CN218567829U - RGB light shield and color filter - Google Patents

Abstract

The utility model discloses a RGB light shield and color filter, the RGB light shield includes: aligning the through holes; the alignment through hole is used for manufacturing an alignment mark; the vertical projection of the alignment through hole on the target object comprises a first edge and a second edge which are oppositely arranged, and a third edge and a fourth edge which are oppositely arranged, wherein the first edge, the third edge, the second edge and the fourth edge are sequentially adjacent; the first edge is provided with a first groove, the second edge is provided with a second groove, the third edge is provided with a third groove, and the fourth edge is provided with a fourth groove. The utility model provides a RGB light shield and color filter can improve the alignment mark's that forms after the exposure shape for circular shape problem to be convenient for measure the relative position between alignment mark and the black matrix.

Description

RGB light shield and color filter

Technical Field

The utility model relates to a show technical field, especially relate to a RGB light shield and color filter.

Background

The lcd generally includes a Color Filter (CF) substrate, the CF substrate includes a Color film layer, the Color film layer includes red, green and blue sub-pixels, and the red, green and blue sub-pixels have similar line widths.

Fig. 1 is a schematic structural view of a conventional RGB photomask, and referring to fig. 1, a shape of a through hole in the RGB photomask 101 for making an alignment mark is rectangular, and the through hole is referred to as a rectangular through hole 102. The offset of the sub-pixels with three different colors of red, green and blue in the color film layer can be determined by measuring the relative position of the alignment mark made by the rectangular through hole 102 and the black matrix on the substrate.

With the improvement of PPI of the liquid crystal display, the line widths of the red, green and blue sub-pixels are reduced, so that the size of the rectangular through hole 102 is reduced, after the size of the rectangular through hole 102 is reduced, when the light of the exposure machine passes through the smaller rectangular through hole 102, the shape of the formed alignment mark tends to be circular, fig. 2 is a structural schematic diagram of the alignment mark formed on the black matrix by adopting the existing RGB photomask, referring to fig. 2, when the shape of the alignment mark 103 tends to be circular, the relative position of the black matrix 104 and the alignment mark 103 cannot be obtained, so that the offset of the red, green and blue sub-pixels can not be determined.

SUMMERY OF THE UTILITY MODEL

The utility model provides a RGB light shield and color filter can improve the alignment mark's that forms after the exposure shape for circular shape problem to be convenient for measure the relative position between alignment mark and the black matrix.

According to an aspect of the present invention, there is provided an RGB photomask, the RGB photomask comprising alignment through holes;

the alignment through hole is used for manufacturing an alignment mark;

the vertical projection of the alignment through hole on the target object comprises a first edge and a second edge which are oppositely arranged, and a third edge and a fourth edge which are oppositely arranged, wherein the first edge, the third edge, the second edge and the fourth edge are sequentially adjacent;

the first edge is provided with a first groove, the second edge is provided with a second groove, the third edge is provided with a third groove, and the fourth edge is provided with a fourth groove.

Optionally, a distance from the bottom surface of the first groove to the bottom surface of the second groove is equal to a distance from the bottom surface of the third groove to the bottom surface of the fourth groove.

Optionally, a vertical projection of the alignment through hole on the target is symmetric about a first symmetry axis and a second symmetry axis, where the first symmetry axis and the second symmetry axis are perpendicular.

Optionally, the shape of the first groove is the same as the shape of the second groove, the shape of the third groove, and the shape of the fourth groove.

Optionally, the ratio of the depth of the first groove to the distance from the bottom surface of the first groove to the bottom surface of the second groove ranges from 0.2 to 0.25.

According to another aspect of the present invention, there is provided a color filter disposed in a display, the color filter including a plurality of alignment marks and a substrate;

the alignment mark is made by the RGB photomask provided in any embodiment of the present invention;

the alignment mark is located on one side of the substrate.

Optionally, the color filter provided in this embodiment further includes a plurality of black matrices;

the black matrix and the alignment mark are positioned on the same side of the substrate; and the distance between two adjacent black matrixes is equal to the distance between two adjacent pixels in the display.

Optionally, one side of the black matrix, which is far away from the substrate, is provided with one alignment mark.

Optionally, the shape of the alignment mark is the same as that of the black matrix.

Optionally, the vertical projection of the alignment mark on the substrate does not overlap with the black matrix;

and the connecting line of the center of the vertical projection of the alignment mark on the substrate and the center of the black matrix is vertical to the arrangement direction of the black matrix.

The RGB photomask provided by this embodiment includes the counterpoint through-hole, the vertical projection of this counterpoint through-hole on the target object includes relative first limit and second limit that sets up to and relative third limit and fourth limit that sets up, first limit, second limit, third limit and fourth limit correspond respectively and are provided with first recess, second recess, third recess and fourth recess to make each corner of counterpoint through-hole form the bellying, when light passes through the counterpoint through-hole, can improve the shape of the alignment mark that forms and be circular problem. Therefore, the RGB mask provided in this embodiment can improve the problem that the alignment mark formed after exposure is circular, thereby facilitating measurement of the relative position between the alignment mark and the black matrix.

It should be understood that the statements herein are not intended to identify key or critical features of any embodiment of the present invention, nor are they intended to limit the scope of the invention. Other features of the present invention will be readily apparent from the following specification.

Drawings

In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings needed to be used in the description of the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings without creative efforts.

FIG. 1 is a schematic diagram of a conventional RGB mask;

FIG. 2 is a schematic diagram of a conventional RGB mask structure for forming alignment marks on a black matrix;

fig. 3 is a schematic structural diagram of an RGB mask according to an embodiment of the present invention;

fig. 4 is a schematic structural diagram of a vertical projection of the alignment through hole on the target object according to an embodiment of the present invention;

FIG. 5 is a schematic diagram of a structure of an alignment mark formed by the RGB mask shown in FIG. 3;

fig. 6 is a schematic structural diagram of another vertical projection of the alignment through hole on the target according to the embodiment of the present invention;

fig. 7 is a schematic structural diagram of a color filter according to an embodiment of the present invention;

fig. 8 is a schematic structural diagram of another color filter according to an embodiment of the present invention;

fig. 9 is a schematic structural diagram of another color filter according to an embodiment of the present invention.

Detailed Description

In order to make the technical solution of the present invention better understood, the technical solution of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by a person skilled in the art without creative efforts shall fall within the protection scope of the present invention.

It should be noted that the terms "first," "second," and the like in the description and claims of the present invention and in the drawings described above are used for distinguishing between similar elements and not necessarily for describing a particular sequential or chronological order. It is to be understood that the data so used is interchangeable under appropriate circumstances such that the embodiments of the invention described herein are capable of operation in other sequences than those illustrated or described herein. Furthermore, the terms "comprises," "comprising," and "having," and any variations thereof, are intended to cover a non-exclusive inclusion, such that a process, method, system, article, or apparatus that comprises a list of steps or elements is not necessarily limited to those steps or elements expressly listed, but may include other steps or elements not expressly listed or inherent to such process, method, article, or apparatus.

Fig. 3 is a schematic structural diagram of an RGB photomask according to an embodiment of the present invention, fig. 4 is a schematic structural diagram of a vertical projection of an alignment through hole on a target object according to an embodiment of the present invention, and referring to fig. 3 and fig. 4, the RGB photomask 100 provided by this embodiment includes an alignment through hole 110; the alignment through hole 110 is used for making an alignment mark; the vertical projection of the alignment through hole 110 on the target object (refer to fig. 4) includes a first side 111 and a second side 112 which are oppositely arranged, and a third side 113 and a fourth side 114 which are oppositely arranged, wherein the first side 111, the third side 113, the second side 112 and the fourth side 114 are adjacent in sequence; the first side 111 is provided with a first groove 10, the second side 112 with a second groove 20, the third side with a third groove 30 and the fourth side 114 with a fourth groove 40.

Specifically, the RGB mask provided in this embodiment can be used to fabricate a display, and the target can be a substrate in the display. The size of the first groove 10 may be the same as the size of the second groove 20, the size of the third groove 30, and the size of the fourth groove 40, and the size of the first groove 10 may be different from at least one of the size of the second groove 20, the size of the third groove 30, and the size of the fourth groove 40.

Compared with the rectangular through hole in the prior art, the alignment through hole 110 provided by the embodiment includes the protruding portion at the corner, so that the problem that the alignment mark formed after exposure is circular can be solved, and the shape of the formed alignment mark can be the same as the shape of the black matrix on the substrate. Fig. 5 is a schematic structural diagram of forming an alignment mark using the RGB mask shown in fig. 3, and referring to fig. 5, the alignment mark 120 formed using the RGB mask provided in this embodiment is rectangular, and the relative positions of the alignment mark 120 and the black matrix 130 can be obtained according to the distance between the edge of the alignment mark 120 and the corresponding edge in the black matrix 130, so as to determine the offset of the sub-pixel. Illustratively, with continued reference to fig. 5, the first side of the alignment mark 120 corresponds to the first side of the black matrix 130, the second side of the alignment mark 120 corresponds to the second side of the black matrix 130, the third side of the alignment mark 120 corresponds to the third side of the black matrix 130, the fourth side of the alignment mark 120 corresponds to the fourth side of the black matrix 130, the distance between the first side of the alignment mark 120 and the first side of the black matrix 130 is Y1, the distance between the second side of the alignment mark 120 and the second side of the black matrix 130 is Y2, the distance between the third side of the alignment mark 120 and the third side of the black matrix 130 is X1, the distance between the fourth side of the alignment mark 120 and the fourth side of the black matrix 130 is X2, and the relative positions P = ((X1-X2), (Y1-Y2)) of the alignment mark 120 and the black matrix 130.

It should be noted that the structural schematic diagram of the RGB mask shown in fig. 3 is only a partial structural schematic diagram of the RGB mask, and the RGB mask provided in this embodiment further includes sub-pixel through holes, and the sub-pixel through holes are used for manufacturing sub-pixels with three different colors of red, green, and blue. The RGB mask provided in this embodiment can simultaneously fabricate the alignment mark 120 and at least one sub-pixel of red, green and blue.

The RGB photomask provided by this embodiment includes the counterpoint through-hole, the vertical projection of this counterpoint through-hole on the target object includes relative first limit and second limit that sets up to and relative third limit and fourth limit that sets up, first limit, second limit, third limit and fourth limit correspond respectively and are provided with first recess, second recess, third recess and fourth recess to make each corner of counterpoint through-hole form the bellying, when light passes through the counterpoint through-hole, can improve the shape of the alignment mark that forms and be circular problem. Therefore, the RGB mask provided in this embodiment can improve the problem that the alignment mark formed after exposure is circular, thereby facilitating measurement of the relative position between the alignment mark and the black matrix.

Optionally, a distance from the bottom surface of the first groove to the bottom surface of the second groove is equal to a distance from the bottom surface of the third groove to the bottom surface of the fourth groove.

Specifically, when the distance from the bottom surface of the first groove to the bottom surface of the second groove is equal to the distance from the bottom surface of the third groove to the bottom surface of the fourth groove, the alignment mark formed by the alignment through hole may be square, and the square alignment mark may be easily recognized, so that the relative position between the alignment mark and the black matrix may be accurately measured.

Optionally, fig. 6 is a schematic structural diagram of another vertical projection of the alignment through hole on the target according to an embodiment of the present invention, and referring to fig. 6, the vertical projection of the alignment through hole on the target is symmetrical about the first symmetry axis 50 and the second symmetry axis 60, where the first symmetry axis 50 and the second symmetry axis 60 are perpendicular.

Specifically, the vertical projection of the alignment through hole on the target object is symmetric about the first symmetry axis 50 and the second symmetry axis 60, so that the alignment mark formed by the alignment through hole provided in this embodiment is in a non-circular axisymmetric pattern, thereby facilitating measurement of the relative position between the alignment mark and the black matrix.

On the basis of the above embodiment, optionally, with continued reference to fig. 6, the shape of the first groove 10 is the same as the shape of the second groove 20, the shape of the third groove 30, and the shape of the fourth groove 40.

Specifically, when the vertical projection of the alignment through hole on the target object is symmetric about the first symmetry axis 50 and the second symmetry axis 60, the shape of the first groove 10, the shape of the second groove 20, the shape of the third groove 30, and the shape of the fourth groove 40 are set to be the same, so that the shape of the alignment mark formed by the alignment through hole provided by the embodiment is closer to a square, and the relative position between the alignment mark and the black matrix can be accurately measured. In the case where the shape of the first groove 10, the shape of the second groove 20, the shape of the third groove 30, and the shape of the fourth groove 40 are identical to each other, a side surface of the first groove 10 may be provided to be perpendicular to a bottom surface of the first groove 10.

On the basis of the above embodiment, optionally, with continued reference to fig. 6, the ratio of the depth a of the first groove 10 to the distance b from the bottom surface of the first groove 10 to the bottom surface of the second groove 20 ranges from 0.2 to 0.25.

Specifically, the ratio of the depth a of the first groove 10 to the distance b from the bottom surface of the first groove 10 to the bottom surface of the second groove 20 is set to be 0.2-0.25, which not only can improve the round shape of the alignment mark of the alignment through hole, but also can not increase the size of the alignment through hole too much, so that the RGB mask provided in this embodiment can be used to fabricate a display with high PPI.

Fig. 7 is a schematic structural diagram of a color filter according to an embodiment of the present invention, and referring to fig. 7, the color filter provided in this embodiment is disposed in a display, and the color filter includes a plurality of alignment marks 120 and a substrate 200; the alignment mark 120 is made by the RGB photomask provided by any embodiment of the present invention; the alignment mark 120 is located at one side of the substrate 200.

Specifically, because adopt the utility model discloses the shape of the alignment mark of the RGB light shield preparation that arbitrary embodiment provided is similar to the square, consequently, the utility model provides an alignment mark's among the color filter shape can be similar to the square.

Optionally, with continuing reference to fig. 7, the color filter provided in this embodiment further includes a plurality of black matrices 130; the black matrix 130 and the alignment mark 120 are located on the same side of the substrate 200; the pitch H between two adjacent black matrices 130 is equal to the pitch of two adjacent pixels in the display.

Specifically, the black matrix 130 is located at one side of the substrate 200. The pixel includes a red sub-pixel, a green sub-pixel, and a blue sub-pixel. When the pitch H between two adjacent black matrices 130 is equal to the pitch between two adjacent sub-pixels, the two adjacent black matrices 130 overlap each other by the smaller pitch of the pixels, and thus the relative position between the alignment mark 120 and the black matrix 130 cannot be accurately measured. The present embodiment sets the distance H between two adjacent black matrices 130 to be equal to the distance between two adjacent pixels in the display, so that there is no overlap between two adjacent black matrices 130, thereby facilitating accurate measurement of the relative position between the alignment mark 120 and the black matrix 130.

It should be noted that the black matrix 130 and the alignment mark 120 provided in this embodiment are both located in the non-display area of the substrate 200.

Optionally, with continued reference to fig. 7, a black matrix 130 is provided with an alignment mark 120 on a side thereof away from the substrate 200.

Specifically, when the alignment mark is manufactured, the alignment through hole in the RGB photomask may be positioned in the black matrix in a vertical projection manner on the substrate, the manufactured alignment mark may be positioned on a side of the black matrix away from the substrate, the alignment mark and the black matrix may be overlapped to form a zigzag structure, and the relative position between the alignment mark and the black matrix may be determined by measuring the distance between each side of the alignment mark and each corresponding side of the black matrix.

Alternatively, the shape of the alignment mark is the same as that of the black matrix.

Specifically, the alignment mark formed by arranging the alignment through hole has the same shape as the black matrix, so that the relative position between the alignment mark and the black matrix can be conveniently measured.

Alternatively, fig. 8 is a schematic structural diagram of another color filter according to an embodiment of the present invention, and referring to fig. 8, the vertical projection of the alignment mark 120 on the substrate 200 does not overlap with the black matrix 130; a line connecting the center of the vertical projection of the alignment mark 120 on the substrate 200 and the center of the black matrix 130 is perpendicular to the arrangement direction of the black matrix 130.

Specifically, fig. 9 is a schematic structural diagram of another color filter according to an embodiment of the present invention, referring to fig. 9, when the distance between two adjacent pixels is smaller than 40 μm, the distance H between two adjacent black matrices 130 is also smaller than 40 μm, and after the RGB mask completes manufacturing one alignment mark 120, if the RGB mask moves by one sub-pixel distance along the horizontal direction, three alignment marks 120 will overlap one black matrix 130, so that the relative position of the alignment mark 120 with respect to the black matrix 130 cannot be measured. When the alignment mark 120 is manufactured, the vertical projection of the alignment via on the substrate 200 may be set to be not overlapped with the black matrix 130, so that the formed alignment mark 120 is not located on the surface of the black rectangle 130, and the color filter shown in fig. 8 is formed. When the color filter provided by the embodiment is applied to a display with high PPI, the position relationship between the black matrix and the alignment mark can still be measured, so that the offset of the sub-pixels can be conveniently measured.

It should be understood that various forms of the flows shown above may be used, with steps reordered, added, or deleted. For example, the steps described in the present invention may be executed in parallel, may be executed sequentially, or may be executed in different orders, as long as the desired result of the technical solution of the present invention can be achieved, and the present invention is not limited thereto.

The above detailed description does not limit the scope of the present invention. It should be understood by those skilled in the art that various modifications, combinations, sub-combinations and substitutions may be made, depending on design requirements and other factors. Any modification, equivalent replacement, and improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims (10)

1. An RGB mask, comprising: aligning the through holes;

the alignment through hole is used for manufacturing an alignment mark;

the vertical projection of the alignment through hole on the target object comprises a first edge and a second edge which are oppositely arranged, and a third edge and a fourth edge which are oppositely arranged, wherein the first edge, the third edge, the second edge and the fourth edge are sequentially adjacent;

the first edge is provided with a first groove, the second edge is provided with a second groove, the third edge is provided with a third groove, and the fourth edge is provided with a fourth groove.

2. The RGB mask of claim 1, wherein the distance from the bottom surface of the first recess to the bottom surface of the second recess is the same as the distance from the bottom surface of the third recess to the bottom surface of the fourth recess.

3. The RGB mask of claim 1, wherein a vertical projection of the alignment via onto the target is symmetric about a first axis of symmetry and a second axis of symmetry, wherein the first axis of symmetry and the second axis of symmetry are perpendicular.

4. The RGB mask of claim 3, wherein the shape of the first groove is the same as the shape of the second groove, the shape of the third groove, and the shape of the fourth groove.

5. The RGB mask of claim 3, wherein the ratio of the depth of the first recess to the distance from the bottom surface of the first recess to the bottom surface of the second recess is in the range of 0.2-0.25.

6. A color filter is arranged in a display and is characterized by comprising a plurality of alignment marks and a substrate;

the alignment mark is made by the RGB mask of any one of claims 1-5;

the alignment mark is located on one side of the substrate.

7. The color filter according to claim 6, further comprising a plurality of black matrices;

the black matrix and the alignment mark are positioned on the same side of the substrate; and the distance between two adjacent black matrixes is equal to the distance between two adjacent pixels in the display.

8. The color filter of claim 7, wherein a side of the black matrix away from the substrate is provided with the alignment mark.

9. The color filter according to claim 7, wherein the shape of the alignment mark is the same as the shape of the black matrix.

10. The color filter according to claim 9, wherein a perpendicular projection of the alignment mark on the substrate does not overlap with the black matrix;

and the connecting line of the center of the vertical projection of the alignment mark on the substrate and the center of the black matrix is vertical to the arrangement direction of the black matrix.

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