CN217213380U - Display substrate and display device thereof - Google Patents
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- CN217213380U CN217213380U CN202122619410.2U CN202122619410U CN217213380U CN 217213380 U CN217213380 U CN 217213380U CN 202122619410 U CN202122619410 U CN 202122619410U CN 217213380 U CN217213380 U CN 217213380U
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Abstract
The application relates to a display substrate, including display area and blind hole region, display substrate's display area is including the first substrate, gate insulation layer, passivation layer, liquid crystal layer, the second substrate that set up of stromatolite in proper order, the liquid crystal layer is in on the display substrate orthographic projection on the gate insulation layer the last orthographic projection of display substrate with the passivation layer is in orthographic projection on the display substrate all covers completely the blind hole region is in orthographic projection on the display substrate. The grid insulating layer, the passivation layer and the liquid crystal layer are all whole layers covering the blind hole region, hole digging is not needed, the light transmittance of the blind hole region is guaranteed, meanwhile, hole digging manufacturing procedures are reduced, the production process is simpler, and therefore the production cost is reduced. The present application also relates to a display device comprising the display substrate.
Description
Technical Field
The application relates to the field of structural display design, in particular to a display substrate and a display device thereof.
Background
With the development of communication technology, the comprehensive screen of the smart phone gradually occupies the mainstream of the market, the front-facing camera of the smart phone is arranged below the display screen, and the light transmittance of the position corresponding to the front-facing camera in the display screen becomes an important influence factor of the camera effect.
The existing method for increasing the light transmittance of the front camera is to dig holes at corresponding positions of a display screen, and different hole digging methods are provided for different screens, and the method comprises the following steps: 1. through-hole screens, which punch through an LCD panel, a polarizer, and a backlight together, have complicated processes from glass to a module; 2. the blind hole screen with the liquid crystal is characterized in that holes are formed in a backlight layer and a polarizer layer on a TFT LCD display screen, mask exposure is carried out on the positions of corresponding holes of an array glass substrate and a color film glass substrate, no graph is manufactured, the holes are not formed in glass and a liquid crystal layer, a camera is blocked, the light transmittance loss of the camera is about 15% -20%, and the requirement on the production process of the camera is high; 3. the blind hole screen without liquid crystal is characterized in that holes are formed in a backlight layer and a polarizer layer on a TFT LCD display screen, mask exposure is carried out at the positions of corresponding holes of an array glass substrate and a color film glass substrate, no graph is manufactured, and a liquid crystal layer is not arranged, so that a packaging process is required to block liquid crystal, and the production process is complicated.
In summary, the existing method for improving the light transmittance of the camera by digging the hole has the technical problems of complex process and the like, and the technology needs to be further optimized.
Disclosure of Invention
The application provides a display substrate and a display device thereof, which are used for solving the technical problem that the production process is complex due to the hole digging mode adopted for improving the light transmittance.
In order to solve the technical problem or at least partially solve the technical problem, the present application provides the following technical solutions:
the utility model provides a display substrates, includes display area and blind hole region, display substrates's blind hole region is including the first substrate, gate insulation layer, passivation layer, liquid crystal layer and the second substrate that set up of stromatolite in proper order, the liquid crystal layer is in on the display substrates orthographic projection the gate insulation layer be in on the display substrates with the passivation layer is in orthographic projection on the display substrates all covers completely the blind hole region is in orthographic projection on the display substrates.
Furthermore, the two sides of the liquid crystal layer are both covered with alignment layers made of polyimide.
Further, a protective layer is arranged between the liquid crystal layer and the second substrate.
Furthermore, a gate signal line is arranged on one side of the first substrate close to the gate insulating layer.
Furthermore, the thickness of the gate insulation layer is 3000-5000 angstroms.
Furthermore, the thickness of the passivation layer is 3500-6000 angstroms.
Furthermore, the thickness of the alignment layer is 800-1200 angstroms.
Further, the display area is arranged around the blind hole area.
Further, the first substrate, the gate insulating layer, the passivation layer, the liquid crystal layer, the alignment layer, the protective layer, and the second substrate cover the blind hole region and the display region simultaneously.
Further, the display area further includes: the pixel structure comprises a grid signal line positioned on the first substrate, an active layer and a pixel electrode layer positioned on the grid insulating layer, a data line layer positioned on one side of the active layer, a common electrode layer positioned on the passivation layer, a spacer positioned on the protection layer, and a black matrix and a color resistance layer positioned on the second substrate.
The application provides another technical scheme, and a display device comprises the display substrate.
Compared with the prior art, the technical scheme provided by the embodiment of the application has the following advantages: the grid insulating layer, the passivation layer and the liquid crystal layer are all whole layers covering the blind hole region, hole digging is not needed, the light transmittance of the blind hole region is guaranteed, meanwhile, hole digging manufacturing procedures are reduced, the production process is simpler, and therefore the production cost is reduced.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments consistent with the invention and together with the description, serve to explain the principles of the invention.
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, and it is obvious for those skilled in the art that other drawings can be obtained according to the drawings without inventive exercise.
Fig. 1 is a cross-sectional view of a display substrate according to a first embodiment.
Fig. 2 is a cross-sectional view of a blind hole region of a display substrate according to a second embodiment.
Fig. 3 is a schematic structural diagram of a display device according to a second embodiment.
Fig. 4 is a cross-sectional view of a display region of a display substrate according to a second embodiment.
Fig. 5 is a schematic view of the manner in which light enters and exits the display substrate according to the second embodiment.
In the figure: 100-blind hole area, 101-first substrate, 102-second substrate, 103-liquid crystal layer, 104-gate insulation layer, 105-passivation layer, 106-alignment layer, 107-protective layer, 108-color resistance layer, 109-black matrix, 110-spacer; 200-display area, 201-active layer, 202-pixel electrode layer, 203-data line layer, 204-common electrode layer, 205-gate signal line; 300-substrate, 301-buffer layer, 302-interlayer insulating layer, 303-organic film layer, 304-first opening, 305-second opening, 306-third opening, 307-fourth opening.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present application clearer, the technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are some embodiments of the present application, but not all embodiments. All other embodiments obtained by a person of ordinary skill in the art based on the embodiments in the present application without making creative efforts shall fall within the protection scope of the present application.
Example one
Referring to fig. 1, the present embodiment provides a display substrate, which includes a substrate 300, a buffer layer 301, an organic film 303, a passivation layer 105, a gate insulating layer 104, and an interlayer insulating layer 302, wherein the substrate 300 defines a blind via region 100, the buffer layer 301 covers a side of the substrate 300, the gate insulating layer 104 is disposed on a side of the buffer layer 301 away from the substrate 300, and has a first opening 304 in the blind via region 100, an interlayer insulating layer 302 disposed on a side of the gate insulating layer 104 remote from the buffer layer 301, and has a second opening 305 in the blind via region 100, an organic film 303 is disposed on the surface of the interlayer insulating layer 302 away from the gate insulating layer 104, and has a third open hole 306 in the blind hole region 100, a passivation layer 105 is disposed on a side of the organic film layer 303 remote from the interlayer insulating layer 302, and a fourth via 307 is provided in the blind via region 100, the blind via region 100 falling within an orthographic projection of the fourth via 307 on the substrate 300. In the blind via region 100, due to the dry etching process performed on the organic film layer 303, the passivation layer 105, the gate insulating layer 104, the interlayer insulating layer 302, and the like, the buffer layer 301 exposed in the blind via region 100 is over-etched, which not only makes the buffer layer 301 thin and has poor uniformity, thereby affecting the shooting function of the display device. In addition, if the buffer layer 301 of the light-transmitting region at the center of the blind via region 100 is removed and only the substrate 300 has the highest transmittance, the dry etching process of the passivation layer 105 and the like still causes the over-etching problem on the surface of the substrate 300, which also causes the surface of the substrate 300 made of glass material to be uneven, thereby causing the problem of abnormal display. Therefore, the etching process performed on the organic film 303, the passivation layer 105, the gate insulating layer 104, and the interlayer insulating layer 302 has the technical problem of high requirement on the production process and the technical problem of low fault tolerance.
Example two
In order to solve the technical defects of the display substrate provided by the first embodiment, the first embodiment is further optimized and a second embodiment is provided.
Referring to fig. 2 and fig. 3, a display substrate includes a display area 200 and a blind hole area 100, the blind hole area 100 of the display substrate includes a first substrate 101, a gate insulating layer 104, a passivation layer 105, a liquid crystal layer 103 and a second substrate 102 which are sequentially stacked, and an orthographic projection of the liquid crystal layer 103 on the display substrate, an orthographic projection of the gate insulating layer 104 on the display substrate and an orthographic projection of the passivation layer 105 on the display substrate completely cover an orthographic projection of the blind hole area 100 on the display substrate. The existing blind hole screen containing liquid crystal needs to dig holes in some film layers in order to ensure light transmittance, the display substrate provided by the embodiment only comprises a first substrate 101, a second substrate 102, a liquid crystal layer 103, a grid insulating layer 104 and a passivation layer 105, fewer film layers are reserved as far as possible relative to the existing display substrate, on the premise that hole digging manufacture is not needed, the transmittance of the blind hole can be ensured to be close to 90%, the display substrate provided by the embodiment is simpler in production process and lower in production cost of batch production relative to the existing display substrate.
In the above embodiment, the first substrate 101 and the second substrate 102 are made of glass, the refractive index of the glass is 1.5, the refractive index of the liquid crystal layer is 1.5, and the refractive indices of the gate insulating layer 104(GI) and the passivation layer 105(PVX) are between 1.9 and 2.1.
The liquid crystal layer 103(LC) is covered with alignment layers 106(PI) on both sides, the alignment layers 106 are made of polyimide, and the alignment layers 106 have a function of aligning the crystals of the liquid crystal layer 303 in a certain direction, and function of guiding light in one direction.
A protective layer 107(OC) is provided between the liquid crystal layer 103 and the second substrate 102, and the refractive index of the protective layer 107(OC) is 1.5.
In this embodiment, the thickness of the gate insulating layer 104(GI) is 3000 to 5000 angstroms. Here, a thickness of the gate insulating layer 104(GI) of 3000 angstroms is a preferred embodiment of the present application.
The thickness of the passivation layer 105(PVX) is 3500 to 6000 angstroms. A thickness of the passivation layer 10(PVX)5 of 3500 angstroms is a preferred embodiment of the present application.
The thickness of the alignment layer 106(PI) is 800-1200 angstroms. A thickness of 800 angstroms for alignment layer 106(PI) is a preferred embodiment of the present application.
Referring to fig. 3, the display region 200 is disposed around the blind via region 100, and referring to fig. 2 and 4, the first substrate 101, the gate insulating layer 104(GI), the passivation layer 105(PVX), the liquid crystal layer 103(LC), the alignment layer 106(PI), the protective layer 107(OC), and the second substrate 102 all cover the blind via region 100 and the display region 200 at the same time.
Referring to fig. 4, the display area 200 further includes: a gate signal line 205 on the first substrate 101, an active layer 201 and a pixel electrode layer 202 on the gate insulating layer 104, a data line layer 203 on one side of the active layer 201, a common electrode layer 204 on the passivation layer 105, a spacer 110 on the protective layer 107, a black matrix 109 and a color resist layer 108 on the second substrate 102.
The first substrate 101, the second substrate 102, the liquid crystal layer 103, the gate insulating layer 104, the passivation layer 105, the alignment layer 106, and the protective layer 107 of this embodiment all remain the whole layer to cover the blind hole region 100, the transmittance of the display substrate provided in this embodiment is still close to 90%, light is irradiated into the blind hole region 100 from the side of the second substrate 102 far away from the protective layer 107, in the propagation process of light, due to the difference in refractive index between the layers, there is reflection of light, the transmittance may be lost, and finally, light entering the camera through glass will be reduced.
When light propagates in different media, the reflection coefficient and the refraction coefficient are usually calculated by using fresnel formulas, and the reflection coefficient r and the refraction coefficient t are expressed as follows:
wherein n is 1 Is the refractive index of the incident medium, n 2 Refractive index of medium for emission, theta 1 Angle of incident ray, θ 2 For the angle of the emergent ray, s is the component of light at the normal incidence plane, p is the component of light at the parallel incidence plane, r s The reflection coefficient, r, of a medium into which light is incident at a normal incidence plane p The reflection coefficient, t, of a medium into which light is incident at a parallel incidence plane s Refractive index, t, of a medium into which light enters at a normal incidence plane p The refractive index of a medium into which light enters at a parallel entrance face.
Light in theta 1 Incident at an angle of theta 2 The way of angular exit is shown in fig. 5:
when light is normally incident, i.e. theta 1 ＝θ 2 The reflectance and refractive index equations can be found as follows:
wherein n is 1 Is the refractive index of the incident medium, n 2 The refractive index of the emitted medium is R, the refractive index is T, and R + T is 1. Through the above formula, and the refractive index of each film layer in table 1 of the following table, the reflectivity and transmittance of the external environment light passing through each film layer in the blind via region 100 at normal incidence of light are calculated.
TABLE 1
Referring to table 1, the external ambient light sequentially passes through the second substrate 102 (glass), the protective layer 107(OC), the alignment layer 106(PI), the liquid crystal layer 103(LC), the alignment layer 106(PI), the passivation layer 105(PVX), the gate insulating layer 104(GI), and the first substrate 101 (glass), the transmittance of the external ambient light when outside the display substrate is 100%, the transmittance of the external ambient light when passing through the second substrate 102 (glass) is 96%, the transmittance of the external ambient light when passing through the protective layer 107(OC) is 96%, the transmittance of the external ambient light when passing through the alignment layer 106(PI) of the first layer is 95.625%, the transmittance of the external ambient light when passing through the liquid crystal layer 103(LC) is 95.251%, the transmittance of the external ambient light when passing through the second alignment layer 106(PI) is 94.879%, the transmittance of the external ambient light when passing through the passivation layer 105(PVX) is 94.136%, the transmittance of the external ambient light when passing through the gate insulating layer 104(GI) is 94.076%, the transmittance of the external ambient light through the first substrate 101 (glass) is 92.597%, and the transmittance of the external ambient light through the air inside the display substrate is 88.893%. Therefore, the display substrate does not need to be manufactured by digging holes, the transmittance of the display substrate reaches 88.893%, the transmittance of the existing product to the blind holes is generally more than 90%, the transmittance of the existing display substrate which can be reached by the blind holes is mostly close to 90%, the display substrate provided by the embodiment can meet the requirement of the existing camera on the transmittance of the blind holes, the manufacturing process is reduced compared with the existing display substrate, the mass production is more convenient, and the production cost is reduced.
In another embodiment of the present application, referring to fig. 3, a display device includes the display substrate of the foregoing embodiment, and a method for manufacturing a display area 200 of the display substrate includes:
s100: a gate signal line 205 is formed on one side of the first substrate 101.
In this step, the first substrate 101 forms the Gate signal line 205 by using a Gate mask (Gate make) to form a pattern mainly through an etching process, and the Gate signal line 205 is used for inputting a scanning signal to the display region 200. The gate signal line 205 is provided on the first substrate 101 side of the display region 200, wherein the blind via region 100 is not provided with the gate signal line 205.
S200: a gate insulating layer 104 is formed on a side of the film layer where the gate signal line 205 is located away from the first substrate 101.
In this step, the gate insulating layer 104 in the display region 200 and the gate insulating layer 104 in the blind via region 100 are in the same layer, that is, the gate insulating layer 104 covers the blind via region 100 and the display region 200, and the gate insulating layer 104 is used to separate the gate signal line 205 from other layers, so as to prevent the signal of the gate signal line 205 from being interfered by other layers.
S300: an active layer 201 is formed on the gate insulating layer 104 on a side away from the first substrate 101.
In this step, the Active layer 201 is formed on the side of the gate insulating layer 104 away from the first substrate 101 by performing an etching process on the gate insulating layer 104 using an Active mask (Active make) to form a pattern. The active layer 201 is disposed only within the display region 200, and the blind via region 100 does not have this layer.
S400: a pixel electrode layer 202 is formed on a side of the gate insulating layer 104 away from the first substrate 101.
In this step, the pixel electrode layer 202 is formed by a pixel electrode etching process using a pixel electrode mask (ITO1 make). The pixel electrode layer 202 is disposed only in the display region 200, and the blind via region 100 has no such layer.
S500: a data line layer 203 is formed on one side of the active layer 201.
In this step, the data line layer 203 is formed on a film layer including a drain electrode, a source electrode and a data line, and the drain electrode, the source electrode and the data line are formed on the active layer 201 by an etching process using a data line mask (SD make). The data line layer 203 is disposed only in the display area 200, and the blind via area 100 has no such layer.
S600: a passivation layer 105 is formed on a side of the data line layer 203 remote from the gate insulating layer 104.
In this step, the passivation layer 105 of the display region 200 is the same layer as the passivation layer 105 of the blind via region 100, i.e., the passivation layer 105 covers the blind via region 100 and the display region 200. The passivation layer 105 is fabricated as a whole layer, and the layer structure is formed without etching.
S700: a common electrode layer 204 is formed on a side of the passivation layer 105 away from the data line layer 203.
In this step, the common electrode layer 204 is formed by an etching process using a common electrode Mask (ITO 2-Mask). The common electrode layer 204 is provided only in the display region 200, and the blind via region 100 is free of this layer.
S800: the alignment layer 106 is formed on the common electrode layer 204 on a side away from the passivation layer 105.
In this step, the alignment layer 106 of the display region 200 and the alignment layer 106 of the blind hole region 100 are the same layer, i.e., the alignment layer 106 covers the blind hole region 100 and the display region 200. The alignment layer 106 is fabricated as a whole layer and is printed on the common electrode layer 204 by an photosensitive plate (APR plate).
S900: the liquid crystal layer 103 is formed on the side of the alignment layer 106 remote from the common electrode layer 204.
In this step, the liquid crystal layer 103 of the display region 200 is the same layer as the liquid crystal layer 103 of the blind via region 100, i.e., the liquid crystal layer 103 covers the blind via region 100 and the display region 200. The liquid crystal layer 103 is dropped on the first substrate 101 with the respective film layers by a liquid crystal dropping device.
S1000: the black matrix 109 is formed on the second substrate 102.
In this step, only the display area 200 forms the black matrix 109, and the blind hole area 100 is free of this layer. The organic light emitting diode is formed by a wet etching process using a black matrix Mask (BM Mask).
S1100: a color resist layer 108 is formed on the black matrix 109.
In this step, only the display area 200 is formed with the color resist layer 108, and the blind via area 100 is free of this layer. By wet etching process, red, green and blue resist layers are sequentially formed by sequentially using 3 kinds of red, green and blue masks (R, G, B Mask).
S1200: a protective layer 107 is formed on the color resist layer 108 on the side away from the second substrate 102.
In this step, the protective layer 107 of the display area 200 and the protective layer 107 of the blind via area 100 are the same layer, i.e., the protective layer 107 covers the blind via area 100 and the display area 200. The protective layer 107 is formed as a full-thickness coating and the layer structure is formed without etching.
S1300: spacers 110 are formed on the protective layer 107.
In this step, the spacers 110 are formed only in the display area 200, and the blind via area 100 is free of this layer. The spacer is formed by a wet etching process using a spacer Mask (PS Mask).
S1400: an alignment layer 106 is formed on the protective layer 107 and on the other side away from the second substrate 102.
In this step, the alignment layer 106 of the display region 200 and the alignment layer 106 of the blind hole region 100 are the same layer, i.e., the alignment layer 106 covers the blind hole region 100 and the display region 200. The alignment layer 106 is a whole layer, and is printed on the protective layer 107 by a photosensitive plate (APR plate).
S1500: the first substrate 101 with the liquid crystal and each film layer is bonded to the second substrate 102 with each film layer, and after vacuum-pumping, the liquid crystal is filled between the first substrate 101 and the second substrate 102 by its own fluidity, thereby forming a liquid crystal panel.
It is noted that, in this document, relational terms such as "first" and "second," and the like, may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising an … …" does not exclude the presence of other identical elements in a process, method, article, or apparatus that comprises the element.
The above description is merely illustrative of particular embodiments of the invention that enable those skilled in the art to understand or practice the invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the spirit or scope of the invention. Thus, the present invention is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.
Claims (10)
1. The display substrate comprises a display area and a blind hole area, and is characterized in that the blind hole area of the display substrate comprises a first substrate, a grid electrode insulating layer, a passivation layer, a liquid crystal layer and a second substrate which are sequentially stacked, wherein the liquid crystal layer is in orthographic projection on the display substrate, orthographic projection of the grid electrode insulating layer on the display substrate and orthographic projection of the passivation layer on the display substrate completely cover the orthographic projection of the blind hole area on the display substrate.
2. The substrate according to claim 1, wherein alignment layers are covered on both sides of the liquid crystal layer, and the alignment layers are made of polyimide.
3. A display substrate according to claim 2, wherein a protective layer is provided between the liquid crystal layer and the second substrate.
4. The display substrate of claim 1, wherein the gate insulating layer has a thickness of 3000 to 5000 angstroms.
5. The display substrate according to claim 1, wherein the passivation layer has a thickness of 3500 to 6000 angstroms.
6. The display substrate of claim 2, wherein the alignment layer has a thickness of 800 to 1200 angstroms.
7. A display substrate according to claim 1, wherein the display area is disposed around the blind hole area.
8. A display substrate according to claim 3, wherein the first substrate, the gate insulating layer, the passivation layer, the liquid crystal layer, the alignment layer, the protective layer and the second substrate cover the blind hole region and the display region simultaneously.
9. A display substrate according to claim 8, wherein the display area further comprises: the pixel structure comprises a grid signal line positioned on the first substrate, an active layer and a pixel electrode layer positioned on the grid insulating layer, a data line layer positioned on one side of the active layer, a common electrode layer positioned on the passivation layer, a spacer positioned on the protection layer, and a black matrix and a color resistance layer positioned on the second substrate.
10. A display device comprising the display substrate according to any one of claims 1 to 9.
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