CN216988926U

CN216988926U - Wafer cleaning, drying and saving device based on fluctuation and swing

Info

Publication number: CN216988926U
Application number: CN202220434456.9U
Authority: CN
Inventors: 孙进; 谢文涛; 周威; 梁立
Original assignee: Yangzhou University
Current assignee: Yangzhou University
Priority date: 2022-03-02
Filing date: 2022-03-02
Publication date: 2022-07-19
Anticipated expiration: 2032-03-02

Abstract

The utility model discloses a wafer cleaning, drying and saving device based on wave oscillation, which comprises a machine body, a wafer boat, a bearing and oscillating mechanism, a lifting mechanism and a bearing box, wherein the wafer boat is arranged on the machine body; the lifting mechanism is vertically arranged on the rear wall inside the machine body in the middle, the bearing and swinging mechanism is arranged on a lifting plate at the front part of the lifting mechanism, the bearing box is arranged on the bearing and swinging mechanism, the wafer boat is arranged in the bearing box, and the bearing box slightly swings left and right through the swinging mechanism, so that wafers in the wafer boat are fully dried. The utility model can realize the integration of cleaning and drying, fully dry the wafer, has the advantages of light weight and miniaturization, improves the quality of wafer drying, improves the production efficiency of the wafer, reduces the damage rate of the wafer and saves the space.

Description

Wafer cleaning, drying and saving device based on fluctuation and swing

Technical Field

The utility model relates to the technical field of semiconductors, in particular to a wafer cleaning, drying and saving device based on wave oscillation.

Background

Wafers are silicon wafers used in the fabrication of silicon semiconductor circuits and are carriers used in the production of integrated circuits. During the processing and preparation process of the wafer, residual particles, dust and other stains after chemical etching can be attached to the surface of the wafer, and the subsequent production can be affected. Therefore, after the wafer is processed, the wafer is cleaned and dried to ensure the production quality of the wafer.

In 2019, Cai Feng Ru et al, a south Asia science and technology company, Inc. proposed a semiconductor wafer drying apparatus and method (application publication No.: CN111276422A, applicant: south Asia science and technology company, Inc.). The utility model adopts the microwave generator and is configured to emit microwaves to the cavity, and the semiconductor wafer drying equipment removes water remained on the surface of the wafer by using the microwaves, so that the drying process becomes simple, and the operation cost of drying the wafer can be effectively reduced. The disadvantage is that the wafer clamping part cannot be effectively dried, which affects further processing.

In 2020, Yangshi, a nitrogen heated wafer drying tank (application publication No. CN212962714U, Applicant: Intelligent semiconductor device technologies, Kunshan, Inc.) was developed. The utility model discloses a through locating the quick-witted incasement with nitrogen gas heating device in, guaranteed drying equipment's integral structure, the transport of being convenient for to set up rotating device and can drive the wafer and constantly rotate in drying process, spin-dry the water on surface, improve drying efficiency. The disadvantage is that the wafer is subject to a large centrifugal force during the rotation process, which is likely to cause damage.

In 2021, Cuocheng et al, a single wafer cleaning device (application publication No.: CN214624981U, applicant: Nanjing, Inc., Asian electric technology) was invented. The utility model discloses a place the monolithic wafer up on the supporting disk, utilize rotatable spray tube blowout washing liquid and clear water, the nitrogen gas after the while heating realizes the effective cleanness to the monolithic wafer from the through-hole blowout through the cavity from the passageway in the middle of the pivot, and the air current that heating nitrogen gas formed also can prevent that the washing liquid from flowing into the wafer bottom surface. The wafer drying device has the defects that only single wafers can be cleaned, the drying effect cannot be realized, and after the cleaning is finished, the wafers need to be conveyed to a drying module and are easy to damage in the conveying process. And the device can only clean one wafer at a time, so that the efficiency is low, and the device is not beneficial to mass production in factories.

In 2021, Utility model of Liangli et al, a Z-shaped telescopic micro-motion swinging wafer full drying device (application publication No. CN213905317U, applicant: Yangzhou university). The utility model discloses a to load the wafer boat of wafer and place in wafer boat wabbler mechanism, it is ejecting with the wafer in the wafer boat by wafer ejection mechanism to utilize wafer boat wabbler mechanism to sway the wafer boat, make wafer dry everywhere abundant, solved the not thorough scheduling problem of drying in the current wafer drying process. The disadvantage is that the washing and drying units are separate, resulting in an overall device that is bulky, not light and compact enough.

In summary, if the above wafer cleaning and drying device is required to be light, only one wafer can be cleaned at a time, which reduces the working efficiency and increases the probability of damage during transportation; in an attempt to dry a plurality of wafers at a time to improve efficiency, space is sacrificed, and insufficient drying of the clamping portion often occurs during the drying process.

SUMMERY OF THE UTILITY MODEL

The utility model aims to overcome the defects of the prior art, provides a wafer cleaning, drying and saving device based on fluctuation and swing, and can solve the problems of insufficient drying and the like in the field of semiconductor wafer manufacturing.

The purpose of the utility model is realized by the following steps: a wafer cleaning, drying and saving device based on fluctuation and swing comprises a machine body, a wafer boat, a bearing and swinging mechanism, a lifting mechanism and a bearing box; the wafer boat comprises a body, a lifting mechanism, a bearing and swinging mechanism, a loading box, a wafer boat and a wafer drying mechanism, wherein the lifting mechanism is arranged on the rear wall in the body in a centered and vertical mode, the bearing and swinging mechanism is arranged on a lifting plate in the front of the lifting mechanism, the bearing box is placed on the bearing and swinging mechanism, the wafer boat is placed in the bearing box, and the bearing box slightly swings left and right through the swinging mechanism, so that wafers in the wafer boat are fully dried.

As a further limitation of the present invention, the bearing and swinging mechanism comprises a second motor, a crank, a rocker, a connecting rod, a back plate, a central rod, an L-shaped slider, a bearing rod and a supporting plate; the second motor is fixed above the back plate, one end of the crank is connected with a second motor shaft, and the other end of the crank is connected with the rocker; sliding grooves are formed in the two sides of the back plate, the L-shaped sliding blocks are embedded in the sliding grooves of the back plate, and hinge shafts are arranged in the middle of the L-shaped sliding blocks; one end of the rocker is connected with the crank, and the other end of the rocker is connected with the hinged shaft; the connecting rod is hinged on the back plate through a middle hole, and grooves are formed in two sides of the connecting rod and arranged on the hinged shaft; the utility model discloses a rocking device, including bearing box, carrier bar, L type slider, well core rod vertical fixation, the carrier bar is fixed in the below of bearing the box, the carrier bar below is equipped with two hollow grooves, accepts the removal of L type slider below carrier bar when waveing, well core rod vertical fixation is on the backplate, carrier bar and layer board are rotatory round well core rod.

As a further limitation of the utility model, the lower part of the carrying box is provided with a plurality of holes for draining water.

As a further limitation of the present invention, the lifting mechanism includes a first motor, a guide rail, a lead screw, and a lifting plate; the guide rail is provided with four guide rail sliding blocks, and the rear side of the lifting plate is fixedly connected with the four guide rail sliding blocks and the screw rod sliding block; the front side of the lifting plate is fixedly connected with the back plate, and the first motor drives the lead screw to drive the lead screw sliding block to move up and down.

As a further limitation of the present invention, the body comprises a water inlet, a water outlet, an ultrasonic device, a nozzle, a control panel and glass; the utility model discloses a glass machine, including fuselage, water inlet, water outlet, ultrasonic device, nozzle, control panel, glass, water inlet and outlet, the left downside and the right downside of fuselage are arranged respectively in to the water inlet, ultrasonic device places in the inside below of fuselage, the nozzle is installed in the inner wall both sides and the antetheca top of fuselage, control panel installs the top at the fuselage, glass installs on the draw-in groove of fuselage top.

By adopting the technical scheme, compared with the prior art, the utility model has the beneficial effects that: firstly, the utility model realizes the integration of cleaning and drying, simultaneously, the whole device has enough light weight and miniaturization, saves space resources, is convenient for transportation and brings considerable economic effect;

secondly, when the marangoni drying method is used, the adopted bearing and swinging mechanism (fluctuation swinging mechanism) can enable the wafer to swing left and right in the wafer boat, so that the contact part of the wafer and the wafer boat can be fully dried;

compared with the traditional technology, the utility model can realize the integration of the two procedures of cleaning and drying, removes unnecessary wafer conveying mechanisms, reduces the damage and scratch of the wafer in the carrying process to a certain extent and saves the time cost; the device can realize the integration of washing, drying, makes the wafer dry abundant to the device is enough lightweight, miniaturized advantage, has improved the dry quality of wafer, promotes wafer production efficiency, has reduced the wafer damage rate, has practiced thrift the space.

Drawings

Fig. 1 is an assembly view of the overall structure of the present invention.

Fig. 2 is a schematic cross-sectional view of the fuselage of the present invention.

Fig. 3 is a perspective view of the carrying and swinging mechanism of the present invention.

Fig. 4 is a perspective view of the interior of the cabinet and the lifting mechanism according to the present invention.

FIG. 5 is a schematic view of the waving pose of the present invention.

Wherein, 1, a machine body, 11 water inlets, 12 ultrasonic devices, 13 nozzles, 14 control panels, 15 glass and 16 water outlets; 2 crystal boats, 3 bearing and swinging mechanisms, 31 supporting plates, 32 bearing rods, 33L-shaped sliding blocks, 34 central rods, 35 back plates, 36 connecting rods, 37 rocker arms, 38 cranks, 39 second motors, 4 lifting mechanisms, 41 guide rails, 42 lead screws, 43 lifting plates, 44 first motors and 5 bearing boxes.

Detailed Description

The saving device for wafer cleaning and drying based on wave oscillation as shown in fig. 1 comprises a machine body 1, a wafer boat 2, a bearing and oscillating mechanism 3, a lifting mechanism 4 and a bearing box 5; the lifting mechanism 4 is arranged on the rear wall of the inner part of the machine body 1 in the middle vertically, the bearing and swinging mechanism 3 is arranged on a lifting plate at the front part of the lifting mechanism 4, the bearing box 5 is arranged on the bearing and swinging mechanism 3, the crystal boat 2 is arranged in the bearing box 5, and the bearing box 5 slightly swings left and right through the swinging mechanism 3, so that the crystal wafers in the crystal boat 2 are fully dried. The lifting mechanism 4 is vertically arranged on the rear wall in the machine body 1 in the middle and at a proper height, so that the crystal boat 2 can smoothly descend below the liquid level in the cleaning process and smoothly ascend to the position where gas is released in the drying process.

As shown in fig. 2, the body 1 includes a water inlet 11, a water discharge port 16, an ultrasonic device 12, a nozzle 13, a control panel 14, and a glass 15; the water inlet 11 and the water outlet 16 are respectively arranged at the left lower side and the right lower side of the machine body 1 and are used for respectively inputting and discharging cleaning liquid and clear water in the cleaning process; the ultrasonic device 12 is placed below the interior of the fuselage 1 and is turned on during the cleaning process; the nozzles 13 are arranged on the two sides of the inner wall and above the front wall of the machine body 1 and release IPA gas and hot nitrogen gas in the drying process; the control panel 14 is arranged above the machine body 1, and the glass 15 is arranged on a clamping groove above the machine body 1 and used for realizing sealing effect during drying.

As shown in fig. 3, the carrying and swinging mechanism 3 includes a second motor 39, a crank 38, a rocker 37, a connecting rod 36, a back plate 35, a central rod 34, an L-shaped slider 33, a carrying rod 32 and a supporting plate 31; the second motor 39 is fixed above the back plate 35, one end of the crank 38 is connected with the second motor shaft, and the other end is connected with the rocker 37; sliding grooves are formed in two sides of the back plate 35, the L-shaped sliding blocks 3 are embedded in the sliding grooves of the back plate 35, up-and-down displacement can be achieved, and hinged shafts are arranged in the middle of the L-shaped sliding blocks 33; one end of the rocker 37 is connected with the crank 38, and the other end is connected with the hinged shaft; the connecting rod 36 is hinged on the back plate 35 through a middle hole, and grooves are arranged on two sides of the connecting rod 36 and are arranged on the hinged shaft; the carrier bar 32 is fixed in the below of bearing the weight of the box 5 for hold up and bear the weight of the box 5, and the carrier bar 32 below is equipped with two hollow grooves, is used for accepting the removal of the bearing post in L type slider 33 below when rocking, and on central rod 34 vertical fixation was in backplate 35, carrier bar 32 and layer board 31 rotated around central rod 34, and layer board 31 is used for holding and bears the weight of the box 5, makes it more stable.

As shown in fig. 4, the lifting mechanism 4 includes a motor first 44, a guide rail 41, a lead screw 42, and a lifting plate 43; four guide rail sliding blocks are arranged on the guide rail 41, and the rear side of the lifting plate 43 is fixedly connected with the four guide rail sliding blocks and the screw rod sliding block; the front side of the lifting plate 43 is fixedly connected with the back plate 35, the first motor 44 drives the screw rod 42 to drive the screw rod slide block to move up and down, meanwhile, the guide rail slide block plays a guiding role, the guide rail slide block moves horizontally on the guide rail 41, so that the lifting displacement is more stable and reliable, the lower part of the bearing box 5 is provided with a plurality of holes for draining water, and the end of the bearing box 5 is just fixed on the bearing and swinging mechanism 3.

As shown in fig. 5, the solid line graph shows the posture in which the carriage 5 is tilted to the left along with the carriage and swing mechanism 3; the dotted line diagram shows the posture that the carrying box 5 tilts to the right along with the carrying and swinging mechanism 3, and the wafers in the wafer boat 2 will tilt to the left and right continuously, so that the contact parts of the wafers and the wafer boat are fully dried.

When the wafer boat lifting device works, firstly, the end of a wafer boat 2 filled with wafers is rightly placed in a bearing box 5, the bearing box 5 is fixedly connected with a bearing and swinging mechanism 3, a control panel 14 is opened to control a motor to work, and the whole wafer boat 2 is enabled to move downwards to a fixed position;

secondly, in the wafer cleaning stage, the water inlet 11 is opened to inject cleaning liquid and clean water, the ultrasonic device 12 is opened to start cleaning when the wafer is completely submerged, the water outlet 16 is opened to remove the cleaning liquid and the clean water after the cleaning is finished, the crystal boat is lifted to a certain height by the screw rod 42, and the crystal boat 2 is controlled to move upwards to a fixed position;

finally, IPA gas and hot nitrogen gas are injected through the nozzle 13, and the carrier and swing mechanism 3 (wave swing mechanism) starts to operate, so that the contact portion between the wafer and the wafer boat 2 is continuously separated, and sufficient drying is realized.

The utility model provides a saving type device for cleaning and drying wafers, which embodies the advantages of integration of cleaning and drying, full drying of the wafers and full light weight of the device, improves the quality of wafer drying, saves space, improves production efficiency, reduces wafer damage rate, and has great market prospect and economic value.

The present invention is not limited to the above-mentioned embodiments, and based on the technical solutions disclosed in the present invention, those skilled in the art can make some substitutions and modifications to some technical features without creative efforts according to the disclosed technical contents, and these substitutions and modifications are all within the protection scope of the present invention.

Claims

1. A wafer cleaning, drying and saving device based on fluctuation and swing is characterized by comprising a machine body (1), a wafer boat (2), a bearing and swinging mechanism (3), a lifting mechanism (4) and a bearing box (5); the wafer drying machine is characterized in that the lifting mechanism (4) is vertically arranged on the rear wall inside the machine body (1) in the middle, the bearing and swinging mechanism (3) is arranged on a lifting plate at the front part of the lifting mechanism (4), the bearing box (5) is arranged on the bearing and swinging mechanism (3), the wafer boat (2) is arranged in the bearing box (5), and the bearing box (5) slightly swings left and right through the swinging mechanism (3), so that wafers in the wafer boat (2) are fully dried.

2. The wafer cleaning, drying and saving device based on wave motion and swing as claimed in claim 1, wherein the carrying and swinging mechanism (3) comprises a second motor (39), a crank (38), a rocker (37), a connecting rod (36), a back plate (35), a central rod (34), an L-shaped sliding block (33), a carrying rod (32) and a supporting plate (31); the second motor (39) is fixed above the back plate (35), one end of the crank (38) is connected with a second motor shaft, and the other end of the crank is connected with the rocker (37); sliding grooves are formed in two sides of the back plate (35), the L-shaped sliding block (33) is embedded in the sliding grooves of the back plate (35), and a hinged shaft is arranged in the middle of the L-shaped sliding block (33); one end of the rocker (37) is connected with the crank (38), and the other end of the rocker is connected with the hinged shaft; the connecting rod (36) is hinged to the back plate (35) through a middle hole, grooves are formed in two sides of the connecting rod (36), and the grooves are formed in the hinged shaft; the bearing rod (32) is fixed below the bearing box (5), two hollow grooves are formed below the bearing rod (32), the bearing column below the L-shaped sliding block (33) moves when the bearing rod is used for bearing and rocking, the central rod (34) is vertically fixed on the back plate (35), and the bearing rod (32) and the supporting plate (31) rotate around the central rod (34).

3. The wafer washing, drying and saving device based on wave motion swing as claimed in claim 1 or 2, wherein the lower part of the carrying box (5) is provided with a plurality of holes for draining water.

4. The wafer cleaning, drying and saving device based on wave motion swing as claimed in claim 1, wherein the lifting mechanism (4) comprises a first motor (44), a guide rail (41), a lead screw (42) and a lifting plate (43); four guide rail sliding blocks are arranged on the guide rail (41), and the rear side of the lifting plate (43) is fixedly connected with the four guide rail sliding blocks and the lead screw sliding block; the front side of the lifting plate (43) is fixedly connected with the back plate (35), and the first motor (44) drives the screw rod (42) to drive the screw rod sliding block to move up and down.

5. The wafer cleaning, drying and saving device based on wave motion and swing as claimed in claim 1, wherein the body (1) comprises a water inlet (11), a water outlet (16), an ultrasonic device (12), a nozzle (13), a control panel (14) and a glass (15); the utility model discloses a portable ultrasonic treatment machine, including fuselage (1), water inlet (11) and outlet (16), place the left downside and the right downside of fuselage (1) respectively in, place in the inside below of fuselage (1) supersound device (12), install the inner wall both sides and the antetheca top in fuselage (1) nozzle (13), the top in fuselage (1) is installed in control panel (14), glass (15) are installed on the draw-in groove of fuselage (1) top.