CN217043820U - Polycrystalline silicon reduction furnace chassis laser cleaning equipment - Google Patents

Polycrystalline silicon reduction furnace chassis laser cleaning equipment Download PDF

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Publication number
CN217043820U
CN217043820U CN202220721644.XU CN202220721644U CN217043820U CN 217043820 U CN217043820 U CN 217043820U CN 202220721644 U CN202220721644 U CN 202220721644U CN 217043820 U CN217043820 U CN 217043820U
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China
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bracket
laser cleaning
rotary
rotation
frame
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CN202220721644.XU
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Chinese (zh)
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丁建
谭忠芳
杨涛
莫可璋
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Inner Mongolia Daquan New Energy Co ltd
Xinjiang Daqo New Energy Co Ltd
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Inner Mongolia Daquan New Energy Co ltd
Xinjiang Daqo New Energy Co Ltd
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Abstract

The utility model relates to the technical field of polysilicon production equipment, in particular to a laser cleaning device for a chassis of a polysilicon reduction furnace, which comprises a frame, a front wheel, a rear wheel, a front wheel and a rear wheel, wherein the frame is provided with a walking wheel; the swing mechanism comprises: the rotary bracket and the rotary driving component; the rotary bracket can be arranged on the frame in a pivoting way; the rotary driving component is arranged on the frame and is in transmission connection with the rotary bracket; the linear moving mechanism is arranged on the rotary support and can move linearly along the rotary support; the rotation mechanism includes: the rotation bracket and the rotation driving component; the rotation bracket can be arranged on the linear moving mechanism in a pivoting way; the rotation driving assembly is arranged on the linear moving mechanism and is in transmission connection with the rotation bracket; the intelligent recognition system is arranged on the rotary bracket; the laser cleaning head is arranged on the autorotation bracket; a protective cover is fixedly arranged on the rotation bracket; the top of the protective cover is provided with a dust suction port; the top of the protective cover is provided with a gas inlet. Adopt the utility model discloses can improve the cleaning performance, promote the cleaning efficiency.

Description

Polycrystalline silicon reduction furnace chassis laser cleaning equipment
Technical Field
The utility model relates to a polycrystalline silicon production facility technical field especially relates to a polycrystalline silicon reduction furnace chassis laser cleaning equipment.
Background
In the production technology of producing polysilicon, the improved Siemens method is the main production method. The polycrystalline silicon reduction furnace is core equipment for producing final products in polycrystalline silicon production and is also a key link for determining system capacity and energy consumption. In the process of generating the polysilicon rod, the polysilicon reduction furnace can continuously form a hard scale layer on the electrode and the chassis; the existence of the scale layer can seriously affect the insulating property of the reduction furnace; meanwhile, the reflection efficiency of the reflecting surface of the reduction furnace is reduced, the energy consumption index is influenced, and the product quality is seriously influenced; therefore, the scale layer must be cleaned in time.
At present, operators mainly adopt cleaning tools for cleaning; cleaning operations are generally performed by scraper scraping, hammer striking, abrasive paper grinding and the like; the cleaning mode can not only damage the chassis of the reduction furnace, but also cause various toxic gases to overflow or remain on the chassis of the reduction furnace during operation, thereby bringing health and safety risks to cleaning personnel. The cleaning mode has low cleaning efficiency and poor effect, and even causes the pipeline on the chassis of the reduction furnace to be blocked; moreover, the cleaned dust has the risk of polluting a hundred thousand grade clean workshop.
SUMMERY OF THE UTILITY MODEL
In view of this, the utility model provides a polycrystalline silicon reduction furnace chassis laser cleaning equipment, main aim at improves the cleaning performance, promotes the cleaning efficiency, reduces operating personnel's intensity of labour.
In order to achieve the above object, the utility model mainly provides the following technical scheme:
the embodiment of the utility model provides a laser cleaning device for a chassis of a polycrystalline silicon reduction furnace, which comprises a frame, a swing mechanism, a linear moving mechanism, an intelligent identification system, a self-rotation mechanism, a laser cleaning head and a control system;
the frame is of a gantry structure; the frame is provided with traveling wheels to support the frame to move;
the swing mechanism includes: a slewing bracket and a slewing drive assembly;
the slewing bracket is pivotably arranged on the frame;
the rotary driving assembly is fixedly arranged on the frame, is in transmission connection with the rotary support and is used for driving the rotary support to rotate;
the linear moving mechanism is arranged on the rotary support and can move linearly along the rotary support;
the rotation mechanism includes: the rotation bracket and the rotation driving component;
the rotation bracket is pivotally arranged on the linear moving mechanism;
the rotation driving assembly is arranged on the linear moving mechanism, is in transmission connection with the rotation support and is used for driving the rotation support to rotate;
the intelligent recognition system is arranged on the rotary support and used for collecting image information of the chassis of the reduction furnace;
the laser cleaning head is arranged on the autorotation bracket;
the self-rotating bracket is fixedly provided with a protective cover; the upper end of the protective cover is closed, and the lower end of the protective cover is of a cylindrical structure with an opening; the protective cover is arranged on the outer side of the laser cleaning head in a surrounding manner;
the top of the protective cover is provided with a dust suction port; the dust suction port is communicated with the negative pressure dust suction mechanism through a dust suction pipe;
the top of the protective cover is provided with a gas inlet; the gas inlet is communicated with a nitrogen source through a gas pipe;
the control system is connected with the intelligent recognition system to receive the information collected by the intelligent recognition system and carry out calculation and analysis;
the control system is respectively connected with the slewing mechanism, the linear moving mechanism and the self-rotating mechanism for control.
Further, the linear movement mechanism includes: a mobile drive assembly and a mobile support;
the movement driving assembly includes: the ball screw pair and the moving motor;
a lead screw of the ball screw pair is rotatably arranged on the rotary bracket; the moving motor is fixedly arranged on the rotary support and is in transmission connection with a lead screw of the ball screw pair;
the movable bracket is slidably arranged on the rotary bracket and is used for supporting the self-rotating bracket; the moving bracket is fixedly connected with a nut of the ball screw pair so as to be driven by the moving driving assembly to slide along the rotary bracket.
Alternatively, the linear movement mechanism includes: a linear motor and a moving member;
the moving component is arranged on the rotary bracket in a sliding way and is used for supporting the self-rotating bracket;
the linear motor is arranged on the rotary support, is hinged with the moving member and is used for driving the moving member to slide on the rotary support.
Further, the dust suction pipe is a hose;
the air pipe is a hose.
Further, the height of the frame can be adjusted;
the frame is provided with support legs; the number of the supporting legs is multiple; the support legs are respectively arranged at two ends of the frame; the lower end of the supporting leg is provided with an adjusting seat; the adjusting seat is connected with the supporting leg through threads; the adjusting seat rotates relative to the supporting leg, and the relative position of the adjusting seat and the supporting leg can be adjusted; the walking wheel is arranged on the adjusting seat.
Further, a locking assembly is arranged on the adjusting seat and used for selectively locking the travelling wheel.
Furthermore, the number of the rotation mechanisms is two; the two automatic transmission mechanisms are independently controlled by the control system; the self-rotation mechanisms and the linear moving mechanisms are arranged in a one-to-one correspondence manner;
at least two laser cleaning heads are arranged on a single autorotation mechanism; at least two laser cleaning heads are arranged in an array by taking the rotation axis of the rotation support as a center.
Furthermore, the outer wall of the protective cover is uniformly distributed with brush hair.
Further, the length of the bristles is not less than twice the height of the electrodes.
Further, the bristles are made of stainless steel materials.
By means of the technical scheme, the utility model discloses polycrystalline silicon reduction furnace chassis laser cleaning equipment has following advantage at least:
can improve the cleaning performance, promote the cleaning efficiency, reduce operating personnel's intensity of labour.
The above description is only an overview of the technical solution of the present invention, and in order to make the technical means of the present invention clearer and can be implemented according to the content of the description, the following detailed description is made with reference to the preferred embodiments of the present invention and accompanying drawings.
Drawings
FIG. 1 is a schematic front view of a laser cleaning apparatus for a chassis of a polysilicon reduction furnace according to an embodiment of the present invention;
fig. 2 is a schematic top perspective view of a laser cleaning apparatus for a chassis of a polysilicon reduction furnace provided in an embodiment of the present invention.
Shown in the figure:
the robot comprises a frame 1, supporting legs 1-1, adjusting seats 1-2, walking wheels 1-3, a swing mechanism 2, a swing support 2-1, a swing driving assembly 2-2, a linear moving mechanism 3-1, a moving driving assembly 3-2, a moving support 4, an intelligent recognition system 5, a rotation mechanism 5, a laser cleaning head 6, a protective cover 7, a dust suction port 7-1, an air inlet 7-2, bristles 8, a chassis 9 and electrodes 10.
Detailed Description
To further illustrate the technical means and effects of the present invention adopted to achieve the intended purpose of the present invention, the following detailed description is given with reference to the accompanying drawings and preferred embodiments, in order to explain the detailed embodiments, structures, features and effects of the present invention. In the following description, different "one embodiment" or "an embodiment" refers to not necessarily the same embodiment. Furthermore, the particular features, structures, or characteristics may be combined in any suitable manner in one or more embodiments.
As shown in fig. 1 and fig. 2, the laser cleaning device for a chassis of a polycrystalline silicon reduction furnace provided by an embodiment of the invention comprises a frame 1, a swing mechanism 2, a linear moving mechanism 3, an intelligent identification system 4, a rotation mechanism 5, a laser cleaning head 6 and a control system; the frame 1 is of a gantry structure and can be erected above the reduction furnace for operation. The frame 1 is formed by splicing and assembling high-quality aluminum profiles, and has a stable structure and small occupied space. The frame 1 is provided with road wheels 1-3 to support the frame 1 to move; preferably, the height of the carriage 1 is adjustable to facilitate adjustment of the height of the laser cleaning head 6. The frame 1 is provided with a supporting leg 1-1; the number of the supporting legs 1-1 is multiple; the plurality of supporting legs 1-1 are respectively arranged at two ends of the frame 1; the lower end of the supporting leg 1-1 is provided with an adjusting seat 1-2; the adjusting seat 1-2 is connected with the supporting leg 1-1 through threads; the adjusting seat 1-2 rotates relative to the supporting leg 1-1, so that the relative position of the adjusting seat and the supporting leg 1-1 can be adjusted, and the height of the supporting leg 1-1 can be adjusted; the walking wheels 1-3 are arranged on the adjusting seats 1-2 and support the frame 1 through the adjusting seats 1-2. Further preferably, the adjusting seat 1-2 is provided with a locking assembly for selectively locking the walking wheel 1-3 so as to lock the walking wheel 1-3 after the frame 1 moves to a specified position.
The turning mechanism 2 includes: a rotary bracket 2-1 and a rotary driving component 2-2; the rotary bracket 2-1 is arranged on the frame 1 in a pivoting way; the pivoting support 2-1 is preferably connected to the frame 1 by means of bearings. The rotary driving component 2-2 is fixedly arranged on the frame 1, is in transmission connection with the rotary support 2-1 and is used for driving the rotary support 2-1 to rotate; the rotary driving component 2-2 can be a stepping motor; a combination of a stepping motor and a speed change mechanism is also possible.
The linear moving mechanism 3 is arranged on the rotary support 2-1 and can move linearly along the rotary support 2-1; in the present embodiment, the linear motion mechanism 3 preferably includes: a mobile driving component 3-1 and a mobile bracket 3-2; the movement driving assembly 3-1 includes: the ball screw pair and the moving motor; a lead screw of the ball screw pair can be rotatably arranged on the rotary bracket 2-1; the moving motor is fixedly arranged on the rotary support 2-1 and is in transmission connection with a lead screw of the ball screw pair; the movable support 3-2 is slidably arranged on the rotary support 2-1 and used for supporting the self-rotating support; the moving support 3-2 is fixedly connected with a nut of the ball screw pair so as to be driven by the moving driving assembly 3-1 to slide along the rotary support 2-1, so that the moving support 3-2 can linearly move on the rotary support 2-1; the movable support 3-2 is used for supporting the rotary support 2-1.
Alternatively, the linear movement mechanism 3 includes: a linear motor and a moving member; the moving component is arranged on the rotary bracket 2-1 in a sliding way and is used for supporting the self-rotating bracket; the linear motor is arranged on the rotary support 2-1, is hinged with the moving member and is used for driving the moving member to slide on the rotary support 2-1 so as to realize the linear movement of the moving member on the rotary support 2-1; the moving member is used for supporting the rotation bracket.
The rotation mechanism 5 includes: the rotation bracket and the rotation driving component; the rotation bracket is pivotally arranged on the linear moving mechanism 3; the rotation driving assembly is arranged on the linear moving mechanism 3, is in transmission connection with the rotation support and is used for driving the rotation support to rotate; the rotation driving assembly may be a stepping motor.
The intelligent recognition system 4 is arranged on the rotary support 2-1 and used for collecting image information of the chassis 9 of the reduction furnace; the intelligent recognition system 4 is a CCD camera.
The laser cleaning head 6 is arranged on the autorotation support and is driven by the autorotation support to rotate, so that the cleaning of the electrode 10 head and the chassis 9 is realized. The laser cleaning head 6 performs laser cleaning of the electrode 10 and the chassis 9. Laser cleaning has the characteristics of no grinding, no contact, no thermal effect, suitability for cleaning objects made of various materials and the like, and is considered to be the most reliable and effective solution. The principle is mainly that high-energy laser beams are gathered on the surface of a chassis 9 to be cleaned, light energy is absorbed by materials and converted into heat energy, and the adsorption force between pollutant particles and the surface of the materials is overcome by utilizing the thermal stress generated by thermal expansion of the materials, so that the cleaning purpose is achieved.
The self-rotating bracket is fixedly provided with a protective cover 7; the protective cover 7 is a cylindrical structure with the upper end closed and the lower end provided with an opening; the protective cover 7 is arranged outside the laser cleaning head 6 in a surrounding mode, so that the laser cleaning head 6 can be protected, dust can be prevented from diffusing, and dust collection is facilitated. The top of the protective cover 7 is provided with a dust suction port 7-1; the dust suction port 7-1 is communicated with the negative pressure dust suction mechanism through a dust suction pipe so that the negative pressure dust suction mechanism can suck dust through the protective cover 7; the negative pressure dust collection mechanism can adopt a central dust collection system of a polysilicon production workshop. In the preferred embodiment, the dust suction pipe is a hose, so that when the rotation bracket rotates in a reciprocating manner, the dust suction pipe can rotate along with the protective cover 7, and dust suction is prevented from being influenced. The top of the protective cover 7 is provided with a gas inlet 7-2; the gas inlet 7-2 is communicated with a nitrogen source through a gas pipe, so that nitrogen is introduced during dust collection, and the safety of the dust collection process is protected. The air tube is preferably a hose in the embodiment, so that the air tube can rotate along with the protective cover 7 when the protective cover 7 rotates back and forth.
The control system is connected with the intelligent recognition system 4 to receive the information collected by the intelligent recognition system 4 and carry out calculation and analysis; the control system is connected with the rotary mechanism 2, the linear moving mechanism 3 and the self-rotating mechanism 5 respectively for control. The control system is connected with a touch screen to facilitate control and parameter display of an operator.
The utility model discloses an embodiment provides a polycrystalline silicon reduction furnace chassis laser cleaning equipment can improve the cleaning performance, promotes the cleaning efficiency, reduces operating personnel's intensity of labour.
As a preferable example of the above embodiment, there are two rotation mechanisms 5; the two self-transmission mechanisms are independently controlled by a control system so as to improve the cleaning efficiency. The autorotation mechanisms 5 are arranged in one-to-one correspondence with the linear moving mechanisms 3; at least two laser cleaning heads 6 are arranged on the single rotation mechanism 5; at least two laser cleaning heads 6 are arranged in an array by taking the rotation axis of the rotation support as the center, so that when the rotation support rotates, the laser cleaning heads 6 can clean the electrode 10 and the chassis 9 along the circumferential direction.
Preferably, the outer wall of the protective cover 7 is provided with bristles 8 uniformly distributed thereon for cleaning the electrodes 10 and the base plate 9 in coordination with the laser cleaning head 6. It is further preferred that the length of the bristles 8 is not less than twice the height of the electrodes 10 to keep the bristles 8 of sufficient length to clean the electrodes 10 and to prevent the shield 7 from interfering with the electrodes 10. More preferably, the bristles 8 are made of a stainless material so that the bristles 8 have high hardness and are less likely to cause new contamination.
In the laser cleaning equipment for the chassis of the polycrystalline silicon reduction furnace, when in operation, an operator moves the frame 1 to a preset position and erects the frame above the reduction furnace, and the intelligent recognition system 4 takes a picture of the furnace and collects the position information of the furnace and the electrode 10; the control system moves the laser cleaning head 6 to a preset area for cleaning operation by controlling the swing mechanism 2, the linear moving mechanism 3 and the self-rotating mechanism 5. When the electrode 10 is cleaned, nitrogen is introduced into the protective cover 7, and dust is simultaneously sucked until the whole cleaning work is finished.
The utility model discloses a polycrystalline silicon reduction furnace chassis laser cleaning equipment that embodiment provided can accomplish whole chassis 9 cleaning processes alone, can realize full automated control.
In the description of the present invention, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "fixed" are to be construed broadly, e.g., as being fixedly connected, detachably connected, or integrated; can be mechanically or electrically connected; they may be directly connected or indirectly connected through intervening media, or may be connected through the use of two elements or the interaction of two elements. The specific meaning of the above terms in the present invention can be understood as a specific case by those skilled in the art.
The utility model discloses the standard part that uses all can purchase from the market, and dysmorphism piece all can be customized according to the description with the record of attached drawing, and the concrete connected mode of each part all adopts conventional means such as ripe bolt, rivet, welding among the prior art, and machinery, part and equipment all adopt prior art, and conventional model, including the connected mode of circuit connection conventional among the adoption prior art, here detailed description no longer.
The above description is only a preferred embodiment of the present invention, and is not intended to limit the present invention in any way, and any simple modification, equivalent change and modification made by the technical spirit of the present invention to the above embodiments are all within the scope of the technical solution of the present invention.

Claims (10)

1. The laser cleaning equipment for the chassis of the polycrystalline silicon reduction furnace is characterized by comprising a frame, a swing mechanism, a linear moving mechanism, an intelligent identification system, a rotation mechanism, a laser cleaning head and a control system;
the frame is of a gantry structure; the frame is provided with traveling wheels to support the frame to move;
the swing mechanism includes: the rotary bracket and the rotary driving component;
the slewing bracket is pivotably arranged on the frame;
the rotary driving assembly is fixedly arranged on the frame, is in transmission connection with the rotary support and is used for driving the rotary support to rotate;
the linear moving mechanism is arranged on the rotary support and can move linearly along the rotary support;
the rotation mechanism includes: the rotation bracket and the rotation driving component;
the rotation bracket can be pivotally arranged on the linear moving mechanism;
the rotation driving assembly is arranged on the linear moving mechanism, is in transmission connection with the rotation support and is used for driving the rotation support to rotate;
the intelligent recognition system is arranged on the rotary support and is used for collecting image information of the chassis of the reduction furnace;
the laser cleaning head is arranged on the autorotation bracket;
the autorotation bracket is fixedly provided with a protective cover; the upper end of the protective cover is closed, and the lower end of the protective cover is of a cylindrical structure with an opening; the protective cover is arranged on the outer side of the laser cleaning head in a surrounding manner;
the top of the protective cover is provided with a dust suction port; the dust suction port is communicated with the negative pressure dust suction mechanism through a dust suction pipe;
the top of the protective cover is provided with a gas inlet; the gas inlet is communicated with a nitrogen source through a gas pipe;
the control system is connected with the intelligent recognition system to receive the information collected by the intelligent recognition system and carry out calculation and analysis;
the control system is respectively connected with the slewing mechanism, the linear moving mechanism and the self-rotating mechanism for control.
2. The polysilicon reducing furnace chassis laser cleaning equipment according to claim 1,
the linear movement mechanism includes: the device comprises a mobile driving component and a mobile bracket;
the movement driving assembly includes: the ball screw pair and the moving motor;
the lead screw of the ball screw pair is rotatably arranged on the rotary bracket; the moving motor is fixedly arranged on the rotary support and is in transmission connection with a lead screw of the ball screw pair;
the movable bracket is slidably arranged on the rotary bracket and used for supporting the self-rotating bracket; the moving bracket is fixedly connected with a nut of the ball screw pair so as to be driven by the moving driving assembly to slide along the rotary bracket.
3. The polysilicon reducing furnace chassis laser cleaning equipment according to claim 1,
the linear movement mechanism includes: a linear motor and a moving member;
the moving component is arranged on the rotary bracket in a sliding way and is used for supporting the self-rotating bracket;
the linear motor is arranged on the rotary support, is hinged with the moving component and is used for driving the moving component to slide on the rotary support.
4. The laser cleaning equipment for the chassis of the polysilicon reduction furnace according to claim 1,
the dust suction pipe is a hose; the air pipe is a hose.
5. The laser cleaning equipment for the chassis of the polysilicon reduction furnace according to claim 1,
the height of the frame can be adjusted; the frame is provided with support legs; the number of the supporting legs is multiple; the support legs are respectively arranged at two ends of the frame; the lower end of the supporting leg is provided with an adjusting seat; the adjusting seat is connected with the supporting leg through threads; the adjusting seat rotates relative to the supporting leg, and the relative position of the adjusting seat and the supporting leg can be adjusted; the walking wheel is arranged on the adjusting seat.
6. The laser cleaning equipment for the chassis of the polysilicon reduction furnace according to claim 5,
and the adjusting seat is provided with a locking assembly for selectively locking the travelling wheel.
7. The polysilicon reducing furnace chassis laser cleaning equipment according to claim 1,
the number of the self-rotating mechanisms is two; the two autorotation mechanisms are independently controlled by the control system; the autorotation mechanisms and the linear moving mechanisms are arranged in a one-to-one correspondence manner;
at least two laser cleaning heads are arranged on a single self-rotating mechanism; at least two laser cleaning heads are arranged in an array by taking the rotation axis of the rotation support as a center.
8. The laser cleaning equipment for the chassis of the polysilicon reduction furnace according to claim 1,
the outer wall of the protective cover is uniformly distributed with brush hairs.
9. The laser cleaning equipment for the chassis of the polysilicon reduction furnace according to claim 8,
the length of the bristles is not less than 2 times the height of the electrodes.
10. The polysilicon reducing furnace chassis laser cleaning equipment according to claim 9,
the bristles are made of stainless steel materials.
CN202220721644.XU 2022-03-28 2022-03-28 Polycrystalline silicon reduction furnace chassis laser cleaning equipment Active CN217043820U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202220721644.XU CN217043820U (en) 2022-03-28 2022-03-28 Polycrystalline silicon reduction furnace chassis laser cleaning equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202220721644.XU CN217043820U (en) 2022-03-28 2022-03-28 Polycrystalline silicon reduction furnace chassis laser cleaning equipment

Publications (1)

Publication Number Publication Date
CN217043820U true CN217043820U (en) 2022-07-26

Family

ID=82466450

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202220721644.XU Active CN217043820U (en) 2022-03-28 2022-03-28 Polycrystalline silicon reduction furnace chassis laser cleaning equipment

Country Status (1)

Country Link
CN (1) CN217043820U (en)

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