CN216687774U - Integrated circuit trade grinding waste water retrieval and utilization and silica flour recovery processing system - Google Patents
Integrated circuit trade grinding waste water retrieval and utilization and silica flour recovery processing system Download PDFInfo
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- CN216687774U CN216687774U CN202123326828.0U CN202123326828U CN216687774U CN 216687774 U CN216687774 U CN 216687774U CN 202123326828 U CN202123326828 U CN 202123326828U CN 216687774 U CN216687774 U CN 216687774U
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Abstract
The utility model provides a system for recycling grinding wastewater and recovering and treating silicon powder in the integrated circuit industry, which is used for treating the grinding wastewater and has the advantages of low treatment cost, low sludge yield and low effluent conductivity. The device comprises an adjusting tank, wherein the adjusting tank is sequentially connected with a UF device, a sterilizer, a filter, an intermediate water tank and an RO device, the UF device is also connected with a filter press, the filter press is connected with the adjusting tank, and the filter press is also connected with a dryer.
Description
Technical Field
The utility model relates to the technical field of wastewater treatment, in particular to a system for recycling grinding wastewater and silicon powder in the integrated circuit industry.
Background
The manufacturing chain of the integrated circuit industry comprises silicon wafer production, chip manufacturing and packaging test, and radial grinding, crystal bar cutting and wafer grinding in the silicon wafer production and chemical mechanical grinding, crystal back thinning, wafer cutting and other processes in the chip manufacturing and packaging test all generate a large amount of grinding wastewater. The proportion of the grinding wastewater in all the wastewater is about 10-15%, and the grinding wastewater is a wastewater which has a large water amount and needs to be separated from a wastewater system for independent treatment. For example, in Chemical Mechanical Polishing (CMP), an inorganic abrasive (e.g., Al) is added during the CMP process2O3) An oxidizing agent (e.g. H)2O2) Chemical agents such as a small amount of surfactant and metal complexing agent are used for flattening the wafer, and ultrapure water is used for cleaning the surface of the wafer, so that a large amount of grinding wastewater is generated. Most of the grinding wastewater has the characteristics of high suspended matter concentration (100-1500 mg/L) and low conductivity (100-400 mu S/cm) and can be recycled.
The method for treating the grinding wastewater comprises a chemical coagulation method, an air floatation method and an electrochemical method, wherein the chemical coagulation method is the most applied method for treating the grinding wastewater at the present stage, a coagulant is added to compress double electronic layers on the surface of a colloid so as to destabilize the colloid, and then the colloid is flocculated into larger particles and finally is removed by sedimentation. But the chemical coagulation method has high treatment cost, large floor area, large sludge yield, high effluent conductivity and poor removal effect of nano-particles, and the effluent SDI is more than 5, so that the effluent is difficult to directly enter the RO membrane for recycling treatment.
SUMMERY OF THE UTILITY MODEL
The utility model provides a grinding wastewater recycling and silicon powder recycling treatment system in the integrated circuit industry, aiming at the problems of high treatment cost, large sludge yield and high effluent conductivity of the traditional grinding wastewater treatment method.
The technical scheme is as follows: the utility model provides an integrated circuit trade grinding waste water retrieval and utilization and silica flour recovery processing system, its includes the equalizing basin, and the equalizing basin connects gradually UF device, sterilizer, filter, middle pond, RO device, and the filter is used for getting rid of the oxidizing substance in the waste water, and the UF device still is connected with the pressure filter, and the filtrating export and the equalizing basin of pressure filter are connected, and the pressure filter still is connected with the desicator for dry the filter cake that the pressure filter produced.
Preferably, the adjusting tank is connected with the UF device through a first delivery pump, the UF device is connected with the sterilizer through a second delivery pump, the sterilizer is connected with the filter through a lift pump, and the intermediate water tank is connected with the RO device through a high-pressure pump.
Preferably, the water production outlet of the UF device is connected with the sterilizer, and the concentrate outlet of the UF device is connected with the filter press.
Preferably, the UF apparatus employs a polyvinylidene fluoride hollow fiber membrane.
Preferably, the filter is an activated carbon filter.
Has the advantages that: the system is adopted to recycle the grinding wastewater in the integrated circuit industry, and compared with the traditional chemical coagulation method, no medicament is required to be added, so that the treatment cost is reduced, the sludge amount is reduced, the water inlet conductivity of the RO device is 150-400 mu S/cm, and the conductivity is low, so that the recovery rate of the RO device can be improved.
Drawings
FIG. 1 is a block diagram of a system for recycling grinding wastewater and silicon powder in the IC industry according to the present invention;
FIG. 2 is a flow chart of the system for recycling grinding wastewater and silicon powder in the integrated circuit industry.
Detailed Description
As shown in fig. 1 and 2, the system for recycling grinding wastewater and silicon powder in the integrated circuit industry comprises an adjusting tank 1, wherein the adjusting tank 1 is sequentially connected with a first delivery pump 9, a UF device 2 (ultrafiltration device), a second delivery pump 10, an ultraviolet sterilizer 3, a lift pump 11, an activated carbon filter 4, an intermediate water tank 5, a high-pressure pump 12 and an RO device 6, the UF device 2 is further connected with a filter press 7, the filter press 7 is connected with the adjusting tank 1, and the filter press 7 is further connected with a dryer 8. Specifically, a water production outlet of the UF device 2 is connected to the ultraviolet sterilizer 3, and a concentrate outlet of the UF device 2 is connected to the filter press 7. Preferably, the UF device 2 employs a polyvinylidene fluoride hollow fiber membrane.
The processing flow of the utility model is as follows: (1) the grinding wastewater firstly enters an adjusting tank 1, acid and alkali are added into the adjusting tank, and the pH value of the grinding wastewater is adjusted to 6-7. The grinding wastewater after pH adjustment enters the UF device 2 through a first delivery pump 9. The UF device 2 is a hollow fiber membrane made of a polyvinylidene fluoride (PVDF) composite material having high hydrophilicity, contamination resistance, oxidation resistance, and high mechanical strength. The membrane area of the membrane element is 50 m2The pore diameter is 0.02-0.03 μm. The water inlet mode is an external pressure type, the operation mode is full pressure filtration, and the cleaning mode is air washing. The UF device 2 operates at a flux of 50-200 LMH, an operation period of 35-50 min and a gas washing time of 120-150 s. The recovery rate of the UF device 2 is 92-96%, the produced water enters the ultraviolet sterilizer 3, and the concentrated water directly enters the filter press 7.
(2) The water produced by the UF device 2 enters an ultraviolet sterilizer 3, and microorganisms in the wastewater are killed by ultraviolet rays (with the wavelength of 253.7 nm), so that the biological pollution and blockage risks of subsequent devices such as ACF (activated carbon fiber) and RO (reverse osmosis) are reduced. The wastewater after the sterilization treatment enters an activated carbon filter 4 through a lift pump 11 at a linear flow rate of 5-12 m/H to remove H in the grinding wastewater2O2And reducing the influence of the oxidizing substances on the RO membrane. The water discharged from the activated carbon filter 4 enters an intermediate water tank 5.
(3) The water from the activated carbon filter 4 in the intermediate water tank 5 enters the RO device 6 through the high-pressure pump 12. The water inlet conductivity of the RO device 6 is 150-400 mu S/cm, the recovery rate is 70-75%, the water production conductivity is 20-100 mu S/cm, and the RO device can be used as raw water of a pure water system; the concentrated water is discharged into other wastewater treatment systems for treatment.
(4) The UF device 2 has concentrated water SS >15000 mg/L and directly enters a filter press 7 for filter pressing treatment. The filtrate flows back to the regulating tank 1; and (3) putting the filter cake with the water content of 80-85% into a dryer 8 for drying treatment, thus obtaining the silicon powder with the purity of more than 99.2%. The recovered silicon powder can be used as a raw material of a silicon wafer and can also be used as an abrasive for a grinding process in the integrated circuit production industry.
As the silicon powder recovery and wastewater reuse can be completed without adding a medicament in the whole process, the treatment cost is reduced, devices such as a coagulation tank with large occupied area do not need to be built, the coagulation is not needed, the generation of sludge is reduced, the water inlet conductivity of the RO device is 150-400 mu S/cm, and the conductivity is lower, so that the recovery rate of the RO device can be improved.
In addition, the membrane main body material provided by the utility model is a polyvinylidene fluoride (PVDF) composite material which is antioxidant and has high mechanical strength. When the membrane is prepared, an amphiphilic block copolymer polymerized by hexafluorobutyl methacrylate and polyethylene glycol methacrylate is doped into the membrane casting solution, the amphiphilic block copolymer is spontaneously enriched to the surface of the membrane in the phase inversion membrane forming process, the hydrophilicity of the surface of the membrane is enhanced through the hydrophilic polyethylene glycol chain segment, a hydration layer is formed on the surface of the membrane, and the anti-pollution performance is improved; the fluorine-containing chain segment with low surface energy reduces the free energy of the film surface, endows the film surface with self-cleaning performance like lotus leaves, and reduces the adhesion of silicon powder particles. The addition of the amphiphilic block copolymer improves the pollution resistance and self-cleaning performance of the membrane, can reduce the adhesion and friction of sharp silicon powder particles on the surface of the membrane, can reduce the chemical cleaning frequency of the membrane, and prolongs the service life of the membrane.
Meanwhile, the interior of the UF device 2 provided by the utility model is connected with the membrane tows, the cleaning mode is air washing, air enters the air pipe from the lower part, so that the membrane tows generate uniform and violent disturbance, and the cleaning effect is excellent. The upper end of the membrane wire is fixedly connected with the shell of the ultrafiltration device, and the lower end of the membrane wire is not fixed with the shell, so that the cleaning effect of the membrane wire is enhanced. A layer of light reticular fiber membrane is wrapped outside the membrane silk bundle, so that the membrane silk is protected and fixed, and the membrane silk is prevented from being wound and stirred when the membrane element is operated and cleaned.
The recycling treatment process provided by the utility model does not need pretreatment equipment, and a special membrane wire fixing form, a membrane wire cleaning method and excellent membrane materials enable a UF device to directly treat most of grinding wastewater (SS 100-2000 mg/L), so that the investment cost is further reduced.
The UF apparatus 2 provided in the present invention operates in a full pressure filtration mode. Compared with cross flow filtration, the membrane has extremely low power consumption, longer service life of the membrane element and further reduced operation cost. The ultrafiltration membrane element only needs air washing and does not need water washing, the generation amount of concentrated water is extremely low, and the ultrafiltration recovery rate can reach more than 92 percent. The SS of the ultrafiltration concentrated water is more than 15 g/L, and the filter pressing treatment can be directly carried out without adding medicine. And drying the sludge subjected to filter pressing to obtain silicon powder with the purity of more than 99.2 percent. The recovered silicon powder can be used as a raw material of a silicon wafer and can also be used as a grinding agent for a grinding process in the integrated circuit production industry.
The following also demonstrates the effect of the present solution in combination with the examples: example 1: the grinding wastewater flow of a certain chip manufacturing plant is 48 m3The water quality is shown in the table 1:
the implementation of the embodiment comprises the following steps:
(1) and (3) pH adjustment: the grinding wastewater firstly enters an adjusting tank, acid and alkali are added into the adjusting tank, and the pH value of the grinding wastewater is adjusted to 6-7.
(2) And (3) ultrafiltration: and (4) feeding the grinding wastewater after pH adjustment into a UF device through a delivery pump. The UF device has the operation flux of 88.5 LMH, the operation period of 45 min and the gas washing time of 120 s. The recovery rate of the UF device is 95.9 percent, the produced water enters an ultraviolet sterilizer, and the quality of the produced water is shown in a table 2; the concentrated water directly enters a filter press. The UF apparatus performs CIP (cleaning) every 12 months.
(3) And (3) sterilization: the water produced by the UF device enters an ultraviolet sterilizer, and microorganisms in the wastewater are killed by ultraviolet rays (with the wavelength of 253.7 nm), so that the biological pollution and blockage risks of subsequent devices such as ACF (activated carbon fiber), RO (reverse osmosis) and the like are reduced.
(4) And (3) removing oxidizing substances: the wastewater after the sterilization treatment enters an activated carbon filter at a linear flow rate of 5-8 m/H by a lift pump to remove H in the grinding wastewater2O2And the like. The effluent of the activated carbon filter enters an intermediate water tank.
(5) Reverse osmosis: and the outlet water of the activated carbon filter in the middle water tank enters the RO device through the high-pressure pump. The RO device has the water inlet pressure of 0.8-1.3 MPa, the water inlet conductivity of 350-390 mu S/cm, the recovery rate of 70% and the water production conductivity of 80-110 mu S/cm, and can be used as raw water of a pure water system; the concentrated water is discharged into other wastewater treatment systems for treatment. The RO plant performs CIP every 3 months.
(6) Silicon powder recovery: and (4) enabling concentrated water SS of the UF device to be larger than 15500 mg/L, and directly entering a filter press for filter pressing treatment. The filtrate flows back to the regulating tank; and (3) the water content of the filter cake is 83-85%, and the filter cake enters a dryer for drying treatment to obtain silicon powder with the purity of more than 99.2%. The recovered silicon powder is used for producing an abrasive for a Chemical Mechanical Polishing (CMP) process.
Example 2: grinding wastewater water volume of 60 m in certain packaging test plant3The water quality is shown in the table 3:
the implementation of the embodiment comprises the following steps:
(1) and (3) pH adjustment: the grinding wastewater firstly enters an adjusting tank, acid and alkali are added into the adjusting tank, and the pH value of the grinding wastewater is adjusted to 6-7.
(2) And (3) ultrafiltration: and (4) feeding the grinding wastewater after pH adjustment into a UF device through a delivery pump. The UF device has the operation flux of 51.7 LMH, the operation period of 35 min and the gas washing time of 135 s. The recovery rate of the UF device is 92 percent, the produced water enters an ultraviolet sterilizer, and the quality of the produced water is shown in a table 4; the concentrated water directly enters a filter press. The UF unit performs CIP every 6 months.
(3) And (3) sterilization: the water produced by the UF device enters an ultraviolet sterilizer, and microorganisms in the wastewater are killed by ultraviolet rays (with the wavelength of 253.7 nm), so that the biological pollution and blockage risks of subsequent devices such as ACF (activated carbon fiber) and RO (reverse osmosis) are reduced.
(4) And (3) removing oxidizing substances: the sterilized wastewater flows linearly at a rate of 5-12 m/h by a lift pumpQuickly enters an active carbon filter to remove H in the grinding wastewater2O2And the like. The effluent of the activated carbon filter enters an intermediate water tank.
(5) Reverse osmosis: the effluent of the activated carbon filter in the middle water tank enters the RO device through a high-pressure pump. The RO device has the water inlet pressure of 0.8-1.5 MPa, the water inlet conductivity of 110-140 mu S/cm, the recovery rate of 75% and the water production conductivity of 20-50 mu S/cm, and can be used as raw water of a pure water system; the concentrated water is discharged into other wastewater treatment systems for treatment. The RO plant performs CIP every 6 months.
(6) Silicon powder recovery: the concentrated water SS of the UF device is more than 15000 mg/L and directly enters a filter press for filter pressing treatment. The filtrate flows back to the regulating tank; and (3) putting the filter cake with the water content of 80-85% into a dryer for drying treatment, thus obtaining the silicon powder with the purity of more than 99.7%. The recovered silicon powder can be used as a raw material of a semiconductor silicon wafer.
Comparative example: grinding wastewater yield of a certain chip manufacturing plant: 2.9 m3H, water quality: SS 600 mg/L. The implementation of the embodiment comprises the following steps:
(1) and (3) filtering: the grinding wastewater enters a multi-media filter to remove larger particles in the grinding wastewater. The effluent of the multi-medium filter enters the security filter, the filter material leaked from the multi-medium filter is intercepted, the ultrafiltration membrane is protected, and the risks of membrane wire fracture and pollution blockage of the ultrafiltration membrane are reduced.
(2) And (3) ultrafiltration: the effluent of the cartridge filter enters ultrafiltration for treatment. The ultrafiltration adopts external pressure type water inlet, and the recovery rate is about 90 percent. The water inlet pressure of the ultrafiltration membrane is 0.1-0.15 MPa. And an SDI (Serial digital interface) tester or a turbidity tester is arranged at the water production end of the ultrafiltration membrane, and whether the ultrafiltration water production meets the standard requirement to be set in advance is judged according to the detection result. If the produced water meets the standard requirements, the water enters a recycling system; if the produced water does not meet the standard requirement, the reflux is mixed with the raw water and reprocessed.
The comparative example adopts a membrane filtration method to treat the grinding wastewater, and the ultrafiltration recovery rate is 90 percent and is lower than the recovery rate of 92 to 96 percent of the ultrafiltration device in the utility model. And the operation mode of ultrafiltration in the comparative example is cross-flow filtration, so that the equipment energy consumption is high, the operation cost is high, and how to treat the ultrafiltration concentrated water is not described. In addition, the comparative example is provided with a multi-medium filter as a pretreatment device before ultrafiltration, so that the investment cost is increased and the overall recovery rate of the process is reduced. Compared with the comparative example, the process provided by the utility model does not need pretreatment equipment, can directly treat most of grinding wastewater (SS 100-2000 mg/L), and has the advantages of high recovery rate, high treatment efficiency and low operation energy consumption. Compared with the traditional grinding wastewater treatment process, the process provided by the utility model has the advantages that the operation cost is greatly reduced, the recycled wastewater and the recycled silicon powder create great economic benefits for enterprises, and the wastewater treatment pressure of the enterprises is reduced.
The above description is only for the preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any changes or substitutions that can be easily conceived by those skilled in the art within the technical scope of the present invention are included in the scope of the present invention. Therefore, the protection scope of the present invention should be subject to the protection scope of the claims.
Claims (5)
1. The utility model provides an integrated circuit trade grinds waste water retrieval and utilization and silica flour recovery processing system, its includes the equalizing basin, its characterized in that: the device comprises an adjusting tank, a filter, an intermediate water tank, a filter press and a dryer, wherein the adjusting tank is sequentially connected with a UF device, a sterilizer, the filter, the intermediate water tank and an RO device, the filter is used for removing oxidizing substances in wastewater, the UF device is further connected with the filter press, a filtrate outlet of the filter press is connected with the adjusting tank, and the filter press is further connected with the dryer and used for drying filter cakes generated by the filter press.
2. The integrated circuit industry grinding wastewater recycling and silicon powder recycling system according to claim 1, characterized in that: the adjusting tank is connected with the UF device through a first delivery pump, the UF device is connected with the sterilizer through a second delivery pump, the sterilizer is connected with the filter through a lifting pump, and the intermediate water tank is connected with the RO device through a high-pressure pump.
3. The integrated circuit industry grinding wastewater recycling and silicon powder recycling system according to claim 1, characterized in that: and a water production outlet of the UF device is connected with the sterilizer, and a concentrated water outlet of the UF device is connected with the filter press.
4. The system for recycling grinding wastewater and silicon powder recovery processing in the integrated circuit industry according to any one of claims 1 to 3, wherein the system comprises: the UF device adopts a polyvinylidene fluoride hollow fiber membrane.
5. The system for recycling grinding wastewater and silicon powder recovery processing in the integrated circuit industry according to any one of claims 1 to 3, wherein the system comprises: the filter is an activated carbon filter.
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115286141A (en) * | 2022-08-10 | 2022-11-04 | 江苏美科太阳能科技股份有限公司 | Treatment device and method for silicon wafer degumming wastewater |
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2021
- 2021-12-28 CN CN202123326828.0U patent/CN216687774U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115286141A (en) * | 2022-08-10 | 2022-11-04 | 江苏美科太阳能科技股份有限公司 | Treatment device and method for silicon wafer degumming wastewater |
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