CN218203024U - Integrated rotary target material convenient to be connected with end head - Google Patents
Integrated rotary target material convenient to be connected with end head Download PDFInfo
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Abstract
The utility model provides a rotatory target of one-piece type convenient to be connected with the end, the rotatory target of one-piece type convenient to be connected with the end sets up conductive adhesive layer on the terminal surface be connected with the end, be used for the one-piece type rotatory target of being convenient for to be connected with the end with the connection of end. Rotatory target of one-piece type convenient to be connected with the end is connected one-piece type rotatory target and end through setting up conductive adhesive layer, under the condition that reaches the service standard, not only easy operation, saving equipment and human cost can also improve the number of times that the end is cyclic utilization, have the significance to the utilization efficiency and the installation effectiveness that improve the end, are favorable to improving the application convenience of rotatory target in the magnetron sputtering field.
Description
Technical Field
The utility model belongs to the technical field of the semiconductor, a target is related to, especially relate to a one-piece type rotary target convenient to be connected with the end.
Background
Magnetron sputtering coating is a coating deposition process widely applied in the coating industry at present, and the principle of sputtering coating is that the surface of a target material is bombarded by argon ions through an electron gun under the vacuum condition, and the surface material of the target material is sputtered out in the forms of molecules, atoms, ions or electrons and the like and splashed onto a substrate to deposit and form a film. With the continuous development of surface coating technology, the demand of a sputtering target, which is a functional material with high added value, is increasing year by year, and therefore, the utilization efficiency and the convenience of utilization of the sputtering target need to be improved continuously.
The LCD is called Liquid Crystal Display in English and refers to a Liquid Crystal Display screen. The metal target is the main material for sputtering and film forming of the liquid crystal display screen lead and the electrode, the plane target corresponds to a Japanese ULVAC machine, and the rotary target corresponds to an AKT machine. Compared with a planar target, the rotary target has the advantages of high target utilization rate, high sputtering speed and effective reduction of arcing and surface slag falling. The rotary target can be divided into two types according to the existence of a back tube: one is a rotary target material with a single back tube, the back tube material is mostly titanium alloy, and the target material corresponds to a plurality of powder metallurgy type target materials; the other type is an integrated rotating target, the target and the back tube are made of the same material and mainly correspond to casting targets such as Al, cu, ti and the like.
In the manufacturing process of the integrated rotary target, the main body is in a tubular shape with two ends not blocked, in the using process, one end of the integrated rotary target is required to be connected with a sputtering machine table, the other end of the integrated rotary target is blocked by an end head, cooling water can be introduced into the integrated rotary target in the magnetron sputtering coating process to meet the sealing state, and the integrated rotary target can be connected with hoisting equipment through the end head to meet the vertical state of the integrated rotary target. Wherein, in the actual operation process, with the end connection end and the end assembly back of integral type rotatory target, often connect through friction stir welding at the junction, on the one hand, friction stir welding utilizes the high-speed rotatory soldering set and the heat that the work piece friction produced, make by welding material local melting, and then form compact solid phase welding seam with the junction under the extrusion of soldering set, only weld on the surface, on the other hand, after friction stir welding finishes, still need get rid of the crater through machining and reach the target size requirement, consequently, there is following shortcoming in the mode that adopts friction stir welding to carry out the end connection: 1. the friction stir welding requires a corresponding welding device, so that the cost of the device is high; 2. the welding process of friction stir welding is complex and needs corresponding professional personnel; 3. the target material and the end head need to keep certain concentricity, and the target material and the end head are easy to shift in the friction stir welding process to cause welding return, so that the time is wasted; 4. the end head connected by friction stir welding can be used only once, and is scrapped together with the residual target after being used, so that the end head cannot be recycled, and the material cost is increased; 5. the friction stir welding generally has a joint strength, and there is a risk that the tip and the integrated target are disconnected.
Therefore, the prior art improves the tip connection method of the integrated rotary target material as follows. For example, CN109807453A discloses a method for welding an end of a high purity copper rotary target, which includes a high purity copper target tube, a copper alloy end and a copper alloy tail cover, wherein the copper alloy end and the copper alloy tail cover are respectively installed at two ends of the high purity copper target tube, one end of the copper alloy end and one end of the copper alloy tail cover are respectively provided with a welding surface, two ends of the high purity copper target are respectively provided with a welding surface, the welding surfaces of the copper alloy end and the copper alloy tail cover are respectively installed in a manner of abutting against the welding surfaces of the high purity copper target, an end welding port and a tail cover welding port are respectively formed after abutting connection, and welding is performed through electron beam welding according to three steps of spot welding, arc welding and circumferential welding. CN209759573U and CN207900488U are connected by adopting an electron beam welding mode, and only the end welding structure is improved. However, according to the technical scheme for connecting the ends by adopting the electron beam welding mode, the problems of high cost of welding equipment, complex welding process, welding return caused by unqualified concentricity and the like exist, and the ends are scrapped together with residual targets after the use is finished, so that the ends cannot be recycled.
For example, CN212051628U discloses an integrated rotary target convenient for connecting with an end, which comprises a sputtering target main body, an equipment connecting end and an end connecting end respectively arranged at two ends of the sputtering target main body, and an end connected with the end connecting end; the end head connecting end is provided with an outer wire, and the outer wire is matched with the inner wire in the end head and used for connecting the end head connecting end with the end head. The integrated rotary target is connected with the end head through threads, the purpose that the end head is recycled can be achieved, but the problems that the concentricity does not reach the standard easily occur in the spiral installation process due to the fact that machining operation and spiral installation operation are increased, and the risk that the end head is disconnected with the integrated target due to the fact that inner threads in the end head are seriously abraded along with the increase of recycling times of the end head is increased.
To sum up, at present, it is urgently needed to develop an integrated rotary target material convenient for being connected with an end, and when the use standard is reached, the integrated rotary target material is simple to operate, saves equipment and labor cost, can improve the recycling frequency of the end, has an important significance for improving the utilization efficiency and the installation efficiency of the end, and is beneficial to improving the application convenience of the rotary target material in the field of magnetron sputtering.
SUMMERY OF THE UTILITY MODEL
Not enough to prior art exists, the utility model provides a rotatory target of one-piece type convenient to be connected with the end is connected rotatory target of one-piece type and end through setting up conductive adhesive layer, under the condition that reaches the service standard, not only easy operation, saving equipment and human cost can also improve the number of times that the end was cyclic utilization, have the significance to the utilization efficiency and the installation effectiveness that improve the end, are favorable to improving the application convenience of rotatory target in the magnetron sputtering field.
In order to achieve the purpose of the utility model, the utility model adopts the following technical proposal:
the utility model provides a rotatory target of one-piece type convenient to be connected with the end, the rotatory target of one-piece type convenient to be connected with the end sets up conductive adhesive layer on the terminal surface be connected with the end, be used for the one-piece type rotatory target of being convenient for to be connected with the end with the connection of end.
Rotatory target of one-piece type convenient to be connected with the end is connected rotatory target of one-piece type and end through conductive adhesive layer, has following advantage: welding equipment is not needed, so that the equipment cost is reduced; the process is simple, and the requirement on the professional degree of operators is low; the end can be recycled, so that the cost of raw materials is reduced; good sealing performance, helium leakage detection result less than 5 multiplied by 10 -10 Pa·m 3 S; the concentricity of the integrated rotary target and the end is less than 0.2mm; in the magnetron sputtering coating process, the conductive requirement of the integrated rotary target is met; the end can realize normal hoist and mount, and no deformation, drop scheduling problem produce.
As the preferable technical proposal of the utility model, the surface density of the conductive adhesive layer is 0.1-0.5g/mm 2 E.g. 0.1g/mm 2 、0.2g/mm 2 、0.3g/mm 2 、0.4g/mm 2 Or 0.5g/mm 2 And the like, but are not limited to the recited values, and other values not recited within the numerical range are also applicable.
As a preferred technical solution of the present invention, the integrated rotary target convenient for being connected to the end comprises a sputtering target main body, and an equipment connecting end and an end connecting end respectively disposed at two ends of the sputtering target main body; and the conductive adhesive layer is arranged on the end face, close to the end head connecting end, of the sputtering target material main body and is used for connecting the integrated rotary target material which is convenient to be connected with the end head.
The sputtering target main body is a tubular body without both ends being blocked, one end of the sputtering target main body is connected with cooling equipment in the using process, and the other end is blocked, so that the cooling medium can exert the cooling effect in the inner cavity of the sputtering target main body.
It is worth explaining, conducting resin layer sets up sputter target main part is close to on the terminal surface of end link, not only can reach the service standard, the follow-up end of still being convenient for is dismantled, if further set up the conducting resin on the side of end link, can further strengthen the joint strength of one-piece type rotatory target and end. After the subsequent magnetron sputtering is finished, the end can be detached only by heating the conductive adhesive layer to a certain temperature and then cleaning the conductive adhesive layer with acetone, and the operation is simple and easy.
As the utility model discloses preferred technical scheme sputter the target main part is close to set up the recess on the terminal surface of end link, conductive adhesive layer sets up on the recess the end with set up the boss on the top surface that the sputtering target main part is connected, the recess with the boss cooperatees.
The one-piece type rotary target convenient to be connected with the end has increased the area that conductive adhesive layer bonds effectively through design matched with recess and boss, has not only further improved the connection degree of combining, still helps the location of end laminating in-process, guarantees the concentricity requirement.
It should be noted that, in the integrated rotary target material convenient to connect with the end of the present invention, the groove is machined on the integrated rotary target material, and the boss is machined on the end, which belongs to the preferred technical scheme, however, the boss is machined on the integrated rotary target material, and the groove is machined on the end, which is still feasible, and is also within the protection scope of the present invention; in addition, on the basis of designing with recess and boss of cooperating, the surface density of the said conductive glue layer is 0.1-0.5g/mm 2 The thinner part of the conductive adhesive layer is designated.
In a preferred embodiment of the present invention, the width of the groove is 4-8mm, such as 4mm, 4.5mm, 5mm, 5.5mm, 6mm, 6.5mm, 7mm, 7.5mm or 8mm, and the depth is 0.15-0.45mm, such as 0.15mm, 0.2mm, 0.25mm, 0.3mm, 0.35mm, 0.4mm or 0.45mm, but not limited to the values listed, and other values not listed in the range of values are equally applicable.
In a preferred embodiment of the present invention, the diameter of the sputtering target main body is 15 to 20mm, for example, 15mm, 16mm, 17mm, 18mm, 19mm, or 20mm, larger than the diameter of the end connecting end, but the present invention is not limited to the above-mentioned values, and other values not shown in the above-mentioned range are also applicable.
In a preferred embodiment of the present invention, the diameter of the sputtering target body is 155 to 180mm, for example 155mm, 160mm, 165mm, 170mm, 175mm or 180mm, and the length is 1000 to 3000mm, for example 1000mm, 1500mm, 2000mm, 2500mm or 3000mm, but the present invention is not limited to the above-mentioned values, and other values not listed in the above-mentioned range of values are also applicable.
The tip connection end has a diameter of 135-165mm, such as 135mm, 140mm, 145mm, 150mm, 155mm, 160mm or 165mm, and a length of 50-70mm, such as 50mm, 55mm, 60mm, 65mm or 70mm, but is not limited to the values listed, and other values not listed in this range are equally applicable.
As the preferred technical scheme of the utility model, the material of sputtering target main part equipment link and the end link is the same.
The utility model discloses divide into one-piece type rotatory target into sputter target main part, be used for the equipment link of being connected with external cooling equipment and be used for the end link of being connected with the end of shutoff. The sputtering target main body, the equipment connecting end and the end connecting end are manufactured through conventional integral casting molding, so that the concentricity of the integral rotary target convenient to be connected with the end is effectively guaranteed.
As the utility model discloses preferred technical scheme, the equipment link is connected with the flange of being connected with external equipment.
As the utility model discloses preferred technical scheme, the equipment link with the connected mode of flange is welded connection.
The integrated rotary target material convenient for being connected with the end head adopts the following method for processing, and comprises the following steps:
(1) Preparing an integrated rotary target and an end, wherein the integrated rotary target comprises a sputtering target main body, and an equipment connecting end and an end connecting end which are respectively arranged at two ends of the sputtering target main body, the diameter of the sputtering target main body is larger than that of the end connecting end, a groove with the width of 4-8mm and the depth of 0.15-0.45mm is machined on the end surface of the sputtering target main body close to the end connecting end, a boss is machined on the top surface of the end connected with the integrated rotary target, and the groove is matched with the boss;
the diameter of the target main body is 15-20mm larger than that of the end head connecting end; the diameter of the target main body is 155-180mm, and the length of the target main body is 1000-3000mm; the diameter of the end head connecting end is 135-165mm, and the length is 50-70mm;
(2) Cleaning the integrated rotary target and the end head obtained in the step (1) by using isopropanol, then arranging a conductive adhesive layer on the end face (comprising the groove) of the sputtering target main body close to the end head connecting end, attaching the integrated rotary target and the end head, embedding the boss into the groove, and completing end head connection through standing treatment;
the conductive adhesive comprises silver conductive adhesive and/or copper conductive adhesive; the surface density of the conductive adhesive layer is 0.1-0.5g/mm 2 The temperature of the conductive adhesive is 20-40 ℃, and in the attaching process, the integrated rotary target is in a horizontal state; the standing treatment time is 10-30min, and the temperature is 20-40 ℃.
It is worth mentioning that after the end head connection in the step (2) is completed, the end head needs to be machined to meet the size requirement for installation and use; the cleaning treatment can remove not only an oxide layer and oil stains on the surfaces of the integrated rotary target and the end head, but also residues generated by machining; the conductive adhesive can be used at normal temperature without being heated, so that the operation process is greatly simplified, and the conductive adhesive is convenient to popularize and use; in the attaching process in the step (2), the integrated rotary target is in a horizontal state, on one hand, the integrated rotary target is convenient to operate in the horizontal state due to a large length-diameter ratio, and on the other hand, the integrated rotary target is in the horizontal state due to the fact that the conductive adhesive is thick and poor in flowability, and the use of the conductive adhesive cannot be influenced due to the fact that the integrated rotary target is in the horizontal state.
Compared with the prior art, the beneficial effects of the utility model are that:
integral type rotary target convenient to be connected with the end is connected integral type rotary target and end through conducting resin layer, and sealing performance is good, and helium leak testing result < 5 x 10 -10 Pa·m 3 And the concentricity of the integrated rotary target and the end is less than 0.2mm, so that the integrated rotary target is simple to operate, saves equipment and labor cost, can improve the recycling frequency of the end under the condition of reaching the use standard, has important significance for improving the utilization efficiency and the installation efficiency of the end, and is favorable for improving the application convenience of the rotary target in the field of magnetron sputtering.
Drawings
Fig. 1 is a schematic structural diagram of an integrated rotary target convenient for connecting with an end head according to the present invention;
FIG. 2 is a side view of FIG. 1 from the tip connection end;
FIG. 3 is a radial cross-sectional view of the tip of FIG. 1;
wherein, 1-sputtering the target main body; 2-end connection end; 3-equipment connecting end; 4-a conductive adhesive layer; 5-a groove; 6-end; 7-a boss; 8-flange.
Detailed Description
The technical solution of the present invention is further explained by the following embodiments with reference to the accompanying drawings.
As shown in fig. 1, the integrated rotary target convenient for connecting with an end comprises a sputtering target main body 1, an equipment connecting end 3 and an end connecting end 2, which are respectively arranged at two ends of the sputtering target main body; a conductive adhesive layer 4 (a shadow part) is arranged on the end surface of the sputtering target material main body 1 close to the end head connecting end 2 and is used for connecting with an end head 6; the equipment connecting end 3 is connected with the flange 8 through welding; as shown in fig. 2, a groove 5 (grid line portion) is provided on an end surface of the sputtering target main body 1 near the tip connection end 2, and the conductive adhesive layer 4 (not shown) is provided on the groove 5; as shown in fig. 3, a boss 7 is provided on the top surface of the tip 6 connected to the sputtering target body 1, and the groove 5 is fitted to the boss 7.
It should be noted that the conductive adhesive layer in the embodiment of the present invention is silver conductive adhesive, and is formed by using japanese living chemical T-3007-20 silver conductive adhesive purchased in the market, but other types of conductive adhesive are within the scope of the present invention as long as the connection strength is satisfied.
Example 1
The embodiment provides an integrated rotary target convenient to be connected with an end, which comprises a sputtering target main body 1, and an equipment connecting end 3 and an end connecting end 2 which are respectively arranged at two ends of the sputtering target main body; a conductive adhesive layer 4 is arranged on the end face, close to the end head connecting end 2, of the sputtering target material main body 1 and is used for being connected with an end head 6; the equipment connecting end 3 is connected with the flange 8 through welding; a groove 5 is formed in the end face, close to the end head connecting end 2, of the sputtering target material main body 1, and the conductive adhesive layer 4 is arranged on the groove 5; a boss 7 is arranged on the top surface of the end head 6 connected with the sputtering target main body 1, and the groove 5 is matched with the boss 7;
wherein the conductive adhesive layer is silver conductive adhesive, and the surface density of the conductive adhesive layer is 0.3g/mm 2 (ii) a The width of the groove 5 is 5mm, and the depth is 0.3mm; the diameter of the sputtering target main body 1 is 20mm larger than that of the end connecting end 2, the diameter of the sputtering target main body 1 is 170mm, and the length of the sputtering target main body is 2000mm; the diameter of the end head connecting end 2 is 150mm, and the length is 60mm; the sputtering target material main body 1, the equipment connecting end 3 and the end head connecting end 2 are made of the same material and are all high-purity copper with the purity of 99.99 wt%; the end head 6 is made of copper alloy.
After the end connection is finished, the tightness detection is carried out by a helium leakage detection device, and the helium leakage detection result is less than 5 multiplied by 10 -10 Pa·m 3 S; detecting by using concentricity measuring equipment to obtain the concentricity of the integrated rotary target and the end head, wherein the concentricity is less than 0.2mm; the hoisting is carried out through hoisting equipment, and the problems of deformation, falling and the like are avoided; after the magnetron sputtering coating is finished, the end head can be detached and the conductive adhesive is removed, and the end head can be recycled for more than five times.
Example 2
The embodiment provides an integrated rotary target convenient to be connected with an end, which comprises a sputtering target main body 1, and an equipment connecting end 3 and an end connecting end 2 which are respectively arranged at two ends of the sputtering target main body; a conductive adhesive layer 4 is arranged on the end face, close to the end head connecting end 2, of the sputtering target material main body 1 and is used for being connected with an end head 6; the equipment connecting end 3 is connected with the flange 8 through welding; a groove 5 is formed in the end face, close to the end head connecting end 2, of the sputtering target material main body 1, and the conductive adhesive layer 4 is arranged on the groove 5; a boss 7 is arranged on the top surface of the end head 6 connected with the sputtering target main body 1, and the groove 5 is matched with the boss 7;
wherein the conductive adhesive layer is silver conductive adhesive, and the surface density of the conductive adhesive layer is 0.1g/mm 2 (ii) a The width of the groove 5 is 4mm, and the depth is 0.15mm; the diameter of the sputtering target main body 1 is 15mm larger than that of the end head connecting end 2, the diameter of the sputtering target main body 1 is 155mm, and the length of the sputtering target main body is 1000mm; the diameter of the end head connecting end 2 is 140mm, and the length is 50mm; the sputtering target material main body 1, the equipment connecting end 3 and the end head connecting end 2 are made of the same material and are all high-purity aluminum with the purity of 99.99 wt%; the end head 6 is made of aluminum alloy.
After the end connection is finished, the tightness detection is carried out by a helium leakage detection device, and the helium leakage detection result is less than 5 multiplied by 10 -10 Pa·m 3 S; detecting by concentricity measuring equipment to obtain the concentricity of the integrated rotary target and the end head less than 0.2mm; the hoisting equipment is used for hoisting, so that the problems of deformation, falling off and the like are avoided; after the magnetron sputtering coating is finished, the end head can be detached and the conductive adhesive is removed, and the end head can be recycled for more than five times.
Example 3
The embodiment provides an integrated rotary target convenient to be connected with an end, which comprises a sputtering target main body 1, and an equipment connecting end 3 and an end connecting end 2 which are respectively arranged at two ends of the sputtering target main body; the end face, close to the end head connecting end 2, of the sputtering target material main body 1 is provided with a conductive adhesive layer 4 which is used for being connected with an end head 6; the equipment connecting end 3 is connected with the flange 8 through welding; a groove 5 is formed in the end face, close to the end head connecting end 2, of the sputtering target material main body 1, and the conductive adhesive layer 4 is arranged on the groove 5; a boss 7 is arranged on the top surface of the end head 6 connected with the sputtering target main body 1, and the groove 5 is matched with the boss 7;
wherein the conductive adhesive layer is silver conductive adhesive, and the surface density of the conductive adhesive layer is 0.5g/mm 2 (ii) a The width of the groove 5 is 8mm, and the depth is 0.45mm; the diameter of the sputtering target main body 1 is 15mm larger than that of the end head connecting end 2, the diameter of the sputtering target main body 1 is 180mm, and the length of the sputtering target main body is 3000mm; the diameter of the end head connecting end 2 is 165mm, and the length is 70mm; the sputtering target main body 1, the equipment connecting end 3 and the end head connecting end 2 are made of the same material and are all high-purity titanium with the purity of 99.99 wt%; the end head 6 is made of titanium alloy.
After the end connection is finished, the tightness detection is carried out by a helium leakage detection device, and the helium leakage detection result is less than 5 multiplied by 10 -10 Pa·m 3 S; detecting by concentricity measuring equipment to obtain the concentricity of the integrated rotary target and the end head less than 0.2mm; the hoisting is carried out through hoisting equipment, and the problems of deformation, falling and the like are avoided; after the magnetron sputtering coating is finished, the end head can be detached and the conductive adhesive is removed, and the end head can be recycled for more than five times.
Comparative example 1
According to the integrated rotating target and the end head of the embodiment, electron beam welding is adopted in CN109807453A, and welding is carried out according to three steps of spot welding, arc section welding and circumference welding, wherein the groove and boss structure and the conductive adhesive layer in embodiment 1 are omitted.
After the termination, the helium leak test result was < 5X 10 -10 Pa·m 3 The concentricity is less than 0.2mm, the problems of deformation, falling and the like do not occur in the hoisting process, but the problems of higher welding equipment cost, complex welding process and the like existAnd the end can be scrapped together with the residual target after the use is finished, so that the end cannot be recycled.
To sum up, be convenient for be connected one-piece type rotary target with the end is connected one-piece type rotary target and end through conducting resin layer, and sealing performance is good, and helium leak testing result < 5 x 10 -10 Pa·m 3 And the concentricity of the integrated rotary target and the end is less than 0.2mm, so that the integrated rotary target is simple to operate, saves equipment and labor cost, can improve the recycling frequency of the end under the condition of reaching the use standard, has important significance for improving the utilization efficiency and the installation efficiency of the end, and is favorable for improving the application convenience of the rotary target in the field of magnetron sputtering.
The applicant states that the above description is only a specific embodiment of the present invention, but the protection scope of the present invention is not limited thereto, and those skilled in the art should understand that any changes or substitutions easily conceivable by those skilled in the art within the technical scope of the present invention are within the protection scope and the disclosure scope of the present invention.
Claims (10)
1. The integrated rotary target convenient for being connected with the end is characterized in that a conductive adhesive layer is arranged on the end face connected with the end and used for connecting the integrated rotary target convenient for being connected with the end and the end.
2. The integrated rotary target material convenient for being connected with a terminal as claimed in claim 1, wherein the surface density of the conductive adhesive layer is 0.1-0.5g/mm 2 。
3. The integrated rotary target convenient for being connected with the end head according to claim 1 or 2, wherein the integrated rotary target convenient for being connected with the end head comprises a sputtering target main body, and an equipment connecting end and an end head connecting end which are respectively arranged at two ends of the sputtering target main body; and the conductive adhesive layer is arranged on the end face, close to the end head connecting end, of the sputtering target material main body and is used for connecting the integrated rotary target material which is convenient to be connected with the end head.
4. An integrated rotating target convenient for being connected with a tip as claimed in claim 3, wherein a groove is provided on the end face of the sputtering target main body near the tip connection end, the conductive adhesive layer is provided on the groove, a boss is provided on the top face of the tip connected with the sputtering target main body, and the groove is matched with the boss.
5. The integrated rotary target facilitating connection with a tip according to claim 4, wherein the groove has a width of 4-8mm and a depth of 0.15-0.45mm.
6. The integrated rotary target facilitating connection to a tip according to claim 3, wherein a diameter of the sputtering target body is 15 to 20mm larger than a diameter of the tip connection end.
7. The integrated rotary target of claim 6, wherein the sputtering target body has a diameter of 155-180mm and a length of 1000-3000mm;
the diameter of the end head connecting end is 135-165mm, and the length is 50-70mm.
8. The integrated rotary target convenient for being connected with a tip according to claim 3, wherein the sputtering target main body, the apparatus connecting end and the tip connecting end are made of the same material.
9. The integrated rotary target convenient for connecting with an end head according to claim 3, wherein the equipment connecting end is connected with a flange connected with external equipment.
10. The integrated rotary target convenient for being connected with a tip according to claim 9, wherein the device connecting end is connected with the flange in a welding manner.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202120597187.3U CN218203024U (en) | 2021-03-24 | 2021-03-24 | Integrated rotary target material convenient to be connected with end head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202120597187.3U CN218203024U (en) | 2021-03-24 | 2021-03-24 | Integrated rotary target material convenient to be connected with end head |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN218203024U true CN218203024U (en) | 2023-01-03 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202120597187.3U Active CN218203024U (en) | 2021-03-24 | 2021-03-24 | Integrated rotary target material convenient to be connected with end head |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN218203024U (en) |
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2021
- 2021-03-24 CN CN202120597187.3U patent/CN218203024U/en active Active
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