wheel and the driven belt wheel.

Further, the rotary processing table further comprises a grating ruler displacement sensor for detecting the rotation angle of the servo motor.

Furthermore, the rotary processing table further comprises a visual detection mechanism, a groove is formed in the rack, and the visual detection mechanism is arranged in the groove.

Further, the contact position between the mounting plate and the frame is provided with an insulating member for insulating the mounting plate and the frame from each other.

Further, the rotary processing table further comprises a first adjusting assembly for adjusting the flatness of the mounting plate so that the mounting plate is parallel to the frame, and the mounting plate is mounted on the frame through the first adjusting assembly; and/or the presence of a gas in the atmosphere,

the rotary processing table further comprises a second adjusting component used for adjusting the flatness of the carrying platform so that the carrying platform is parallel to the mounting plate, and the carrying platform is mounted on the mounting plate through the second adjusting component.

Furthermore, the first adjusting assembly comprises a first adjusting piece and a first locking piece, a first adjusting hole is formed in the mounting plate, the first adjusting piece is adjustably mounted in the first adjusting hole, one end of the first adjusting piece extends out of the first adjusting hole and abuts against the rack, a first locking hole is formed in the rack, and the first locking piece is used for being connected and fixed with the first locking hole after the first adjusting piece is adjusted in place; and/or the presence of a gas in the atmosphere,

the second adjusting assembly comprises a second adjusting piece and a second locking piece, a second adjusting hole is formed in the carrying platform, the second adjusting piece is adjustably installed in the second adjusting hole, one end of the second adjusting piece extends out of the second adjusting hole and abuts against the mounting plate, a second locking hole is formed in the mounting plate, and the second locking piece is used for being connected and fixed with the second locking hole after the second adjusting piece is adjusted in place.

Further, the number of the first adjusting pieces comprises a plurality of first adjusting pieces which are arranged on the mounting plate at intervals; and/or the number of the second adjusting pieces comprises a plurality of second adjusting pieces which are arranged on the carrier at intervals.

The application also provides a wafer processing device which comprises the rotary processing table.

The application provides a rotatory processing platform's beneficial effect lies in: through setting up servo motor on the mounting panel and being located one side of frame to cooperation drive assembly, give servo motor's rotary driving power transmission for the microscope carrier, and then drive the microscope carrier rotation, can effectively reduce the overall height of rotary machining platform, compact structure has avoided adopting and has directly driven rotary motor to lead to the overall height increase of rotary machining platform and then lead to the problem that the space occupies greatly.

Drawings

In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings needed to be used in the embodiments or the prior art descriptions will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present application, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without inventive exercise.

Fig. 1 is a schematic perspective view of a rotary processing table according to an embodiment of the present disclosure;

FIG. 2 is a schematic perspective view of FIG. 1 at another angle;

fig. 3 is a schematic front view of a rotary processing table according to an embodiment of the present disclosure;

fig. 4 is a schematic right-view structural diagram of a rotary processing table according to an embodiment of the present application;

FIG. 5 is an enlarged partial view of FIG. 4 at A;

fig. 6 is a schematic top view of a rotary processing table according to an embodiment of the present disclosure.

Wherein, in the figures, the various reference numbers:

10. a frame; 11. a concave position; 12. a groove; 20. mounting a plate; 21. a first mounting portion; 22. a second mounting portion; 30. carrying platform; 40. a servo motor; 50. a transmission assembly; 51. a driving pulley; 52. a synchronous belt; 60. a first adjustment assembly; 61. a first adjusting member; 611. a first through hole; 70. a second adjustment assembly; 71. a second adjusting member; 711. a second through hole; 80. an insulating member.

Detailed Description

In order to make the technical problems, technical solutions and advantageous effects to be solved by the present application clearer, the present application is further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present application and are not intended to limit the present application.

It will be understood that when an element is referred to as being "secured to" or "disposed on" another element, it can be directly on the other element or be indirectly on the other element. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or be indirectly connected to the other element.

It will be understood that the terms "length," "width," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," and the like, refer to an orientation or positional relationship illustrated in the drawings for convenience in describing the present application and to simplify description, and do not indicate or imply that the referenced device or element must have a particular orientation, be constructed and operated in a particular orientation, and thus should not be construed as limiting the present application.

Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or to implicitly indicate the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the present application, "a plurality" means two or more unless specifically limited otherwise.

Referring to fig. 1 to 3 together, the rotary processing table provided in the present application will now be described. The rotary machining table of the present application includes a frame 10, an attachment plate 20, a stage 30, and a drive mechanism. The mounting plate 20 is disposed on the frame 10. The carrier 30 is rotatably mounted on the mounting plate 20. The carrier 30 may be used to carry a workpiece to be processed, which may be a wafer or the like. The drive mechanism includes a servo motor 40 and a transmission assembly 50. The servo motor 40 is disposed on the mounting plate 20 and located at one side of the frame 10, and the transmission assembly 50 is connected to the servo motor 40 and the stage 30 in a transmission manner, and is configured to transmit a rotation driving force of the servo motor 40 to the stage 30 to drive the stage 30 to rotate. By providing the servo motor 40 and the transmission assembly 50, the rotational driving force of the servo motor 40 is transmitted to the stage 30, and the stage 30 is driven to rotate.

The application provides a rotary processing platform, through set up servo motor 40 on mounting panel 20 and be located one side of frame 10 to cooperation drive assembly 50, transmit servo motor 40's rotary driving power for microscope carrier 30, and then drive microscope carrier 30 rotatory, can effectively reduce rotary processing platform's overall height, and compact structure has avoided adopting the overall height that directly drives rotary motor and lead to rotary processing platform to increase and then lead to the space to occupy big problem.

Referring to fig. 1 to 2, the mounting plate 20 may include a first mounting portion 21 and a second mounting portion 22 connected to the first mounting portion 21. The first installation part 21 is arranged on the frame 10, the carrying platform 30 can be rotatably installed on the first installation part 21, the second installation part 22 extends out of the frame 10, and the servo motor 40 is arranged on the second installation part 22, so that the height of the whole rotary processing table can be effectively reduced. Specifically, the first mounting portion 21 and the second mounting portion 22 may be integrally connected.

Referring to fig. 1, a recess 11 may be formed on the frame 10, and the first mounting portion 21 is mounted in the recess 11, so as to further reduce the overall height of the rotary processing table.

Referring to fig. 1 to 2 and 6, the driving assembly 50 may include a driving pulley 51 in driving connection with the servo motor 40, a driven pulley in driving connection with the stage 30, and a timing belt 52 in driving connection between the driving pulley 51 and the driven pulley (not shown). Through setting up driving pulley 51, driven pulley and hold-in range 52 to can realize transmitting the rotary drive power of servo motor 40 to microscope carrier 30, and then drive microscope carrier 30 and rotate, its simple structure, and convenient nimble position that sets up servo motor 40.

The rotary processing table may further include a grating scale displacement sensor (not shown) for detecting the rotation angle of the servo motor 40. Through the arrangement of the grating ruler displacement sensor, the rotation precision of the servo motor 40 can be improved, and the requirement of high-precision rotation is met.

Referring to fig. 1 to 3, the rotary processing table may further include a visual inspection mechanism (not shown), a groove 12 is formed on the frame 10, and the visual inspection mechanism is disposed in the groove 12. The existing rotary machining table cannot be provided with a visual detection mechanism due to limited space, and when the back of a workpiece needs to be detected, the workpiece needs to be taken down from the carrying platform 30 for detection. In the present application, the groove 12 is formed in the rack 10, so that the visual detection mechanism can be accommodated in the groove 12, and the visual detection mechanism can be additionally arranged in a narrow space, thereby realizing a real-time monitoring function from the back. Specifically, the groove 12 may be a C-shaped groove 12.

Referring to fig. 1 to 2 and 6, in one embodiment of the present application, the rotary processing table may further include a first adjusting assembly 60 for adjusting the flatness of the mounting plate 20 such that the mounting plate 20 is parallel to the frame 10, and the mounting plate 20 is mounted on the frame 10 by the first adjusting assembly 60. Through the arrangement of the first adjusting component 60, the adjustment of the flatness of the mounting plate 20 can be realized, and further, the adjustment of the parallelism between the mounting plate 20 and the rack 10 can be realized.

Referring to fig. 1 to 2 and 6, in another embodiment of the present application, the rotary machining table may further include a second adjusting assembly 70 for adjusting the flatness of the carrier 30 so that the carrier 30 is parallel to the mounting plate 20, and the carrier 30 is mounted on the mounting plate 20 through the second adjusting assembly 70. Through the arrangement of the second adjusting assembly 70, the flatness of the carrier 30 can be adjusted, and further, the parallelism between the carrier 30 and the mounting plate 20 can be adjusted.

Certainly, in another embodiment of the present application, the first adjusting assembly 60 and the second adjusting assembly 70 may also be simultaneously disposed, and the parallelism between the carrier 30 and the rack 10 is finally achieved through two layers of adjustment, so that the debugging efficiency is effectively improved, and the debugging difficulty is reduced.

Referring to fig. 1-2 and 6, the first adjusting assembly 60 may include a first adjusting member 61 and a first locking member (not shown). The mounting plate 20 is provided with a first adjusting hole (not shown), the first adjusting member 61 is adjustably installed in the first adjusting hole, and one end of the first adjusting member 61 extends out of the first adjusting hole and abuts against the rack 10, so that the distance between the mounting plate 20 and the rack 10 can be adjusted, the flatness of the mounting plate 20 can be adjusted, and the mounting plate 20 and the rack 10 can be parallel to each other. The frame 10 may be provided with a first locking hole (not shown), and the first locking member is used to be connected and fixed with the first locking hole after the first adjusting member 61 is adjusted to the position. When the first adjusting member 61 is adjusted to a predetermined position, the first locking member is engaged with the first locking hole, so that the mounting plate 20 is fixed to the frame 10. When the adjustment is needed, the first locking piece and the first locking hole are only required to be loosened, and then the flatness of the mounting plate 20 can be adjusted by adjusting the position of the first adjusting piece 61 in the first adjusting hole. Specifically, the first adjusting member 61 may be an adjusting jackscrew, the first adjusting hole may be a threaded hole, the first locking member may be a screw, and the first locking hole may be a threaded hole. In one embodiment of the present application, the first adjusting member 61 may be provided with a first through hole 611, and the first locking member passes through the first through hole 611 and is connected and fixed with the first locking hole.

Referring to fig. 1-2 and 6, the second adjusting assembly 70 may include a second adjusting member 71 and a second locking member (not shown). A second adjusting hole (not shown) is formed in the carrier 30, the second adjusting piece 71 is adjustably installed in the second adjusting hole, and one end of the second adjusting piece 71 extends out of the second adjusting hole and abuts against the mounting plate 20, so that the distance between the carrier 30 and the mounting plate 20 can be adjusted, the flatness of the carrier 30 can be adjusted, and the carrier 30 and the mounting plate 20 are parallel to each other. The mounting plate 20 is provided with a second locking hole (not shown), and the second locking member is used for being connected and fixed with the second locking hole after the second adjusting member 71 is adjusted in place. When the second adjusting member 71 is adjusted in position, the second locking member can be engaged with the second locking hole, so as to fix the carrier 30 on the mounting plate 20. When the adjustment is needed, the flatness of the carrier 30 can be adjusted only by loosening the second locking member and the second locking hole and adjusting the position of the second adjusting member 71 in the second adjusting hole. Specifically, the second adjusting member 71 may be an adjusting jack screw, the second adjusting hole may be a threaded hole, the second locking member may be a screw, and the second locking hole may be a threaded hole. In one embodiment of the present application, the second adjusting member 71 may have a second through hole 711, and the second locking member passes through the second through hole 711 and is connected and fixed with the second locking hole.

Referring to fig. 1 to 2 and fig. 6, the number of the first adjusting members 61 may include a plurality of first adjusting members 61, and the plurality of first adjusting members 61 are disposed on the mounting plate 20 at intervals. By providing a plurality of first adjusting members 61, the adjustment accuracy of the flatness of the mounting plate 20 can be improved. Specifically, in one embodiment of the present application, the number of the first adjusting members 61 may be three, and the adjustment of the flatness of the mounting plate 20 can be conveniently and quickly achieved by using the basic principle that three points define one plane.

Referring to fig. 1 to 2 and fig. 6, the number of the second adjusting members 71 may include a plurality of second adjusting members 71, and the plurality of second adjusting members 71 are disposed on the carrier 30 at intervals. By providing a plurality of second adjusters 71, the adjustment accuracy of the flatness of the stage 30 can be improved. Specifically, in one embodiment of the present application, the number of the second adjusting members 71 may be three, and the flatness adjustment of the carrier 30 can be conveniently and quickly realized by using the basic principle that three points determine one plane.

Referring to fig. 4 to 5, an insulating member 80 may be further disposed at a contact position between the mounting plate 20 and the frame 10, so as to insulate the mounting plate 20 and the frame 10 from each other, thereby preventing the carrier 30 from being conducted with the frame 10, and further providing an insulating environment required for contact height measurement.

In one embodiment of the present application, the insulating member 80 is disposed between the first adjusting member 61 and the frame 10, and an insulating sleeve (not shown) is disposed outside the first adjusting member 61, so as to prevent the conduction between the mounting plate 20 and the frame 10.

The application also provides a wafer processing apparatus comprising the rotary processing table of any of the above embodiments.

The wafer processing equipment of the present application includes the rotating processing table in any of the above embodiments, so that the wafer processing equipment has the beneficial effects of the rotating processing table in any of the above embodiments, and details are not repeated herein.

The above description is only exemplary of the present application and should not be taken as limiting the present application, as any modification, equivalent replacement, or improvement made within the spirit and principle of the present application should be included in the protection scope of the present application.

Claims

1. A rotary processing table, characterized by: the method comprises the following steps:

a frame;

the mounting plate is arranged on the rack;

the carrying platform is rotatably arranged on the mounting plate; and (c) a second step of,

2. The rotary processing station of claim 1, wherein: the mounting panel include first installation department and with the second installation department that first installation department is connected, first installation department set up in the frame, the microscope carrier rotatable mounting in on the first installation department, the second installation department stretches out outside the frame, servo motor set up in on the second installation department.

3. The rotary processing station of claim 1, wherein: the transmission assembly comprises a driving belt wheel in transmission connection with the servo motor, a driven belt wheel in transmission connection with the carrier platform, and a synchronous belt in transmission connection between the driving belt wheel and the driven belt wheel.

4. The rotary processing station of claim 1, wherein: the rotary processing table further comprises a grating ruler displacement sensor for detecting the rotation angle of the servo motor.

5. The rotary processing station of claim 1, wherein: the rotary machining table further comprises a visual detection mechanism, a groove is formed in the rack, and the visual detection mechanism is arranged in the groove.

6. The rotary processing station of claim 1, wherein: and an insulating piece used for insulating the mounting plate and the rack from each other is arranged at the contact position between the mounting plate and the rack.

7. The rotary processing station of any of claims 1-6, wherein: the rotary processing table further comprises a first adjusting assembly used for adjusting the flatness of the mounting plate so as to enable the mounting plate to be parallel to the rack, and the mounting plate is mounted on the rack through the first adjusting assembly; and/or the presence of a gas in the atmosphere,

8. The rotary processing station of claim 7, wherein: the first adjusting assembly comprises a first adjusting piece and a first locking piece, a first adjusting hole is formed in the mounting plate, the first adjusting piece is adjustably mounted in the first adjusting hole, one end of the first adjusting piece extends out of the first adjusting hole and abuts against the rack, a first locking hole is formed in the rack, and the first locking piece is used for being connected and fixed with the first locking hole after the first adjusting piece is adjusted in place; and/or the presence of a gas in the atmosphere,

9. The rotary processing station of claim 8, wherein: the number of the first adjusting pieces comprises a plurality of first adjusting pieces which are arranged on the mounting plate at intervals; and/or the number of the second adjusting pieces comprises a plurality of second adjusting pieces which are arranged on the carrier at intervals.

10. A wafer processing apparatus, characterized by: comprising a rotary processing table according to any of claims 1 to 9.