CN216988912U - Double-layer quartz groove for cleaning silicon wafer - Google Patents

Abstract

The utility model discloses a double-layer quartz tank for cleaning silicon wafers, which comprises a quartz tank body, wherein a placing rack consisting of a plurality of placing rods is arranged inside the quartz tank body, a lifting mechanism is arranged on one side of the upper end of the placing rack, and the placing rack vertically moves inside the quartz tank body through the lifting mechanism, and the double-layer quartz tank has the following advantages that: through setting up hoist mechanism, only need the horizontal pole of pulling hoist mechanism just can mention and put back the rack, this kind of moving means is simple and with low costs, be applicable to the silicon chip washing of small batch, can drive the silicon chip on the rack through hoist mechanism and reciprocate simultaneously, make the silicon chip produce the vibration, spot on the silicon chip can drop, be convenient for wash, through setting up the filter plate of being connected with the rack integration, the filter plate can filter the waste liquid, and when proposing the rack, the filter plate fixed with the rack bottom is proposed thereupon, conveniently wash its surperficial impurity.

Description

Double-layer quartz groove for cleaning silicon wafer

Technical Field

The utility model relates to the technical field of silicon wafer cleaning equipment, in particular to a double-layer quartz tank for cleaning a silicon wafer.

Background

When the silicon wafer is cleaned, the silicon wafer needs to be placed in a quartz tank and cleaned by using a cleaning solution, the existing quartz tank for cleaning the silicon wafer generally puts the silicon wafer into the quartz tank through a mechanical arm for cleaning, and the mode is very quick, but the cost is high, and the method is not suitable for cleaning small batches of silicon wafers.

SUMMERY OF THE UTILITY MODEL

The utility model provides a double-layer quartz tank for cleaning a silicon wafer.

The technical scheme adopted by the utility model for solving the technical problem is as follows: a double-layer quartz cell for cleaning silicon wafers comprises: the silicon wafer placing device comprises a quartz groove body, wherein a placing frame consisting of a plurality of placing rods is arranged inside the quartz groove body, a lifting mechanism is arranged on one side of the upper end of the placing frame, the placing frame vertically moves inside the quartz groove body through the lifting mechanism, and the placing frame vertically reciprocates up and down, so that a silicon wafer is vibrated, and stains on the silicon wafer can fall off;

lifting mechanism includes the horizontal pole, the connecting rod fixed connection that the horizontal pole passes through the bottom both sides is in upper end one side of rack, the tip fixedly connected with montant of horizontal pole, the montant extends to the outer wall middle part of quartz cell body by the tip of horizontal pole, the vertical groove has been seted up to the relative montant of quartz cell body, the lower extreme of montant passes through connecting block sliding connection in erecting the inslot, stimulates the horizontal pole, can make the connecting block of the montant lower extreme of one side slide in erecting the inslot, and the rack of horizontal pole below can remove, and the mode of putting into is simple and with low costs in mentioning of this kind of silicon chip, is applicable to the silicon chip of small batch and washs.

Preferably, the inside of quartz cell body and the below that is located the rack are provided with the filter plate, the upper end both sides middle part of filter plate is through short rod fixed connection in the bottom both sides of rack, the inner wall of quartz cell body is laminated to the side of filter plate, can filter the impurity in the waste liquid through the filter plate to when proposing the rack, the filter plate of fixing with the rack bottom end is proposed thereupon, conveniently washs the impurity on its surface.

Preferably, the front cross-section of filter plate is the arc, and impurity accumulation is difficult for dropping in the curved concave surface, a plurality of evenly distributed's filtration pore is seted up to the bottom of filter plate, form the drainage chamber between the bottom of filter plate and the inside diapire of quartz cell body, the waste liquid after the filtration can get into the drainage chamber and discharge.

Preferably, the side wall of the lower part of one side of the quartz groove body is provided with a water outlet relative to the drainage cavity, the water outlet is in a strip shape, a rubber plug is embedded in the water outlet, and waste liquid can be discharged from the water outlet after the rubber plug is pulled out.

Preferably, fixedly connected with spring on the diapire of perpendicular groove, the upper end of spring passes through connecting block fixed connection in the lower extreme of montant, and the spring provides certain resistance, and too big range of motion is too big hard when avoiding the pulling horizontal pole, arouses that the great vibration skew of silicon chip drops.

The utility model has the following advantages:

through setting up hoist mechanism, only need the horizontal pole of pulling hoist mechanism just can mention and put back the rack, this kind of moving means is simple and with low costs, be applicable to the silicon chip washing of small batch, can drive the silicon chip on the rack through hoist mechanism and reciprocate simultaneously, make the silicon chip produce the vibration, spot on the silicon chip can drop, be convenient for wash, through setting up the filter plate of being connected with the rack integration, the filter plate can filter the waste liquid, and when proposing the rack, the filter plate fixed with the rack bottom is proposed thereupon, conveniently wash its surperficial impurity.

Drawings

FIG. 1 is a schematic sectional view of a double-layered quartz cell for cleaning a silicon wafer according to a preferred embodiment of the present invention;

FIG. 2 is a schematic perspective view of a double-layered quartz tank for cleaning silicon wafers according to a preferred embodiment of the present invention;

FIG. 3 is an enlarged schematic view of a double-layer quartz cell for cleaning silicon wafers according to a preferred embodiment of the present invention.

Description of the reference numerals: 1. a quartz cell body; 2. placing a rack; 3. a lifting mechanism; 31. a cross bar; 32. a vertical rod; 33. a vertical slot; 34. a spring; 4. filtering a plate; 41. filtering holes; 5. a water outlet; 6. a drainage chamber.

Detailed Description

The technical scheme of the utility model is clearly and completely described in the following with reference to the attached drawings. In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc., indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of description and simplicity of description, but do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance.

Examples

The double-layer quartz tank for cleaning the silicon wafer as shown in the figures 1-3 comprises a quartz tank body 1, wherein a placing frame 2 consisting of a plurality of placing rods is arranged inside the quartz tank body 1, cleaning liquid is placed in the quartz tank body 1, the silicon wafer is placed on the placing frame 2, so that the silicon wafer is soaked in the cleaning liquid, stains on the surface of the silicon wafer can be dissolved, a lifting mechanism 3 is arranged on one side of the upper end of the placing frame 2, the placing frame 2 vertically moves in the quartz tank body 1 through the lifting mechanism 3, the placing frame 2 vertically reciprocates to enable the silicon wafer to vibrate, stains on the silicon wafer can drop, the placing frame 2 drops along gaps between the placing rods, and after cleaning is finished, the placing frame 2 is lifted out of the quartz tank body 1 through the lifting mechanism 3, and the silicon wafer on the placing frame 2 can be taken out.

The lifting mechanism 3 comprises a cross rod 31, the cross rod 31 is fixedly connected to one side of the upper end of the placing rack 2 through connecting rods on two sides of the bottom end, the end part of the cross rod 31 is fixedly connected with a vertical rod 32, the vertical rod 32 extends to the middle part of the outer wall of the quartz groove body 1 from the end part of the cross rod 31, the quartz groove body 1 is provided with a vertical groove 33 relative to the vertical rod 32, the lower end of the vertical rod 32 is connected into the vertical groove 33 in a sliding manner through a connecting block, when the lifting mechanism 3 is used for lifting, the cross rod 31 is pulled, the connecting block at the lower end of the vertical rod 32 on one side can slide in the vertical groove 33, the placing rack 2 below the cross rod 31 can move, the lifting and placing mode of the silicon wafer is simple and low in cost, the lifting and placing mode is suitable for cleaning small batches of silicon wafers, the movement of the vertical rod 32 is guided by the vertical groove 33, the moving positions of the cross rod 31 and the placing rack 2 are guided, the up-down and down movement of the placing rack 2 is convenient, and the spring 34 is fixedly connected to the bottom wall of the vertical groove 33, the upper end of spring 34 passes through connecting block fixed connection in the lower extreme of montant 32, and spring 34 provides certain resistance, and too big range of movement is too big hard when avoiding pulling horizontal pole 31, arouses that the great vibration skew of silicon chip drops.

Impurity in the waste liquid is inconvenient discharges after wasing, consequently set up filter plate 4 in the inside of quartz groove body 1 and the below that is located rack 2, can filter the impurity in the waste liquid through filter plate 4, quarter butt fixed connection in rack 2's bottom both sides is passed through at the upper end both sides middle part of filter plate 4, the inner wall of quartz groove body 1 is laminated to the side of filter plate 4, when proposing rack 2, the filter plate 4 with rack 2 bottom mounting is thereupon proposed, conveniently wash the impurity on its surface.

Impurity on the filter plate 4 drops easily, consequently, the front cross-section of filter plate 4 is established to the arc, a plurality of evenly distributed's filtration pore 41 has been seted up to the bottom of filter plate 4, impurity accumulation is in curved concave surface, be difficult for dropping, form drainage chamber 6 between the bottom of filter plate 4 and the inside diapire of quartz cell body 1, the waste liquid after the filtration can get into drainage chamber 6 and discharge, relative drainage chamber 6 has seted up delivery port 5 on one side lower part lateral wall of quartz cell body 1, delivery port 5 is rectangular type, the gomphosis has the rubber buffer in the delivery port 5, after extracting the rubber buffer, the waste liquid can be followed delivery port 5 and discharged.

The working principle is as follows: place the silicon chip on rack 2, make the silicon chip soak in the washing liquid, can make its surperficial spot dissolve, horizontal pole 31 through pulling and pushing elevating system 3 drives rack 2 reciprocating motion from top to bottom, make the silicon chip produce the vibration, spot on the silicon chip can drop, space whereabouts between the pole of placing along rack 2, and the washing back that finishes, put forward quartz tank body 1 with rack 2 through elevating system 3, can take out the silicon chip on rack 2, can filter the impurity in the waste liquid through filter plate 4, when putting forward rack 2, filter plate 4 with rack 2 bottom mounting is followed by and is carried out, conveniently wash the impurity on its surface, finally, extract the rubber buffer, waste liquid after the filtration can get into drainage chamber 6 and discharge from delivery port 5.

Finally, it should be noted that: the above embodiments are only used to illustrate the technical solution of the present invention, and not to limit the same; while the utility model has been described in detail and with reference to the foregoing embodiments, it will be understood by those skilled in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some or all of the technical features may be equivalently replaced; and these modifications or substitutions do not depart from the spirit of the corresponding technical solutions of the embodiments of the present invention.

Claims (5)

1. A double-layer quartz cell for cleaning a silicon wafer comprises: the quartz cell comprises a quartz cell body (1), wherein a placing rack (2) consisting of a plurality of placing rods is arranged inside the quartz cell body (1), and the quartz cell is characterized in that a lifting mechanism (3) is arranged on one side of the upper end of the placing rack (2), and the placing rack (2) vertically moves inside the quartz cell body (1) through the lifting mechanism (3);

hoist mechanism (3) include horizontal pole (31), connecting rod fixed connection in the upper end one side of rack (2) through the bottom both sides is passed through in horizontal pole (31), the tip fixedly connected with montant (32) of horizontal pole (31), montant (32) extend to the outer wall middle part of quartz groove body (1) by the tip of horizontal pole (31), quartz groove body (1) montant (32) relatively has been seted up and has been erected groove (33), the lower extreme of montant (32) passes through connecting block sliding connection in erecting groove (33).

2. The double-layer quartz tank for cleaning the silicon wafers as claimed in claim 1, wherein a filter plate (4) is arranged inside the quartz tank body (1) and below the placing rack (2), the middle parts of two sides of the upper end of the filter plate (4) are fixedly connected to two sides of the bottom end of the placing rack (2) through short rods, and the side surface of the filter plate (4) is attached to the inner wall of the quartz tank body (1).

3. The double-layered quartz cell for cleaning the silicon wafer according to claim 2, wherein the cross section of the front surface of the filter plate (4) is arc-shaped, the bottom end of the filter plate (4) is provided with a plurality of uniformly distributed filter holes (41), and a drainage cavity (6) is formed between the bottom end of the filter plate (4) and the inner bottom wall of the quartz cell body (1).

4. The double-layered quartz cell for cleaning silicon wafers as claimed in claim 3, wherein the quartz cell body (1) has a water outlet (5) formed on a lower side wall of one side thereof opposite to the water discharge chamber (6), the water outlet (5) is elongated, and a rubber plug is embedded in the water outlet (5).

5. The double-layered quartz tank for silicon wafer cleaning according to claim 1, wherein a spring (34) is fixedly connected to the bottom wall of the vertical groove (33), and the upper end of the spring (34) is fixedly connected to the lower end of the vertical rod (32) through a connecting block.

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